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    LIQUID PHASE SELECTIVE OXIDATION TO EPOXIDES WITH MOLECULAR OXYGEN
    2.
    发明申请
    LIQUID PHASE SELECTIVE OXIDATION TO EPOXIDES WITH MOLECULAR OXYGEN 审中-公开

    公开(公告)号：US20180208569A1

    公开(公告)日：2018-07-26

    申请号：US15878837

    申请日：2018-01-24

    申请人： Lyondell Chemical Technology, L.P.

    发明人： Sandor Nagy ,  Barbara Kimmich ,  Justin E. Turner ,  Nicholas Bruschi ,  George R. Horvat

    IPC分类号： C07D301/06 ,  C07D303/04 ,  B01J23/50 ,  C07C23/36 ,  C07C23/44

    CPC分类号： C07D301/06 ,  B01J23/50 ,  B01J2231/72 ,  C07C23/36 ,  C07C23/44 ,  C07D301/10 ,  C07D303/04 ,  Y02P20/52

    摘要： The present disclosure relates to a method for effecting catalytic selective oxidation in liquid phase comprising a perfluorinated solvent and an olefinic compound with molecular oxygen to produce an epoxide. The method may provide enhanced selectivity to the epoxide of greater than 60%. The olefinic compound may be ethylene, propylene, butenes, 1-octene, butadiene, allyl chloride, allyl alcohol, styrene, and the like. The perfluorinated solvent may be perfluoro methyldecalin, perfluorodecalin, perfluoroperhydrophenanthrene, perfluoro (butyltetrahydrofuran), isomers thereof, or a combination thereof. In some embodiments, the method includes catalytically epoxidizing, in a liquid phase comprising a perfluorinated solvent, propylene with molecular oxygen to produce propylene oxide. A system for carrying out the method is also provided, the system comprising a source of a perfluorinated solvent, and a liquid phase reactor fluidly connected with the source, and configured for effecting catalytic selective oxidation, in a liquid phase comprising the perfluorinated solvent, of an olefinic compound with molecular oxygen to produce an epoxide.

    Ionic, organic photoacid generators for DUV, MUV and optical lithography based on peraceptor-substituted aromatic anions
    3.
    发明授权
    Ionic, organic photoacid generators for DUV, MUV and optical lithography based on peraceptor-substituted aromatic anions 有权
    离子，有机光致酸发生器，用于DUV，MUV和基于吸收剂取代的芳族阴离子的光刻

    公开(公告)号：US07655379B2

    公开(公告)日：2010-02-02

    申请号：US11970731

    申请日：2008-01-08

    申请人： Martin Glodde ,  Sen Liu ,  Irene Y. Popova

    发明人： Martin Glodde ,  Sen Liu ,  Irene Y. Popova

    IPC分类号： G03F7/004 ,  G03F7/30 ,  C07C23/08 ,  C07C23/18 ,  C07C23/34 ,  C07C23/44

    CPC分类号： G03F7/0045 ,  G03F7/0392

    摘要： A photoacid generator compound P+A−, comprises an antenna group P+ comprising a cation that generates protons upon interaction with light, and A− comprising a weakly coordinating peracceptor-substituted aromatic anion that does not contain fluorine or semi-metallic elements such as boron. In one embodiment, such anions comprise the following compounds 4, 5, 6 and 7, wherein E comprises an electron-withdrawing group and the removal of one proton generates aromaticity. P+ comprises an onium cation that decomposes into a proton and other components upon interaction with photons. P+ may comprise an organic chalcogen onium cation or a halonium cation, wherein the chalcogen onium cation in another embodiment may comprises an oxonium, sulfonium, selenium, tellurium, or onium cation, and the halonium cation may comprise an iodonium, chlorine or bromine onium cation. A novel compound comprises TPS CN5. A photolithographic formulation comprises the photoacid generator in combination with a photolithographic composition such as a photolithographic polymer. The formulation, when on a substrate, is exposed to optical lithographic radiation or ArF (193 nm) or KrF (248 nm) radiation, and developed. A product comprises an article of manufacture made by the method of the invention.

    摘要翻译： 光致酸发生剂化合物P + A-包含天线组P +，其包含在与光相互作用时产生质子的阳离子，以及A-包含不含氟或半金属元素如硼的弱配位的受体取代的芳族阴离子 。 在一个实施方案中，这种阴离子包含以下化合物4,5,6和7，其中E包括吸电子基团，并且去除一个质子产生芳香性。 P +包含在与光子相互作用时分解成质子和其它成分的鎓阳离子。 P +可以包含有机硫族元素鎓阳离子或卤鎓阳离子，其中在另一个实施方案中的硫属离子阳离子可以包含氧鎓，锍，硒，碲或鎓阳离子，卤鎓阳离子可以包含碘鎓，氯或溴鎓阳离子 。 一种新型化合物包括TPS CN5。 光刻制剂包括与诸如光刻聚合物的光刻组合物组合的光酸产生剂。 当在基板上暴露于光学平版照射或ArF（193nm）或KrF（248nm）辐射时，该制剂开发。 产品包括通过本发明的方法制造的制品。

    Liquid phase selective oxidation to epoxides with molecular oxygen
    4.
    发明授权
    Liquid phase selective oxidation to epoxides with molecular oxygen 有权

    公开(公告)号：US10308622B2

    公开(公告)日：2019-06-04

    申请号：US15878837

    申请日：2018-01-24

    申请人： Lyondell Chemical Technology, L.P.

    发明人： Sandor Nagy ,  Barbara Kimmich ,  Justin E. Turner ,  Nicholas Bruschi ,  George R. Horvat

    IPC分类号： C07D301/06 ,  C07C23/36 ,  B01J23/50 ,  C07D303/04 ,  C07C23/44 ,  C07D301/10

    摘要： The present disclosure relates to a method for effecting catalytic selective oxidation in liquid phase comprising a perfluorinated solvent and an olefinic compound with molecular oxygen to produce an epoxide. The method may provide enhanced selectivity to the epoxide of greater than 60%. The olefinic compound may be ethylene, propylene, butenes, 1-octene, butadiene, allyl chloride, allyl alcohol, styrene, and the like. The perfluorinated solvent may be perfluoro methyldecalin, perfluorodecalin, perfluoroperhydrophenanthrene, perfluoro (butyltetrahydrofuran), isomers thereof, or a combination thereof. In some embodiments, the method includes catalytically epoxidizing, in a liquid phase comprising a perfluorinated solvent, propylene with molecular oxygen to produce propylene oxide. A system for carrying out the method is also provided, the system comprising a source of a perfluorinated solvent, and a liquid phase reactor fluidly connected with the source, and configured for effecting catalytic selective oxidation, in a liquid phase comprising the perfluorinated solvent, of an olefinic compound with molecular oxygen to produce an epoxide.

    Photoacid generators for extreme ultraviolet lithography
    6.
    发明授权
    Photoacid generators for extreme ultraviolet lithography 有权
    用于极紫外光刻的光酸发生器

    公开(公告)号：US08039194B2

    公开(公告)日：2011-10-18

    申请号：US11970827

    申请日：2008-01-08

    申请人： Martin Glodde

    发明人： Martin Glodde

    IPC分类号： G03F7/004 ,  G03F7/30 ,  C07C23/08 ,  C07C23/18 ,  C07C23/34 ,  C07C23/44

    CPC分类号： G03F7/0045 ,  C07C25/18 ,  C07C255/46 ,  C07C309/06 ,  C07C381/12 ,  C07C391/02 ,  C07C2601/10 ,  G03F7/0046 ,  G03F7/0397 ,  Y10T428/24612 ,  Y10T428/24802

    摘要： A photoacid generator P+ A− comprises (a) an antenna group P+ comprising atoms with high EUV photoabsorption cross-sections according to FIG. 1 and A− anions; or (b) an antenna group P+ and A− comprising anions with low photoabsorption cross-sections for EUV; or (c) an antenna group P+, comprising atoms with high EUV photoabsorption cross-sections according to FIG. 1 and A− comprising anions with low photoabsorption cross-sections for EUV. Novel compounds comprise DTFPIO PFBuS, and DTBPIO CN5.

    摘要翻译： 光致酸发生器P + A-包括（a）包含根据图1的具有高EUV光吸收横截面的原子的天线组P + 1和A-阴离子; 或（b）天线组P +和A-包括对EUV具有低光吸收横截面的阴离子; 或（c）天线组P +，包括根据图1的具有高EUV光吸收横截面的原子。 1和A-包括对于EUV具有低光吸收横截面的阴离子。 新型化合物包括DTFPIO PFBuS和DTBPIO CN5。