公开(公告)号：US20050186424A1

公开(公告)日：2005-08-25

申请号：US10465618

申请日：2003-06-20

申请人： Yasuo Murakami ,  Takashi Mikami ,  Hiroshi Murakami

发明人： Yasuo Murakami ,  Takashi Mikami ,  Hiroshi Murakami

IPC分类号： C23C14/02 ,  C23C14/06 ,  C23C14/24 ,  C23C28/00 ,  B32B9/00

CPC分类号： H01J37/32055 ,  C23C14/024 ,  C23C14/0605 ,  C23C28/321 ,  C23C28/322 ,  C23C28/343 ,  C23C28/347 ,  Y10T428/12625 ,  Y10T428/24975 ,  Y10T428/265 ,  Y10T428/30 ,  Y10T428/31678

摘要： This invention is directed to a carbon film-coated article comprising a substrate; a mixed layer formed on at least a part of the substrate, and composed of an element(s) constituting the substrate and tungsten; a tungsten film formed on the mixed layer; and a carbon film formed on the tungsten film. The invention provides a method of producing the carbon film-coated article, the method comprising the steps of: forming a mixed layer on at least a part of the substrate, the mixed layer being composed of an element(s) constituting the substrate and tungsten, forming a tungsten film on the mixed layer, and forming a carbon film on the tungsten film, wherein at least one of the mixing layer, the tungsten film and the carbon film is formed using a cathode material evaporated by arc discharge in a vacuum arc deposition apparatus having a vacuum arc evaporation source including the cathode.

摘要翻译： 本发明涉及一种包含基材的碳膜涂覆制品; 形成在所述基板的至少一部分上并且由构成所述基板的元素和钨构成的混合层; 形成在混合层上的钨膜; 和形成在钨膜上的碳膜。 本发明提供一种制备碳膜涂覆制品的方法，该方法包括以下步骤：在至少部分基材上形成混合层，该混合层由构成基材的元素和钨 在所述混合层上形成钨膜，并在所述钨膜上形成碳膜，其中使用在真空电弧中通过电弧放电蒸发的阴极材料形成所述混合层，所述钨膜和所述碳膜中的至少一个 具有包括阴极的真空电弧蒸发源的沉积设备。

公开(公告)号：US20070071993A1

公开(公告)日：2007-03-29

申请号：US11605250

申请日：2006-11-29

申请人： Yasuo Murakami ,  Takashi Mikami ,  Hiroshi Murakami

发明人： Yasuo Murakami ,  Takashi Mikami ,  Hiroshi Murakami

IPC分类号： H05H1/24 ,  B32B9/00 ,  B32B15/04 ,  C03C27/00

CPC分类号： H01J37/32055 ,  C23C14/024 ,  C23C14/0605 ,  C23C28/321 ,  C23C28/322 ,  C23C28/343 ,  C23C28/347 ,  Y10T428/12625 ,  Y10T428/24975 ,  Y10T428/265 ,  Y10T428/30 ,  Y10T428/31678

摘要： This invention is directed to a carbon film-coated article comprising a substrate; a mixed layer formed on at least a part of the substrate, and composed of an element(s) constituting the substrate and tungsten; a tungsten film formed on the mixed layer; and a carbon film formed on the tungsten film. The invention provides a method of producing the carbon film-coated article, the method comprising the steps of: forming a mixed layer on at least a part of the substrate, the mixed layer being composed of an element(s) constituting the substrate and tungsten, forming a tungsten film on the mixed layer, and forming a carbon film on the tungsten film, wherein at least one of the mixing layer, the tungsten film and the carbon film is formed using a cathode material evaporated by arc discharge in a vacuum arc deposition apparatus having a vacuum arc evaporation source including the cathode.

公开(公告)号：US07033462B2

公开(公告)日：2006-04-25

申请号：US10305008

申请日：2002-11-27

申请人： Yasuo Murakami ,  Takashi Mikami ,  Kiyoshi Ogata ,  Hiroshi Murakami

发明人： Yasuo Murakami ,  Takashi Mikami ,  Kiyoshi Ogata ,  Hiroshi Murakami

IPC分类号： C23C14/34

CPC分类号： H01J37/32055 ,  C23C14/325 ,  H01J2237/022

摘要： To prevent the film forming characteristic deterioration by a magnetic field of a magnetic filter to thereby make vacuum arc vapor deposition uniform, in the invention, plurality of magnets includes a terminal magnet closest to a plasma injection hole located at the other end of duct and specified magnets. The terminal magnet located closest to plasma injection hole may be set to incline to a plasma injection plane of the plasma injection hole. Further, at lease one of specified magnets may be inclined to the plasma injection plane. Further more, at least one of magnetic field generating coils may be formed with a plurality of electromagnetic coils, which are inclined at different angles with respect to a cross section of the duct. One of electromagnetic coils may be selectively energized by current on a basis of setting and controlling of deflection magnetic field generated by the magnetic filter.

公开(公告)号：US07169473B2

公开(公告)日：2007-01-30

申请号：US10465618

申请日：2003-06-20

申请人： Yasuo Murakami ,  Takashi Mikami ,  Hiroshi Murakami

发明人： Yasuo Murakami ,  Takashi Mikami ,  Hiroshi Murakami

IPC分类号： C23C14/06

CPC分类号： H01J37/32055 ,  C23C14/024 ,  C23C14/0605 ,  C23C28/321 ,  C23C28/322 ,  C23C28/343 ,  C23C28/347 ,  Y10T428/12625 ,  Y10T428/24975 ,  Y10T428/265 ,  Y10T428/30 ,  Y10T428/31678

摘要： This invention is directed to a carbon film-coated article comprising a substrate; a mixed layer formed on at least a part of the substrate, and composed of an element(s) constituting the substrate and tungsten; a tungsten film formed on the mixed layer; and a carbon film formed on the tungsten film. The invention provides a method of producing the carbon film-coated article, the method comprising the steps of: forming a mixed layer on at least a part of the substrate, the mixed layer being composed of an element(s) constituting the substrate and tungsten, forming a tungsten film on the mixed layer, and forming a carbon film on the tungsten film, wherein at least one of the mixing layer, the tungsten film and the carbon film is formed using a cathode material evaporated by arc discharge in a vacuum arc deposition apparatus having a vacuum arc evaporation source including the cathode.

摘要翻译： 本发明涉及一种包含基材的碳膜涂覆制品; 形成在所述基板的至少一部分上并且由构成所述基板的元素和钨构成的混合层; 形成在混合层上的钨膜; 和形成在钨膜上的碳膜。 本发明提供一种制备碳膜涂覆制品的方法，该方法包括以下步骤：在至少部分基材上形成混合层，该混合层由构成基材的元素和钨 在所述混合层上形成钨膜，并在所述钨膜上形成碳膜，其中使用在真空电弧中通过电弧放电蒸发的阴极材料形成所述混合层，所述钨膜和所述碳膜中的至少一个 具有包括阴极的真空电弧蒸发源的沉积设备。

公开(公告)号：US06506292B2

公开(公告)日：2003-01-14

申请号：US09968016

申请日：2001-10-02

申请人： Hiroshi Murakami ,  Takashi Mikami

发明人： Hiroshi Murakami ,  Takashi Mikami

IPC分类号： C23C1432

CPC分类号： H01J37/32055 ,  H01J37/32871 ,  H01J2237/022

摘要： The vacuum arc evaporation apparatus removes coarse particles from plasma containing cathode materials generated from a cathode 7 provided to a evaporation source 6 by a vacuum arc discharge, and is provided with a porous member 10 on the inside wall of a plasma duct equipped with means for forming deflection magnetic field having a magnetic coil 8 outside thereof so as to guide the plasma in the vicinity of a substrate 11 accommodated in the film forming chamber 1.

公开(公告)号：US6124003A

公开(公告)日：2000-09-26

申请号：US283289

申请日：1999-04-01

申请人： Takashi Mikami ,  Hiroshi Murakami

发明人： Takashi Mikami ,  Hiroshi Murakami

IPC分类号： C23C14/32 ,  C23C16/48 ,  C23C16/50 ,  C23C16/505 ,  C23C16/513 ,  H01J37/317 ,  H01J37/32 ,  H01L21/205 ,  H05H1/46 ,  G21K1/087 ,  H01S27/02

CPC分类号： H01J37/32082 ,  C23C16/486 ,  C23C16/505 ,  H01J37/3178 ,  H01J2237/08

摘要： A film is deposited on a target object by exposing the target object to film deposition plasma of a film deposition material gas while irradiating the target object with ion beams. An ion source is used for the irradiation with the ion beams. The ion source has a plasma container and an ion beam producing electrode system formed of four electrodes. The plasma container and the first electrode located in an inner position nearest to the plasma container carry a positive potential. The second electrode carries a negative potential or a lower potential than the film deposition plasma. The third electrode carries a positive potential or a higher potential than the film deposition plasma. The fourth electrode in the outer position remotest from the plasma container carries a ground potential.

摘要翻译： 通过将目标物体暴露于成膜材料气体的成膜等离子体，同时用离子束照射目标物体，将膜沉积在目标物体上。 离子源用于照射离子束。 离子源具有等离子体容器和由四个电极形成的离子束产生电极系统。 位于最靠近等离子体容器的内部位置的等离子体容器和第一电极携带正电位。 第二电极具有比电沉积等离子体更低的负电位或更低的电位。 第三电极具有比成膜等离子体的正电位或更高的电位。 距等离子体容器最远的外部位置的第四电极具有接地电位。

公开(公告)号：US06116187A

公开(公告)日：2000-09-12

申请号：US315145

申请日：1999-05-20

申请人： Hiroshi Murakami ,  Takashi Mikami ,  Kiyoshi Ogata

发明人： Hiroshi Murakami ,  Takashi Mikami ,  Kiyoshi Ogata

IPC分类号： C30B25/02 ,  C23C16/50 ,  C23C16/517 ,  H01J37/32 ,  H01L21/205 ,  H01L21/336 ,  H01L29/786 ,  C23C16/00

CPC分类号： H01J37/3233 ,  C23C16/517

摘要： A thin film forming apparatus has a vacuum chamber as a film forming chamber, a plasma generating unit and an ion source. In the vacuum chamber, a substrate is placed and a thin film is formed on the substrate. The plasma generating unit decomposes a source gas introduced into the vacuum chamber to generate a plasma of the source gas near a film-forming surface of the substrate within the vacuum chamber. The ion source is provided around the vacuum chamber. The ion source produces ion beams that are drawn out to be directed substantially parallel to the film-forming surface of the substrate to irradiate the plasma.

摘要翻译： 薄膜形成装置具有作为成膜室的真空室，等离子体产生单元和离子源。 在真空室中，放置基板，在基板上形成薄膜。 等离子体产生单元分解引入真空室的源气体，以在真空室内的基板的成膜表面附近产生源气体的等离子体。 离子源设置在真空室周围。 离子源产生离子束，其被引出以基本上平行于衬底的成膜表面引导以照射等离子体。

公开(公告)号：US07060167B2

公开(公告)日：2006-06-13

申请号：US10726655

申请日：2003-12-04

申请人： Yasuo Murakami ,  Hiroshi Murakami

发明人： Yasuo Murakami ,  Hiroshi Murakami

IPC分类号： C23C14/34

CPC分类号： H01J37/32623 ,  H01J37/32055

摘要： A vacuum arc vapor deposition apparatus can form a film of good quality without uselessly increasing a time from start of film deposition to completion thereof even when a trigger electrode induces vacuum arc discharge in response to turn-off of the vacuum arc discharge during deposition of the film onto the deposition target object. For example, the vacuum arc vapor deposition apparatus includes a shield member moved to and away from a position between a vapor source and a holder for supporting the deposition target object, a drive device for locating the shield plate selectively in a shield position between the vapor source and the holder, and a retracted position shifted from the shield position, a detector (e.g., current detector) detecting turn-on/off of the vacuum arc discharge, and a control portion controlling the drive device to locate the shield plate in the shield position when the detector detects turn-off of the vacuum arc discharge, and to locate the shield plate in the retracted position when a time required for stabilizing the vacuum arc discharge elapses after the detector detected turn-on of the vacuum arc discharge.

摘要翻译： 真空电弧气相沉积装置可以形成质量好的膜，而不会从成膜开始到完成的时间无需增加时间，即使当触发电极响应于在沉积期间的真空电弧放电的关闭而引起真空电弧放电 电影到沉积目标物体上。 例如，真空电弧蒸镀装置包括：移动到蒸发源和用于支撑沉积目标物体的保持件之间的位置的屏蔽构件;用于将屏蔽板选择性地定位在蒸气之间的屏蔽位置的驱动装置 源极和保持器，以及从屏蔽位置偏移的缩回位置，检测真空电弧放电的接通/断开的检测器（例如电流检测器）以及控制驱动装置以将屏蔽板定位在 当检测器检测到真空电弧放电的接通时，当检测器检测到真空电弧放电的关闭时，并且当稳定真空电弧放电所需的时间过去时，将屏蔽板定位在缩回位置，屏蔽位置。

公开(公告)号：US09046145B2

公开(公告)日：2015-06-02

申请号：US13479821

申请日：2012-05-24

申请人： Hiroshi Murakami ,  Osamu Yuno ,  Tomohiko Fujioka ,  Takashi Nezu ,  Shunsuke Mori

发明人： Hiroshi Murakami ,  Osamu Yuno ,  Tomohiko Fujioka ,  Takashi Nezu ,  Shunsuke Mori

IPC分类号： F16F9/34 ,  F16F9/46 ,  F16F9/32

CPC分类号： F16F9/464 ,  F16F9/325 ,  F16F2226/04

摘要： A shock absorber in which a flow of hydraulic oil caused by sliding movement of a piston in a cylinder is controlled by a pilot type main valve and a pilot valve to generate damping force. The valve-opening operation of the main valve is controlled by adjusting the pressure in a pilot chamber with the pilot valve. A valve block and a solenoid block are connected together into one unit and inserted into a casing before being secured with a nut. At this time, an actuating rod of the solenoid block is engaged with a pilot valve member retained by a pilot spring and a fail-safe spring in a cylindrical portion of a pilot body of the valve block.

摘要翻译： 一种减振器，其中由气缸中的活塞的滑动运动引起的液压油流由先导式主阀和先导阀控制，以产生阻尼力。 通过用先导阀调节先导室中的压力来控制主阀的开阀操作。 在用螺母固定之前，将阀块和螺线管块连接在一起，并插入到壳体中。 此时，螺线管块的致动杆与由先导弹簧保持的先导阀构件和阀块的先导体的圆筒部中的故障保护弹簧接合。

公开(公告)号：US08493582B2

公开(公告)日：2013-07-23

申请号：US11588232

申请日：2006-10-27

申请人： Hiroshi Murakami

发明人： Hiroshi Murakami

IPC分类号： G06K15/00

CPC分类号： H04N1/4433 ,  G06F21/608 ,  G06F21/629 ,  G06F2221/2137 ,  G06F2221/2149 ,  H04N1/444 ,  H04N2201/0094

摘要： An image processor comprising: a user information storage unit for storing information of a plurality of users; a plurality of different user information input units for inputting user information; a user information matching unit for determining whether or not user information inputted by said respective user information input units matches any of the user information registered in said user information storage unit; a job processing unit for executing jobs instructed by a user, whose user information is determined to match any of the registered user information by said user information matching unit; and a job processing control unit for restricting jobs that are processed by said job processing unit, depending on which user information input unit is used.

摘要翻译： 一种图像处理器，包括：用户信息存储单元，用于存储多个用户的信息; 用于输入用户信息的多个不同的用户信息输入单元; 用户信息匹配单元，用于确定由所述各个用户信息输入单元输入的用户信息是否匹配登记在所述用户信息存储单元中的任何用户信息; 作业处理单元，用于执行由用户指定的作业，其用户信息被确定为与所述用户信息匹配单元中的所述注册用户信息匹配; 以及作业处理控制单元，用于根据使用哪个用户信息输入单元来限制由所述作业处理单元处理的作业。