Abstract:
Laser device characterized in that it comprises, as gain medium, a film of colloidal nanocrystals of semiconductor material, wherein said nanocrystals are two-dimensional nanocrystals suitable for forming quantum wells for confinement of the charge carriers in the nanocrystals and having a biexciton gain mechanism.
Abstract:
Light sources are disclosed. A disclosed light source includes a III-V based pump light source (170) that includes nitrogen and emits light at a first wavelength. The light source further includes a vertical cavity surface emitting laser (VCSEL) that converts at least a portion of the first wavelength light (174) emitted by the pump light surce (170) to at least a partially coherent light at a second wavelength (176). The VCSEL includes first and second mirrors (120, 160) that form an optical cavity for light at the second wavelength. The first mirror (120) is substantially reflective at the second wavelength and includes a first multilayer slfack. The second mirror (160) is substantially transmissive at the first wavelength and partially reflective and partially transmissive at the second wavelength. The second mirror includes a second multilayer stack. The VCSEL further includes a semiconductor multilayer stack (130) that is disposed between the first and second mirrors and converts at least a portion of the first wavelength light to the second wavelength light. The semiconductor multilayer stack (130) includes a quantum well that includes a Cd(Mg)ZnSe alloy.
Abstract:
A persistent p-type group II-VI semiconductor material is disclosed containing atoms of group II elements, atoms of group VI elements, and a p-type dopant which replaces atoms of the group VI element in the semiconductor material. The p-type dopant has a negative oxidation state. The p-type dopant causes formation of vacancies of atoms of the group II element in the semiconductor material. Fabrication methods and solid state devices containing the group II-VI semiconductor material are disclosed.
Abstract:
A blue, green or blue-green stripe-geometry II/VI semiconductor injection laser utilizing a Zn1-uCduSe active layer (quantum well) having Zn1-uMgxSySe1-y cladding layers and ZnSxSe1-z guiding layers is fabricated on a GaAs substrate. The stripe-geometry configuration is obtained by ion implanting a dopant such as Nitrogen or Oxygen into the structure to form blocking layer portions of higher resistivity in the second cladding layer and the second guiding cladding layer. These blocking layer portions are positioned on both sides of, and thereby define, a stripe-shaped lateral confinement region of lower resistivity in the second cladding layer and the second guiding cladding layer.
Abstract:
A II-VI compound semiconductor laser diode (10) is formed from overlaying layers of material including an n-type single crystal semiconductor substrate (12), adjacent n-type and p-type guiding lasers (14) and (16) of II-VI semiconductor forming a pn junction, a quantum well active layer (18) of II-VI semiconductor between the guiding layers (14) and (16), first electrode (32) opposite the substrate (12) from the n-type guiding layer (14), and a second electrode (30) opposite the p-type guiding layer (16) from the quantum well layer (18). Electrode layer (30) is characterized by a Fermi energy. A p-type ohmic contact layer (26) is doped, with shallow acceptors having a shallow acceptor energy, to a net acceptor concentration of at least 1 x 1017 cm-3, and includes sufficient deep energy states between the shallow acceptor energy and the electrode layer Fermi energy to enable cascade tunneling by charge carriers.
Abstract:
Nanoribbons 40 and nanowires 38 having diameters less than the wavelength of light, as shown for example in Fig. 7B, are used in the formation of optical circuits and devices. Such nano structures function as subwavelength optical waveguides which form a fundamental building block for optical integration. The extraordinary length, flexibility and strength of these structures enable their manipulation on surfaces, including the precise positioning and optical linking of nanoribbon/wire waveguides 40, 38 and other nanoribbon/wire elements to form optical networks and devices. In addition, such structures provide for waveguiding in liquids, enabling them to further be used in other applications such as optical probes and sensors.
Abstract:
A semiconductor laser includes a multilayer semiconductor laser heterostructure including at least one active layer of a II-VI semiconductor material (26) and is optically pumped by one or more indium gallium nitride (InGaN) diode-lasers (38). Group II elements in the II-VI semiconductor material are zinc, cadmium, magnesium, beryllium, strontium, and barium. Group VI elements in the II-VI semiconductor material are Sulfur, Selenium, and Tellurium. In one example of the laser an edge emitting heterostructure includes two active layers of zinc cadmium selenide, two waveguide layers of zinc magnesium sulfoselenide, and two cladding layers, also of zinc magnesium sulfoselenide. Proportions of elements in the cladding layer material and the waveguide layer material are selected such that the waveguide layer material has a higher bandgap than the material of the waveguide layers. In another example, a two dimensional array of InGaN diode-lasers is arranged to optically pump a one-dimensional array of II-VI edge-emitting heterostructure lasers.
Abstract:
The invention relates to an optoelectronic semiconductor component comprising a radiation-emitting active series of layers to which at least one poorly dopable semiconductor layer of a first conductivity type is assigned. A first highly doped degenerate transition layer of the first conductivity type and a second highly doped degenerate transition layer of a second conductivity type contrasting with the first conductivity type are arranged between the poorly dopable semiconductor layer and a contact layer of the semiconductor body assigned to said semiconductor layer.
Abstract:
Known semiconductor structures emitting blue light have a limited efficiency. It is the purpose of the present invention to obtain such a structure which is suitable for diodes and diode lasers in particular and which has an improved efficiency. According to the invention such a semiconductor structure comprises a first layer of a p-type II-VI compound of the formula: ZnxQ1-xSySe1-y wherein Q is an element selected from the group consisting of Mg, Cd and Mn, 0.5 « x « 1 and 0 « y « 1 and a substrate X of p-type GaAs, said first layer and said substrate being separated by a series of thin epitaxial undoped or p-doped layers of a total thickness of up to 2 νm and each layer of a thickness of 2 to 200 nm contacting opposing surfaces of said substrate and said first layer. Said series of layers comprise: a layer of In0.5Al0.5P contacting the opposing surface of said first layer, a layer of a compound selected from the group consisting of In0.5Ga0.5P and AlxGa1-xAs wherein x = 0.1 - 0.3 contacting the opposing surface of said substrate, a layer of In0.5Ga0.5P contacting said layer of AlxGa1-xAs and at least one layer of In0.5AlzGa0.5-zP wherein 0