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    Methods and systems for determining optical properties using low-coherence interference signals
    1.
    发明申请
    Methods and systems for determining optical properties using low-coherence interference signals 有权
    使用低相干干涉信号确定光学性质的方法和系统

    公开(公告)号：US20070086019A1

    公开(公告)日：2007-04-19

    申请号：US11604668

    申请日：2006-11-27

    Applicant: Xavier De Lega

    Inventor： Xavier De Lega

    IPC: G01B11/02

    CPC classification number: G01B9/02084 ,  G01B9/02058 ,  G01B9/0209 ,  G01B11/2441 ,  G01M11/0228 ,  G01M11/0271 ,  G01N21/45

    Abstract: Methods and related systems for determining properties of optical systems (e.g., interferometers) and/or optical elements (e.g., lenses and/or lens systems) are described. For example, information related to an optical thickness mismatch of an interferometer can be determined by providing scanning interferometry data. The data typically include obtaining one or more interference signals each corresponding to a different spatial location of a test object. A phase is determined for each of multiple frequencies of each interference signal. The information related to the optical thickness mismatch is determined based on the phase for each of the multiple frequencies of the interference signal(s).

    Abstract translation: 描述了用于确定光学系统（例如，干涉仪）和/或光学元件（例如，透镜和/或透镜系统）的性质的方法和相关系统。 例如，可以通过提供扫描干涉测量数据来确定与干涉仪的光学厚度失配有关的信息。 数据通常包括获得每个对应于测试对象的不同空间位置的一个或多个干扰信号。 确定每个干扰信号的多个频率中的每一个的相位。 基于干涉信号的多个频率中的每一个的相位确定与光学厚度失配有关的信息。

    Scanning interferometry for thin film thickness and surface measurements
    4.
    发明申请
    Scanning interferometry for thin film thickness and surface measurements 有权
    用于薄膜厚度和表面测量的扫描干涉测量

    公开(公告)号：US20050088663A1

    公开(公告)日：2005-04-28

    申请号：US10974466

    申请日：2004-10-27

    Applicant: Peter De Groot ,  Xavier De Lega

    Inventor： Peter De Groot ,  Xavier De Lega

    IPC: G01B9/02 ,  G01B11/06 ,  G02F1/1333 ,  G02F1/1339

    CPC classification number: G01B11/0675 ,  G01B9/02057 ,  G01B9/0207 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B2290/50 ,  G01B2290/70 ,  G01N21/8422 ,  G02F1/13392 ,  G02F2001/133354

    Abstract: A method including: providing a low coherence scanning interferometry data for at least one spatial location of a sample having multiple interfaces, wherein the data is collected using a low coherence scanning interferometer having an illumination geometry and an illumination frequency spectrum, and wherein the data comprises a low coherence scanning interferometry signal having multiple regions of fringe contrast corresponding to the multiple interfaces; and determining a distance between at least one pair of interfaces based on a distance between the corresponding regions of fringe contrast and information about the illumination geometry.

    Abstract translation: 一种方法，包括：为具有多个接口的样本的至少一个空间位置提供低相干扫描干涉测量数据，其中使用具有照明几何形状和照明频谱的低相干扫描干涉仪来收集数据，并且其中数据包括 低相干扫描干涉测量信号，具有对应于多个界面的多个边缘对比区域; 以及基于条纹对比的对应区域和关于照明几何形状的信息之间的距离来确定至少一对界面之间的距离。

    Interferometry method and system including spectral decomposition
    7.
    发明申请
    Interferometry method and system including spectral decomposition 有权
    干涉测量方法和系统包括光谱分解

    公开(公告)号：US20070086013A1

    公开(公告)日：2007-04-19

    申请号：US11546119

    申请日：2006-10-11

    Applicant: Xavier De Lega ,  Peter De Groot

    Inventor： Xavier De Lega ,  Peter De Groot

    IPC: G01J3/45 ,  G01B11/02 ,  G01B9/02

    CPC classification number: G01B9/02044 ,  G01B9/02022 ,  G01B9/02037 ,  G01B9/02072 ,  G01B9/0209 ,  G01B2290/70

    Abstract: In general, in one aspect, the disclosure features a method that includes directing measurement light to reflect from a measurement surface and combining the reflected measurement light with reference light, where the measurement light and reference light are derived from a common source, and there is a non-zero optical path length difference between the measurement light and reference light that is greater than a coherence length of the measurement light. The method further includes spectrally dispersing the combined light onto a multi-element detector to detect a spatially-varying intensity pattern, determining spatial information about the measurement surface based on the spatially-varying intensity pattern, and outputting the spatial information.

    Abstract translation: 通常，在一个方面，本发明的特征在于一种方法，其包括引导测量光从测量表面反射并将反射的测量光与参考光组合，其中测量光和参考光源自公共源，并且存在 测量光和参考光之间的非零光程长度差大于测量光的相干长度。 该方法还包括将组合的光谱分散到多元素检测器上以检测空间变化的强度图案，基于空间变化的强度图案确定关于测量表面的空间信息，并输出空间信息。

    Interferometer for determining characteristics of an object surface, including processing and calibration
    8.
    发明申请
    Interferometer for determining characteristics of an object surface, including processing and calibration 有权
    用于确定物体表面特征的干涉仪，包括处理和校准

    公开(公告)号：US20060158657A1

    公开(公告)日：2006-07-20

    申请号：US11334949

    申请日：2006-01-19

    Applicant: Xavier De Lega ,  Peter De Groot

    Inventor： Xavier De Lega ,  Peter De Groot

    IPC: G01B11/02

    CPC classification number: G01B9/023 ,  G01B9/02004 ,  G01B9/02027 ,  G01B9/02043 ,  G01B9/02044 ,  G01B9/02057 ,  G01B9/02072 ,  G01B9/02074 ,  G01B9/02084 ,  G01B9/02088 ,  G01B9/0209 ,  G01B11/0675 ,  G01B11/2441 ,  G01B2290/45 ,  G01B2290/70 ,  G01N21/21 ,  G01N21/211

    Abstract: Disclosed is a system including: (i) an interferometer configured to direct test electromagnetic radiation to a test surface and reference electromagnetic radiation to a reference surface and subsequently combine the electromagnetic radiation to form an interference pattern, the electromagnetic radiation being derived from a common source; (ii) a multi-element detector; (iii) one or more optics configured to image the interference pattern onto the detector so that different elements of the detector correspond to different illumination angles of the test surface by the test electromagnetic radiation; and (iv) an electronic processor coupled to the detector, wherein the electronic processor is configured to process information measured by the detector to determine information about a test object having the test surface. The measurements made by the detector elements provide ellipsometry/reflectometry data for the test surface.

    Abstract translation: 公开了一种系统，包括：（i）干涉仪，被配置为将测试电磁辐射引导到测试表面并将电磁辐射引用到参考表面，并且随后组合电磁辐射以形成干涉图案，所述电磁辐射是从公共源 ; （ii）多元素检测器; （iii）一个或多个光学器件，被配置为将干涉图案成像到检测器上，使得检测器的不同元件对应于测试电磁辐射的测试表面的不同照明角度; 以及（iv）耦合到所述检测器的电子处理器，其中所述电子处理器被配置为处理由所述检测器测量的信息以确定关于具有所述测试表面的测试对象的信息。 由检测器元件进行的测量为测试表面提供椭偏仪/反射测量数据。

    Triangulation methods and systems for profiling surfaces through a thin film coating
    10.
    发明申请
    Triangulation methods and systems for profiling surfaces through a thin film coating 有权
    用于通过薄膜涂层对表面进行成形的三角测量方法和系统

    公开(公告)号：US20050068540A1

    公开(公告)日：2005-03-31

    申请号：US10941622

    申请日：2004-09-15

    Applicant: Peter De Groot ,  Xavier De Lega

    Inventor： Peter De Groot ,  Xavier De Lega

    IPC: G01B9/02 ,  G01B11/00 ,  G01B11/06 ,  G03F7/20 ,  G03F9/00

    CPC classification number: G03F7/70491 ,  G01B9/02019 ,  G01B9/02022 ,  G01B9/02084 ,  G01B9/02087 ,  G01B9/0209 ,  G01B11/0675 ,  G01B2290/30 ,  G01B2290/70 ,  G03F7/70608 ,  G03F7/70641 ,  G03F7/70775 ,  G03F9/7003 ,  G03F9/7049 ,  G03F9/7088

    Abstract: An apparatus for positioning an object having a substrate and an overlying film and a portion of a photolithography apparatus relative to one another includes a photolithography system, a positioner, an optical system, and a processor. The photolithography system is configured to illuminate a portion of an object with an first light pattern and includes a reference surface. The positioner can change a relative position between the photolithography system and the object. The light projector is configured to project a second light pattern on the overlying thin film of the object. The optical system images light of the second light pattern that is diffusely scattered by the substrate. The processor is configured to determine a spatial property of the object based on the diffusely scattered light and operate the positioner to change the relative position between the photolithography system and the object.

    Abstract translation: 用于定位具有基板和上覆膜的物体的一个设备和光刻设备的一部分相对于彼此包括光刻系统，定位器，光学系统和处理器。 光刻系统被配置为用第一光图案照亮物体的一部分并且包括参考表面。 定位器可以改变光刻系统和物体之间的相对位置。 光投影仪被配置为将第二光图案投影在物体的上覆薄膜上。 光学系统对由基板漫反射散射的第二光图案的光进行成像。 处理器被配置为基于漫散射光来确定对象的空间属性，并且操作定位器以改变光刻系统和对象之间的相对位置。

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