Abstract:
The present invention provides a method for manufacturing a surface graft material including forming an insulator layer containing an insulating resin and a polymerization initiator on a substrate, and forming a graft polymer directly bonding to the surface of the insulator layer, a surface graft material manufactured by this method, a method for manufacturing an electrically conductive material including forming an insulator layer containing an insulating resin and a polymerization initiator on a substrate, forming a graft polymer directly bonding to the surface of the insulator layer, and forming an electrically conductive layer on the graft polymer, an electrically conductive material manufactured by this method, and an electrically conductive pattern material obtained by etching the electrically conductive material.
Abstract:
A method for applying a metal on a substrate comprises: a) applying a coating by treatment in a plasma, comprising a compound selected from alkanes up to 1 0 carbon atoms, and unsaturated monomers, and b l ) producing polymers on the surface of said substrate, said polymers comprising carboxylic groups and adsorbed ions of a second metal, reducing said ions to the second metal, or alternatively b2) producing polymers on the surface, bringing the surface of said substrate in contact with a dispersion of colloidal metal particles of at least one second metal, and c) depositing said first metal on said second metal. Advantages include that materials sensitive to for instance low pH or solvents can be coated. Substrates including glass, Si0 2 with very few of no abstractable hydrogen atoms as well as polymer materials containing halogen atoms can be coated with good adhesion.
Abstract:
The present invention is directed to a method for the adhesiveless deposition of metal, and especially copper, to the surface of polyimides and derivatives of polyimide. More specifically, the invention is .directed to the method for surface modification of polyimides and derivatives of polyimides by plasma graft co-polymerization with the vapor deposition of an appropriate functional monomer followed by subsequent deposition of metal of interest through a process of electroless and electrolytic plating. The so deposited metal-polyimide interface exhibit a T-peel adhesive strength in excess of 10 N/cm with polyimide films with a thickness of 75 .mu.m.
Abstract:
This invention concerns a process for modifying polymer surfaces by contacting the surface with a selected organic modifying agent while irradiating the surface with ultraviolet and/or visible light that can be absorbed by the modifier. Patterns of modified and unmodified surfaces can be produced. Polymers with modified surfaces are useful for absorbing biologically active molecules, composites, printing plates and electronics.
Abstract:
In using a photoinitiator and irradiation with UV-light suitable monomers can be selectively inoculated on the surface of a non conducting substrate in a distinct pattern. Metal ions are thereafter absorbed by these monomers and are reduced. To this pattern further conducting materials, e.g., metals, can thereafter be added in a conventional way. The method according to the invention comprises a fully additive method to produce a circuit board with high resolution and the production of functional components directly on a non conducting substrate.