Semiconductor device and manufacturing method of semiconductor device
    1.
    发明授权
    Semiconductor device and manufacturing method of semiconductor device 有权
    半导体器件及半导体器件的制造方法

    公开(公告)号:US08432018B2

    公开(公告)日:2013-04-30

    申请号:US13271469

    申请日:2011-10-12

    IPC分类号: H01L29/06

    摘要: The present invention provides a thin and bendable semiconductor device utilizing an advantage of a flexible substrate used in the semiconductor device, and a method of manufacturing the semiconductor device. The semiconductor device has at least one surface covered by an insulating layer which serves as a substrate for protection. In the semiconductor device, the insulating layer is formed over a conductive layer serving as an antenna such that the value in the thickness ratio of the insulating layer in a portion not covering the conductive layer to the conductive layer is at least 1.2, and the value in the thickness ratio of the insulating layer formed over the conductive layer to the conductive layer is at least 0.2. Further, not the conductive layer but the insulating layer is exposed in the side face of the semiconductor device, and the insulating layer covers a TFT and the conductive layer.

    摘要翻译: 本发明提供了利用半导体器件中使用的柔性衬底的优点的薄且可弯曲的半导体器件以及半导体器件的制造方法。 半导体器件具有被绝缘层覆盖的至少一个表面,该绝缘层用作用于保护的衬底。 在半导体器件中,绝缘层形成在用作天线的导电层上,使得不覆盖导电层的部分中的绝缘层的厚度比值至少为1.2,并且该值 在导电层上形成的绝缘层与导电层的厚度比为至少0.2。 此外,导电层而不是绝缘层不会在半导体器件的侧面露出,并且绝缘层覆盖TFT和导电层。

    Semiconductor device and manufacturing method of semiconductor device
    2.
    发明申请
    Semiconductor device and manufacturing method of semiconductor device 有权
    半导体器件及半导体器件的制造方法

    公开(公告)号:US20070296037A1

    公开(公告)日:2007-12-27

    申请号:US11812813

    申请日:2007-06-21

    IPC分类号: H01L27/12 H01L21/84

    摘要: The present invention provides a thin and bendable semiconductor device utilizing an advantage of a flexible substrate used in the semiconductor device, and a method of manufacturing the semiconductor device. The semiconductor device has at least one surface covered by an insulating layer which serves as a substrate for protection. In the semiconductor device, the insulating layer is formed over a conductive layer serving as an antenna such that the value in the thickness ratio of the insulating layer in a portion not covering the conductive layer to the conductive layer is at least 1.2, and the value in the thickness ratio of the insulating layer formed over the conductive layer to the conductive layer is at least 0.2. Further, not the conductive layer but the insulating layer is exposed in the side face of the semiconductor device, and the insulating layer covers a TFT and the conductive layer. In addition, a substrate covering an element formation layer side is a substrate having a support on its surface is used in the manufacturing process.

    摘要翻译: 本发明提供了利用半导体器件中使用的柔性衬底的优点的薄且可弯曲的半导体器件以及半导体器件的制造方法。 半导体器件具有被绝缘层覆盖的至少一个表面,该绝缘层用作用于保护的衬底。 在半导体器件中,绝缘层形成在用作天线的导电层上,使得不覆盖导电层的部分中的绝缘层的厚度比值至少为1.2,并且该值 在导电层上形成的绝缘层与导电层的厚度比为至少0.2。 此外,导电层而不是绝缘层不会在半导体器件的侧面露出,并且绝缘层覆盖TFT和导电层。 此外,在制造过程中使用覆盖元件形成层侧的基板是其表面上具有支撑体的基板。

    Semiconductor device and manufacturing method of semiconductor device
    3.
    发明授权
    Semiconductor device and manufacturing method of semiconductor device 有权
    半导体器件及半导体器件的制造方法

    公开(公告)号:US08039353B2

    公开(公告)日:2011-10-18

    申请号:US12854060

    申请日:2010-08-10

    摘要: The present invention provides a thin and bendable semiconductor device utilizing an advantage of a flexible substrate used in the semiconductor device, and a method of manufacturing the semiconductor device. The semiconductor device has at least one surface covered by an insulating layer which serves as a substrate for protection. In the semiconductor device, the insulating layer is formed over a conductive layer serving as an antenna such that the value in the thickness ratio of the insulating layer in a portion not covering the conductive layer to the conductive layer is at least 1.2, and the value in the thickness ratio of the insulating layer formed over the conductive layer to the conductive layer is at least 0.2. Further, not the conductive layer but the insulating layer is exposed in the side face of the semiconductor device, and the insulating layer covers a TFT and the conductive layer. In addition, a substrate covering an element formation layer side is a substrate having a support on its surface is used in the manufacturing process.

    摘要翻译: 本发明提供了利用半导体器件中使用的柔性衬底的优点的薄且可弯曲的半导体器件以及半导体器件的制造方法。 半导体器件具有被绝缘层覆盖的至少一个表面,该绝缘层用作用于保护的衬底。 在半导体器件中,绝缘层形成在用作天线的导电层上,使得不覆盖导电层的部分中的绝缘层的厚度比值至少为1.2,并且该值 在导电层上形成的绝缘层与导电层的厚度比为至少0.2。 此外,导电层而不是绝缘层不会在半导体器件的侧面露出,并且绝缘层覆盖TFT和导电层。 此外,在制造过程中使用覆盖元件形成层侧的基板是其表面上具有支撑体的基板。

    Semiconductor device and manufacturing method of semiconductor device
    4.
    发明授权
    Semiconductor device and manufacturing method of semiconductor device 有权
    半导体器件及半导体器件的制造方法

    公开(公告)号:US07851886B2

    公开(公告)日:2010-12-14

    申请号:US11812813

    申请日:2007-06-21

    IPC分类号: H01L29/06

    摘要: The present invention provides a thin and bendable semiconductor device utilizing an advantage of a flexible substrate used in the semiconductor device, and a method of manufacturing the semiconductor device. The semiconductor device has at least one surface covered by an insulating layer which serves as a substrate for protection. In the semiconductor device, the insulating layer is formed over a conductive layer serving as an antenna such that the value in the thickness ratio of the insulating layer in a portion not covering the conductive layer to the conductive layer is at least 1.2, and the value in the thickness ratio of the insulating layer formed over the conductive layer to the conductive layer is at least 0.2. Further, not the conductive layer but the insulating layer is exposed in the side face of the semiconductor device, and the insulating layer covers a TFT and the conductive layer. In addition, a substrate covering an element formation layer side is a substrate having a support on its surface is used in the manufacturing process.

    摘要翻译: 本发明提供了利用半导体器件中使用的柔性衬底的优点的薄且可弯曲的半导体器件以及半导体器件的制造方法。 半导体器件具有被绝缘层覆盖的至少一个表面,该绝缘层用作用于保护的衬底。 在半导体器件中,绝缘层形成在用作天线的导电层上,使得不覆盖导电层的部分中的绝缘层的厚度比值至少为1.2,并且该值 在导电层上形成的绝缘层与导电层的厚度比为至少0.2。 此外,导电层而不是绝缘层不会在半导体器件的侧面露出,并且绝缘层覆盖TFT和导电层。 此外,在制造过程中使用覆盖元件形成层侧的基板是其表面上具有支撑体的基板。

    Semiconductor device and manufacturing method of semiconductor device

    公开(公告)号:US07772675B2

    公开(公告)日:2010-08-10

    申请号:US11812813

    申请日:2007-06-21

    IPC分类号: H01L29/06

    摘要: The present invention provides a thin and bendable semiconductor device utilizing an advantage of a flexible substrate used in the semiconductor device, and a method of manufacturing the semiconductor device. The semiconductor device has at least one surface covered by an insulating layer which serves as a substrate for protection. In the semiconductor device, the insulating layer is formed over a conductive layer serving as an antenna such that the value in the thickness ratio of the insulating layer in a portion not covering the conductive layer to the conductive layer is at least 1.2, and the value in the thickness ratio of the insulating layer formed over the conductive layer to the conductive layer is at least 0.2. Further, not the conductive layer but the insulating layer is exposed in the side face of the semiconductor device, and the insulating layer covers a TFT and the conductive layer. In addition, a substrate covering an element formation layer side is a substrate having a support on its surface is used in the manufacturing process.