公开(公告)号：US08956560B2

公开(公告)日：2015-02-17

申请号：US13423543

申请日：2012-03-19

申请人： Yasuaki Ootera ,  Yoshiyuki Kamata ,  Naoko Kihara ,  Yoshiaki Kawamonzen ,  Takeshi Okino ,  Ryosuke Yamamoto ,  Tomoyuki Maeda ,  Norikatsu Sasao ,  Akiko Yuzawa ,  Takuya Shimada ,  Hiroyuki Hieda

发明人： Yasuaki Ootera ,  Yoshiyuki Kamata ,  Naoko Kihara ,  Yoshiaki Kawamonzen ,  Takeshi Okino ,  Ryosuke Yamamoto ,  Tomoyuki Maeda ,  Norikatsu Sasao ,  Akiko Yuzawa ,  Takuya Shimada ,  Hiroyuki Hieda

IPC分类号： H01L21/00 ,  B29C33/38 ,  G11B5/855

CPC分类号： B29C33/3857 ,  G11B5/855

摘要： In one embodiment, a method of manufacturing a mold includes: forming a first layer having an affinity to a second polymer on a substrate having an affinity to a first polymer; forming first and second openings in the first layer; filling a resist in the second openings and hardening the resist to obtain a hardened resist; and forming a second layer containing a block copolymer and causing it to self-assemble.

摘要翻译： 在一个实施方案中，制造模具的方法包括：在对第一聚合物具有亲和性的基材上形成对第二聚合物具有亲和性的第一层; 在第一层中形成第一和第二开口; 在第二开口中填充抗蚀剂并使抗蚀剂硬化以获得硬化抗蚀剂; 并形成含有嵌段共聚物并使其自组装的第二层。

公开(公告)号：US08916053B2

公开(公告)日：2014-12-23

申请号：US13528348

申请日：2012-06-20

申请人： Yoshiaki Kawamonzen ,  Yasuaki Ootera ,  Akiko Yuzawa ,  Naoko Kihara ,  Yoshiyuki Kamata ,  Hiroyuki Hieda ,  Norikatsu Sasao ,  Ryosuke Yamamoto ,  Takeshi Okino ,  Tomoyuki Maeda ,  Takuya Shimada

发明人： Yoshiaki Kawamonzen ,  Yasuaki Ootera ,  Akiko Yuzawa ,  Naoko Kihara ,  Yoshiyuki Kamata ,  Hiroyuki Hieda ,  Norikatsu Sasao ,  Ryosuke Yamamoto ,  Takeshi Okino ,  Tomoyuki Maeda ,  Takuya Shimada

IPC分类号： C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  B44C3/08 ,  B44C5/04 ,  B81C1/00 ,  B44C1/22 ,  H01L21/033 ,  G03F7/00 ,  B41M5/00

CPC分类号： B44C1/227 ,  B41M5/00 ,  B81C1/0046 ,  B81C2201/0153 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/0337 ,  Y10T156/1041

摘要： A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.

摘要翻译： 根据实施例的图案形成方法包括：在第一基板上形成图案膜，所述图案膜具有凹凸图案，所述图案膜由包含第一待打印剂的材料制成; 在第二基板上形成材料膜，所述材料膜含有蚀刻速率高于第一待打印剂的蚀刻速率的第二待定印剂; 通过在第一基板和第二基板之间施加压力将图案膜的凹凸图案转印到材料膜上，图案膜定位成面对材料膜，并且通过固化第二待打印剂; 从图案膜分离第一衬底; 并通过蚀刻去除材料膜，以将图案膜留在第二基板上。

公开(公告)号：US20130069272A1

公开(公告)日：2013-03-21

申请号：US13423543

申请日：2012-03-19

申请人： Yasuaki OOTERA ,  Yoshiyuki KAMATA ,  Naoko KIHARA ,  Yoshiaki KAWAMONZEN ,  Takeshi OKINO ,  Ryosuke YAMAMOTO ,  Tomoyuki MAEDA ,  Norikatsu SASAO ,  Akiko YUZAWA ,  Takuya SHIMADA ,  Hiroyuki Hieda

发明人： Yasuaki OOTERA ,  Yoshiyuki KAMATA ,  Naoko KIHARA ,  Yoshiaki KAWAMONZEN ,  Takeshi OKINO ,  Ryosuke YAMAMOTO ,  Tomoyuki MAEDA ,  Norikatsu SASAO ,  Akiko YUZAWA ,  Takuya SHIMADA ,  Hiroyuki Hieda

IPC分类号： B29C41/22 ,  G11B5/84 ,  B44C1/22

CPC分类号： B29C33/3857 ,  G11B5/855

摘要： In one embodiment, a method of manufacturing a mold includes: forming a first layer having an affinity to a second polymer on a substrate having an affinity to a first polymer; forming first and second openings in the first layer; filling a resist in the second openings and hardening the resist to obtain a hardened resist; and forming a second layer containing a block copolymer and causing it to self-assemble.

摘要翻译： 在一个实施方案中，制造模具的方法包括：在对第一聚合物具有亲和性的基材上形成对第二聚合物具有亲和性的第一层; 在第一层中形成第一和第二开口; 在第二开口中填充抗蚀剂并使抗蚀剂硬化以获得硬化抗蚀剂; 并形成含有嵌段共聚物并使其自组装的第二层。

公开(公告)号：US20090078673A1

公开(公告)日：2009-03-26

申请号：US12222916

申请日：2008-08-19

申请人： Naoko Kihara ,  Hiroyuki Hieda ,  Yoshiyuki Kamata

发明人： Naoko Kihara ,  Hiroyuki Hieda ,  Yoshiyuki Kamata

IPC分类号： C25F3/14

CPC分类号： G11B5/82 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G11B5/855

摘要： A pattern forming method is provided, which includes forming, above a substrate, a layer of a diblock copolymer composition containing at least PS and PEO, subjecting the layer to phase separation to obtain a phase-separated layer, thereby forming an easy-to-etch region constituted by PS and having a cylindrical or lamellar configuration extending in a first direction, forming an imprinting resist layer on the phase-separated layer, subjecting the imprinting resist layer to imprinting to form, on the imprinting resist layer, an uneven pattern consisting of projections and recesses extending in a second direction intersecting with the first direction, selectively removing, from the imprinting resist layer, the recesses, thereby leaving only the projections and, at the same time, selectively removing the PS from the phase-separated layer to obtain an etching resistive pattern containing PEO, and etching the substrate using, as a mask, not only the projections but also the etching resistive pattern.

摘要翻译： 提供了图案形成方法，其包括在基底上形成含有至少PS和PEO的二嵌段共聚物组合物层，使该层相分离以获得相分离层，由此形成易于 蚀刻区域由PS构成并且具有在第一方向上延伸的圆柱形或层状结构，在相分离层上形成刻印抗蚀剂层，使压印抗蚀剂层压印以在压印抗蚀剂层上形成不均匀图案，该不均匀图案包括 在与第一方向相交的第二方向上延伸的突起和凹部，从压印抗蚀剂层选择性地去除凹部，从而仅留下突起，并且同时从相分离层选择性地去除PS 获得含有PEO的蚀刻电阻图案，并且使用不仅突起而且还具有抗蚀刻性，作为掩模来蚀刻基板 ve模式。

公开(公告)号：US08105952B2

公开(公告)日：2012-01-31

申请号：US12222916

申请日：2008-08-19

申请人： Naoko Kihara ,  Hiroyuki Hieda ,  Yoshiyuki Kamata

发明人： Naoko Kihara ,  Hiroyuki Hieda ,  Yoshiyuki Kamata

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： G11B5/82 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G11B5/855

摘要： A pattern forming method is provided, which includes forming, above a substrate, a layer of a diblock copolymer composition containing at least PS and PEO, subjecting the layer to phase separation to obtain a phase-separated layer, thereby forming an easy-to-etch region constituted by PS and having a cylindrical or lamellar configuration extending in a first direction, forming an imprinting resist layer on the phase-separated layer, subjecting the imprinting resist layer to imprinting to form, on the imprinting resist layer, an uneven pattern consisting of projections and recesses extending in a second direction intersecting with the first direction, selectively removing, from the imprinting resist layer, the recesses, thereby leaving only the projections and, at the same time, selectively removing the PS from the phase-separated layer to obtain an etching resistive pattern containing PEO, and etching the substrate using, as a mask, not only the projections but also the etching resistive pattern.

摘要翻译： 提供了图案形成方法，其包括在基底上形成含有至少PS和PEO的二嵌段共聚物组合物层，使该层相分离以获得相分离层，由此形成易于 蚀刻区域由PS构成并且具有在第一方向上延伸的圆柱形或层状结构，在相分离层上形成刻印抗蚀剂层，使压印抗蚀剂层压印以在压印抗蚀剂层上形成不均匀图案，该不均匀图案包括 在与第一方向相交的第二方向上延伸的突起和凹部，从压印抗蚀剂层选择性地去除凹部，从而仅留下突起，并且同时从相分离层选择性地去除PS 获得含有PEO的蚀刻电阻图案，并且使用不仅突起而且还具有抗蚀刻性，作为掩模来蚀刻基板 ve模式。

公开(公告)号：US07195827B2

公开(公告)日：2007-03-27

申请号：US10722599

申请日：2003-11-28

申请人： Tomoyuki Maeda ,  Akira Kikitsu ,  Hiroyuki Hieda ,  Yoshiyuki Kamata

发明人： Tomoyuki Maeda ,  Akira Kikitsu ,  Hiroyuki Hieda ,  Yoshiyuki Kamata

IPC分类号： G11B5/66

CPC分类号： G11B5/732 ,  G11B5/65 ,  G11B5/7325

摘要： A perpendicular magnetic recording medium includes a substrate, an underlayer formed on the substrate, and containing at least one element selected from the group A consisting of Pt, Pd, Rh, Ag, Au, Ir and Fe, and at least one element or compound selected from the group B consisting of C, Ta, Mo, W, Nb, Zr, Hf, V, Mg, Al, Zn, Sn, In, Bi, Pb, Cd, SiO2, MgO, Al2O3, TaC, TiC, TaN, TiN, B2O3, ZrO2, In2O3 and SnO2, and a magnetic layer formed on the underlayer, containing at least one element selected from the group consisting of Fe, Co, and Ni, and at least one element selected from the group consisting of Pt, Pd, Au and Ir, and containing crystal grains having an L10 structure.

摘要翻译： 垂直磁记录介质包括衬底，形成在衬底上的底层，并且包含选自由Pt，Pd，Rh，Ag，Au，Ir和Fe组成的组A中的至少一种元素，以及至少一种元素或化合物 选自由C，Ta，Mo，W，Nb，Zr，Hf，V，Mg，Al，Zn，Sn，In，Bi，Pb，Cd，SiO 2，MgO组成的组B ，Al 2 O 3，TaC，TiC，TaN，TiN，B 2 O 3 3，ZrO _{2 3 3＆lt; 2＆gt;和在底层上形成的含有至少一个元素的磁性层 选自Fe，Co和Ni中的至少一种元素，以及选自Pt，Pd，Au和Ir中的至少一种元素，并且含有具有L 1 O 3结构的晶粒。}

公开(公告)号：US07740961B2

公开(公告)日：2010-06-22

申请号：US11434519

申请日：2006-05-16

申请人： Hiroyuki Hieda ,  Naoko Kihara ,  Yoshitaka Yanagita

发明人： Hiroyuki Hieda ,  Naoko Kihara ,  Yoshitaka Yanagita

IPC分类号： G11B5/66

CPC分类号： G11B5/855

摘要： A magnetic recording media has recording cells formed of two-dimensionally arrayed magnetic material, a nonmagnetic layer surrounding the recording cells, an adhesive film formed on each of the recording cells, and a lubricant directly adhered to the adhesive film.

摘要翻译： 磁记录介质具有由二维排列的磁性材料形成的记录单元，围绕记录单元的非磁性层，形成在每个记录单元上的粘合膜，以及直接附着在粘合膜上的润滑剂。

公开(公告)号：US07931819B2

公开(公告)日：2011-04-26

申请号：US11727158

申请日：2007-03-23

申请人： Naoko Kihara ,  Hiroyuki Hieda

发明人： Naoko Kihara ,  Hiroyuki Hieda

IPC分类号： H01L21/302

CPC分类号： H01L21/3086 ,  B82Y10/00 ,  Y10S438/942

摘要： There is provided a method for pattern formation, including a step of coating a composition comprising a block copolymer, a silicon compound, and a solvent for dissolving these components onto an object to form a layer of the composition on the object, a step of subjecting the layer of the composition to self-organization of the block copolymer to cause phase separation into a first phase, in which the silicon compound is localized, having higher etching resistance by heat treatment or/and oxygen plasma treatment, and a second phase comprising a polymer phase and having lower etching resistance by heat treatment or/and oxygen plasma treatment, and thereby forming a pattern layer with a fine pattern, and a step of etching the object using as a mask the thus formed pattern layer.

摘要翻译： 提供了一种形成图案的方法，其包括将包含嵌段共聚物，硅化合物和溶剂的组合物涂布到物体上以形成该物质层的步骤， 所述组合物层自组织所述嵌段共聚物以引起相分离成其中所述硅化合物定位的第一相，通过热处理或/和氧等离子体处理具有较高的耐蚀刻性，以及第二相，其包含 聚合物相，并且通过热处理或/和氧等离子体处理具有较低的耐腐蚀性，从而形成具有精细图案的图案层，以及使用由此形成的图案层作为掩模蚀刻该物体的步骤。

公开(公告)号：US20060257694A1

公开(公告)日：2006-11-16

申请号：US11434519

申请日：2006-05-16

申请人： Hiroyuki Hieda ,  Naoko Kihara ,  Yoshitaka Yanagita

发明人： Hiroyuki Hieda ,  Naoko Kihara ,  Yoshitaka Yanagita

IPC分类号： G11B5/64

CPC分类号： G11B5/855

摘要： A magnetic recording media has recording cells formed of two-dimensionally arrayed magnetic material, a nonmagnetic layer surrounding the recording cells, an adhesive film formed on each of the recording cells, and a lubricant directly adhered to the adhesive film.

摘要翻译： 磁记录介质具有由二维排列的磁性材料形成的记录单元，围绕记录单元的非磁性层，形成在每个记录单元上的粘合膜，以及直接附着在粘合膜上的润滑剂。

公开(公告)号：US20060078681A1

公开(公告)日：2006-04-13

申请号：US11248587

申请日：2005-10-13

申请人： Hiroyuki Hieda ,  Naoko Kihara ,  Katsuyuki Naito

发明人： Hiroyuki Hieda ,  Naoko Kihara ,  Katsuyuki Naito

IPC分类号： B05D3/04 ,  B05D5/12 ,  B05D3/02

CPC分类号： G11B5/855

摘要： The present invention provides a pattern forming method using phase separation structure of self-assembling block copolymer and minimizing variations in pattern. A substrate having groove structure pre-formed thereon, is coated with a solution of the block copolymer comprising at least one block having a mesogen group. The block copolymer is caused to self-assemble in the groove to form block copolymer assemblies, which are regularly arrayed. The invention also relates to a processing method of processing a substrate by the use of the pattern obtained by the pattern forming method as a template.