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公开(公告)号：US20220348789A1
公开(公告)日：2022-11-03
申请号：US17697647
申请日：2022-03-17
发明人： Changzai CHI
IPC分类号： C09G1/02 , C01B33/141 , C09K3/14 , C01B33/149
摘要： Modified silanized colloidal silica particles are reaction products of silanized colloidal silica particles having epoxy moieties with nitrogen of amines to form stable and tunable modified silanized colloidal silica particles. The modified silanized colloidal silica particles can be used as an abrasive in chemical mechanical polishing of various substrates.
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公开(公告)号：US09790606B2
公开(公告)日：2017-10-17
申请号：US14556154
申请日：2014-11-30
发明人： Koichi Yomogida
CPC分类号： C25D3/48 , C23C22/05 , C23C22/60 , C23F11/10 , C23F11/161 , C25D5/48 , H05K3/282 , H05K2203/122
摘要： To provide a surface treatment solution and treatment method for gold or gold alloy plating that effectively suppresses corrosion of underlying metal or substrate metal from pinholes that develop on the gold or gold alloy plating film.[Solution] A surface treatment solution containing a disulfide compound is brought into contact with a gold or gold alloy plating film. A compound represented by the following formula (2) is preferred as the disulfide compound. X1O3S—R3—S—S—R4—SO3X2 (2) in the formula, R3 and R4 independently represent a linear or branched alkylene group having from 1 to 10 carbon atoms, cyclic alkylene group having from 3 to 10 carbon atoms, or phenylene group, R3 and R4 independently may be substituted by one or more substituents selected from an alkyl group, halogen atom, hydroxyl group, or alkoxy group, and X1 and X2 represent monovalent cations.
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公开(公告)号：US09612217B2
公开(公告)日：2017-04-04
申请号：US14693818
申请日：2015-04-22
发明人： Matthew A. Thorseth
CPC分类号： G01N27/026 , C25D3/38 , C25D21/14
摘要： Electrochemical impedance spectroscopy is used to determine the amount of organic additive in a metal electroplating bath.
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公开(公告)号：US09076719B2
公开(公告)日：2015-07-07
申请号：US13972307
申请日：2013-08-21
IPC分类号： H01L21/38 , H01L21/22 , H01L21/225 , H01L21/04 , H01L21/385
CPC分类号： H01L21/2254 , H01L21/0455 , H01L21/2225 , H01L21/225 , H01L21/228 , H01L21/385
摘要： Disclosed herein is a method for doping a substrate, comprising disposing a coating of a composition comprising a dopant-containing polymer and a non-polar solvent on a substrate; and annealing the substrate at a temperature of 750 to 1300° C. for 1 second to 24 hours to diffuse the dopant into the substrate; wherein the dopant-containing polymer is a polymer having a covalently bound dopant atom; wherein the dopant-containing polymer is free of nitrogen and silicon; and wherein the method is free of a step of forming an oxide capping layer over the coating prior to the annealing step.
摘要翻译： 本文公开了一种用于掺杂衬底的方法，包括在衬底上设置包含含掺杂剂的聚合物和非极性溶剂的组合物的涂层; 并在750-1300℃的温度下退火衬底1秒至24小时以将掺杂剂扩散到衬底中; 其中所述含掺杂剂的聚合物是具有共价结合的掺杂剂原子的聚合物; 其中所述含掺杂剂的聚合物不含氮和硅; 并且其中所述方法没有在所述退火步骤之前在所述涂层上形成氧化物覆盖层的步骤。
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5.发明授权公开(公告)号：US08975001B2
公开(公告)日：2015-03-10
申请号：US13407508
申请日：2012-02-28
申请人： Young Cheol Bae , Rosemary Bell , Thomas Cardolaccia , Seung-Hyun Lee , Yi Liu , Jong Keun Park
发明人： Young Cheol Bae , Rosemary Bell , Thomas Cardolaccia , Seung-Hyun Lee , Yi Liu , Jong Keun Park
CPC分类号： G03F7/0397 , G03F7/091 , G03F7/2041 , G03F7/325
摘要： Provided are photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
摘要翻译： 提供了可用于形成光刻图案的光致抗蚀剂组合物。 还提供了涂覆有光致抗蚀剂组合物的基材和形成光刻图案的方法。 组合物，方法和涂覆的基材在半导体器件的制造中具有特别的适用性。
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6.发明授权Self-assembled structures, method of manufacture thereof and articles comprising the same 有权自组装结构，其制造方法和包含该组合结构的制品公开(公告)号：US08822130B2
公开(公告)日：2014-09-02
申请号：US13681019
申请日：2012-11-19
CPC分类号： G03F7/2004 , C08F2438/03 , C08G2261/126 , C08G2261/136 , C08G2261/146 , G03F7/0046 , G03F7/038 , G03F7/0382 , G03F7/40
摘要： Disclosed herein is a composition comprising a graft block copolymer comprising a first block polymer; the first block polymer comprising a backbone polymer and a first graft polymer; where the first graft polymer comprises a surface energy reducing moiety; and a second block polymer; the second block polymer being covalently bonded to the first block; wherein the second block comprises the backbone polymer and a second graft polymer; where the second graft polymer comprises a functional group that is operative to crosslink the graft block copolymer; a photoacid generator; and a crosslinking agent.
摘要翻译： 本文公开了包含含有第一嵌段聚合物的接枝嵌段共聚物的组合物; 所述第一嵌段聚合物包含主链聚合物和第一接枝聚合物; 其中第一接枝聚合物包含表面能减少部分; 和第二嵌段聚合物; 第二嵌段聚合物共价键合到第一嵌段; 其中所述第二嵌段包含主链聚合物和第二接枝聚合物; 其中第二接枝聚合物包含可操作地交联接枝嵌段共聚物的官能团; 光致酸发生器; 和交联剂。
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公开(公告)号：US08697338B2
公开(公告)日：2014-04-15
申请号：US13607729
申请日：2012-09-09
申请人： Young Cheol Bae , Rosemary Bell , Jong Keun Park , Seung-Hyun Lee
发明人： Young Cheol Bae , Rosemary Bell , Jong Keun Park , Seung-Hyun Lee
IPC分类号： G03F7/26
CPC分类号： G03F7/11 , G03F7/0397 , G03F7/168 , G03F7/20 , G03F7/2041 , G03F7/325 , H01L21/3081
摘要： Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.
摘要翻译： 提供光刻胶外涂层组合物，涂覆有外涂层组合物的基材和通过负色调显影方法形成电子器件的方法。 组合物，涂覆的基底和方法在半导体器件的制造中特别适用。
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公开(公告)号：US08697217B2
公开(公告)日：2014-04-15
申请号：US12657202
申请日：2010-01-15
申请人： Adam Loyack , Alan Nakatani , Mary Jo Kulp , David G. Kelly
发明人： Adam Loyack , Alan Nakatani , Mary Jo Kulp , David G. Kelly
IPC分类号： B24B49/00
CPC分类号： B24B37/205 , B24B37/013
摘要： The polishing pad is useful for polishing at least one of magnetic, optical and semiconductor substrates. The polishing pad includes a polishing layer having a polyurethane window. The polyurethane window has a cross-linked structure formed with an aliphatic or cycloaliphatic isocyanate and a polyol in a prepolymer mixture. The prepolymer mixture is reacted with a chain extender having OH or NH2 groups and having an OH or NH2 to unreacted NCO stoichiometry less than 95%. The polyurethane window has a time dependent strain less than or equal to 0.02% when measured with a constant axial tensile load of 1 kPa at a constant temperature of 60° C. at 140 minutes, a Shore D hardness of 45 to 90 and an optical double pass transmission of at least 15% at a wavelength of 400 nm for a sample thickness of 1.3 mm.
摘要翻译： 抛光垫可用于抛光磁性，光学和半导体衬底中的至少一种。 抛光垫包括具有聚氨酯窗的抛光层。 聚氨酯窗口具有在预聚物混合物中与脂族或脂环族异氰酸酯和多元醇形成的交联结构。 预聚物混合物与具有OH或NH 2基团并且具有OH或NH 2的扩链剂反应至未反应的NCO化学计量比小于95％。 聚氨酯窗的时间依赖应变小于或等于0.02％，当在140℃恒温60℃，肖氏D硬度为45〜90°，光学性 对于样品厚度为1.3mm，在400nm的波长下双通传输至少15％。
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公开(公告)号：US07919222B2
公开(公告)日：2011-04-05
申请号：US11698397
申请日：2007-01-26
摘要： Underlying coating compositions are provided for use with an overcoated photoresist composition. In one aspect, the coating composition can be crosslinked and comprise one or more components that contain one or more acid-labile groups and/or one or more base-reactive groups that are reactive following crosslinking. In another aspect, underlying coating composition are provided that can be treated to provide a modulated water contact angle. Preferred underlying coating compositions can exhibit enhanced etch rates in plasma etchants. Additional preferred coating compositions can enhance lithographic performance of an associated photoresist composition.
摘要翻译： 提供底涂层组合物用于外涂光致抗蚀剂组合物。 在一个方面，涂料组合物可以是交联的并且包含一种或多种含有一个或多个酸不稳定基团的组分和/或一个或多个在交联后是反应性的碱反应性基团。 在另一方面，提供了可以处理以提供调制水接触角的下面的涂料组合物。 优选的下层涂料组合物可以在等离子体蚀刻剂中显示出增强的蚀刻速率。 另外优选的涂料组合物可以增强相关光致抗蚀剂组合物的平版印刷性能。
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10.发明授权Silicon-containing polymers and polymers and optical waveguides formed therefrom 有权含硅聚合物和聚合物以及由其形成的光波导公开(公告)号：US07693383B2
公开(公告)日：2010-04-06
申请号：US11598872
申请日：2006-11-14
IPC分类号： G02B6/10
CPC分类号： G02B6/125 , C08G77/06 , C08G77/20 , C08G77/24 , C08G77/70 , C08G77/80 , C08K5/42 , C08L83/04 , C09D183/04 , G02B1/045 , G02B6/1221 , G02B6/138 , C08L83/00
摘要： Provided are polymers comprising the condensation product of silicon-containing reactants. Also provided are compositions suitable for use in forming optical waveguides which include such polymers, as well as optical waveguides formed from such polymers. The polymers, compositions and optical waveguides have particular use in the formation of printed wiring boards having electrical and optical functionality.
摘要翻译： 提供包含含硅反应物的缩合产物的聚合物。 还提供了适合用于形成包括这种聚合物的光波导的组合物以及由这种聚合物形成的光波导。 聚合物，组合物和光波导在形成具有电和光学功能性的印刷线路板方面具有特别的用途。
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