ETCHING METHOD AND DEVICES PRODUCED USING THE ETCHING METHOD
    1.
    发明申请
    ETCHING METHOD AND DEVICES PRODUCED USING THE ETCHING METHOD 审中-公开
    蚀刻方法和使用蚀刻方法生产的装置

    公开(公告)号:WO2013010067A2

    公开(公告)日:2013-01-17

    申请号:PCT/US2012046640

    申请日:2012-07-13

    CPC classification number: C23F1/30 C09K13/04 G06F3/044

    Abstract: A double ITO structure, containing sequential layers of indium tin oxide (ITO), silicon dioxide (SiO2) (which may include a dopant material) and ITO, is selectively protected by a patterned photo-resist mask. The sequential layers are etched together in a single etching step using an etchant composition which is an acidic solution containing a transition metal chloride and hydrochloric acid (HCl). Thus, the double ITO structure is etched using a substantially fluoride-free etchant composition.

    Abstract translation: 包含铟锡氧化物(ITO),二氧化硅(SiO 2)(其可以包括掺杂剂材料)和ITO的顺序层的双ITO结构被图案化的光刻胶掩模选择性地保护。 使用蚀刻剂组合物在单个蚀刻步骤中将顺序层蚀刻在一起,该蚀刻剂组合物是含有过渡金属氯化物和盐酸(HCl)的酸性溶液。 因此,使用基本上不含氟化物的蚀刻剂组合物来蚀刻双ITO结构。

    A FLEXIBLE CIRCUIT AND A METHOD OF PRODUCING THE SAME
    8.
    发明申请
    A FLEXIBLE CIRCUIT AND A METHOD OF PRODUCING THE SAME 审中-公开
    一种柔性电路及其制造方法

    公开(公告)号:WO2012023902A1

    公开(公告)日:2012-02-23

    申请号:PCT/SG2010/000303

    申请日:2010-08-18

    CPC classification number: H05K3/108 H05K1/0393 H05K3/281

    Abstract: A structure comprising a flexible dielectric film supporting on at least one side a thermoplastic polyimide layer, and on it a conductive layer, is treated by an "semi- additive" process. The "semi-additive" process comprises forming a patterned photo¬ resist layer, filling gaps in the photo-resist layer with conductive material, removing the photo-resist and exposed portions of the laminated conductive layer, and covering the structure with a coverlay. The inventors have realized that the process of laminating the copper layer onto the thermoplastic polyimide layer roughens the surface of the thermoplastic polyimide layer, thus anchoring the copper layer to the polyimide, which means that when the conductive material is deposited into the gaps in the photo-resist, conductive bodies are formed which are strongly anchored to the thermoplastic polyimide layer, and which can be used as electrodes of a flexible circuit.

    Abstract translation: 包括在至少一个侧面上支撑热塑性聚酰亚胺层的柔性电介质薄膜及其上的导电层的结构通过“半添加剂”方法进行处理。 “半添加”工艺包括形成图案化的光致抗蚀剂层,用导电材料填充光刻胶层中的间隙,去除光刻胶和层压导电层的暴露部分,并用覆盖物覆盖结构。 发明人已经认识到,将铜层层压到热塑性聚酰亚胺层上的过程使热塑性聚酰亚胺层的表面粗糙化,从而将铜层锚定到聚酰亚胺上,这意味着当导电材料沉积到照片中的间隙中时 形成能够牢固地固定在热塑性聚酰亚胺层上的导电体,可以作为柔性电路的电极使用。

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