Abstract:
A passive infrared sensor uses two detectors having elements of different configurations such that each element outputs a respective frequency when an object moves in front of it. Based on the presence of two frequencies with similar peak and/or slope characteristics, a motion signal is output to, e.g., activate an alarm. In another embodiment the detectors have plural elements with the elements of one detector being wired in a dimension that is orthogonal to the dimension in which the elements of the other detector are wired. The signals from the detectors are combined to determine motion and size of object. The detector elements can also be configured differently from each other as in the first embodiment, and the polarities of signals can be used to determine direction of motion.
Abstract:
A filtered photocontroller with a housing including a window portion; a circuit board within the housing including a light sensor behind the window portion of the housing; and a polymer filter which attenuates infrared radiation in front of the light sensor for improving the responsiveness of the photocontroller.
Abstract:
Multispectral infrared detectors are needed for advanced imaging systems with capabilities to discriminate actual targets against decoys. Simultaneous detection of the infrared radiation emitted by the target in more than one wavelength range has significant advantages for this purpose. In the current invention, a technology for producing a plurality of multi-color infrared sensing elements in a monolithic array format is provided. Each element has a multi-layer structure of mercury cadmium telluride (HgCdTe), a group II-VI semiconductor. The unit cell of the integrated detector consists of two co-located detectors, each sensitive to a different infrared wavelength. The prior art to produce such infrared device arrays is nullhybrid technologynull, meaning the infrared sensing elements and the read-out electronics are fabricated on two different materials-silicon and HgCdTe and joined together by indium pillars/bumps. The yield and reliability are poor in the prior art due to the large difference in the thermal expansion of the two dissimilar materials. The unique feature of the current invention is producing multi-color infrared sensing device monolithically connected to the readout electronic circuit, both fabricated on a common silicon substrate. This invention is benefited from the high performances achieved in both silicon-based readout electronics and HgCdTe-based infrared detectors. Furthermore, the current invention eliminates the columnar indium metal electrodes and the low-yield hybridization process by the direct growth of the complex HgCdTe structure on pre-fabricated read-out electronics on a common silicon substrate by Molecular Beam Epitaxy (MBE).
Abstract:
To provide a thermopile infrared detecting element capable of accurate temperature measurement at low cost. An infrared detecting element 1 using a silicon nitride film as a first structure layer 22 constituting a structure of a membrane portion 4 is provided. Unlike silicon oxide, the first structure layer 22 has internal stress in the tensile direction, and can thus prevent the occurrence of bending. Also, diodes D1 and D2 can be formed in a silicon substrate 2 by using the first structure layer 22 as an element isolation region, and thus deformation of a thermopile 12 due to a change in the environment can be prevented to suppress measurement error of the thermopile 12. Furthermore, a high accuracy infrared detecting element capable of accurately detecting the temperature of cold junctions using the diodes D1 and D2 can be provided.
Abstract:
A detector array that eliminates the channel spectrum effect. In one embodiment the detector consists of a charge couple device (CCD) detector having a photoactive layer supported on a wedge-shaped substrate. Incident radiation impinging any of the pixels and passing through the substrate to the wedge-shaped surface thereof is reflected back at an angle away from the pixel from which it passed through. An infrared array and a single element detector each including a wedge-shaped substrate are also disclosed. The detectors do not require costly signal processing equipment and further can be constructed in accordance with well known manufacturing techniques and with little or no additional cost beyond that normally associated with producing such devices.
Abstract:
Within both a method for fabricating an optoelectronic microelectronic fabrication and the optoelectronic microelectronic fabrication fabricated in accord with the method for fabricating the optoelectronic microelectronic fabrication there is first provided a substrate having formed therein a minimum of one photoactive region which is sensitive to infrared radiation. There is also formed over the substrate and in registration with the minimum of one optically active region a minimum of one microlens layer. Similarly, there is also formed interposed between the substrate and the minimum of one microlens layer an infrared filter layer, wherein the infrared filter is not formed contacting the substrate. The method provides that the optoelectronic microelectronic fabrication is fabricated with enhanced optical sensitivity.
Abstract:
A transmitting and receiving module helps reduce electrical crosstalk and noise during transmitting and/or receiving signals. Electrical isolation among metallized electrodes in a surface-mounted module with an optical fiber and an optical device can be achieved by using a low resistivity Si substrate, providing ground terminals on the surface of the Si substrate, and grounding the Si substrate. Noise and crosstalk during transmitting and receiving signals can be reduced by providing a copper contact adhered to the bottom surface of the Si substrate and by grounding.
Abstract:
The invention relates to a device for detecting thermal radiation (3), comprising at least one thermal detector element (2) that converts the thermal radiation into an electric signal (4). The inventive device is further provided with at least one focusing element (12) that focuses the thermal radiation onto the detector element. The focusing element is for example a lens that consists of a semiconducting material such a silicon. Preferably, the focusing element is integrated in the detection window for detecting the thermal radiation, said detection window consisting of a semiconducting material.
Abstract:
Amorphous silicon/amorphous silicon germanium NI1PI2N position detectors are fabricated to suppress visible light and increase detection of infrared light. The material of I1 layer is amorphous silicon or amorphous silicon germanium used to absorb visible light, and material of I2 layer is amorphous silicon germanium or amorphous germanium used to absorb infrared light. A suppression of signal due to the absorption of the visible light and amplification of signals due to absorption of the infrared light can be obtained when the NI1P diode is forward biased and the P12N diode is reverse biased. The optical band gap of the 11 and 12 layers can be controlled by the Si/Ge atomic ratio. The suppression of visible light and enhanced detection of infrared light may be tuned by controlling thickness and optical band gaps of the I1 and I2 layers. The amorphous silicon and amorphous silicon germanium layers may be deposited by square-wave modulation at 13.56 MHz.
Abstract:
Disclosed are an infrared detector having a semiconductor substrate, a single crystal silicon thin film arranged and held in a hollow state at a predetermined distance above the semiconductor substrate, a plurality of thermoelectric changing means which are embedded in the single crystal silicon thin film and able to change heat energy generated by an infrared ray irradiated to the single crystal silicon thin film to an electric signal, a first connecting layer which are embedded in the single crystal silicon thin film and electrically connecting the plurality of thermoelectric changing means to each other and a second connecting layer for transmitting the electric signal outputted from the thermoelectric changing means to wire formed in the semiconductor substrate. In the infrared detector of the present invention, at least one of the first and second connecting layers is constructed by a silicon compound.