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    Method for bubble-free gas-enrichment of a flowing liquid within a conduit
    1.
    发明授权
    Method for bubble-free gas-enrichment of a flowing liquid within a conduit 有权

    公开(公告)号：US12194420B2

    公开(公告)日：2025-01-14

    申请号：US17860514

    申请日：2022-07-08

    Applicant: TherOx, Inc.

    Inventor： Stephen E. Myrick ,  Jeffrey L. Creech

    IPC: B01F23/232 ,  A61M1/16 ,  A61M1/32 ,  A61M25/00 ,  B01F23/234 ,  B01F23/454 ,  B01F25/23 ,  B01F25/313 ,  B01F33/82 ,  B29C53/08

    Abstract: The present invention provides a system for enriching a flowing liquid with a dissolved gas inside a conduit. The system comprises two or more capillaries, each capillary delivering a stream of a gas-enriched liquid to the flowing liquid. The first ends of the capillaries are positioned to form an intersecting angle with respect to the effluent streams such that these streams of gas-enriched liquid collide with each other upon exit from the first ends of the capillaries, effecting localized convective mixing within the larger liquid conduit before these gas-enriched streams are able to come into close contact with the boundary surfaces of the conduit, whereby the gas-enriched liquid mixes with the flowing liquid to form a gas-enriched flowing liquid. In the preferred embodiment, no observable bubbles are formed in the gas-enriched flowing liquid. Methods of making and using such system are also provided.

    Method of estimating an output diameter of a capillary tube, and related methods
    5.
    发明授权
    Method of estimating an output diameter of a capillary tube, and related methods 有权

    公开(公告)号：US11691110B2

    公开(公告)日：2023-07-04

    申请号：US17174912

    申请日：2021-02-12

    Applicant: XTPL S.A.

    Inventor： Szymon Zięba ,  Maciej Tybel ,  Piotr Kowalczewski ,  Filip Granek

    IPC: B01F23/23 ,  B01F23/232 ,  B01F23/20 ,  B01F23/454 ,  B01F23/2373

    CPC classification number: B01F23/232 ,  B01F23/23 ,  B01F23/29 ,  B01F23/454 ,  B01F23/2373

    Abstract: A method of obtaining a numerical model is disclosed. The numerical model correlates estimated capillary tube output diameter values to minimum pressure for gas bubble generation (MPGBG) values. An MPGBG value of each capillary tube in the reference group is measured for a liquid. An output diameter of each of the capillary tubes is measured by a microscope apparatus. A numerical model that correlates estimated capillary tube output diameter values to MPGBG values for the liquid is calculated.
    A method of estimating an output diameter of a capillary tube includes the following steps. An MPGBG value of the capillary tube for a liquid is measured, and the measured MPGBG value is input into the numerical model to estimate the capillary tube output diameter value.
    Other methods include a method of estimating an output diameter value of a capillary tube in a test group, a method of estimating and storing output diameter values of capillary tubes in a test group, methods of selecting at least one capillary tube from a plurality of capillary tubes in a test group, and a method of cutting a capillary tube to a desired estimated capillary tube output diameter value.

    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
    6.
    发明公开
    SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 审中-公开

    公开(公告)号：US20240096651A1

    公开(公告)日：2024-03-21

    申请号：US18523474

    申请日：2023-11-29

    Applicant: SCREEN Holdings Co., Ltd.

    Inventor： Shuichi YASUDA ,  Kenji KOBAYASHI

    IPC: H01L21/67 ,  B01F23/40 ,  B01F23/45 ,  B01F23/454 ,  B08B3/00

    CPC classification number: H01L21/67023 ,  B01F23/40 ,  B01F23/45 ,  B01F23/454 ,  B01F23/49 ,  B08B3/00 ,  H01L21/67017 ,  H01L21/67034 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67253 ,  B01F35/833 ,  Y10T137/0396

    Abstract: First and second concentration measurement parts (415, 425) are provided in first and second supply liquid lines (412, 422) in which first and second supply liquids flow, respectively. A dissolved concentration of gas in the second supply liquid is lower than that in the first supply liquid. In the first and second supply liquid lines, respective one ends of first and second branch lines (51, 52) are connected to respective positions on the upstream side of the concentration measurement parts. The other ends of the first and second branch lines are connected to a mixing part (57), and by mixing the first and second supply liquids, a processing liquid is generated. Respective flow rate adjustment parts (58) of the first and second branch lines are controlled on the basis of respective measured values of the first and second concentration measurement parts so that the dissolved concentration of the gas in the processing liquid can become a set value. It is thereby possible to prevent the supply liquid containing particles or the like caused by the concentration measurement part from being contained into the processing liquid to be supplied to a substrate and also to adjust the dissolved concentration of the gas in the processing liquid to the set value with high accuracy.

    Substrate processing apparatus and substrate processing method
    8.
    发明授权
    Substrate processing apparatus and substrate processing method 有权

    公开(公告)号：US12211708B2

    公开(公告)日：2025-01-28

    申请号：US18523474

    申请日：2023-11-29

    Applicant: SCREEN Holdings Co., Ltd.

    Inventor： Shuichi Yasuda ,  Kenji Kobayashi

    IPC: H01L21/02 ,  B01F23/40 ,  B01F23/45 ,  B01F23/454 ,  B08B3/00 ,  H01L21/67 ,  B01F35/221 ,  B01F35/83

    Abstract: First and second concentration measurement parts (415, 425) are provided in first and second supply liquid lines (412, 422) in which first and second supply liquids flow, respectively. A dissolved concentration of gas in the second supply liquid is lower than that in the first supply liquid. In the first and second supply liquid lines, respective one ends of first and second branch lines (51, 52) are connected to respective positions on the upstream side of the concentration measurement parts. The other ends of the first and second branch lines are connected to a mixing part (57), and by mixing the first and second supply liquids, a processing liquid is generated. Respective flow rate adjustment parts (58) of the first and second branch lines are controlled on the basis of respective measured values of the first and second concentration measurement parts so that the dissolved concentration of the gas in the processing liquid can become a set value. It is thereby possible to prevent the supply liquid containing particles or the like caused by the concentration measurement part from being contained into the processing liquid to be supplied to a substrate and also to adjust the dissolved concentration of the gas in the processing liquid to the set value with high accuracy.

    REACTOR SPARGER ASSEMBLY
    10.
    发明公开
    REACTOR SPARGER ASSEMBLY 审中-公开

    公开(公告)号：US20230211358A1

    公开(公告)日：2023-07-06

    申请号：US17924061

    申请日：2021-05-27

    Applicant: Solugen, Inc.

    Inventor： Sean T. Hunt ,  Kenneth Keckler

    IPC: B03D1/14 ,  B01F23/21 ,  B01F23/454 ,  B01F23/80 ,  B01F25/53 ,  B01J4/00 ,  B01J8/00

    CPC classification number: B03D1/1431 ,  B01F23/214 ,  B01F23/454 ,  B01F23/808 ,  B01F25/53 ,  B01J4/004 ,  B01J8/002 ,  B01J8/004 ,  B03D1/1493 ,  B01F2101/44

    Abstract: A reactor system includes a reactor vessel configured to contain a process fluid, and a sparger assembly that operably coupled to the reactor vessel and configured to supply a mixture of a gas and a recirculated process fluid to the reactor vessel. The sparger assembly includes a plurality of sparger chambers. Each sparger chamber includes a process fluid conduit fluidly coupled to a process fluid return of the reactor vessel via a process fluid inlet, wherein the process fluid inlet has a first block and bleed valve assembly. Each sparger chamber includes a sparger conduit fluidly coupled to the process fluid conduit and a sparger disposed within the sparger conduit and fluidly coupled to a gas source via a gas inlet. Each sparger chamber also includes a process fluid-gas mixture outlet that fluidly couples the sparger conduit to a sparger outlet of the reactor vessel.

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