摘要:
A method for forming a low dielectric constant film includes the steps of: introducing reaction gas comprising an organo Si gas and an inert gas into a reactor of a capacitively-coupled CVD apparatus; adjusting a size of fine particles being generated in the vapor phase to a nanometer order size as a function of a plasma discharge period inside the reactor; and depositing fine particles generated on a substrate being placed between upper and lower electrodes inside the reactor while controlling a temperature gradient between the substrate and the upper electrode at about 100° C./cm or less.
摘要:
The intention is to clarify characteristics of a cluster-free amorphous silicon film which is practically produceable without incorporation of large clusters having a size of 1 nm or more, and provide a method and an apparatus for producing the amorphous silicon film. In the cluster-free amorphous silicone (a-Si:H) film, an in-film Si—H2 bond density is 10−2 atomic % or less, and an in-film volume fraction of the large clusters is 10−1% or less. The a-Si:H film is produced by depositing, on a substrate, a deposition material in a plasma flow of any one of a silane gas, a disilane gas and a gas obtained by diluting a silane or disilane gas with one or a combination of two or more selected from the group consisting of hydrogen, Ar, He, Ne and Xe. The a-Si:H film has prominent characteristics, such that: a light-induced defect density is reduced from 2×1016 cm−3 or more in conventional a-Si:H films to substantially zero; a stabilized efficiency (%), i.e., a light-energy conversion efficiency, is increased from 9% at the highest in existing a-Si:H films up to 14% or more; and a light-induced degradation rate, i.e., [(initial efficiency−stabilized efficiency)/initial efficiency]×100%, is reduced from 20% at the lowest in the existing a-Si:H films to substantially zero.
摘要:
A method for forming a low dielectric constant film includes the steps of: introducing reaction gas comprising an organo Si gas and an inert gas into a reactor of a capacitively-coupled CVD apparatus; adjusting a size of fine particles being generated in the vapor phase to a nanometer order size as a function of a plasma discharge period inside the reactor; and depositing fine particles generated on a substrate being placed inside the reactor.
摘要:
Provided is a plasma oxidation-reduction method with which it is possible to control the structure of amino acids and proteins with high and stable reproducibility, by using plasma in order to control the amino acids and proteins that make up a living body, particularly by using plasma in order to oxidize or reduce amino acids and proteins. Also provided are a method for promoting plant/animal growth using the plasma oxidation-reduction method, and a plasma-generating device for use in the method for promoting plant/animal growth. Amino acids or proteins are oxidized or reduced in the plasma oxidation-reduction method by using an active oxygen species or active hydrogen in the plasma. Preferably, the active oxygen species comprises any one of singlet oxygen atoms, excited oxygen molecules, or hydroxyl radicals, and the active hydrogen comprises excited hydrogen atoms.
摘要:
An ultrasonic flaw detecting apparatus for efficiently detecting a flaw existing in a deep portion of a multi-layer structure includes a first sensor arranged so as to transmit an ultrasonic wave into a different property layer surrounded by a medium having a different acoustic impedance in the multi-layer structure, a function generator for generating a pulse-shaped sine wave, a power amplifier for amplifying and supplying the pulse-shaped sine wave to the first sensor, a second sensor arranged so as to receive a boundary echo from the different property layer, a first amplifier for amplifying the boundary echo received by the second sensor, an intensity detector for judging the intensity of an amplified signal of the boundary echo, a third sensor arranged so as to receive an echo from a flaw inside a layer in a deep portion of the different property layer, a second amplifier for amplifying the flaw echo received by the third sensor, a recorder for recording the amplified flaw echo signal, and a control unit for reading data from the intensity detector and outputting commands to the function generator and the recorder.
摘要:
Disclosed is a silicon nitride sintered body comprising 85 to 99 mole % of .beta.-Si.sub.3 N.sub.4, 1 to 5 mole % as the oxide (M.sub.2 O.sub.3) of at least one compound of an element (M) selected from the group consisting of Sc, Vb, Er, Ho and Dy and less than 10 mole % of excessive oxygen (O.sub.2) based on the three components, wherein the excessive oxygen/M.sub.2 O.sub.3 molar ratio is lower than 2.
摘要翻译:公开了一种氮化硅烧结体,其包含85至99摩尔%的β-Si 3 N 4,1至5摩尔%的至少一种元素(M)的化合物的氧化物(M 2 O 3),其选自Sc,Vb, Er,Ho和Dy,并且基于三种组分小于10摩尔%的过量氧(O 2),其中过量的氧/ M 2 O 3摩尔比低于2。
摘要:
An ultrasonic inspection apparatus and method in which a linear array of acoustic transmitters and receivers are disposed adjacent to a workpiece, and alternating potential source is connected to some of the acoustic transmitters to project a side lobe of an acoustic wave toward a specific zone of the workpiece. Thereafter, the connections between some of the acoustic transmitters and the potential source are automatically changed, to move the specific zone as many times as may be necessary to provided scanning of the workpiece.
摘要:
A two-probe ultrasonic flaw detection apparatus, in which an ultrasonic wave is transmitted from a transmission probe into an object being inspected and ultrasonic waves reflected from a reflection surface in the object are received by a reception probe, operates to determine the position at which the combined intensity of ultrasonic waves reflected from each part of the reflection surface form a maximum. The reception probe is then moved to the position of maximum reception intensity. The position of maximum reception intensity is determined using as input parameters the ultrasonic characteristics of the object being inspected and of the transmission and reception probes, and the position of the transmission probe and the angle of incidence of the ultrasonic wave into the object.
摘要:
An ultrasonic flaw detecting technique in which reflection echoes of ultrasonic waves transmitted from a plurality of vibrator elements are received, and a composite signal obtained by composing the reception signals is supplied to a composite signal reception processing circuit. A method and an apparatus in which the existence of the composite signal is detected at a first time point at which the composite signal based on the reflection echoes from an inspection target in a main lobe can be detected and at a second and a third time point which are in advance of and later than the first time point respectively and at which the composite signal based on the reflection echoes from an inspection target in the main lobe can not be detected, so that when the existence of the composite signal is detected only at the first time point, it is determined that the composite signal is that based on the reflection echoes from the inspection target.
摘要:
A confocal microscope that can reduce the measurement time is provided. Linear bright lines are extracted from the light of a light source. White light emitted from the linear bright lines is chromatically dispersed into continuous wavelength components by a chromatic aberration lens, which then irradiate a sample on a stage via an objective lens. The chromatically dispersed linear bright lines are continuously imaged for each wavelength on an optical axis in the height direction, and light having one wavelength is focused on one certain point on the surface of the sample. The reflected light of light having wavelengths focused on a surface of the sample is collected by the chromatic aberration lens via the objective lens and then focused on a slit. The light passed through the slit is separated by a spectroscopic device and imaged on a two-dimensional array photodetector.