HOLOGRAPHIC RECORDING METHOD
    4.
    发明申请
    HOLOGRAPHIC RECORDING METHOD 审中-公开
    全景记录方法

    公开(公告)号:US20110228663A1

    公开(公告)日:2011-09-22

    申请号:US12880828

    申请日:2010-09-13

    IPC分类号: G11B7/00

    CPC分类号: G11B7/0065 G11B7/083

    摘要: A holographic recording method includes the following steps: irradiating an optical recording medium with a coherent reference beam and a coherent information beam to produce a hologram in the optical recording medium while irradiating the optical recording medium with an incoherent pretreatment beam to consume a polymerization inhibitor; irradiating the hologram with the reference beam to extract a reproduction beam while stopping irradiating the optical recording medium with the reference beam; sensing the signal beam with an image pick-up unit to detect an intensity of the signal beam; and calculating a bit error rate with a control unit to irradiate the hologram with the information beam if the bit error rate is larger than a prescribed value, or to stop irradiating the optical recording medium with the reference beam, the information beam and the pretreatment beam if the bit error rate is smaller than the prescribed value.

    摘要翻译: 全息记录方法包括以下步骤:用光学记录介质照射具有相干参考光束和相干信息光束的光学记录介质,以在光学记录介质中用不相干的预处理光束照射消耗阻聚剂; 用参考光束照射全息图以提取再现光束,同时停止用参考光束照射光学记录介质; 用图像拾取单元感测信号光束以检测信号光束的强度; 如果比特错误率大于规定值,则用控制单元计算与信息光束照射全息图的比特错误率,或停止用参考光束照射光学记录介质,信息光束和预处理光束 如果误码率小于规定值。

    HOLOGRAM-RECORDING MEDIUM
    5.
    发明申请
    HOLOGRAM-RECORDING MEDIUM 审中-公开
    全息记录介质

    公开(公告)号:US20120251927A1

    公开(公告)日:2012-10-04

    申请号:US13524850

    申请日:2012-06-15

    摘要: A hologram-recording medium containing: a recording layer containing a polymerizable monomer containing a structural framework represented by the following general formula (1). In general formula (1), X and Y are not the same, and X and Y are selected from hydrogen, iodine, bromine, and chlorine atoms and from methyl, ethyl, isopropyl, tert-butyl, phenyl, naphthyl, hydroxyl, methoxy, ethoxy, isopropoxy, tert-butoxy, phenoxy, naphthoxy, acetyl, carboxyl, acetoxy, thiophenyl, thionaphthyl, thiomethyl, thioethyl, thioisopropyl, thio-tert-butyl, and thiol groups; and W is selected from the group consisting of benzylvinyl, styryl, acryloyl, and methacryloyl groups.

    摘要翻译: 一种全息记录介质,其包含:包含含有由以下通式(1)表示的结构框架的可聚合单体的记录层。 在通式(1)中,X和Y不相同,X和Y选自氢,碘,溴和氯原子,甲基,乙基,异丙基,叔丁基,苯基,萘基,羟基,甲氧基 乙氧基,异丙氧基,叔丁氧基,苯氧基,萘氧基,乙酰基,羧基,乙酰氧基,噻吩基,萘基,硫代甲基,硫代乙基,硫代异丙基,硫代叔丁基和硫醇基。 W选自苄基乙烯基,苯乙烯基,丙烯酰基和甲基丙烯酰基。

    Polyimide precursor composition, method of forming polyimide film,
electronic parts and liquid crystal element
    7.
    发明授权
    Polyimide precursor composition, method of forming polyimide film, electronic parts and liquid crystal element 失效
    聚酰亚胺前体组合物,聚酰亚胺膜的形成方法,电子部件和液晶元件

    公开(公告)号:US5756650A

    公开(公告)日:1998-05-26

    申请号:US816595

    申请日:1997-03-13

    摘要: A polyimide precursor composition, which comprises, a polyamic acid having a repeating unit represented by the following general formula (PA), and at least one kinds of cure accelerator selected from the group consisting of a substituted or unsubstituted nitrogen-containing heterocyclic compound exhibiting an acid dissociation index "pKa" of a proton complex ranging from 0 to 8 in an aqueous solution thereof, or an N-oxide compound of said nitrogen-containing heterocyclic compound (AC1), a substituted or unsubstituted amino acid compound (AC2), and an aromatic hydrocarbon compound or an aromatic heterocyclic compound having a molecular weight of 1,000 or less and two or more hydroxyl groups (AC3): ##STR1## wherein .phi. is a quadrivalent organic group, .phi. is a bivalent organic group, R is a substituted or unsubstituted hydrocarbon group, organosilicic group or hydrogen atom.

    摘要翻译: 一种聚酰亚胺前体组合物,其包含具有由以下通式(PA)表示的重复单元的聚酰胺酸和至少一种选自取代或未取代的含氮杂环化合物的固化促进剂, 在其水溶液中为0〜8的质子络合物的酸解离指数“pKa”,或所述含氮杂环化合物(AC1)的N-氧化物,取代或未取代的氨基酸化合物(AC2)和 分子量为1000以下的芳香族烃化合物或芳香族杂环化合物以及两个以上的羟基(AC3):其中phi是四价有机基团,Phi是二价有机基团,其中R为 取代或未取代的烃基,有机硅基或氢原子。

    Negative photosensitive resin composition, method of forming a pattern and electronic parts
    10.
    发明授权
    Negative photosensitive resin composition, method of forming a pattern and electronic parts 失效
    负型感光性树脂组合物,形成图案的方法和电子部件

    公开(公告)号:US06183934B2

    公开(公告)日:2001-02-06

    申请号:US09108178

    申请日:1998-07-01

    IPC分类号: G03F7004

    摘要: A negative photosensitive resin composition, which comprises a thermosetting polymer precursor which can be cured through cyclodehydration upon heating, and a photosensitive heat cure accelerator. This photosensitive heat cure accelerator may be, a compound having a protective substituent group which can be eliminated upon irradiation of light, an N-oxide compound which is capable of exhibiting a heat cure accelerating property through a transition of an oxide group thereof upon irradiation of light, or a compound which is capable of exhibiting a heat cure accelerating property through generation of an acid upon irradiation of light. Further, this photosensitive heat cure accelerator may be formed of a combination of a latent heat cure accelerator which is capable of changing into a compound exhibiting a heat cure accelerating property through a reaction with an acid and a photo-acid generating agent which is capable of generating an acid upon irradiation of light.

    摘要翻译: 一种负型感光性树脂组合物,其包含可通过加热时通过环化脱水固化的热固性聚合物前体和感光热固化促进剂。 该光敏热固化促进剂可以是具有保护性取代基的化合物,其可以在光照射时被除去,通过在其照射时能够通过其氧化物基团的转变而显示出热固化促进性能的N-氧化物化合物 光或能够通过在照射光时产生酸而显示热固化加速性的化合物。 此外,该感光性热固化促进剂可以由潜热固化促进剂的组合形成,该潜热固化促进剂能够通过与酸的反应形成具有热固化加速性的化合物和光酸产生剂, 在照射光时产生酸。