摘要:
The embodiments relate to a process for preparing a polythiol composition, which comprises reacting a halogen compound or an alcohol compound with thiourea to prepare a thiouronium salt solution; and adding a basic solution to the thiouronium salt solution to hydrolyze it. The hydrolysis reaction is terminated when the area of peak A in the graph measured by gel permeation chromatography of the reactant in the hydrolysis step under certain conditions is 0.5% to 8% based on the total peak area. A tetrafunctional polythiol composition having high purity can be obtained. Thus, an optical lens having excellent color, transparency, and refractive index can be obtained.
摘要:
A novel guanidine compound having excellent fungicidal activity is represented by formula [I]. (In the formula, Y represents a divalent group represented by formula [II] (wherein each of R7-R9 independently represents a hydrogen atom or the like) or the like; each of X and Z independently represents an unsubstituted or substituted alkylene group or the like; each of Q1 and Q2 independently represents a single bond or the like; each of A1 and A2 independently represents an unsubstituted or substituted divalent heterocyclic compound residue or the like; and each of R1-R6 independently represents a hydrogen atom or the like.)
摘要:
A method for making a surfactant-based monolithic column is provided. The method comprises providing a mixture comprising at least one surfactant monomer, at least one crosslinker, at least one initiator, and at least one porogen and polymerizing the mixture to form the surfactant-based monolithic column. The present disclosure also provides a surfactant-based monolithic column, a method for separating molecules, and a process for preparing a surfactant monomer.
摘要:
There are provided novel compounds of formula I ##STR1## wherein D represents alkyl C1 to 6; T represents a C.sub.3-5 saturated or unsaturated alkylene chain substituted by --(CH.sub.2).sub.m --NXY; --O--(CH.sub.2).sub.2 --NH-- substituted by --(CH.sub.2).sub.m --NXY; or --U--(CH.sub.2).sub.a --N(X)--(CH.sub.2).sub.b --; and a, b, m, X and Y are as defined in the specification together with processes for their preparation, compositions containing them and their use in therapy. Compounds of formula I are expected to be useful inter alia in the treatment of neurodegenerative disorders.
摘要:
The present disclosure relates to a compound of formula (I) where R1 is as defined herein. The compound of formula I is an inhibitor of the dephosphorylation of phosphorylated elF2α. The phosphorylation of elF2α affects the quiescence and self renewal properties of stem cells such as muscle stem cells. The compound of formula (I) can thus be used to expand stem cells populations and treat degenerative diseases that have a quiescence regulation affected or mediated by the phosphorylation of elF2α.
摘要:
This disclosure relates to the field of molecules having pesticidal utility against pests in phyla Nematoda, Arthropoda, and/or Mollusca, processes to produce such molecules and intermediates used in such processes, compositions containing such molecules, and processes of using such molecules against such pests. These molecules may be used, for example, as nematicides, acaricides, insecticides, miticides, and/or molluscicides. This document discloses molecules having the following formula (“Formula One” and “Formula Two”).
摘要:
This disclosure relates to the field of molecules having pesticidal utility against pests in phyla Nematoda, Arthropoda, and/or Mollusca, processes to produce such molecules and intermediates used in such processes, compositions containing such molecules, and processes of using such molecules against such pests. These molecules may be used, for example, as nematicides, acaricides, insecticides, miticides, and/or molluscicides. This document discloses molecules having the following formula (“Formula One”).
摘要:
There is provided an anti-reflective coating forming composition for lithography comprising a reaction product obtained by reacting a sulfur-containing compound having thiourea structure with a nitrogen-containing compound having two or more nitrogen atoms substituted with a hydroxymethyl group or an alkoxymethyl group in the presence of an acid catalyst and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, has a higher dry etching rate compared with photoresists and can use in lithography process for manufacturing semiconductor device.