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    TEMPORAL ATOMIC LAYER DEPOSITION PROCESSING CHAMBER
    1.
    发明申请
    TEMPORAL ATOMIC LAYER DEPOSITION PROCESSING CHAMBER 审中-公开

    公开(公告)号：WO2018106627A1

    公开(公告)日：2018-06-14

    申请号：PCT/US2017/064598

    申请日：2017-12-05

    Applicant: APPLIED MATERIALS, INC.

    Inventor： POLYAK, Alexander S. ,  YUDOVSKY, Joseph

    IPC: H01L21/67 ,  H01L21/683

    Abstract: A dual channel showerhead comprising a first plurality of channels formed in the back surface of the showerhead and extending from a first end to a second end, a second plurality of channels formed through the thickness of the showerhead and extending from a first end to a second end, a first end plenum in fluid connection with the second plurality of channels at the first end and a second end plenum in fluid connection with the second plurality of channels at the second end. Processing chambers including the dual channel showerhead and a blocker ring separating the edge ring from the pumping ring are also discussed.

    IN-SITU WAFER ROTATION FOR CAROUSEL PROCESSING CHAMBERS
    3.
    发明申请
    IN-SITU WAFER ROTATION FOR CAROUSEL PROCESSING CHAMBERS 审中-公开

    公开(公告)号：WO2019210135A1

    公开(公告)日：2019-10-31

    申请号：PCT/US2019/029291

    申请日：2019-04-26

    Applicant: APPLIED MATERIALS, INC.

    Inventor： YUDOVSKY, Joseph ,  POLYAK, Alexander S.

    IPC: H01L21/683 ,  H01L21/687 ,  H01L21/673 ,  H01L21/02

    Abstract: Apparatus and methods of processing a substrate in a carousel processing chamber are described. A wafer pedestal has a support surface with a support shaft extending below the wafer pedestal. A roller pinion wheel is below the wafer support around the support shaft. The roller pinion wheel has a plurality of spokes in contact with the support shaft and a wheel with a plurality of roller pinions spaced around the outer periphery of the wheel. Processing chambers incorporating the wafer pedestal and processing methods using the wafer pedestal for in-situ rotation are also described

    NOVEL METHOD FOR BALANCING GAS FLOW AMONG MULTIPLE CVD REACTORS
    5.
    发明申请
    NOVEL METHOD FOR BALANCING GAS FLOW AMONG MULTIPLE CVD REACTORS 审中-公开
    用于在多种CVD反应器之间平衡气体流动的新方法

    公开(公告)号：WO2013062778A1

    公开(公告)日：2013-05-02

    申请号：PCT/US2012/059758

    申请日：2012-10-11

    Applicant: APPLIED MATERIALS, INC. ,  OH, Jeonghoon ,  COX, Michael S. ,  POLYAK, Alexander S.

    Inventor： OH, Jeonghoon ,  COX, Michael S. ,  POLYAK, Alexander S.

    IPC: H01L21/205

    CPC classification number: F16K11/00 ,  C23C16/45561 ,  Y10T137/0324 ,  Y10T137/877

    Abstract: Gas supply systems and methods are disclosed for solar cell production using multiple parallel reactors. A first gas supply control system has a gas panel having a plurality of gas outlet lines, supplying a first main supply line having a main line mass flow meter measuring the combined total gas mass flow rate in the first main supply line. First, second and third branch lines supplied by the first main supply line each branch line having mass flow controller and one or more control loops established between the mass flow meter and the branch line mass flow controllers. In addition, a second gas supply control system may be coupled to the first gas supply control system to avoid mixing certain gases before they enter the respective reactors to which they are supplied.

    Abstract translation: 公开了使用多个并联反应器的太阳能电池生产的气体供应系统和方法。 第一气体供给控制系统具有具有多个气体出口管线的气体面板，供给具有测量第一主供应管线中的总气体质量流量的总线质量流量计的第一主供应管线。 第一，第二和第三分支线由第一主供应线提供，每个分支线具有质量流量控制器和在质量流量计和分支线质量流量控制器之间建立的一个或多个控制回路。 此外，第二气体供应控制系统可以耦合到第一气体供应控制系统，以避免在它们进入它们所供应的相应反应器之前混合某些气体。

    DEVICE TO INCREASE DEPOSITION UNIFORMITY IN SPATIAL ALD PROCESSING CHAMBER
    6.
    发明申请
    DEVICE TO INCREASE DEPOSITION UNIFORMITY IN SPATIAL ALD PROCESSING CHAMBER 审中-公开
    提高空间加工室沉积均匀性的装置

    公开(公告)号：WO2018009443A1

    公开(公告)日：2018-01-11

    申请号：PCT/US2017/040257

    申请日：2017-06-30

    Applicant: APPLIED MATERIALS, INC.

    Inventor： YUDOVSKY, Joseph ,  POLYAK, Alexander S.

    IPC: C23C16/458 ,  C23C16/455

    Abstract: Susceptor assemblies comprising a susceptor with a top surface with a plurality of recesses and a bottom surface are described. A heater is positioned below the susceptor to heat the susceptor. A shield is positioned between the bottom surface of the susceptor and the heater. The shield increases deposition uniformity across the susceptor.

    Abstract translation: 描述了包括具有带有多个凹槽和底面的顶面的基座的感受器组件。 加热器位于感受器下方以加热感受器。 屏蔽罩位于感受器的底面和加热器之间。 屏蔽层提高了整个感受器的沉积均匀性。

    APPARATUS FOR PREVENTION OF BACKSIDE DEPOSITION IN A SPATIAL ALD PROCESS CHAMBER
    7.
    发明申请
    APPARATUS FOR PREVENTION OF BACKSIDE DEPOSITION IN A SPATIAL ALD PROCESS CHAMBER 审中-公开
    用于防止在空间ALD过程室中背部沉积的装置

    公开(公告)号：WO2017189408A1

    公开(公告)日：2017-11-02

    申请号：PCT/US2017/029078

    申请日：2017-04-24

    Applicant: APPLIED MATERIALS, INC.

    Inventor： YUDOVSKY, Joseph ,  POLYAK, Alexander S.

    IPC: C23C16/458 ,  C23C16/455 ,  C23C16/44

    Abstract: Susceptor assemblies comprising a susceptor with a support post are described. The susceptor has a body with a top surface and a bottom surface. The top surface has a plurality of recesses therein. The support post is connected to the bottom surface of the susceptor to rotate the susceptor assembly. The support post includes support post vacuum plenum in fluid communication with a susceptor vacuum plenum in the body of the susceptor. The support post also includes a purge gas line extending through the support post to a purge gas plenum in the body of the susceptor.

    Abstract translation: 描述了包括具有支柱的感受器的感受器组件。 感受器具有具有顶面和底面的主体。 顶面在其中具有多个凹部。 支撑柱连接到感受器的底表面以旋转感受器组件。 支撑柱包括支撑柱真空室，其与感受器主体中的感受器真空室流体连通。 支柱还包括通过支柱延伸到感受器主体中的吹扫气体增压室的吹扫气体管线。

    LOADLOCK CONVEYOR WAFER HOLDER DESIGN
    8.
    发明申请
    LOADLOCK CONVEYOR WAFER HOLDER DESIGN 审中-公开
    LOADLOCK输送机水龙头设计

    公开(公告)号：WO2014163776A1

    公开(公告)日：2014-10-09

    申请号：PCT/US2014/016247

    申请日：2014-02-13

    Applicant: APPLIED MATERIALS, INC.

    Inventor： L'HEUREUX, James ,  POLYAK, Alexander S. ,  LIU, Yongsheng ,  LANE, Christopher T. ,  PONNEKANTI, Hari K. ,  ZHONG, Shengde

    IPC: H01L21/677 ,  B65G49/07

    CPC classification number: H01L21/67706 ,  H01L21/6776

    Abstract: Embodiments described herein generally relate to a dynamic load lock chamber that is adapted to transfer one or more substrates from a first region that is at first pressure to a second region that is at a second pressure. More specifically, embodiments relate to apparatuses for restraining substrates on a transport belt. In certain embodiments, wafer retention apparatuses are disposed on a flexible transport belt to maintain a position of a substrate on the transport belt while the substrate is transferred through the dynamic load lock chamber.

    Abstract translation: 本文描述的实施例通常涉及动态负载锁定室，其适于将一个或多个衬底从处于第一压力的第一区域转移到处于第二压力的第二区域。 更具体地，实施例涉及用于限制输送带上的基板的装置。 在某些实施例中，晶片保持装置设置在柔性输送带上，以在衬底通过动态负载锁定室传送时保持衬底在输送带上的位置。

    NON-METALLIC THERMAL CVD/ALD GAS INJECTOR AND PURGE SYSTEM
    9.
    发明申请
    NON-METALLIC THERMAL CVD/ALD GAS INJECTOR AND PURGE SYSTEM 审中-公开
    非金属热CVD / ALD气体喷射器和清洗系统

    公开(公告)号：WO2017117221A1

    公开(公告)日：2017-07-06

    申请号：PCT/US2016/068875

    申请日：2016-12-28

    Applicant: APPLIED MATERIALS, INC.

    Inventor： POLYAK, Alexander S. ,  YUDOVSKY, Joseph

    IPC: H01L21/02 ,  H01L21/205 ,  H01L21/324 ,  H01L21/67

    CPC classification number: C23C16/45544 ,  C23C16/4401 ,  C23C16/4408 ,  C23C16/45551 ,  C23C16/45563 ,  C23C16/45572 ,  C23C16/463 ,  H01L21/0262

    Abstract: Gas distribution assemblies and processing chambers using same are described. The gas distribution assemblies comprise a cooling plate with a quartz puck, a plurality of reactive gas sectors and a plurality of purge gas sectors suspended therefrom. The reactive gas sectors and purge gas sectors having a coaxial gas inlet with inner tubes and outer tubes, the inner tubes and outer tubes in fluid communication with different gas or vacuum ports in the front faces of the sectors. The sectors may be suspended from the cooling plate by a plurality of suspension rods comprising a metal rod body with an enlarged lower end positioned within a quartz frame with a silicon washer around the enlarged lower end.

    Abstract translation: 描述了气体分配组件和使用其的处理室。 气体分配组件包括具有石英圆盘的冷却板，多个反应气体区段和从其悬置的多个吹扫气区段。 反应性气体部分和吹扫气体部分具有带有内管和外管的同轴气体入口，内管和外管与部分前表面中的不同气体或真空端口流体连通。 这些扇区可以通过多个悬挂杆悬挂在冷却板上，所述悬挂杆包括金属杆体，其中放大的下端放置在石英框架内，并且在扩大的下端周围具有硅垫圈。

    ELECTRICAL CONTACT METHOD BETWEEN FIXED ELECTRODE AND REMOVABLE TARGET PIECE
    10.
    发明申请
    ELECTRICAL CONTACT METHOD BETWEEN FIXED ELECTRODE AND REMOVABLE TARGET PIECE 审中-公开
    固定电极与可拆卸目标件之间的电气接触方法

    公开(公告)号：WO2015108548A1

    公开(公告)日：2015-07-23

    申请号：PCT/US2014/017457

    申请日：2014-02-20

    Applicant: APPLIED MATERIALS, INC.

    Inventor： HAMMOND, Edward P., IV ,  RUHLAND, Eric ,  POLYAK, Alexander S. ,  TANAKA, Tsutomu ,  LANE, Christopher T. ,  L'HEUREUX, James L.

    IPC: C23C14/34

    CPC classification number: C23C14/3464 ,  C23C14/3407

    Abstract: Embodiments of the present invention relate to a plasma source that includes an electrode and a plurality of target pieces covering an outer side surface of the electrode. The target pieces are electrically coupled to the electrode by one or more springs or spring-like elements. Alternatively, the target pieces may be pushed against the outer surface of the electrode by clamps or brackets. Since the target pieces are not bonded to the electrode, replacing the target pieces becomes more convenient

    Abstract translation: 本发明的实施例涉及一种等离子体源，其包括电极和覆盖电极的外侧表面的多个靶片。 目标片通过一个或多个弹簧或弹簧状元件电耦合到电极。 或者，可以通过夹具或支架将目标片推压到电极的外表面。 由于目标片未粘接到电极上，所以更换目标片变得更加方便

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