利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

150 条记录 (耗时 0.034 秒)

    Thin film transistor and display panel employing the same
    3.
    发明授权
    Thin film transistor and display panel employing the same 有权
    薄膜晶体管和采用其的显示面板

    公开(公告)号：US09178030B2

    公开(公告)日：2015-11-03

    申请号：US13616964

    申请日：2012-09-14

    申请人： Sang-hun Jeon ,  I-hun Song ,  Chang-jung Kim ,  Seung-eon Ahn

    发明人： Sang-hun Jeon ,  I-hun Song ,  Chang-jung Kim ,  Seung-eon Ahn

    IPC分类号： G02F1/136 ,  H01L29/45 ,  G02F1/1368 ,  G06F3/042 ,  H01L29/49 ,  H01L29/786 ,  G02F1/1333

    CPC分类号： H01L29/45 ,  G02F1/13338 ,  G02F1/1368 ,  G06F3/0421 ,  G06F2203/04103 ,  H01L29/4908 ,  H01L29/78606 ,  H01L29/7869

    摘要： A thin film transistor is provided. The transistor includes a gate; a first passivation layer covering the gate; a channel layer disposed on the first passivation layer; a source and a drain that are disposed on the first passivation layer and contact two sides of the channel layer; a second passivation layer covering the channel layer, the source, and the drain; first and second transparent electrode layers that are disposed on the second passivation layer and spaced apart from each other; a first transparent conductive via that penetrates the second passivation layer and connects the source and the first transparent electrode layer; and a second transparent conductive via that penetrates the second passivation layer and connects the drain and the second transparent electrode layer. A cross-sectional area of the gate is larger than a cross-sectional area of the channel layer, the source, and the drain combined.

    摘要翻译： 提供薄膜晶体管。 晶体管包括一个栅极; 覆盖所述栅极的第一钝化层; 设置在所述第一钝化层上的沟道层; 源极和漏极，其设置在所述第一钝化层上并接触所述沟道层的两侧; 覆盖沟道层，源极和漏极的第二钝化层; 第一和第二透明电极层，其设置在第二钝化层上并彼此间隔开; 第一透明导电通孔，其穿透所述第二钝化层并连接所述源极和所述第一透明电极层; 以及第二透明导电通孔，其穿透第二钝化层并连接漏极和第二透明电极层。 栅极的横截面面积大于沟道层，源极和漏极组合的横截面面积。

    X-ray detector including oxide semiconductor transistor
    6.
    发明授权
    X-ray detector including oxide semiconductor transistor 有权
    X射线检测器包括氧化物半导体晶体管

    公开(公告)号：US08963096B2

    公开(公告)日：2015-02-24

    申请号：US12926921

    申请日：2010-12-17

    申请人： Sun-il Kim ,  Jae-chul Park ,  Sang-wook Kim ,  Chang-jung Kim

    发明人： Sun-il Kim ,  Jae-chul Park ,  Sang-wook Kim ,  Chang-jung Kim

    IPC分类号： H01L27/146 ,  G01T1/24 ,  H01L31/08

    CPC分类号： H01L31/085 ,  G01T1/24

    摘要： Example embodiments are directed an X-ray detector including an oxide semiconductor transistor. The X-ray detector including the oxide semiconductor transistor includes an oxide semiconductor transistor and a signal storage capacitor in parallel to each other on a substrate. The oxide semiconductor transistor includes a channel formed of an oxide semiconductor material, and a photoconductor. A pixel electrode and a common electrode are formed on opposite surfaces of the photoconductor. The channel includes ZnO, or a compound including ZnO and at least one selected from a group consisting of gallium (Ga), indium (In), hafnium (Hf), and tin (Sn).

    摘要翻译： 示例性实施例涉及包括氧化物半导体晶体管的X射线检测器。 包括氧化物半导体晶体管的X射线检测器包括在基板上彼此平行的氧化物半导体晶体管和信号存储电容器。 氧化物半导体晶体管包括由氧化物半导体材料形成的沟道和感光体。 像素电极和公共电极形成在感光体的相对表面上。 该通道包括ZnO或包含ZnO和选自镓（Ga），铟（In），铪（Hf）和锡（Sn）中的至少一种的化合物。

    HIGH-VOLTAGE OXIDE TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
    7.
    发明申请
    HIGH-VOLTAGE OXIDE TRANSISTOR AND METHOD OF MANUFACTURING THE SAME 有权
    高电压氧化物晶体管及其制造方法

    公开(公告)号：US20130168770A1

    公开(公告)日：2013-07-04

    申请号：US13547200

    申请日：2012-07-12

    申请人： Sang-hun Jeon ,  Chang-jung Kim ,  I-hun Song

    发明人： Sang-hun Jeon ,  Chang-jung Kim ,  I-hun Song

    IPC分类号： H01L29/772 ,  H01L21/336

    CPC分类号： H01L29/42384 ,  H01L29/78648 ,  H01L29/7869 ,  H01L29/78696

    摘要： A high-voltage oxide transistor includes a substrate; a channel layer disposed on the substrate; a gate electrode disposed on the substrate to correspond to the channel layer; a source contacting a first side of the channel layer; and a drain contacting a second side of the channel layer, wherein the channel layer includes a plurality of oxide layers, and none of the plurality of oxide layers include silicon. The gate electrode may be disposed on or under the channel layer. Otherwise, the gate electrodes may be disposed respectively on and under the channel layer.

    摘要翻译： 高压氧化物晶体管包括基板; 设置在所述基板上的沟道层; 设置在所述基板上以对应于所述沟道层的栅电极; 源极，与所述沟道层的第一侧接触; 以及与沟道层的第二面接触的漏极，其中所述沟道层包括多个氧化物层，并且所述多个氧化物层中没有一个包括硅。 栅电极可以设置在沟道层上或下面。 否则，栅极电极可以分别设置在沟道层上和下面。