METHOD FOR PREPARING POLYTHIOL COMPOSITION

    公开(公告)号:US20210179552A1

    公开(公告)日:2021-06-17

    申请号:US17117407

    申请日:2020-12-10

    申请人: SKC CO., LTD.

    摘要: The embodiments relate to a process for preparing a polythiol composition, which comprises reacting a halogen compound or an alcohol compound with thiourea to prepare a thiouronium salt solution; and adding a basic solution to the thiouronium salt solution to hydrolyze it. The hydrolysis reaction is terminated when the area of peak A in the graph measured by gel permeation chromatography of the reactant in the hydrolysis step under certain conditions is 0.5% to 8% based on the total peak area. A tetrafunctional polythiol composition having high purity can be obtained. Thus, an optical lens having excellent color, transparency, and refractive index can be obtained.

    Bicyclic isothiourea derivatives useful in therapy
    5.
    发明授权
    Bicyclic isothiourea derivatives useful in therapy 失效
    用于治疗的双环异硫脲衍生物

    公开(公告)号:US5786364A

    公开(公告)日:1998-07-28

    申请号:US615254

    申请日:1996-03-08

    申请人: James MacDonald

    发明人: James MacDonald

    CPC分类号: C07D217/04 C07C335/32

    摘要: There are provided novel compounds of formula I ##STR1## wherein D represents alkyl C1 to 6; T represents a C.sub.3-5 saturated or unsaturated alkylene chain substituted by --(CH.sub.2).sub.m --NXY; --O--(CH.sub.2).sub.2 --NH-- substituted by --(CH.sub.2).sub.m --NXY; or --U--(CH.sub.2).sub.a --N(X)--(CH.sub.2).sub.b --; and a, b, m, X and Y are as defined in the specification together with processes for their preparation, compositions containing them and their use in therapy. Compounds of formula I are expected to be useful inter alia in the treatment of neurodegenerative disorders.

    摘要翻译: PCT No.PCT / SE96 / 00162 Sec。 371日期:1996年3月8日 102(e)1996年3月8日PCT PCT 1996年2月9日PCT公布。 第WO96 / 24588号公报 日期:1996年8月15日提供式I的新化合物,其中D代表烷基C1至6; T表示被 - (CH 2)m -YYYY取代的C3-5饱和或不饱和亚烷基链; -O-(CH 2)2 -NH-取代的 - (CH 2)m -YYY; 或-U-(CH 2)a -N(X) - (CH 2)b - ; 和a,b,m,X和Y如说明书中所定义,以及其制备方法,含有它们的组合物及其在治疗中的用途。 预期式I化合物尤其可用于治疗神经变性疾病。

    Sulfur Atom-Containing Anti-Reflective Coating Forming Composition For Lithography
    9.
    发明申请
    Sulfur Atom-Containing Anti-Reflective Coating Forming Composition For Lithography 有权
    含硫原子的防反射涂层组合物用于光刻

    公开(公告)号:US20080118870A1

    公开(公告)日:2008-05-22

    申请号:US11664989

    申请日:2005-09-27

    CPC分类号: G03F7/091

    摘要: There is provided an anti-reflective coating forming composition for lithography comprising a reaction product obtained by reacting a sulfur-containing compound having thiourea structure with a nitrogen-containing compound having two or more nitrogen atoms substituted with a hydroxymethyl group or an alkoxymethyl group in the presence of an acid catalyst and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, has a higher dry etching rate compared with photoresists and can use in lithography process for manufacturing semiconductor device.

    摘要翻译: 提供了一种用于光刻的抗反射涂层形成组合物,其包含通过使具有硫脲结构的含硫化合物与具有羟基甲基或烷氧基甲基取代的具有两个或更多个氮原子的含氮化合物反应而获得的反应产物 存在酸催化剂和溶剂。 由组合物得到的抗反射涂层对于反射光具有很高的防止效果,不会与光致抗蚀剂混合,与光致抗蚀剂相比具有更高的干蚀刻速度,并可用于制造半导体器件的光刻工艺。