IMPRINT METHOD AND APPARATUS
    10.
    发明申请
    IMPRINT METHOD AND APPARATUS 审中-公开
    印刷方法和装置

    公开(公告)号:WO2014208571A1

    公开(公告)日:2014-12-31

    申请号:PCT/JP2014/066753

    申请日:2014-06-18

    Abstract: An imprint method includes: placing a light-curable composition on a workpiece substrate (placement); bringing the light-curable composition and a mold into contact with each other an atmosphere.of a condensable gas (contact); aligning the mold and the workpiece substrate (alignment); irradiating the light-curable composition with light to obtain a light-cured composition (irradiation); and separating the light-cured composition and the mold from each other after the irradiation (release). The film thickness of the light-curable composition during the alignment is 20% or more greater than that of the light- cured composition after the release.

    Abstract translation: 压印方法包括:将光固化组合物放置在工件基板上(放置); 使可光固化组合物和模具彼此接触可冷凝气体(接触)的气氛; 对准模具和工件基板(对准); 用光照射光固化性组合物以获得光固化组合物(照射); 并且在照射(释放)之后将光固化组合物和模具彼此分离。 取向时的光固化性组合物的膜厚比脱模后的光固化性组合物的膜厚为20%以上。

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