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1.发明授权Insulating film formation method, semiconductor device, and production apparatus 有权绝缘膜形成方法，半导体装置和制造装置公开(公告)号：US06620744B2
公开(公告)日：2003-09-16
申请号：US10037558
申请日：2002-01-04
IPC分类号： H01L2131
CPC分类号： H01L21/02238 , H01L21/02252 , H01L21/02255 , H01L21/02274 , H01L21/0234 , H01L21/28185 , H01L21/28194 , H01L21/28211 , H01L21/31612 , H01L21/31662 , H01L27/1214 , H01L27/1259 , H01L29/4908 , H01L29/66757
摘要： A method for forming an insulator film at a semiconductor temperature of 600° C. or less comprises the steps of forming a first insulator film by oxidizing a surface of a semiconductor in an atmosphere containing oxygen atom radicals, and forming a second insulator film on the first insulator film by deposition without exposing the first insulator film to outside air.
摘要翻译： 在半导体温度为600℃以下的绝缘膜形成方法包括以下步骤：通过在含有氧原子的气氛中氧化半导体的表面来形成第一绝缘膜，并在第二绝缘膜上形成第二绝缘膜 通过沉积而不将第一绝缘膜暴露于外部空气的第一绝缘膜。
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公开(公告)号：US07311796B2
公开(公告)日：2007-12-25
申请号：US10681615
申请日：2003-10-08
申请人： Masashi Goto , Yukihiko Nakata , Kazufumi Azuma , Tetsuya Okamoto
发明人： Masashi Goto , Yukihiko Nakata , Kazufumi Azuma , Tetsuya Okamoto
IPC分类号： H01L21/306 , C23C16/00 , C23C14/34
CPC分类号： H01J37/32192 , C23C16/511
摘要： A plasma processing apparatus comprises: a chamber 12 having at least one opening and for generating plasma; a dielectric member 14 provided to cover the opening air-tightly; at least one wave guide 16 provided in the exterior of the chamber such that the one end side opposes the dielectric member; an electromagnetic wave source 20 provided on the other end side of the wave guide; a plurality of holes 38, 40, 42, 44, 46 provided on a surface opposing the dielectric member of the wave guide; and hole area adjusting means 18 provided in at least one of the above-mentioned holes so as to adjust the opening area of the hole.
摘要翻译： 等离子体处理装置包括：具有至少一个开口并用于产生等离子体的室12; 设置成气密地覆盖开口的电介质部件14; 至少一个波导16，其设置在所述室的外部，使得所述一端侧与所述电介质构件相对; 设置在波导管的另一端侧的电磁波源20; 设置在与波导的电介质构件相对的表面上的多个孔38,40,42,44,46; 以及设置在至少一个所述孔中的孔区域调节装置18，以调节孔的开口面积。
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公开(公告)号：US20070034157A1
公开(公告)日：2007-02-15
申请号：US11584566
申请日：2006-10-23
申请人： Yukihiko Nakata , Kazufumi Azuma , Tetsuya Okamoto , Masashi Goto
发明人： Yukihiko Nakata , Kazufumi Azuma , Tetsuya Okamoto , Masashi Goto
CPC分类号： H01J37/32229 , C23C16/511 , H01J37/32192
摘要： Disclosed is a plasma processing apparatus for performing a plasma processing, comprising an electromagnetic wave source for generating an electromagnetic wave, a rectangular waveguide, a plurality of slots formed in the rectangular waveguide and constituting a waveguide antenna, an electromagnetic wave radiation window consisting of a dielectric body, and a vacuum chamber, wherein a plasma is generated by an electromagnetic wave radiated from the slots into the vacuum chamber through the electromagnetic wave radiation window, the plasma processing apparatus being constructed to include an electromagnetic wave distributing waveguide portion for distributing the electromagnetic wave generated from the electromagnetic wave source into each of the waveguides, the plural waveguides being branched from the electric field plane or a plane perpendicular to the magnetic field plane of the electromagnetic wave distributing waveguide portion.
摘要翻译： 公开了一种用于执行等离子体处理的等离子体处理装置，包括用于产生电磁波的电磁波源，矩形波导，形成在矩形波导中并构成波导天线的多个槽，电磁波辐射窗， 电介质体和真空室，其中通过电磁波辐射窗通过从槽辐射到真空室中的电磁波产生等离子体，等离子体处理装置被构造成包括用于分配电磁波的电磁波分配波导部分 从电磁波源产生的每个波导的波形，多个波导从电场平面或与电磁波分配波导部分的磁场平面垂直的平面分支。
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4.发明申请Dielectric film, its formation method, semiconductor device using the dielectric film and its production method 审中-公开电介质膜，其形成方法，使用电介质膜的半导体器件及其制造方法公开(公告)号：US20090029507A1
公开(公告)日：2009-01-29
申请号：US11998202
申请日：2007-11-28
申请人： Masashi Goto , Yukihiko Nakata , Kazufumi Azuma , Tetsuya Okamoto
发明人： Masashi Goto , Yukihiko Nakata , Kazufumi Azuma , Tetsuya Okamoto
IPC分类号： H01L21/285 , H01L21/336
CPC分类号： H01L21/02164 , H01L21/0214 , H01L21/0217 , H01L21/02238 , H01L21/02247 , H01L21/02252 , H01L21/31662 , H01L21/3185 , H01L21/32105 , H01L21/3211
摘要： A high-quality dielectric film is formed by generating plasma of a high electron density by a method such as diluting a rare gas or raising a frequency of a power supplier, and generating oxygen atoms or nitrogen atoms of a high density. The dielectric film contains silicon oxide in which the composition ratio of silicon and oxygen is between (1:1.94) and (1:2) both inclusive, silicon nitride in which the composition ratio of silicon and nitrogen is between (1:1.94) and (1:2) both inclusive, or silicon oxynitride in which the composition ratio of silicon and nitrogen is between (3:3.84) and (3:4) both inclusive.
摘要翻译： 通过稀释稀有气体或提高供电频率，并产生高密度的氧原子或氮原子的方法，产生高电子密度的等离子体，形成高质量的电介质膜。 电介质膜含有其中硅和氧的组成比在（1：1.94）和（1:2）之间的硅氧化物，其中硅和氮的组成比在（1：1.94）和 （1：2）或硅氮组成比在（3：3.84）和（3：4）之间的氮氧化硅。
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公开(公告)号：US20080099447A1
公开(公告)日：2008-05-01
申请号：US11544051
申请日：2006-10-06
申请人： Makoto Ando , Takuichi Hirano , Yukihiko Nakata , Kazufumi Azuma , Masashi Goto , Atsushi Sasaki , Tetsuya Ide , Tetsuya Okamoto
发明人： Makoto Ando , Takuichi Hirano , Yukihiko Nakata , Kazufumi Azuma , Masashi Goto , Atsushi Sasaki , Tetsuya Ide , Tetsuya Okamoto
IPC分类号： B23K9/00
CPC分类号： H05H1/46 , H01J37/32192 , H01J37/32229
摘要： A plurality of electromagnetic wave radiation waveguides are formed to branch from an electromagnetic wave distribution waveguide. A plurality of slots are provided to each electromagnetic wave radiation waveguide. A width of the electromagnetic wave radiation waveguide, a height of the electromagnetic wave radiation waveguide and an electromagnetic wave radiation waveguide cycle p are set to satisfy a relationship of λ0>p>a2>b2 and p=(λg1/2)+±α (where α is 5% or below of λg1), where λ0 is a free space wavelength of an electromagnetic wave, al is a width of the electromagnetic wave distribution waveguide, εr1 is a specific inductive capacity of a dielectric material in the electromagnetic wave distribution waveguide, and λg1 is a wavelength of the electromagnetic wave output from the electromagnetic wave source in the electromagnetic wave distribution waveguide.
摘要翻译： 多个电磁波辐射波导形成为从电磁波分布波导分支。 向每个电磁波辐射波导提供多个槽。 电磁波辐射波导的宽度，电磁波辐射波导的高度和电磁波辐射波导周期p被设定为满足λ<2> / SUB >> b 2和p =（λ1g1 / 2）+±α（其中α为λ1的5％或更低） ），其中λ<0>是电磁波的自由空间波长，a1是电磁波分布波导的宽度，ε是电介质的介电常数 电磁波分布波导中的材料，λ1g1是从电磁波分布波导中的电磁波源输出的电磁波的波长。
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6.发明授权公开(公告)号：US08936448B2
公开(公告)日：2015-01-20
申请号：US13635585
申请日：2011-03-18
申请人： Tetsuya Okamoto , Yoshitaka Shibamoto , Kazuhiro Furusho , Takazou Sotojima , Takayuki Kawano , Hiroshi Yoh
发明人： Tetsuya Okamoto , Yoshitaka Shibamoto , Kazuhiro Furusho , Takazou Sotojima , Takayuki Kawano , Hiroshi Yoh
CPC分类号： F04C18/324 , F01C21/0809 , F04C18/045 , F04C23/001
摘要： A rotary compressor includes a cylinder having an annular cylinder space, a piston eccentrically disposed relative to the cylinder, and a drive shaft (53) connected to the piston. The piston has a piston portion eccentrically rotatable relative to the cylinder, and a piston end plate closing the cylinder space. The cylinder has an end plate storage space storing the piston end plate in an eccentrically rotatable manner. The cylinder space forms a main cylinder chamber, and the end plate storage space forms a sub-cylinder chamber.
摘要翻译： 旋转压缩机包括具有环形气缸空间的气缸，相对于气缸偏心设置的活塞以及连接到活塞的驱动轴（53）。 活塞具有相对于气缸偏心旋转的活塞部分，以及关闭气缸空间的活塞端板。 气缸具有以可偏心旋转的方式存储活塞端板的端板存储空间。 气缸空间形成主气缸室，端板存储空间形成副气缸室。
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公开(公告)号：US08245528B2
公开(公告)日：2012-08-21
申请号：US12224777
申请日：2007-03-05
IPC分类号： F25B43/02
CPC分类号： F04C23/008 , F01C1/322 , F04C23/003 , F04C29/023 , F25B13/00 , F25B2313/02742 , F25B2400/14
摘要： In a compression/expansion unit (30) serving as a fluid machine, both of a compression mechanism (50) and an expansion mechanism (60) are contained in a single casing (31). A shaft (40) coupling the compression mechanism (50) to the expansion mechanism (60) has an oil feeding channel (90) formed therein. Refrigerating machine oil accumulated at the bottom of the casing (31) is sucked up into the oil feeding channel (90) and fed to the compression mechanism (50) and the expansion mechanism (60). The refrigerating machine oil fed to the expansion mechanism (60) is discharged from the expansion mechanism (60) together with the refrigerant after expansion, flows through the refrigerant circuit and then flows back to the compression mechanism (50) in the compression/expansion unit (30).
摘要翻译： 在用作流体机械的压缩/膨胀单元（30）中，压缩机构（50）和膨胀机构（60）都包含在单个壳体（31）中。 将压缩机构（50）与膨胀机构（60）连接的轴（40）具有形成在其中的供油通道（90）。 积存在壳体31的底部的制冷机油被吸入供油通道90，供给压缩机构50和膨胀机构60。 供给到膨胀机构60的制冷机油与膨胀机构60一起在膨胀后与制冷剂一起排出，流过制冷剂回路，然后回流到压缩/膨胀单元中的压缩机构50 （30）。
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公开(公告)号：US08122735B2
公开(公告)日：2012-02-28
申请号：US12226433
申请日：2007-04-16
IPC分类号： F25B43/02
CPC分类号： F25B13/00 , F25B9/008 , F25B9/06 , F25B31/004 , F25B2309/061 , F25B2313/02742 , F25B2400/14 , F25B2700/03
摘要： A refrigerant circuit (11) of an air conditioner (10) includes a compressor (20) and an expander (30). In the compressor (20), refrigerator oil is supplied from an oil reservoir (27) to a compression mechanism (21). In the expander (30), the refrigerator oil is supplied from an oil reservoir (37) to an expansion mechanism (31). The inner pressures of the compressor casing (24) and the expander casing (34) are the high pressure and the low pressure of the refrigeration cycle, respectively. An oil adjusting valve (52) is provided in an oil pipe (42) connecting the compressor casing (24) and the expander casing (34). The oil amount adjusting valve (52) is operated on the basis of an output signal of an oil level sensor (51). When the oil amount adjusting valve (52) is opened, the refrigerator oil flows from the oil reservoir (27) in the compressor casing (24) toward the oil reservoir (37) in the expander casing (34) through the oil pipe (42).
摘要翻译： 空调装置（10）的制冷剂回路（11）具有压缩机（20）和膨胀机（30）。 在压缩机20中，从油箱27向压缩机构21供给冷冻机油。 在膨胀机30中，冷冻机油从储油部37向膨胀机构31供给。 压缩机壳体（24）和膨胀机壳体（34）的内部压力分别是制冷循环的高压和低压。 在连接压缩机壳体（24）和膨胀机壳体（34）的油管（42）中设置有油调节阀（52）。 油量调节阀52基于油位传感器51的输出信号进行动作。 当油量调节阀52打开时，冷冻机油通过油管（42）从压缩机壳体（24）中的储油部（27）朝向膨胀机壳体（34）内的储油部（37） ）。
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公开(公告)号：US07802447B2
公开(公告)日：2010-09-28
申请号：US11664302
申请日：2005-09-30
CPC分类号： F01C1/322 , F01C11/002 , F01C21/006
摘要： A casing (31) houses therein an expansion mechanism (60) and a compression mechanism (50). The expansion mechanism (60) has a rear head (62) in which a pressure snubbing chamber (71) is provided. The pressure snubbing chamber (71) is divided by a piston (77) into an inflow/outflow chamber (72) which fluidly communicates with an inflow port (34) and a back pressure chamber (73) which fluidly communicates with the inside of the casing (31). The piston (77) is displaced in response to suction pressure variation whereby the volume of the inflow/outflow chamber (72) varies. This enables the inflow/outflow chamber (72) to directly perform supply of refrigerant to or suction of refrigerant from the inflow port (34) which is a source of pressure variation, thereby making it possible to effectively inhibit suction pressure variation.
摘要翻译： 壳体（31）容纳有膨胀机构（60）和压缩机构（50）。 膨胀机构（60）具有设置有压力缓冲室（71）的后头部（62）。 压力缓冲室71被活塞77分成流入/流出室72，该流入室72流体地与流入端口34流体连通， 套管（31）。 活塞（77）响应于入口/流出室（72）的体积变化的吸入压力变化而移位。 由此，能够使流入室72直接从作为压力变化源的流入口34进行制冷剂的供给或制冷剂的吸入，能够有效地抑制吸入压力的变化。
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公开(公告)号：US20090113907A1
公开(公告)日：2009-05-07
申请号：US11662206
申请日：2005-09-09
申请人： Katsumi Sakitani , Michio Moriwaki , Yume Inokuchi , Tetsuya Okamoto , Yoshinari Sasaki , Eiji Kumakura , Masakazu Okamoto
发明人： Katsumi Sakitani , Michio Moriwaki , Yume Inokuchi , Tetsuya Okamoto , Yoshinari Sasaki , Eiji Kumakura , Masakazu Okamoto
CPC分类号： F25B13/00 , F25B1/04 , F25B9/008 , F25B9/06 , F25B2309/061 , F25B2313/0272 , F25B2600/17 , F25B2600/2513
摘要： A refrigeration apparatus having a refrigerant circuit (20) for performing a vapor compression refrigeration cycle is disclosed. Refrigerant in a wet state, which provides an optimum coefficient of performance (COP) for a present operating condition, is drawn into the compressor (31). If the operating condition changes, the opening of an expansion valve (23) is adjusted such that the suction refrigerant of the compressor (31) is brought into a wet state which provides an optimum coefficient of performance for a new operating condition.
摘要翻译： 公开了一种具有用于进行蒸气压缩制冷循环的制冷剂回路（20）的制冷装置。 将处于工作状态的最佳性能系数（COP）提供到湿态的制冷剂被吸入压缩机（31）。 如果操作条件改变，则调节膨胀阀（23）的打开，使得压缩机（31）的吸入制冷剂处于潮湿状态，从而为新的操作条件提供最佳的性能系数。
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