摘要:
When a position of a tool blade tip for displaying the work shape, tool shape and tool locus is calculated by an interpolation arithmetic operation based on the interpolation instruction and feed speed instruction within a numerical control data, the calculated position of the tool blade tip is compared with the display scope every time an interpolation arithmetic operation is conducted; a determination is made as to whether or not the tool shape and tool locus to be displayed are inside of the display scope, and when they exist outside, uses a higher speed as the feed speed for the interpolation arithmetic operation. Therefore, even when an operator tries to check numerical control data by reducing the display scope for local graphic display, the interpolation outside the display scope can be conducted at a higher speed to thereby allow the operator to check the numerical control data quickly and immediately.
摘要:
A numerical control apparatus is characterized by a structure in which: a machining program stores the final shape of a work as well as the shape of a material; designates the outermost point (an apex) on the work in a direction opposing a cutting direction as a cutting reference point; sets linear lines which are respectively lowered from the cutting reference point by cutting depths, and obtains the inter-sections of the lines and the material shape. The intersections thus obtained are classified into points where the tool enters the work zone and points where the tool emerges from the work zone, so that the tool can be moved at a predetermined cutting rate for a cutting operation between the point where it enters and the point where it emerges from the work zone while it is moved at a rapid traverse rate between the emerging point and the point where it re-enters the work zone. These operations are repeated until the tool touches the final machining shape, whereupon the tool is moved along the final machining shape at the predetermined cutting rate and cutting depth. In this manner, the cutting tool is prevented from idle operations in the feed zones where the material does not exist and the machining time can be reduced effectively.
摘要:
A controller includes a difference detector that detects a difference between a switching timing of a first channel of a switching power supply including a plurality of channels, and a switching timing of a second channel of the switching power supply, the plurality of channels being coupled in common to an input power supply and performing switching operations in response to clock signals, and a timing adjuster that, based on a detection result of the difference detector, increases a difference between a timing of a clock signal supplied to the first channel and a timing of a clock signal supplied to the second channel when the difference between the switching timing of the first channel and the switching timing of the second channel is smaller than a first value.
摘要:
Disclosed is an annealing device that includes a processing chamber into which a wafer is received, a heating source having a plurality of light emitting diodes (LEDs) for emitting a light toward the wafer, which faces the surface of the wafer, and a light transmissive member provided corresponding to the heating source, into which the light from the light emitting elements is transmitted. The heating source has the light emitting elements attached on a support toward the wafer. Each of the light emitting elements is individually covered with a lens layer made of a transparent resin.
摘要:
An infectious etiologic agent detection probe set which detects an infectious etiologic agent gene, includes a plurality of kinds of probes including oligonucleotide having base sequences selected from each of a plurality of groups selected from a first group including base sequences of SEQ ID Nos. 1 to 14 and complementary sequences thereof, a second group including base sequences of SEQ ID Nos. 15 to 24 and complementary sequences thereof, a third group including base sequences of SEQ ID Nos. 25 to 36 and complementary sequences thereof, a fourth group including base sequences of SEQ ID Nos. 37 to 47 and complementary sequences thereof, a fifth group including base sequences of SEQ ID Nos. 48 to 57 and complementary sequences thereof, a sixth group including base sequences of SEQ ID Nos. 58 to 68 and complementary sequences thereof, a seventh group including base sequences of SEQ ID Nos. 69 to 77 and complementary sequences thereof, an eighth group including base sequences of SEQ ID Nos. 78 to 85 and complementary sequences thereof, a ninth group including base sequences of SEQ ID Nos. 86 to 97 and complementary sequences thereof, and a 10th group including base sequences of SEQ ID Nos. 98 to 106 and complementary sequences thereof.
摘要翻译:检测感染性病原体基因的感染性病原体检测探针组包括多种探针,包括具有选自多个基团中的每一个的碱基序列的寡核苷酸,第一组包括SEQ ID NO.1至 14及其互补序列,第二组包括SEQ ID No.15至24的碱基序列及其互补序列,第三组包括SEQ ID No.25至36的碱基序列及其互补序列,第四组包括碱基序列 SEQ ID No.37至47及其互补序列的第五组,包括SEQ ID No.48至57的碱基序列及其互补序列的第五组,包含SEQ ID No.58至68的碱基序列的第六组及其互补序列 第七组,其包括SEQ ID NO:69至77的碱基序列及其互补序列,第八组包括SEQ ID NO:69至77的碱基序列 第78至85个及其互补序列,第九组包括SEQ ID No.86-97的碱基序列及其互补序列,以及第十组,其包含SEQ ID NO:98至106的碱基序列及其互补序列。
摘要:
An annealing apparatus is provided with a chamber 2 wherein a wafer W is stored. Heating sources 17a and 17b have a plurality of LEDs 33 for irradiating the wafer W in the chamber 2 with light. A power supply section 60 is included for feeding the LEDs 33 of the heating sources 17a and 17b with power. Power feed control sections 42a and 42b are provided which control power feed from the power supply section 60 to the LEDs 33. Light transmitting members 18a and 18b are provided which transmit light emitted from the LEDs 33. An exhaust mechanism for exhausting inside the chamber 2 is provided. The power feed control sections 42a and 42b drive the LEDs 33 with direct current.
摘要:
Disclosed is an annealing device that includes a processing chamber into which a wafer is received, a heating source having a plurality of light emitting diodes (LEDs) for emitting a light toward the wafer, which faces the surface of the wafer, and a light transmissive member provided corresponding to the heating source, into which the light from the light emitting elements is transmitted. The heating source has the light emitting elements attached on a support toward the wafer. Each of the light emitting elements is individually covered with a lens layer made of a transparent resin.
摘要:
A liquid discharging device includes a plurality of liquid discharge sections. Each liquid discharge section includes a reservoir, a nozzle that discharges a solution supplied from the reservoir, and discharge energy generating means that generates energy to discharge the solution from the nozzle. The number of the liquid discharge sections corresponds to the number of probe types to be formed. The nozzles are two-dimensionally arranged. Using this liquid discharging device, probe liquids are discharged from the corresponding reservoirs onto a solid-phase substrate to form a predetermined two-dimensional probe array of high-purity probes on the substrate. This process exhibits high reproducibility and processability, and the resulting probe array has high array density.
摘要:
An advertisement delivery system by a telephone service utilizing IP telephone communication technology. The system comprises at least a call control apparatus controlling calling between a sending side terminal provided with a reproduction device and a receiving side terminal, and an advertisement delivery apparatus delivering advertisement video information to the terminal. The call control apparatus comprises a monitoring function unit monitoring the “voice media state” and “video media state” of the terminal and a delivery connection function unit delivering the advertisement video information based on the results of monitoring.
摘要:
A method capable of accurately measuring a physical quantity of a measurement object in a substrate processing apparatus. In a temperature measurement apparatus for implementing the method, two interference positions are measured at different timings when a reference mirror is caused to move in the direction away from a collimator fiber, and a difference between the two interference positions is calculated. When the reference mirror remote from the collimator fiber is caused to move toward the collimator fiber, two interference positions are measured at different timings, and a difference between the two interference positions is calculated. An average value of the interference position differences is calculated, an optical path length difference is determined from the average value, and a wafer temperature is calculated from the optical path length difference.