公开(公告)号：US08899174B2

公开(公告)日：2014-12-02

申请号：US12896496

申请日：2010-10-01

申请人： Won-Hyouk Jang ,  Eu-Gene Kang ,  Joo-Hwa Lee ,  Min-Jeong Hwang

发明人： Won-Hyouk Jang ,  Eu-Gene Kang ,  Joo-Hwa Lee ,  Min-Jeong Hwang

IPC分类号： C23C16/52 ,  C23C16/448 ,  C23C16/44 ,  C23C16/00 ,  B05C11/00

CPC分类号： C23C16/00 ,  B05C11/00 ,  C23C16/44 ,  C23C16/448 ,  C23C16/52

摘要： A device for manufacturing a display device includes a deposition source; a deposition thickness calculator for calculating a deposition thickness of a deposition material deposited on a substrate; and a controller for controlling a power of a heater which heats the deposition source by comparing the deposition thickness calculated with a reference thickness. The controller controls the power of the heater either at least one time for each substrate on which the thin film is to be deposited or at regular intervals while the deposition material is deposited. Influence of measurement noise that is included in a quartz crystal sensor for measuring a deposition speed may be minimized, and distribution of deposition thickness of an organic light emitting material may be reduced, thereby increasing the yield of the deposition process and producing quality display devices.

摘要翻译： 一种用于制造显示装置的装置包括沉积源; 沉积厚度计算器，用于计算沉积在衬底上的沉积材料的沉积厚度; 以及控制器，用于通过比较用参考厚度计算的沉积厚度来控制加热沉积源的加热器的功率。 控制器对于要沉积薄膜的每个衬底至少一次控制加热器的功率，或者在沉积材料沉积时以规则的间隔控制加热器的功率。 包含在用于测量沉积速度的石英晶体传感器中的测量噪声的影响可以被最小化，并且可以减少有机发光材料的沉积厚度的分布，从而提高沉积工艺的产量并产生高质量的显示装置。

公开(公告)号：US20110189380A1

公开(公告)日：2011-08-04

申请号：US12896496

申请日：2010-10-01

申请人： Won-Hyouk Jang ,  Eu-Gene Kang ,  Joo-Hwa Lee ,  Min-Jeong Hwang

发明人： Won-Hyouk Jang ,  Eu-Gene Kang ,  Joo-Hwa Lee ,  Min-Jeong Hwang

IPC分类号： C23C16/52 ,  C23C16/00

CPC分类号： C23C16/00 ,  B05C11/00 ,  C23C16/44 ,  C23C16/448 ,  C23C16/52

摘要： A device for manufacturing a display device includes a deposition source; a deposition thickness calculator for calculating a deposition thickness of a deposition material deposited on a substrate; and a controller for controlling a power of a heater which heats the deposition source by comparing the deposition thickness calculated with a reference thickness. The controller controls the power of the heater either at least one time for each substrate on which the thin film is to be deposited or at regular intervals while the deposition material is deposited. Influence of measurement noise that is included in a quartz crystal sensor for measuring a deposition speed may be minimized, and distribution of deposition thickness of an organic light emitting material may be reduced, thereby increasing the yield of the deposition process and producing quality display devices.

摘要翻译： 一种用于制造显示装置的装置包括沉积源; 沉积厚度计算器，用于计算沉积在基底上的沉积材料的沉积厚度; 以及控制器，用于通过比较用参考厚度计算的沉积厚度来控制加热沉积源的加热器的功率。 控制器对于要沉积薄膜的每个衬底至少一次控制加热器的功率，或者在沉积材料沉积时以规则的间隔控制加热器的功率。 包含在用于测量沉积速度的石英晶体传感器中的测量噪声的影响可以被最小化，并且可以减少有机发光材料的沉积厚度的分布，从而提高沉积工艺的产量并产生高质量的显示装置。

公开(公告)号：US08512473B2

公开(公告)日：2013-08-20

申请号：US12881759

申请日：2010-09-14

申请人： Jae-Mork Park ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Hong Ahn ,  Min-Jeong Hwang

发明人： Jae-Mork Park ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Hong Ahn ,  Min-Jeong Hwang

IPC分类号： C23C16/458 ,  H01L21/306 ,  C23F1/00 ,  C23C16/06 ,  C23C16/22

CPC分类号： H01L21/682 ,  C23C14/042 ,  H01L51/001 ,  H01L51/56

摘要： A substrate centering device for an organic material deposition system comprises: a plurality of substrate support holders configured to be reciprocally movable in a facing direction within an organic material deposition chamber and supporting both side portions of a substrate loaded by a robot; a substrate centering unit configured to be reciprocally movable at each of the substrate support holders and centering the substrate by guiding both side portions of the substrate; and a plurality of substrate clampers configured to be reciprocally movable in a vertical direction at each of the substrate support holders, and clamping the substrate that has been centered by the substrate centering unit.

摘要翻译： 一种用于有机材料沉积系统的基板定心装置，包括：多个基板支撑保持器，其构造成可在有机材料沉积室内面向相反方向往复运动，并支撑由机器人装载的基板的两侧部分; 基板定心单元，其构造成在每个基板支撑保持器处可往复运动，并且通过引导基板的两个侧部对准基板; 以及多个基板夹持器，其构造成在每个基板支撑保持器处在垂直方向上往复运动，并且夹持由基板定心单元居中的基板。

公开(公告)号：US20130302134A1

公开(公告)日：2013-11-14

申请号：US13942514

申请日：2013-07-15

申请人： Jae-Mork Park ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Hong Ahn ,  Min-Jeong Hwang

发明人： Jae-Mork Park ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Hong Ahn ,  Min-Jeong Hwang

IPC分类号： H01L21/68

CPC分类号： H01L21/682 ,  C23C14/042 ,  H01L51/001 ,  H01L51/56

摘要： A substrate centering device for an organic material deposition system comprises: a plurality of substrate support holders configured to be reciprocally movable in a facing direction within an organic material deposition chamber and supporting both side portions of a substrate loaded by a robot; a substrate centering unit configured to be reciprocally movable at each of the substrate support holders and centering the substrate by guiding both side portions of the substrate; and a plurality of substrate clampers configured to be reciprocally movable in a vertical direction at each of the substrate support holders, and clamping the substrate that has been centered by the substrate centering unit.

摘要翻译： 一种用于有机材料沉积系统的基板定心装置，包括：多个基板支撑保持器，其构造成可在有机材料沉积室内面向相反方向往复运动，并支撑由机器人装载的基板的两侧部分; 基板定心单元，其构造成在每个基板支撑保持器处可往复运动，并且通过引导基板的两个侧部对准基板; 以及多个基板夹持器，其构造成在每个基板支撑保持器处在垂直方向上往复运动，并且夹持由基板定心单元居中的基板。

公开(公告)号：US08961692B2

公开(公告)日：2015-02-24

申请号：US12659987

申请日：2010-03-26

申请人： Jae-Wan Park ,  You-Min Cha ,  Jae-Hong Ahn ,  Won-Seok Cho ,  Jae-Mork Park ,  Min-Jeong Hwang

发明人： Jae-Wan Park ,  You-Min Cha ,  Jae-Hong Ahn ,  Won-Seok Cho ,  Jae-Mork Park ,  Min-Jeong Hwang

IPC分类号： C23C16/00 ,  C23C14/24 ,  C23C14/04

CPC分类号： C23C14/243 ,  C23C14/044

摘要： Provided is an evaporating apparatus that deposits a deposition material onto a treatment object. The evaporating apparatus includes a base, a deposition source, and first and second correction units. The deposition source deposits the deposition material onto the treatment object. The base is disposed separately from the treatment object. The deposition source is placed on a surface of the base. The first and second correction units located between the deposition source and the treatment object. The first and second correction units are disposed on outer regions of the deposition source and face each other. Each of the first and second correction units rotates to control the thickness of a layer formed by the deposition material deposited on the treatment object.

摘要翻译： 提供了一种将沉积材料沉积到处理物体上的蒸发装置。 蒸发装置包括基座，沉积源以及第一和第二校正单元。 沉积源将沉积材料沉积到处理对象上。 基座与治疗对象分开设置。 沉积源放置在基底的表面上。 位于沉积源和处理对象之间的第一和第二校正单元。 第一和第二校正单元设置在沉积源的外部区域上并且彼此面对。 第一和第二校正单元中的每一个旋转以控制由沉积在处理对象上的沉积材料形成的层的厚度。

公开(公告)号：US20110073042A1

公开(公告)日：2011-03-31

申请号：US12881759

申请日：2010-09-14

申请人： Jae-Mork Park ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Hong Ahn ,  Min-Jeong Hwang

发明人： Jae-Mork Park ,  You-Min Cha ,  Won-Seok Cho ,  Jae-Hong Ahn ,  Min-Jeong Hwang

IPC分类号： C23C16/458 ,  C23C16/00

CPC分类号： H01L21/682 ,  C23C14/042 ,  H01L51/001 ,  H01L51/56

摘要： A substrate centering device for an organic material deposition system comprises: a plurality of substrate support holders configured to be reciprocally movable in a facing direction within an organic material deposition chamber and supporting both side portions of a substrate loaded by a robot; a substrate centering unit configured to be reciprocally movable at each of the substrate support holders and centering the substrate by guiding both side portions of the substrate; and a plurality of substrate clampers configured to be reciprocally movable in a vertical direction at each of the substrate support holders, and clamping the substrate that has been centered by the substrate centering unit.

摘要翻译： 一种用于有机材料沉积系统的基板定心装置，包括：多个基板支撑保持器，其构造成可在有机材料沉积室内面向相反方向往复运动，并支撑由机器人装载的基板的两侧部分; 基板定心单元，其构造成在每个基板支撑保持器处可往复运动，并且通过引导基板的两个侧部对准基板; 以及多个基板夹持器，其构造成在每个基板支撑保持器处在垂直方向上往复运动，并且夹持由基板定心单元居中的基板。

公开(公告)号：US08623455B2

公开(公告)日：2014-01-07

申请号：US13215434

申请日：2011-08-23

申请人： Sung-Ho Lee ,  Su-Hwan Kim ,  Min-Jeong Hwang

发明人： Sung-Ho Lee ,  Su-Hwan Kim ,  Min-Jeong Hwang

IPC分类号： C23C16/00

CPC分类号： C23C14/243 ,  C23C14/56

摘要： A multiple vacuum evaporation coating device and a method for controlling the same. The vacuum evaporation coating device includes a plurality of evaporation sources, a rotating part adapted to rotate the plurality of evaporation sources and a coating block plate adapted to block all but one of said plurality of evaporation sources at any time, each of the plurality of evaporation sources comprise a case, a melting pot arranged within said case, an evaporation material arranged within the melting pot, a heating device arranged outside the melting pot and adapted to heat and evaporate the evaporation material, and a cooling device adapted to block heat generated by the heating device from transferring to an outside.

摘要翻译： 多重真空蒸镀装置及其控制方法。 真空蒸发涂布装置包括多个蒸发源，适于使多个蒸发源旋转的旋转部分和适于在任何时间阻止所有多个蒸发源中的除所有多个蒸发源之外的所有蒸发源的涂层阻挡板，多个蒸发 源包括壳体，布置在所述壳体内的熔炉，布置在熔炉内的蒸发材料，布置在熔池外部并适于加热和蒸发蒸发材料的加热装置，以及适于阻挡由蒸发材料产生的热的冷却装置 加热装置转移到外部。

公开(公告)号：US08057648B2

公开(公告)日：2011-11-15

申请号：US11324344

申请日：2006-01-04

申请人： Min-Jeong Hwang

发明人： Min-Jeong Hwang

IPC分类号： C23C14/52

CPC分类号： C23C14/542

摘要： A deposition system and its method of control cancels the influence of noise occurring during measuring of a deposition rate using a noise canceller in order to exactly control the deposition rate, and obtains a film of a desired thickness. The deposition system includes a deposition device. A deposition rate sensor measures a deposition rate of the deposition device. A noise canceller cancels a noise component of the measured deposition rate. A power supply unit adjusts power supplied to the deposition device according to an output of the noise canceller.

摘要翻译： 沉积系统及其控制方法使用噪声消除器来抵消在测量沉积速率期间发生的噪声的影响，以精确地控制沉积速率，并获得所需厚度的膜。 沉积系统包括沉积装置。 沉积速率传感器测量沉积装置的沉积速率。 噪声消除器消除所测量的沉积速率的噪声分量。 电源单元根据噪声消除器的输出来调整提供给沉积装置的功率。

公开(公告)号：US20100275842A1

公开(公告)日：2010-11-04

申请号：US12659987

申请日：2010-03-26

申请人： Jae-Wan Park ,  You-Min Cha ,  Jae-Hong Ahn ,  Won-Seok Cho ,  Jae-Mork Park ,  Min-Jeong Hwang

发明人： Jae-Wan Park ,  You-Min Cha ,  Jae-Hong Ahn ,  Won-Seok Cho ,  Jae-Mork Park ,  Min-Jeong Hwang

IPC分类号： C23C16/00

CPC分类号： C23C14/243 ,  C23C14/044

摘要： Provided is an evaporating apparatus that deposits a deposition material onto a treatment object. The evaporating apparatus includes a base, a deposition source, and first and second correction units. The deposition source deposits the deposition material onto the treatment object. The base is disposed separately from the treatment object. The deposition source is placed on a surface of the base. The first and second correction units located between the deposition source and the treatment object. The first and second correction units are disposed on outer regions of the deposition source and face each other. Each of the first and second correction units rotates to control the thickness of a layer formed by the deposition material deposited on the treatment object.

摘要翻译： 提供了一种将沉积材料沉积到处理物体上的蒸发装置。 蒸发装置包括基座，沉积源以及第一和第二校正单元。 沉积源将沉积材料沉积到处理对象上。 基座与治疗对象分开设置。 沉积源放置在基底的表面上。 位于沉积源和处理对象之间的第一和第二校正单元。 第一和第二校正单元设置在沉积源的外部区域上并且彼此面对。 第一和第二校正单元中的每一个旋转以控制由沉积在处理对象上的沉积材料形成的层的厚度。

公开(公告)号：US07862855B2

公开(公告)日：2011-01-04

申请号：US11325558

申请日：2006-01-05

申请人： Min-Jeong Hwang ,  Kwan-Seop Song ,  Do-Geun Kim ,  Jae-Hong Ahn ,  Sung-Ho Lee

发明人： Min-Jeong Hwang ,  Kwan-Seop Song ,  Do-Geun Kim ,  Jae-Hong Ahn ,  Sung-Ho Lee

IPC分类号： C23C16/448

CPC分类号： C23C14/243 ,  C23C14/12

摘要： In a method of controlling an effusion cell in a deposition system, including a crucible, a guiding pathway and an injection nozzle, a guiding pathway and an injection nozzle are heated. The crucible is heated after heating the guiding pathway and the injection nozzle. In addition, in cooling the effusion cell including a crucible, a guiding pathway and an injection nozzle, the crucible is cooled. The guiding pathway and the injection nozzle are cooled after cooling the crucible. This method has an advantage of enhancing uniformity of the organic layer formed on the substrate by preventing the clogging of the injection nozzle by deposition material vaporized in the crucible or splashing.

摘要翻译： 在包括坩埚，引导通道和注射喷嘴，引导通道和注射喷嘴的沉积系统中控制渗出池的方法中， 在加热引导通道和注射喷嘴之后加热坩埚。 此外，在冷却包括坩埚，引导通道和注射喷嘴的积液池时，将坩埚冷却。 冷却坩埚后，引导通道和喷嘴被冷却。 该方法具有通过防止在坩埚中蒸发的沉积材料或喷溅而防止喷嘴堵塞而提高形成在基板上的有机层的均匀性的优点。