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    XENON RETRIEVAL SYSTEM AND RETRIEVAL DEVICE
    1.
    发明申请
    XENON RETRIEVAL SYSTEM AND RETRIEVAL DEVICE 有权
    XENON检索系统和检索设备

    公开(公告)号：US20100074820A1

    公开(公告)日：2010-03-25

    申请号：US12516723

    申请日：2007-11-30

    申请人： Masahiro Kimoto ,  Terumasa Koura ,  Yukio Fukuda ,  Masaki Narazaki ,  Taiji Hashimoto ,  Toru Sakai ,  Kazuo Yokogi

    发明人： Masahiro Kimoto ,  Terumasa Koura ,  Yukio Fukuda ,  Masaki Narazaki ,  Taiji Hashimoto ,  Toru Sakai ,  Kazuo Yokogi

    IPC分类号： C01B23/00 ,  B01D53/02

    CPC分类号： B01D53/02 ,  B01D2253/108 ,  B01D2256/18 ,  B01D2257/11 ,  C01B23/0042 ,  C01B23/0052 ,  C01B23/0084 ,  C01B2210/0037 ,  C01B2210/0068 ,  F25J3/028 ,  F25J2205/20 ,  F25J2205/40 ,  F25J2205/60 ,  F25J2215/36

    摘要： To provide a simple highly-pure Xe retrieval method and device with high retrieval efficiency by functionally removing such elements as water, CO2 and FCs from waste gases from semiconductor production processes, such as the plasma etching, that contain low-concentration Xe. For samples containing xenon and fluorocarbon, this invention is characterized by having at least first adsorption means (A1) filled with synthetic zeolite with pore size of 4A or smaller and aluminum oxide, arranged serially, gas separation means (A2) composed of silicone or polyethylene hollow fiber gas separation membrane modules 4, second adsorption means (A3) filled with either activated carbon, synthetic zeolite with pore size of 5A or larger, molecular sieving carbon with pore size of 5A or larger, or a combination of these, and reaction means (A4) filled with calcium compounds as reactant.

    摘要翻译： 通过从包含低浓度Xe的半导体生产工艺（例如等离子体蚀刻）的废气中功能去除水，CO2和FC等元素，提供具有高回收效率的简单的高纯度Xe回收方法和装置。 对于含有氙气和碳氟化合物的样品，本发明的特征在于至少具有填充有4A或更小孔径的合成沸石的第一吸附装置（A1）和串联排列的氧化铝，由硅氧烷或聚乙烯组成的气体分离装置（A2） 中空纤维气体分离膜组件4，填充有活性碳的第二吸附装置（A3），孔径为5A以上的合成沸石，孔径为5A以上的分子筛碳，或它们的组合，以及反应装置 （A4）填充有钙化合物作为反应物。

    Maskless, microlens EUV lithography system
    4.
    发明授权
    Maskless, microlens EUV lithography system 失效
    无掩模，微透镜EUV光刻系统

    公开(公告)号：US06498685B1

    公开(公告)日：2002-12-24

    申请号：US09478233

    申请日：2000-01-04

    申请人： Kenneth C. Johnson

    发明人： Kenneth C. Johnson

    IPC分类号： G02B2710

    CPC分类号： G02B21/0056 ,  B81C1/0038 ,  B82Y10/00 ,  F25J2215/36 ,  G02B3/0056 ,  G02B3/0062 ,  G02B21/0028 ,  G02B21/004 ,  G02B21/0044 ,  G02B21/14 ,  G03F7/70033 ,  G03F7/70291 ,  G03F7/704 ,  G03F9/70 ,  G21K1/06

    摘要： A maskless, extreme ultraviolet (EUV) lithography system uses microlens arrays to focus EUV radiation (at an operating wavelength of 11.3 nm) onto diffraction-limited (58-nm FWHM) focused spots on a wafer printing surface. The focus spots are intensity-modulated by means of microshutter modulators and are raster-scanned across a wafer surface to create a digitally synthesized exposure image. The system uses a two-stage microlens configuration to achieve both a high fill factor and acceptable transmission efficiency. EUV illumination is supplied by a 6 kHz xenon plasma source, and the illumination optics comprise an aspheric condenser mirror, a spherical collimating mirror, and two sets of flat, terraced fold mirrors that partition the illumination into separate illumination fields covering individual microlens arrays. (The system has no projection optics, because the image modulator elements are integrated with the microlens arrays.) The printing throughput is estimated to be 62 (300-mm) wafers per hour (assuming a resist exposure threshold of 20 mJ/cm2), and print resolution is estimated at 70 nanometers for mixed positive- and negative-tone patterns (at k1=0.6).

    摘要翻译： 无掩模，极紫外（EUV）光刻系统使用微透镜阵列将EUV辐射（在11.3nm的工作波长）聚焦到晶片印刷表面上的衍射限制（58-nm FWHM）聚焦点上。 聚焦点通过微振荡调制器进行强度调制，并在晶片表面上进行光栅扫描，以产生数字合成的曝光图像。 该系统使用两级微透镜配置来实现高填充因子和可接受的传输效率。 EUV照明由6kHz氙等离子体源提供，并且照明光学器件包括非球面聚光镜，球面准直镜和两组平坦的梯形折叠镜，其将照明分成分开的照明场，覆盖各个微透镜阵列。 （该系统没有投影光学器件，因为图像调制器元件与微透镜阵列集成。）打印吞吐量估计为每小时62（300mm）晶片（假定抗蚀剂曝光阈值为20mJ / cm 2）， 并且对于混合的正负色调图案（k1 = 0.6），印刷分辨率估计为70纳米。

    Separation and purification of xenon
    6.
    发明授权
    Separation and purification of xenon 失效
    氙气的分离纯化

    公开(公告)号：US4078907A

    公开(公告)日：1978-03-14

    申请号：US9256

    申请日：1970-02-18

    申请人： Carl Solomon Schlea, deceased

    发明人： Carl Solomon Schlea, deceased

    IPC分类号： B01D3/40 ,  C01B23/00 ,  F25J3/02 ,  B01D19/00

    CPC分类号： C01B23/00 ,  B01D3/40 ,  F25J3/028 ,  F25J2210/50 ,  F25J2215/36 ,  F25J2270/904

    摘要： Xenon is separated from a mixture of xenon and krypton by extractive distillation using carbon tetrafluoride as the partitioning agent. Krypton is flushed out of the distillation column with CF.sub.4 in the gaseous overhead stream while purified xenon is recovered from the liquid bottoms. The distillation is conducted at about atmospheric pressure or at subatmospheric pressure.

    摘要翻译： 通过采用四氟化碳作为分配剂，通过萃取蒸馏将氙与氙和氪的混合物分离。 氪气在气态塔顶流中用CF4从蒸馏塔中冲出，同时从液体底部回收纯化的氙气。 蒸馏在大气压或低于大气压下进行。

    Process for recovery and containment of radioactive gases
    8.
    发明授权
    Process for recovery and containment of radioactive gases 失效
    放射性气体的恢复和容纳过程

    公开(公告)号：US3748864A

    公开(公告)日：1973-07-31

    申请号：US3748864D

    申请日：1969-01-21

    申请人： AIRCO INC

    发明人： LOFREDO A ,  GOLDSCHMIDT D

    IPC分类号： F25J3/02 ,  G21C19/303 ,  F25J3/00 ,  F25J3/06

    CPC分类号： G21C19/303 ,  F25J3/028 ,  F25J2205/20 ,  F25J2215/34 ,  F25J2215/36 ,  Y10S62/919 ,  Y10S62/925

    摘要： This invention relates to apparatus and methods for the removal and safe containment of radioactive krypton and xenon present in the air leakage stream of a nuclear plant utilizing a boiling water reactor. The invention utilizes cryogenic techniques to separate the xenon and krypton isotopes from the air and then stores the same until they are no longer a safety hazard.

    摘要翻译： 本发明涉及用于利用沸水反应器在核电厂的漏气流中存在的放射性氪和氙的去除和安全遏制的装置和方法。 本发明利用低温技术将氙气和氪同位素与空气分离，然后储存，直至不再具有安全隐患。

    Method for separating a krypton-xenon concentrate and a device for carrying out said method
    9.
    发明授权
    Method for separating a krypton-xenon concentrate and a device for carrying out said method 失效
    用于分离氪 - 氙浓缩物的方法和用于实施所述方法的装置

    公开(公告)号：US07516627B2

    公开(公告)日：2009-04-14

    申请号：US10523231

    申请日：2003-10-07

    申请人： Mikhail Yurievich Savinov

    发明人： Mikhail Yurievich Savinov

    IPC分类号： B01D3/14 ,  B01D53/00 ,  F25J3/02

    CPC分类号： F25J3/04793 ,  B01D3/343 ,  F25J3/0426 ,  F25J3/04278 ,  F25J3/04751 ,  F25J3/04818 ,  F25J2210/42 ,  F25J2215/34 ,  F25J2215/36 ,  F25J2270/12 ,  F25J2270/66 ,  Y10S62/925

    摘要： A krypton-xenon concentrate is first divided into krypton and xenon fractions in a preliminary rectifying column. Semi-volatile impurities are removed from each fraction, and production krypton and xenon are obtained from the refined fractions in krypton and xenon production columns. A recovered krypton flow is produced in a krypton recovery rectifying column. Reflux is formed in condensers-evaporators of rectification columns of the device in such a way that the formation of a solid phase is excluded. The operation of the rectification columns is initiated by supplying krypton to a contacting space.

    摘要翻译： 氪 - 氙浓缩物首先在初步整流柱中分为氪和氙气。 从各部分中除去半挥发性杂质，并从氪和氙生产塔中的精制馏分得到生产氪和氙。 在氪回收精馏塔中产生回收的氪气流。 在装置的精馏塔的冷凝器 - 蒸发器中形成回流，以排除固相的形成。 整流塔的运行是通过向接触空间供应氪来启动的。

    System for liquefying or freezing xenon
    10.
    发明授权
    System for liquefying or freezing xenon 有权
    液化或冷冻氙气系统

    公开(公告)号：US07137274B2

    公开(公告)日：2006-11-21

    申请号：US10669834

    申请日：2003-09-24

    申请人： Darren Mennie ,  Ron Clark Lee ,  Colin Michael Harrison ,  Makoto Kaneko ,  Joanne Rachel Greenwood

    发明人： Darren Mennie ,  Ron Clark Lee ,  Colin Michael Harrison ,  Makoto Kaneko ,  Joanne Rachel Greenwood

    IPC分类号： F25J1/00

    CPC分类号： B82Y10/00 ,  F25J1/0005 ,  F25J1/0222 ,  F25J1/0276 ,  F25J2205/20 ,  F25J2210/42 ,  F25J2215/36 ,  G03F7/70033 ,  G03F7/70858 ,  H05G2/006

    摘要： Apparatus for producing liquid or solid xenon comprises a duct 12 having an inlet 14 for receiving gaseous xenon and an outlet 16 for outputting gaseous xenon at a reduced temperature to a nozzle located in a vacuum chamber 60. A housing 18 extends about the duct and contains a halocarbon coolant in thermal contact with the duct, and a second duct 24 in thermal contact with the halocarbon coolant for conveying a flow of liquid nitrogen through the housing 18 to control the temperature of the halocarbon. In view of the difference in the pressure of the xenon gas output from the duct and the pressure in the chamber, the thus-cooled gas is caused to liquefy or solidify in the vicinity of the nozzle.

    摘要翻译： 用于生产液体或固体氙的装置包括具有用于接收气态氙的入口14和用于将降低的温度的气态氙输出到位于真空室60中的喷嘴的出口16的管道12。 壳体18围绕管道延伸并且包含与管道热接触的卤代烃冷却剂，以及与卤烃冷却剂热接触的第二管道24，用于将液氮流通过壳体18以控制卤化碳的温度。 鉴于从管道输出的氙气体的压力和室内的压力的差异，使得如此冷却的气体在喷嘴附近液化或固化。