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公开(公告)号：US10160093B2
公开(公告)日：2018-12-25
申请号：US12631557
申请日：2009-12-04
IPC分类号： H01L21/321 , B24B41/06 , B24B7/20 , B24B37/30 , B24B37/32
摘要： An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.
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公开(公告)号：US08662957B2
公开(公告)日：2014-03-04
申请号：US12825276
申请日：2010-06-28
IPC分类号： B24B49/00
CPC分类号： B24B37/205 , B24B37/26 , B24B49/12
摘要： In one aspect, a polishing pad includes a homogeneous unitary polishing layer having a polishing surface, an opposed bottom surface, a recess in the polishing surface extending partially but not entirely through the polishing layer, and a solid light-transmissive window is secured in the recess. In another aspect, a polishing pad includes a polishing layer having a polishing surface, and the polishing surface includes a first region having a first plurality of grooves with a first depth extending partially but not entirely through the polishing layer and a second region surrounded by the first region and having a second plurality of grooves with a second depth extending partially but not entirely through the polishing layer, the second depth greater than the first depth.
摘要翻译： 在一个方面，抛光垫包括具有研磨表面，相对的底表面，抛光表面中的部分但不完全延伸穿过抛光层的凹部的均匀单一抛光层，并且固体透光窗口固定在 休息。 在另一方面，抛光垫包括具有抛光表面的抛光层，并且抛光表面包括具有第一多个凹槽的第一区域，该第一区域具有部分但不完全延伸穿过该抛光层的第一深度和由该抛光层包围的第二区域 第一区域并且具有第二多个凹槽，其具有部分但不完全延伸穿过抛光层的第二深度，第二深度大于第一深度。
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公开(公告)号：US20100330879A1
公开(公告)日：2010-12-30
申请号：US12825276
申请日：2010-06-28
CPC分类号： B24B37/205 , B24B37/26 , B24B49/12
摘要： In one aspect, a polishing pad includes a homogeneous unitary polishing layer having a polishing surface, an opposed bottom surface, a recess in the polishing surface extending partially but not entirely through the polishing layer, and a solid light-transmissive window is secured in the recess. In another aspect, a polishing pad includes a polishing layer having a polishing surface, and the polishing surface includes a first region having a first plurality of grooves with a first depth extending partially but not entirely through the polishing layer and a second region surrounded by the first region and having a second plurality of grooves with a second depth extending partially but not entirely through the polishing layer, the second depth greater than the first depth.
摘要翻译： 在一个方面，抛光垫包括具有研磨表面，相对的底表面，抛光表面中的部分但不完全延伸穿过抛光层的凹部的均匀单一抛光层，并且固体透光窗口固定在 休息。 在另一方面，抛光垫包括具有抛光表面的抛光层，并且抛光表面包括具有第一多个凹槽的第一区域，该第一区域具有部分但不完全延伸穿过该抛光层的第一深度和由该抛光层包围的第二区域 第一区域并且具有第二多个凹槽，其具有部分但不完全延伸穿过抛光层的第二深度，第二深度大于第一深度。
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公开(公告)号：US20100311311A1
公开(公告)日：2010-12-09
申请号：US12631239
申请日：2009-12-04
CPC分类号： B24B37/30
摘要： A flexible membrane includes a horizontal central portion, a vertical portion coupled to the central portion, a thick rim portion coupled to the vertical portion, and an extension coupled to the thick rim portion. An outer surface of the horizontal central portion provides a mounting surface configured to receive a substrate. The thick rim portion has a thickness that is greater than a portion directly adjacent to the thick rim portion. The thick rim portion is between the extension and the vertical portion and a greatest dimension of the extension is less than the thickness of the thick rim portion.
摘要翻译： 柔性膜包括水平中心部分，连接到中心部分的垂直部分，耦合到垂直部分的厚边缘部分，以及连接到厚边缘部分的延伸部分。 水平中心部分的外表面提供了构造成接收基底的安装表面。 厚边缘部分的厚度大于与厚边缘部分直接相邻的部分。 厚边缘部分在延伸部分和垂直部分之间，并且延伸部分的最大尺寸小于厚边缘部分的厚度。
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公开(公告)号：US08475231B2
公开(公告)日：2013-07-02
申请号：US12631239
申请日：2009-12-04
CPC分类号： B24B37/30
摘要： A flexible membrane includes a horizontal central portion, a vertical portion coupled to the central portion, a thick rim portion coupled to the vertical portion, and an extension coupled to the thick rim portion. An outer surface of the horizontal central portion provides a mounting surface configured to receive a substrate. The thick rim portion has a thickness that is greater than a portion directly adjacent to the thick rim portion. The thick rim portion is between the extension and the vertical portion and a greatest dimension of the extension is less than the thickness of the thick rim portion.
摘要翻译： 柔性膜包括水平中心部分，连接到中心部分的垂直部分，耦合到垂直部分的厚边缘部分和连接到厚边缘部分的延伸部分。 水平中心部分的外表面提供了构造成接收基底的安装表面。 厚边缘部分的厚度大于与厚边缘部分直接相邻的部分。 厚边缘部分在延伸部分和垂直部分之间，并且延伸部分的最大尺寸小于厚边缘部分的厚度。
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公开(公告)号：US20100173566A1
公开(公告)日：2010-07-08
申请号：US12631557
申请日：2009-12-04
CPC分类号： B24B37/30 , B24B37/32 , H01L21/3212
摘要： An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.
摘要翻译： 一种装置包括用于与基板化学机械抛光装置的载体头一起使用的柔性膜。 膜包括提供基板接收表面的外表面，其中外表面具有中心部分和围绕中心部分的边缘部分，其中中心部分具有第一表面粗糙度，并且边缘部分具有第二表面粗糙度，第一 表面粗糙度大于第二表面粗糙度。
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公开(公告)号：US20140287662A1
公开(公告)日：2014-09-25
申请号：US14219913
申请日：2014-03-19
申请人： Irfanulla Khuddus Rahmathullah , Bopanna Ichettira Vansantha , Padma Gopalakrishnan , Abraham Palaty , Aswathnarayanaiah Ravi , Ashish Bhatnagar , Young J. Paik , Stacy Meyer , Daniel Martin
发明人： Irfanulla Khuddus Rahmathullah , Bopanna Ichettira Vansantha , Padma Gopalakrishnan , Abraham Palaty , Aswathnarayanaiah Ravi , Ashish Bhatnagar , Young J. Paik , Stacy Meyer , Daniel Martin
IPC分类号： B24B37/32
CPC分类号： B24B37/32
摘要： A retaining ring includes a generally annular upper portion having a top surface configured to be connected to a base of a carrier head and a lower surface, and a plurality of substantially identical arcuate segments detachably secured to the upper portion to form an annular lower portion. Each of the arcuate segments has an upper surface that abuts the lower surface of the upper portion and a bottom surface for contacting a polishing pad during polishing.
摘要翻译： 保持环包括大致环形的上部，其具有构造成连接到承载头和下表面的基部的顶表面，以及可拆卸地固定到上部以形成环形下部的多个基本相同的弧形段。 每个弧形段具有邻接上部下表面的上表面和用于在抛光过程中接触抛光垫的底表面。
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公开(公告)号：US20130324017A1
公开(公告)日：2013-12-05
申请号：US13907658
申请日：2013-05-31
申请人： Irfanulla Khuddus Rahmathullah , Bopanna Ichettira Vansantha , Padma Gopalakrishnan , Ravi Aswathnarayanaiah , Abraham Palaty , Young J. Paik , Stacy Meyer , James Klingler , Ashish Bhatnagar
发明人： Irfanulla Khuddus Rahmathullah , Bopanna Ichettira Vansantha , Padma Gopalakrishnan , Ravi Aswathnarayanaiah , Abraham Palaty , Young J. Paik , Stacy Meyer , James Klingler , Ashish Bhatnagar
IPC分类号： B24B37/32
CPC分类号： B24B37/32
摘要： A retaining ring includes an annular lower portion and an annular upper portion. The annular lower portion has a main body with a bottom surface for contacting a polishing pad during polishing, an inner rim projecting upward from the main body, an outer rim projecting upward from the main body and separated from the inner rim by a gap, and a plurality of azimuthally separated interlock features positioned between the inner rim and the outer rim, each interlock feature projecting upwardly from the main body. The annular upper portion has a top surface and a bottom surface and a plurality of azimuthally separated recesses in the bottom surface, the recesses defining thin portions of the upper portion, the plurality of interlock features fitting into the plurality of recesses. The lower portion is a plastic and the upper portion is a material that is more rigid than the plastic.
摘要翻译： 保持环包括环形下部和环形上部。 环形下部具有主体，其具有用于在抛光期间接触抛光垫的底面，从主体向上突出的内边缘，从主体向上突出并与内边缘分开的外缘间隙， 位于内边缘和外边缘之间的多个方位分离的互锁特征，每个互锁特征从主体向上突出。 环形上部具有顶表面和底表面以及在底表面中的多个方位分离的凹槽，所述凹部限定上部的薄部分，多个互锁特征装配到多个凹部中。 下部是塑料，上部是比塑料更硬的材料。
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公开(公告)号：US20130035022A1
公开(公告)日：2013-02-07
申请号：US13560606
申请日：2012-07-27
申请人： Young J. Paik , James Klingler , Stacy Meyer , Christopher R. Mahon , Laxman Murugesh , Ashish Bhatnagar , Padma Gopalakrishnan
发明人： Young J. Paik , James Klingler , Stacy Meyer , Christopher R. Mahon , Laxman Murugesh , Ashish Bhatnagar , Padma Gopalakrishnan
IPC分类号： B24B37/32
CPC分类号： B24B37/32
摘要： A retaining ring includes a generally annular lower portion and a generally annular upper portion. The lower portion has a bottom surface for contacting a polishing pad during polishing and a top surface. The upper portion has a bottom surface secured to the top surface of the lower portion and a top surface configured to be mechanically affixed to and abut a rigid base of a carrier head. The lower portion is a first plastic, and the upper portion is a different second plastic that is about the same or more rigid than the first plastic.
摘要翻译： 保持环包括大致环形的下部和大致环形的上部。 下部具有用于在抛光期间接触抛光垫的底表面和顶表面。 上部具有固定到下部的顶表面的底表面和被配置为机械地固定到承载头的刚性基座并邻接其的刚性基座的顶表面。 下部是第一塑料，上部是与第一塑料大致相同或更刚性的不同的第二塑料。
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公开(公告)号：US20090242125A1
公开(公告)日：2009-10-01
申请号：US12409371
申请日：2009-03-23
申请人： Young J. Paik , Melvin Barrentine , Abhijit Y. Desai , Hai Nguyen , Ashish Bhatnagar , Rajkumar Alagarsamy
发明人： Young J. Paik , Melvin Barrentine , Abhijit Y. Desai , Hai Nguyen , Ashish Bhatnagar , Rajkumar Alagarsamy
CPC分类号： H01L21/6838 , B24B37/30 , H01L21/0201 , H01L21/30625 , Y10T428/24355 , Y10T428/24612
摘要： A method and apparatus for planarizing a substrate are provided. A substrate carrier head with an improved cover for holding the substrate securely is provided. The cover may have a bead that is larger than the recess into which it fits, such that the compression forms a conformal seal inside the recess. The bead may also be left uncoated to enhance adhesion of the bead to the surface of the groove. The surface of the cover may be roughened to reduce adhesion of the substrate to the cover without using a non-stick coating.
摘要翻译： 提供了一种用于平坦化基板的方法和装置。 提供了一种具有改进的用于固定基板的盖的基板载体头。 盖可以具有比其配合的凹部大的凸缘，使得压缩在凹部内形成共形密封。 胎圈也可以不涂覆以增强胎圈与沟槽表面的粘附。 盖的表面可以被粗糙化，以减少基材与盖的粘附，而不使用不粘涂层。
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