摘要:
In one embodiment, a method of manufacturing a mold includes: forming a first layer having an affinity to a second polymer on a substrate having an affinity to a first polymer; forming first and second openings in the first layer; filling a resist in the second openings and hardening the resist to obtain a hardened resist; and forming a second layer containing a block copolymer and causing it to self-assemble.
摘要:
A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.
摘要:
According to one embodiment, a servo area of a magnetic recording medium includes magnetic dots arrayed at a period L0. The magnetic dots include a plurality of magnetic dot regions divided in the cross track direction. A width Wm in the down track direction of the mth magnetic dot region from the innermost circumference and a number Nm of dot rows in the down track direction of the mth region meet a relationship represented by L0{Nm√3/2−0.3}≦Wm≦L0{Nm√3/2+0.3} (1).
摘要:
A pattern forming method is provided, which includes forming, above a substrate, a layer of a diblock copolymer composition containing at least PS and PEO, subjecting the layer to phase separation to obtain a phase-separated layer, thereby forming an easy-to-etch region constituted by PS and having a cylindrical or lamellar configuration extending in a first direction, forming an imprinting resist layer on the phase-separated layer, subjecting the imprinting resist layer to imprinting to form, on the imprinting resist layer, an uneven pattern consisting of projections and recesses extending in a second direction intersecting with the first direction, selectively removing, from the imprinting resist layer, the recesses, thereby leaving only the projections and, at the same time, selectively removing the PS from the phase-separated layer to obtain an etching resistive pattern containing PEO, and etching the substrate using, as a mask, not only the projections but also the etching resistive pattern.
摘要:
A pattern forming method is provided, which includes forming, above a substrate, a layer of a diblock copolymer composition containing at least PS and PEO, subjecting the layer to phase separation to obtain a phase-separated layer, thereby forming an easy-to-etch region constituted by PS and having a cylindrical or lamellar configuration extending in a first direction, forming an imprinting resist layer on the phase-separated layer, subjecting the imprinting resist layer to imprinting to form, on the imprinting resist layer, an uneven pattern consisting of projections and recesses extending in a second direction intersecting with the first direction, selectively removing, from the imprinting resist layer, the recesses, thereby leaving only the projections and, at the same time, selectively removing the PS from the phase-separated layer to obtain an etching resistive pattern containing PEO, and etching the substrate using, as a mask, not only the projections but also the etching resistive pattern.
摘要:
A magnetic disk according to an embodiment includes: a plurality of data regions each including a plurality of tracks, each of the tracks being arranged to extend in a circumferential direction; a servo region provided between the data regions, the servo region extending in a radial direction, the servo region including: a plurality of guide patterns each extending in the radial direction; and at least one line of dots arranged by post patterns in the radial direction at least on a side of one of adjacent guide patterns, the post patterns being arranged in the radial direction between the adjacent guide patterns.
摘要:
A perpendicular magnetic recording medium includes a substrate, an underlayer formed on the substrate, and containing at least one element selected from the group A consisting of Pt, Pd, Rh, Ag, Au, Ir and Fe, and at least one element or compound selected from the group B consisting of C, Ta, Mo, W, Nb, Zr, Hf, V, Mg, Al, Zn, Sn, In, Bi, Pb, Cd, SiO2, MgO, Al2O3, TaC, TiC, TaN, TiN, B2O3, ZrO2, In2O3 and SnO2, and a magnetic layer formed on the underlayer, containing at least one element selected from the group consisting of Fe, Co, and Ni, and at least one element selected from the group consisting of Pt, Pd, Au and Ir, and containing crystal grains having an L10 structure.
摘要翻译:垂直磁记录介质包括衬底,形成在衬底上的底层,并且包含选自由Pt,Pd,Rh,Ag,Au,Ir和Fe组成的组A中的至少一种元素,以及至少一种元素或化合物 选自由C,Ta,Mo,W,Nb,Zr,Hf,V,Mg,Al,Zn,Sn,In,Bi,Pb,Cd,SiO 2,MgO组成的组B ,Al 2 O 3,TaC,TiC,TaN,TiN,B 2 O 3 3,ZrO 2 sub> 3 sub> 3< 2>和在底层上形成的含有至少一个元素的磁性层 选自Fe,Co和Ni中的至少一种元素,以及选自Pt,Pd,Au和Ir中的至少一种元素,并且含有具有L 1 O 3结构的晶粒。
摘要:
According to one embodiment, a magnetic recording medium includes protruded magnetic patterns formed on a substrate, and a non-magnetic material filled in recesses between the magnetic patterns and made of a multi-element amorphous alloy containing Ni or Cu, and two or more metals selected from the group consisting of Ta, Nb, Ti, Zr, Hf, Cr, Mo and Ag.
摘要:
According to one embodiment, a substrate for a magnetic recording media has circumferential protrusions corresponding to recording tracks and circumferential recesses corresponding to grooves between the recording tracks, in which the substrate satisfying at least one of conditions of (a) a surface of the recess has a surface energy smaller than that of the protrusion, (b) the surface of the recess is modified with a thermally decomposable or deformable substance, (c) the surface of the recess has surface roughness smaller than that of the protrusion, (d) crystal orientation is more disturbed on the surface of the recess than on the protrusion, (e) the surface of the recess is modified with a substance that causes reaction with a magnetic material or that diffuses into the magnetic material, and (f) the surface of the recess is modified with a substance soluble in a solvent or with a deformable substance.
摘要:
A method of forming patterns includes coating a toroidal substrate having a center hole with an imprint material containing a precursor of a metal oxide film, selected from the group consisting of a metal alkoxide and a metal oxide, and an ether type nonionic surfactant containing fluorine or silicon, imprinting a stamper on the imprint material to transfer patterns of protrusions and recesses of the stamper to the imprint material, and removing organic components from the imprint material through plasma processing or heat treatment to form a metal oxide film having patterns of protrusions and recesses.