公开(公告)号：US06425497B1

公开(公告)日：2002-07-30

申请号：US09812735

申请日：2001-03-20

申请人： Yiau-Yi Chu ,  Jen-Sen Huang ,  Shih-Hung Lu ,  Tzung-Chi Fu

发明人： Yiau-Yi Chu ,  Jen-Sen Huang ,  Shih-Hung Lu ,  Tzung-Chi Fu

IPC分类号： B67D508

CPC分类号： G03F7/162 ,  H01L21/6715 ,  H01L21/67253

摘要： A method and apparatus for dispensing a resist solution used in a semiconductor device manufacturing process senses the presence of air bubbles in the solution during delivery through a line feeding a dispensing pump. Air bubbles in the line are sensed by an optical photocoupler that senses changes in the intensity of light refracted through the solution caused by air bubbles entrapped in the solution. The sensor produces an air bubble indicating signal that can be used to activate an alarm or to stop the dispensing process.

摘要翻译： 用于分配半导体器件制造工艺中使用的抗蚀剂溶液的方法和装置在通过供给分配泵的管线输送期间检测溶液中存在气泡。 线中的气泡被光学光耦合器感测到，该光耦合器感测由溶于溶液中的气泡引起的溶液折射的光的强度变化。 传感器产生一个气泡指示信号，可用于激活报警或停止分配过程。

公开(公告)号：US20110267593A1

公开(公告)日：2011-11-03

申请号：US12772647

申请日：2010-05-03

申请人： Chang-Tsun Hsieh ,  Fu-Jye Liang ,  Tzung-Chi Fu ,  Li-Jui Chen ,  Chih-Ming Ke

发明人： Chang-Tsun Hsieh ,  Fu-Jye Liang ,  Tzung-Chi Fu ,  Li-Jui Chen ,  Chih-Ming Ke

IPC分类号： G03B27/53 ,  G01J3/28

CPC分类号： G03F7/70616 ,  G02B7/28 ,  G03F7/70575 ,  G03F7/70641 ,  G03F9/70 ,  G03F9/7026

摘要： A method includes directing a beam of radiation along an optical axis toward a workpiece support, measuring a spectrum of the beam at a first time to obtain a first profile, measuring the spectrum of the beam at a second time to obtain a second profile, determining a spectral difference between the two profiles, and adjusting a position of the workpiece support along the optical axis based on the difference. A different aspect involves an apparatus having a workpiece support, beam directing structure that directs a beam of radiation along an optical axis toward the workpiece support, spectrum measuring structure that measures a spectrum of the beam at first and second times to obtain respective first and second profiles, processing structure that determines a difference between the two profiles, and support adjusting structure that adjusts a position of the workpiece support along the optical axis based on the difference.

摘要翻译： 一种方法包括将辐射束沿着光轴引向工件支撑件，在第一时间测量光束的光谱以获得第一分布，在第二时间测量光束的光谱以获得第二分布，确定 两个轮廓之间的光谱差异，并且基于该差异来调整沿着光轴的工件支撑件的位置。 不同的方面涉及一种具有工件支撑件的装置，将导光束沿着光轴朝向工件支撑件的光束引导结构，光谱测量结构，其在第一次和第二次测量光束的光谱以获得相应的第一和第二 轮廓，确定两个轮廓之间的差异的处理结构，以及基于该差异来调整沿着光轴的工件支撑件的位置的支撑调整结构。

公开(公告)号：US07800731B2

公开(公告)日：2010-09-21

申请号：US11556550

申请日：2006-11-03

申请人： Hsin Chang ,  Tzung-Chi Fu ,  Tsai-Sheng Gau

发明人： Hsin Chang ,  Tzung-Chi Fu ,  Tsai-Sheng Gau

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70341 ,  G03F7/70925

摘要： A method and system involve supplying an immersion fluid to a space between an imaging lens and a substrate to be patterned, generating an electric field in the immersion fluid within the space so that the electric field urges particles away from a surface of the substrate, removing the immersion fluid along with the particles from the space, and thereafter supplying immersion fluid to the space and performing a lithographic exposing process on the surface of the substrate.

摘要翻译： 一种方法和系统包括将浸没流体提供给成像透镜和要被图案化的基底之间的空间，在空间内的浸没流体中产生电场，使得电场促使颗粒远离基底表面，去除 所述浸没流体与来自所述空间的颗粒一起，然后向所述空间供给浸没流体，并对所述基板的表面进行平版印刷曝光处理。

公开(公告)号：US20080106709A1

公开(公告)日：2008-05-08

申请号：US11556550

申请日：2006-11-03

申请人： Hsin Chang ,  Tzung-Chi Fu ,  Tsai-Sheng Gau

发明人： Hsin Chang ,  Tzung-Chi Fu ,  Tsai-Sheng Gau

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70341 ,  G03F7/70925

摘要： A method and system involve supplying an immersion fluid to a space between an imaging lens and a substrate to be patterned, generating an electric field in the immersion fluid within the space so that the electric field urges particles away from a surface of the substrate, removing the immersion fluid along with the particles from the space, and thereafter supplying immersion fluid to the space and performing a lithographic exposing process on the surface of the substrate.

摘要翻译： 一种方法和系统包括将浸没流体提供给成像透镜和要被图案化的基底之间的空间，在空间内的浸没流体中产生电场，使得电场促使颗粒远离基底表面，去除 所述浸没流体与来自所述空间的颗粒一起，然后向所述空间供给浸没流体，并对所述基板的表面进行平版印刷曝光处理。

公开(公告)号：US08068208B2

公开(公告)日：2011-11-29

申请号：US11677949

申请日：2007-02-22

申请人： Jui-Chung Peng ,  Tzung-Chi Fu ,  Chin-Hsiang Lin ,  Chien-Hsun Lin ,  Chun-Hung Lin ,  Yao-Wen Guo ,  Shy-Jay Lin ,  Heng-Hsin Liu

发明人： Jui-Chung Peng ,  Tzung-Chi Fu ,  Chin-Hsiang Lin ,  Chien-Hsun Lin ,  Chun-Hung Lin ,  Yao-Wen Guo ,  Shy-Jay Lin ,  Heng-Hsin Liu

IPC分类号： G03B27/52 ,  G03B27/68 ,  G03B27/42 ,  G03B27/58 ,  G03B27/60 ,  G03B27/32

CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/70783

摘要： System and method for improving immersion scanner overlay performance are described. One embodiment is a method of improving overlay performance of an photolithography immersion scanner including a wafer table having lens cooling water (“LCW”) disposed in a water channel therein, the wafer table having an input for receiving the LCW into the water channel and an output for expelling the LCW from the water channel. The method includes providing a water tank that connects to at least one of the wafer table input and the wafer table output; monitoring a pressure of water in the water tank; and maintaining the pressure of the water in the water tank at a predetermined level.

摘要翻译： 描述了用于提高浸没式扫描仪覆盖性能的系统和方法。 一个实施例是一种提高光刻浸没扫描仪的覆盖性能的方法，该扫描仪包括设置在其中的水通道中的具有透镜冷却水（“LCW”）的晶片台，晶片台具有用于将LCW接收到水通道中的输入端， 输出用于从水道排出LCW。 该方法包括：提供连接到晶片台输入和晶片台输出中的至少一个的水箱; 监测水箱内的水压; 并且将水箱中的水的压力保持在预定水平。

公开(公告)号：US07728952B2

公开(公告)日：2010-06-01

申请号：US11627247

申请日：2007-01-25

申请人： Tzung-Chi Fu ,  Hsin Chang

发明人： Tzung-Chi Fu ,  Hsin Chang

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/58 ,  G03B27/32

CPC分类号： G03F7/7085 ,  G03F7/70341 ,  G03F7/707

摘要： Aspects of the present disclosure provide a method and a system for closing plate take-over in immersion lithography. A plate holder is provided for a closing plate in a wafer holder of an immersion lithography system. An optical detector is provided below the plate holder for determining whether a light signal passing through the closing plate is aligned with the plate holder using the optical detector. If the light signal is aligned, a fluid containment mechanism is lowered, and the closing plate is placed into the plate holder. Alternatively, the fluid containment mechanism is lowered to surface of the closing plate, the closing plate is affixed to the mechanism, and the mechanism is raised with the closing plate. If the light signal is not aligned, an error is triggered and the scanner is stopped.

摘要翻译： 本公开的方面提供了一种用于在浸没式光刻中闭合板接收的方法和系统。 在浸没式光刻系统的晶片保持器中设置用于封闭板的板保持器。 光学检测器设置在印版保持器的下面，用于确定通过封闭板的光信号是否使用光学检测器与印版保持器对准。 如果光信号对准，则流体容纳机构降低，并且封闭板被放置在板夹中。 或者，流体容纳机构下降到封闭板的表面，封闭板固定在机构上，并且机构与封闭板一起升高。 如果光信号未对齐，则会触发错误并停止扫描仪。

公开(公告)号：US07675604B2

公开(公告)日：2010-03-09

申请号：US11427434

申请日：2006-06-29

申请人： Li-Jui Chen ,  Tzung-Chi Fu ,  Ching-Yu Chang ,  Fu-Jye Liang ,  Lin-Hung Shiu ,  Chun-Kuang Chen ,  Tsai-Sheng Gau

发明人： Li-Jui Chen ,  Tzung-Chi Fu ,  Ching-Yu Chang ,  Fu-Jye Liang ,  Lin-Hung Shiu ,  Chun-Kuang Chen ,  Tsai-Sheng Gau

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70341

摘要： A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; a fluid retaining module configured to hold a fluid in a space between the imaging lens module and a substrate on the substrate stage; and a heating element configured in the fluid retaining module and adjacent to the space. The heating element includes at least two of following: a sealant insoluble to the fluid for sealing the heating element in the fluid retaining module; a sealed opening configured in one of top portion and side portion of the fluid retaining module for sealing the heating element in the fluid retaining module; and/or a non-uniform temperature compensation device configured with the heating element.

摘要翻译： 光刻设备包括成像透镜模块; 位于所述成像透镜模块下方且被配置为保持基板的基板台; 流体保持模块，被配置为将流体保持在所述成像透镜模块和所述基板载台上的基板之间的空间中; 以及配置在所述流体保持模块中且与所述空间相邻的加热元件。 所述加热元件包括以下至少两个：对所述流体不溶的密封剂，用于密封所述流体保持模块中的所述加热元件; 密封开口，其构造在流体保持模块的顶部和侧部之一中，用于密封流体保持模块中的加热元件; 和/或配置有加热元件的不均匀的温度补偿装置。

公开(公告)号：US20140061655A1

公开(公告)日：2014-03-06

申请号：US13602618

申请日：2012-09-04

申请人： Chia-Hao Hsu ,  Chia-Chen Chen ,  Tzung-Chi Fu ,  Tzu-Wei Kao ,  Yu Chao Lin

发明人： Chia-Hao Hsu ,  Chia-Chen Chen ,  Tzung-Chi Fu ,  Tzu-Wei Kao ,  Yu Chao Lin

IPC分类号： H01L21/20 ,  H01L29/04

CPC分类号： H01L23/562 ,  G03F7/70708 ,  H01L21/26506 ,  H01L21/32155 ,  H01L21/6831 ,  H01L29/0603 ,  H01L29/34 ,  H01L2924/0002 ,  H01L2924/00

摘要： The present disclosure provides one embodiment of a semiconductor structure. The semiconductor structure includes a semiconductor substrate having a front surface and a backside surface; integrated circuit features formed on the front surface of the semiconductor substrate; and a polycrystalline silicon layer disposed on the backside surface of the semiconductor substrate.

摘要翻译： 本公开提供了半导体结构的一个实施例。 半导体结构包括具有前表面和后表面的半导体衬底; 集成电路特征形成在半导体衬底的前表面上; 以及设置在半导体衬底的背面上的多晶硅层。

公开(公告)号：US08520189B2

公开(公告)日：2013-08-27

申请号：US12772647

申请日：2010-05-03

申请人： Chang-Tsun Hsieh ,  Fu-Jye Liang ,  Tzung-Chi Fu ,  Li-Jiu Chen ,  Chih-Ming Ke

发明人： Chang-Tsun Hsieh ,  Fu-Jye Liang ,  Tzung-Chi Fu ,  Li-Jiu Chen ,  Chih-Ming Ke

IPC分类号： G01J3/28 ,  G03B27/32 ,  G03B27/42 ,  G03B27/52 ,  G03B27/54 ,  G03B27/74

CPC分类号： G03F7/70616 ,  G02B7/28 ,  G03F7/70575 ,  G03F7/70641 ,  G03F9/70 ,  G03F9/7026

摘要： A method includes directing a beam of radiation along an optical axis toward a workpiece support, measuring a spectrum of the beam at a first time to obtain a first profile, measuring the spectrum of the beam at a second time to obtain a second profile, determining a spectral difference between the two profiles, and adjusting a position of the workpiece support along the optical axis based on the difference. A different aspect involves an apparatus having a workpiece support, beam directing structure that directs a beam of radiation along an optical axis toward the workpiece support, spectrum measuring structure that measures a spectrum of the beam at first and second times to obtain respective first and second profiles, processing structure that determines a difference between the two profiles, and support adjusting structure that adjusts a position of the workpiece support along the optical axis based on the difference.

公开(公告)号：US20080129969A1

公开(公告)日：2008-06-05

申请号：US11677949

申请日：2007-02-22

申请人： Jui-Chung Peng ,  Tzung-Chi Fu ,  Chin-Hsiang Lin ,  Chien-Hsun Lin ,  Chun-Hung Lin ,  Yao-Wen Guo ,  Shy-Jay Lin ,  Heng-Hsin Liu

发明人： Jui-Chung Peng ,  Tzung-Chi Fu ,  Chin-Hsiang Lin ,  Chien-Hsun Lin ,  Chun-Hung Lin ,  Yao-Wen Guo ,  Shy-Jay Lin ,  Heng-Hsin Liu

IPC分类号： G03B27/52

CPC分类号： G03F7/70875 ,  G03F7/70341 ,  G03F7/70783

摘要： System and method for improving immersion scanner overlay performance are described. One embodiment is a method of improving overlay performance of an photolithography immersion scanner comprising a wafer table having lens cooling water (“LCW”) disposed in a water channel therein, the wafer table having an input for receiving the LCW into the water channel and an output for expelling the LCW from the water channel. The method comprises providing a water tank at least one of the wafer table input and the wafer table output; monitoring a pressure of water in the water tank; and maintaining the pressure of the water in the water tank at a predetermined level.

摘要翻译： 描述了用于提高浸没式扫描仪覆盖性能的系统和方法。 一个实施例是一种提高光刻浸没式扫描仪的覆盖性能的方法，其包括设置在其中的水通道中的透镜冷却水（“LCW”）的晶片台，晶片台具有用于将LCW接收到水通道中的输入端， 输出用于从水道排出LCW。 该方法包括：提供一个水箱至少一个晶片台输入和晶片台输出; 监测水箱内的水压; 并且将水箱中的水的压力保持在预定水平。