公开(公告)号：US07063986B2

公开(公告)日：2006-06-20

申请号：US10910745

申请日：2004-08-03

申请人： Woo Young Lee ,  Suk Hee Han ,  Joon Yeon Chang ,  Hi Jung Kim ,  Jung Mi Lee ,  Jae Min Myoung

发明人： Woo Young Lee ,  Suk Hee Han ,  Joon Yeon Chang ,  Hi Jung Kim ,  Jung Mi Lee ,  Jae Min Myoung

IPC分类号： H01L21/302

CPC分类号： B82Y25/00 ,  B82Y40/00 ,  H01F1/404 ,  H01F10/193 ,  H01F10/3213 ,  H01F41/30 ,  H01L21/0242 ,  H01L21/0254 ,  H01L21/02543 ,  H01L21/02573 ,  H01L21/02581 ,  H01L21/0262 ,  H01L21/02631 ,  H01L29/66984 ,  H01L33/40 ,  H01L43/08 ,  H01L43/10

摘要： A 3 group–5 group compound ferromagnetic semiconductor, comprising one material ‘A’ selected from the group of Ga, Al and In and one material ‘B’ selected from the group consisting of N and P, wherein one material ‘C’ selected from the group consisting of Mn, Mg, Co, Fe, Ni, Cr and V is doped as a material for substituting the material ‘A’, the compound semiconductor has a single phase as a whole. The ferromagnetic semiconductor can be fabricated by a plasma-enhance molecular beam epitaxy growing method and since it shows the ferromagnetic characteristics at a room temperature, it can be applied as various spin electron devices.

摘要翻译： 包含选自Ga，Al和In的一种材料“A”和选自N和P的一种材料“B”的3组5族化合物铁磁半导体，其中一种选自 掺杂有Mn，Mg，Co，Fe，Ni，Cr和V的组合作为材料“A”的材料被掺杂，化合物半导体整体上具有单相。 铁磁半导体可以通过等离子体增强分子束外延生长方法制造，并且由于其显示室温下的铁磁特性，因此可以用作各种自旋电子器件。

公开(公告)号：US08227348B2

公开(公告)日：2012-07-24

申请号：US12349164

申请日：2009-01-06

申请人： Jae Min Myoung ,  Jyoti Prakash Kar

发明人： Jae Min Myoung ,  Jyoti Prakash Kar

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： B81C1/00206 ,  B81B2203/0361 ,  C30B25/005 ,  C30B25/04 ,  C30B29/16 ,  C30B29/605 ,  G03F7/0035 ,  H01L21/02521 ,  H01L21/02554 ,  H01L21/02603 ,  H01L21/02639 ,  H01L21/0331

摘要： A method for patterning nanowires on a substrate. The method includes procedures of preparing a substrate having a patterned sacrificial layer of barium fluoride thereon; growing nanowires on an entire surface of the resultant substrate including the patterned sacrificial layer; and removing the patterned sacrificial layer using a solvent to remove part of the nanowires on the patterned sacrificial layer such that part of the nanowires in direct contact with the substrate remains on the substrate to thereby form a nanowire pattern.

摘要翻译： 一种用于在衬底上构图纳米线的方法。 该方法包括制备其上具有氟化钡的图案化牺牲层的衬底的步骤; 在包括图案化牺牲层的所得基底的整个表面上生长纳米线; 并且使用溶剂去除图案化的牺牲层以去除图案化牺牲层上的部分纳米线，使得与衬底直接接触的部分纳米线保留在衬底上，从而形成纳米线图案。

公开(公告)号：US09112076B2

公开(公告)日：2015-08-18

申请号：US13816016

申请日：2011-08-10

申请人： Jae Min Myoung ,  Jun Jie Xiong ,  Tae Il Lee

发明人： Jae Min Myoung ,  Jun Jie Xiong ,  Tae Il Lee

IPC分类号： C03C15/00 ,  H01L31/0392 ,  H01G9/20 ,  H01L31/0236

CPC分类号： H01L31/0392 ,  B60R1/04 ,  C03C3/078 ,  C03C3/087 ,  C03C4/0092 ,  C03C11/005 ,  C03C15/00 ,  C03C2204/00 ,  C03C2204/08 ,  G02B27/0006 ,  G02B2207/107 ,  G02F1/133308 ,  G02F2001/133302 ,  G06F3/041 ,  H01G9/20 ,  H01L31/02366 ,  Y02B10/10 ,  Y02E10/50 ,  Y10T428/1045 ,  Y10T428/24355 ,  Y10T428/249969

摘要： A glass substrate manufacturing method of the present invention comprises forming a multi-porous structure layer which comprises nano-size pores at a surface of a glass substrate by etching the surface of the glass substrate with hydrofluoric (HF) acid or an etchant substituting for fluoride. Unlike related art methods, the glass substrate forms no additional coating layer, uses no harmful chemical material, and is given anti-reflection, anti-fogging, and super-hydrophilic characteristics through a simple process at a relatively low temperature. The glass substrate is effectively applied to various applications requiring high light transmission such as a protective filter for a display device, a solar cell, a mobile communication device, glass of a building structure, and an optical element lens.

摘要翻译： 本发明的玻璃基板的制造方法包括通过用氢氟酸（HF）酸或蚀刻剂代替氟化物蚀刻玻璃基板的表面，在玻璃基板的表面上形成包含纳米尺寸孔的多孔结构层 。 与现有技术方法不同，玻璃基板不形成额外的涂层，不使用有害化学材料，并且通过在较低温度下的简单工艺得到抗反射，防雾和超亲水特性。 玻璃基板有效地应用于需要高光传输的各种应用，例如用于显示装置的保护滤光器，太阳能电池，移动通信装置，建筑结构的玻璃和光学元件透镜。

公开(公告)号：US09653625B2

公开(公告)日：2017-05-16

申请号：US14123808

申请日：2011-12-15

申请人： Jae Min Myoung ,  Beom Ki Shin ,  Tae Il Lee

发明人： Jae Min Myoung ,  Beom Ki Shin ,  Tae Il Lee

IPC分类号： H01L31/0216 ,  H01L31/0236

CPC分类号： H01L31/02168 ,  H01L31/02363 ,  H01L31/02366 ,  Y02E10/50

摘要： A method of manufacturing antireflective coating for solar cell having a moth-eye structure and a solar cell including the same are provided to greatly reduce reflectivity by forming an antireflective coating layer having a moth-eye structure on an upper electrode layer of the solar cell using a bottom-up method. A bottom electrode layer is formed on a substrate. A photoreactive layer is formed on the bottom electrode layer. The photoreactive layer is made of CIS (Copper, Indium, Selenide) materials. A buffer layer is formed on the photoreactive layer. A ZnO layer is formed on the buffer layer. A top electrode layer is formed on the ZnO layer.

公开(公告)号：US20140166101A1

公开(公告)日：2014-06-19

申请号：US14123808

申请日：2011-12-15

申请人： Jae Min Myoung ,  Beom Ki Shin ,  Tae II Lee

发明人： Jae Min Myoung ,  Beom Ki Shin ,  Tae II Lee

IPC分类号： H01L31/0216 ,  H01L31/0236

CPC分类号： H01L31/02168 ,  H01L31/02363 ,  H01L31/02366 ,  Y02E10/50

摘要： A method of manufacturing antireflective coating for solar cell having a moth-eye structure and a solar cell including the same are provided to greatly reduce reflectivity by forming an antireflective coating layer having a moth-eye structure on an upper electrode layer of the solar cell using a bottom-up method. A bottom electrode layer is formed on a substrate. A photoreactive layer is formed on the bottom electrode layer. The photoreactive layer is made of CIS (Copper, Indium, Selenide) materials. A buffer layer is formed on the photoreactive layer. A ZnO layer is formed on the buffer layer. A top electrode layer is formed on the ZnO layer.

摘要翻译： 提供一种制造具有蛾眼结构的太阳能电池用抗反射涂层的方法和包括该防反射涂层的太阳能电池的方法，以通过在太阳能电池的上电极层上形成具有蛾眼结构的抗反射涂层来大大降低反射率 自下而上的方法。 在基板上形成底部电极层。 在底部电极层上形成光反应层。 光反应层由CIS（铜，铟，硒化物）材料制成。 在光反应层上形成缓冲层。 在缓冲层上形成ZnO层。 在ZnO层上形成顶部电极层。

公开(公告)号：US20130164521A1

公开(公告)日：2013-06-27

申请号：US13816016

申请日：2011-08-10

申请人： Jae Min Myoung ,  Jun Jie Xiong ,  Tae Il Lee

发明人： Jae Min Myoung ,  Jun Jie Xiong ,  Tae Il Lee

IPC分类号： C03C15/00

CPC分类号： H01L31/0392 ,  B60R1/04 ,  C03C3/078 ,  C03C3/087 ,  C03C4/0092 ,  C03C11/005 ,  C03C15/00 ,  C03C2204/00 ,  C03C2204/08 ,  G02B27/0006 ,  G02B2207/107 ,  G02F1/133308 ,  G02F2001/133302 ,  G06F3/041 ,  H01G9/20 ,  H01L31/02366 ,  Y02B10/10 ,  Y02E10/50 ,  Y10T428/1045 ,  Y10T428/24355 ,  Y10T428/249969

摘要： A glass substrate manufacturing method of the present invention comprises forming a multi-porous structure layer which comprises nano-size pores at a surface of a glass substrate by etching the surface of the glass substrate with hydrofluoric (HF) acid or an etchant substituting for fluoride. Unlike related art methods, the glass substrate forms no additional coating layer, uses no harmful chemical material, and is given anti-reflection, anti-fogging, and super-hydrophilic characteristics through a simple process at a relatively low temperature. The glass substrate is effectively applied to various applications requiring high light transmission such as a protective filter for a display device, a solar cell, a mobile communication device, glass of a building structure, and an optical element lens.

摘要翻译： 本发明的玻璃基板的制造方法包括通过用氢氟酸（HF）酸或蚀刻剂代替氟化物蚀刻玻璃基板的表面，在玻璃基板的表面上形成包含纳米尺寸孔的多孔结构层 。 与现有技术方法不同，玻璃基板不形成额外的涂层，不使用有害化学材料，并且通过在较低温度下的简单工艺得到抗反射，防雾和超亲水特性。 玻璃基板有效地应用于需要高光传输的各种应用，例如用于显示装置的保护滤光器，太阳能电池，移动通信装置，建筑结构的玻璃和光学元件透镜。

公开(公告)号：US08399334B2

公开(公告)日：2013-03-19

申请号：US13015286

申请日：2011-01-27

申请人： Jae Min Myoung ,  Hong Koo Baik ,  Tae Il Lee

发明人： Jae Min Myoung ,  Hong Koo Baik ,  Tae Il Lee

IPC分类号： H01L29/66 ,  H01L21/20 ,  H01L21/66 ,  B82Y99/00

CPC分类号： H01L29/0665 ,  B82Y10/00 ,  B82Y30/00 ,  H01L21/02532 ,  H01L21/02603 ,  H01L21/02628 ,  H01L22/12 ,  H01L22/20 ,  H01L29/0673 ,  H01L29/775 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method of manufacturing a nano device by directly printing a plurality of NW devices in a desired shape on a predesigned gate substrate. The method includes preparing an NW solution, preparing a building block for performing decaling onto the substrate by carrying an NW device, forming the NW device by connecting electrodes of each of building block units of the building block using NWs by dropping the NW solution between the electrodes and then through dielectrophoresis, visually inspecting the numbers of NW bridges that are formed between the electrodes of each of the building block units through the dielectrophoresis, grouping the building block units according to the numbers, and decaling the NW device formed on each of the building block units onto the gate substrate by bringing the grouped building block units into contact with the predesigned gate substrate and then detaching the grouped building block units.

摘要翻译： 一种通过在预先设计的栅极衬底上以期望的形状直接印刷多个NW器件来制造纳米器件的方法。 该方法包括：准备一个NW解决方案，准备一个构建块，用于通过运送一个NW装置来对基板执行贴花加工，通过使用NW来连接构造块的每个结构单元的电极来形成NW装置， 电极，然后通过介电电泳，目视检查通过介电电泳在每个构建块单元的电极之间形成的NW桥的数量，根据数字对构建块单元进行分组，以及对每个 通过使分组的构建块单元与预先设计的门基板接触并且然后分离分组的构件单元，将构件单元组合到栅极基板上。

公开(公告)号：US20100116780A1

公开(公告)日：2010-05-13

申请号：US12349164

申请日：2009-01-06

申请人： Jae Min Myoung ,  Jyoti Prakash Kar

发明人： Jae Min Myoung ,  Jyoti Prakash Kar

IPC分类号： B44C1/22 ,  B32B9/00

CPC分类号： B81C1/00206 ,  B81B2203/0361 ,  C30B25/005 ,  C30B25/04 ,  C30B29/16 ,  C30B29/605 ,  G03F7/0035 ,  H01L21/02521 ,  H01L21/02554 ,  H01L21/02603 ,  H01L21/02639 ,  H01L21/0331

摘要： A method for patterning nanowires on a substrate. The method includes procedures of preparing a substrate having a patterned sacrificial layer of barium fluoride thereon; growing nanowires on an entire surface of the resultant substrate including the patterned sacrificial layer; and removing the patterned sacrificial layer using a solvent to remove part of the nanowires on the patterned sacrificial layer such that part of the nanowires in direct contact with the substrate remains on the substrate to thereby form a nanowire pattern.

摘要翻译： 一种用于在衬底上构图纳米线的方法。 该方法包括制备其上具有氟化钡的图案化牺牲层的衬底的步骤; 在包括图案化牺牲层的所得基底的整个表面上生长纳米线; 并且使用溶剂去除图案化的牺牲层以去除图案化牺牲层上的部分纳米线，使得与衬底直接接触的部分纳米线保留在衬底上，从而形成纳米线图案。