公开(公告)号：US20170149104A1

公开(公告)日：2017-05-25

申请号：US14949498

申请日：2015-11-23

Applicant: Samsung Electronics, Co. Ltd. ,  Massachusetts Institute of Technology

Inventor： Sang Bok Ma ,  Mariya Khiterer ,  Young-Gyoon Ryu ,  Paula T. Hammond ,  Yang Shao-Horn ,  Chibueze Vincent Amanchukwu

IPC: H01M12/08 ,  C07C311/48 ,  H01M10/0567 ,  H01M4/38 ,  H01M8/0204 ,  H01M10/0525 ,  C07C309/01 ,  H01M4/587

CPC classification number: H01M12/08 ,  C07C309/01 ,  C07C311/48 ,  H01M4/38 ,  H01M4/587 ,  H01M8/0204 ,  H01M10/0525 ,  H01M10/0567 ,  H01M2004/027 ,  Y02E60/128

Abstract: Provided are electrochemical cells that include a compound having the general formula wherein R1 is moiety associated with a lithium ion, X1 and X3 are unsubstituted methylene moieties, X2 and X4 are each independently selected from a substituted or unsubstituted methylene moiety, X is a substituted or unsubstituted C1-C10 alkylene moiety, arylene moiety or heteroarylene moiety, R2 is selected from Li, H, an alkyl moiety, or a heteroalkyl moiety, 0

公开(公告)号：US2522212A

公开(公告)日：1950-09-12

申请号：US79165847

申请日：1947-12-13

Applicant: SHELL DEV

Inventor： FREDERIK DAMMERS HENDRIK

IPC: C07C303/44 ,  C07C305/06 ,  C07C309/01 ,  C07C309/04 ,  C07C309/29 ,  C07C309/31 ,  F02P3/01 ,  F02P7/02

CPC classification number: F02P7/026 ,  C07C303/44 ,  F02P3/01 ,  Y10S516/03 ,  C07C305/06 ,  C07C309/01 ,  C07C309/04 ,  C07C309/29 ,  C07C309/31

公开(公告)号：US20170123314A1

公开(公告)日：2017-05-04

申请号：US15297556

申请日：2016-10-19

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Irvinder Kaur ,  Cong Liu ,  Kevin Rowell ,  Gerhard Pohlers ,  Mingqi Li

IPC: G03F7/004 ,  C07D213/61 ,  C07D239/26 ,  G03F7/40 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  C07C309/06 ,  C07C309/58

CPC classification number: G03F7/0045 ,  C07C309/01 ,  C07C309/28 ,  C07C309/33 ,  C07C309/39 ,  C07C309/40 ,  C07C309/58 ,  C07C2603/74 ,  C07D213/61 ,  C07D239/26 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2022 ,  G03F7/327 ,  G03F7/38 ,  G03F7/40 ,  G03F7/405

Abstract: Provided are ionic thermal acid generators comprising an anion of an aromatic sulfonic acid comprising one or more fluorinated alcohol group and a cation. Also provided are photoresist pattern trimming compositions that include an ionic thermal acid generator, a matrix polymer and a solvent, and methods of trimming a photoresist pattern using the trimming compositions. The thermal acid generators, compositions and methods find particular applicability in the manufacture of semiconductor devices.

公开(公告)号：US2965658A

公开(公告)日：1960-12-20

申请号：US74610858

申请日：1958-07-02

Applicant: VISCO PRODUCTS CO

Inventor： KIRKPATRICK WILLARD H

IPC: C07C51/367 ,  C07C309/01 ,  C07C309/63 ,  C07C311/00 ,  C08G65/28 ,  C10G33/04

CPC classification number: C10G33/04 ,  C07C51/367 ,  C07C309/01 ,  C07C309/63 ,  C07C311/00 ,  Y10S516/03 ,  Y10S516/06 ,  C07C59/305 ,  C07C59/01

公开(公告)号：US2757194A

公开(公告)日：1956-07-31

申请号：US26443652

申请日：1952-01-02

Applicant: PHILLIPS PETROLEUM CO

Inventor： HUTTO JOHN F ,  NELSON AXE WILLIAM

IPC: C07C309/01 ,  C07C309/44 ,  C07C309/62

CPC classification number: C07C303/44 ,  C07C309/62 ,  C07C309/01

公开(公告)号：US11754927B2

公开(公告)日：2023-09-12

申请号：US16871228

申请日：2020-05-11

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Irvinder Kaur ,  Colin Liu ,  Xisen Hou ,  Kevin Rowell ,  Mingqi Li ,  Cheng-Bai Xu

IPC: G03F7/38 ,  G03F7/40 ,  C07C309/28 ,  H01L21/311 ,  H01L21/027 ,  C07C309/01 ,  C07C309/39

CPC classification number: G03F7/38 ,  C07C309/01 ,  C07C309/28 ,  C07C309/39 ,  G03F7/40 ,  H01L21/0273 ,  H01L21/31138

Abstract: Photoresist pattern trimming compositions comprise a polymer, an aromatic sulfonic acid, and an organic-based solvent system, wherein the aromatic sulfonic acid is of general formula (I):




wherein: Ar1 represents an aromatic group; R1 independently represents a halogen atom, hydroxy, substituted or unsubstituted alkyl, substituted or unsubstituted heteroalkyl, substituted or unsubstituted carbocyclic aryl, substituted or unsubstituted heterocyclic aryl, substituted or unsubstituted alkoxy, or a combination thereof, wherein adjacent R1 groups together optionally form a fused ring structure with Ar1; a represents an integer of 2 or more; and b represents an integer of 1 or more, provided that a+b is at least 3 and is not greater than the total number of available aromatic carbon atoms of Ar1, and two or more of R1 are independently a fluorine atom or a fluoroalkyl group bonded directly to an aromatic ring carbon atom.

公开(公告)号：US10007179B2

公开(公告)日：2018-06-26

申请号：US15297556

申请日：2016-10-19

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Irvinder Kaur ,  Cong Liu ,  Kevin Rowell ,  Gerhard Pohlers ,  Mingqi Li

IPC: G03F7/11 ,  G03F7/004 ,  C07D213/61 ,  C07D239/26 ,  C07C309/58 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  G03F7/38 ,  C07C309/01 ,  C07C309/33 ,  C07C309/39 ,  C07C309/40 ,  C07C309/28

CPC classification number: G03F7/0045 ,  C07C309/01 ,  C07C309/28 ,  C07C309/33 ,  C07C309/39 ,  C07C309/40 ,  C07C309/58 ,  C07C2603/74 ,  C07D213/61 ,  C07D239/26 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2022 ,  G03F7/327 ,  G03F7/38 ,  G03F7/40 ,  G03F7/405

Abstract: Provided are ionic thermal acid generators comprising an anion of an aromatic sulfonic acid comprising one or more fluorinated alcohol group and a cation. Also provided are photoresist pattern trimming compositions that include an ionic thermal acid generator, a matrix polymer and a solvent, and methods of trimming a photoresist pattern using the trimming compositions. The thermal acid generators, compositions and methods find particular applicability in the manufacture of semiconductor devices.

公开(公告)号：US20160187783A1

公开(公告)日：2016-06-30

申请号：US14971087

申请日：2015-12-16

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Irvinder Kaur ,  Cong Liu ,  Kevin Rowell

IPC: G03F7/42

CPC classification number: G03F7/42 ,  C07C309/01 ,  C07C309/28 ,  C07C309/33 ,  C07C309/39 ,  C07C309/40 ,  G03F7/004 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/38 ,  G03F7/405

Abstract: Photoresist pattern trimming compositions are provided. The compositions comprise: a matrix polymer, an aromatic sulfonic acid and a solvent, wherein the aromatic sulfonic acid comprises one or more fluorinated alcohol group. Also provided are methods of trimming a photoresist pattern using the trimming compositions. The compositions and methods find particular applicability in the manufacture of semiconductor devices.

Abstract translation: 提供光刻胶图案修剪组合物。 组合物包括：基质聚合物，芳族磺酸和溶剂，其中芳族磺酸包含一个或多个氟化醇基团。 还提供了使用修整组合物修整光致抗蚀剂图案的方法。 组合物和方法在半导体器件的制造中具有特别的适用性。

公开(公告)号：US3927081A

公开(公告)日：1975-12-16

申请号：US33385773

申请日：1973-02-26

Applicant: CONTINENTAL OIL CO

Inventor： THOMAS JR SAMUEL CHARLES ,  CEASE VINCENT JAY

IPC: C07C309/01 ,  C07C67/00 ,  C07C301/00 ,  C07C303/42 ,  C07C303/44 ,  C07C143/24

CPC classification number: C07C303/44 ,  C07C309/01 ,  C07C309/31

Abstract: A method of purifying crude, oil-soluble sulfonic acids is disclosed, wherein the method comprises contacting a volatile hydrocarbon solution of crude, oil-soluble sulfonic acids with 2methoxyethanol or a mixture of water and 2-methoxyethanol. Primarily, the term ''''purifying'''' means removal of sulfuric acid and sulfur oxides.

Abstract translation: 公开了一种纯化粗油溶性磺酸的方法，其中所述方法包括使粗油溶性磺酸的挥发性烃溶液与2-甲氧基乙醇或水与2-甲氧基乙醇的混合物接触。 首先，术语“纯化”是指除去硫酸和硫氧化物。

公开(公告)号：US3359297A

公开(公告)日：1967-12-19

申请号：US44478465

申请日：1965-04-01

Applicant: DEHYDAG GMBH

Inventor： WOLFGANG GUNDEL

IPC: C07C309/01 ,  C07C333/14 ,  C07C333/18 ,  C07C335/08 ,  C07C335/12 ,  C07C335/14 ,  C07C335/40 ,  C07D295/215 ,  C25D3/38

CPC classification number: C07D295/215 ,  C07C309/01 ,  C07C333/14 ,  C07C333/18 ,  C07C335/08 ,  C07C335/12 ,  C07C335/14 ,  C07C335/40 ,  C25D3/38