摘要:
A method for manufacturing a multiple-wavelength semiconductor laser comprises: forming a first bar having an array of first semiconductor chips, wherein at least two semiconductor lasers producing light of different wavelengths are monolithically formed; forming a second bar having an array of second semiconductor chips, wherein a semiconductor laser producing light having a different wavelength from the light produced by the semiconductor lasers of the first semiconductor chips is formed; forming a third bar by locating a laser-forming surface of said first bar facing a back surface of the second bar, and joining respective first semiconductor chips in the first bar to respective second semiconductor chips in the second bar; forming scribe lines by irradiating boundaries of the first semiconductor chips and boundaries of the second semiconductor chips with laser beams, and dividing the third bar along the scribe lines into respective chips.
摘要:
A semiconductor laser device includes an optical fiber having an optical fiber grating formed therein, a semiconductor laser having an active layer with a single quantum well, for emitting laser light, and a coupling optical system for coupling the laser light emitted out of the semiconductor laser into the optical fiber. The coupling optical system can include a narrow-band filter for adjusting an incident angle of the laser light emitted out of the semiconductor laser. The optical fiber grating can have a reflection bandwidth wider than or substantially equal to a 3dB bandwidth of the gain of the semiconductor laser or a spectrum full width at half maximum of the laser light of the semiconductor laser.
摘要:
A semiconductor laser device comprises an optical fiber having an optical fiber grating formed therein, a semiconductor laser having an active layer with a single quantum well, for emitting laser light, and a coupling optical system for coupling the laser light emitted out of the semiconductor laser into the optical fiber. The coupling optical system can include a narrow-band filter for adjusting an incident angle of the laser light emitted out of the semiconductor laser. The optical fiber grating can have a reflection bandwidth wider than or substantially equal to a 3 dB bandwidth of the gain of the semiconductor laser or a spectrum full width at half maximum of the laser light of the semiconductor laser.
摘要:
A semiconductor laser device includes a stacked structure. The stacked structure includes a first electrode, a substrate of a first conductivity type on the first electrode, a first cladding layer of the first conductivity type, an active layer, a second cladding layer of a second conductivity type opposite the first conductivity type, an insulating layer, and a second electrode. The second cladding layer includes at least first and second portions having thickness different from each other. The first portion is thicker than the second portion. The insulating layer is deposited on the second cladding layer but not on the first portion. The second electrode is electrically connected to the first portion. A product of a reciprocal of layer thickness and heat conductivity of the insulating layer is smaller than 4×108 W/(m2K).
摘要:
A semiconductor laser device includes a cavity extending in a propagation direction of a laser beam (X-direction). A front facet is on one end of the cavity through which the laser beam is emitted. A rear facet is on the other end of the cavity. Further, an adhesive layer and a coating film are on the front facet, and an adhesive layer and a coating film are on the rear facet. The adhesive layers preferably have a thickness of 10 nm or less and preferably include an anodic oxide film of one of Al, Ti, Nb, Zr, Ta, Si, and Hf.
摘要:
A method for simulating and analyzing two-dimensional current and light distributions of a semiconductor laser including an active layer, a cladding layer, and a light absorbing layer includes obtaining initial values of light distribution and carrier distribution, setting a bias condition, and performing current and light distribution analyses. The calculation of the initial value of the two-dimensional light distribution includes calculating a provisional absorption coefficient of the light absorbing layer from the refractive index of the cladding layer, the refractive index of the light absorbing layer, and the laser light wavelength; obtaining a solution in which the real part of the propagation constant of the wave equation is a maximum, using the provisional absorption coefficient; and repeating the calculation, using a sequential approximation method, until the absorption coefficient in the propagation constant equals the absorption coefficient in the original light absorbing layer. The propagation constant in the active layer is then larger than in a light absorbing region. Thus, the center of the light distribution is located in the active layer and the solution, specifying a laser oscillation mode, can be automatically derived without special judgment criteria.
摘要:
A method of fabricating a semiconductor laser device includes successively forming an active layer and upper cladding layers on a lower cladding layer, etching and removing portions except regions of the upper cladding layers where a current is to flow to form a stripe-shaped ridge structure, and forming a buffer layer comprising Al.sub.x Ga.sub.1-x As having an Al composition ratio x of 0 to 0.3 on a surface of the upper cladding layers exposed by the etching and forming a current blocking layer of first conductivity type Al.sub.y Ga.sub.1-y As having an Al composition ratio y of at least 0.5 on the buffer layer to bury portions of the upper cladding layers which are not removed by the etching process. Therefore, since the layer grown on the upper cladding layer exposed by etching of AlGaAs or GaAs having a low Al composition ratio (0-0.3), three-dimensional growth of and crystalline defects in the buffer layer are suppressed. Current leakage is suppressed, so that a semiconductor laser device having a low threshold current and a high efficiency is fabricated with a stable yield.
摘要翻译:一种制造半导体激光器件的方法包括:在下包层上连续形成有源层和上覆层,蚀刻除去电流流过的上覆层的区域以外的部分,形成条状脊结构, 以及在通过蚀刻暴露的上覆层的表面上形成包含Al组成比x为0至0.3的Al x Ga 1-x As的缓冲层,并形成具有Al组成比y的第一导电型AlyGa1-yAs的电流阻挡层 在缓冲层上至少为0.5以掩埋未被蚀刻工艺除去的上覆层的部分。 因此,由于通过蚀刻Al AlAs或Al组成比低(0-0.3)的GaAs而暴露在上包层上的层,抑制了缓冲层的三维生长和晶体缺陷。 电流泄漏被抑制,从而以稳定的产量制造具有低阈值电流和高效率的半导体激光器件。
摘要:
A semiconductor laser device includes semiconductor layers including an active layer and cladding layers sandwiching the active layer and current injecting structure for regulating a region in the active layer into which current is injected. A light confinement coefficient in the current injection region perpendicular to the active layer is smaller than a light confinement coefficient in the same direction of a saturable absorption region. The function of the saturable absorption region is enhanced and pulsation oscillation can be produced at a high power light output.
摘要:
In a semiconductor laser having a first facet (front facet) through which laser light is emitted and a second facet (rear facet), and a first coating film composed of a single-layer dielectric film on the first facet. The oscillating wavelength of the laser light is λ and the refractive index of the dielectric film is n. The thickness of the dielectric film is within a range between 5% and 50% of λ/4n.
摘要:
A semiconductor laser is provided which emits laser light in which the intensity center of the far-field pattern in the horizontal direction does not vary with variation of the optical output and in which the shape of the far-field pattern in the horizontal direction is stable. The width of trenches is determined so that the magnitude (E1) of the electric field at the center of a ridge and the magnitude (E2) of the electric field at the edges of the trenches provide. a ratio E1/E2 that is larger than 0.0001 and smaller than 0.01. In a semiconductor laser with a double-channel ridge structure, layers having a larger equivalent refractive index than the trenches exist outside the trenches. Accordingly, the semiconductor absorbs the light distributed outside the trenches and it is possible to obtain laser light in which the intensity center of the far-field pattern in the horizontal direction does not vary with variation of the optical output and in which the shape of the far-field pattern in the horizontal direction is stable.