Charged particle source with integrated energy filter
    23.
    发明公开
    Charged particle source with integrated energy filter 审中-公开
    Quellefürgeladene Teilchen mit integriertem Energiefilter

    公开(公告)号:EP2128885A1

    公开(公告)日:2009-12-02

    申请号:EP08156906.3

    申请日:2008-05-26

    申请人: FEI COMPANY

    摘要: The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 103 eccentrically through a lens 107. As a result of this, energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit 109 in an energy selecting diaphragm 108, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam 113 will have a reduced energy spread. Deflection unit 112 deflects the beam to the optical axis 101. One can also elect to deflect a beam 105 going through the middle of the lens toward the optical axis and having, for example, greater current.
    The energy dispersed spot is imaged on the slit by a deflector 111. When positioning the energy dispersed spot on the slit, central beam 105 is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm. Hereby reflections and contamination resulting from this beam in the region after the diaphragm are avoided. Also electron-electron interaction resulting from the electrons from the central beam interacting with the energy filtered beam in the area of deflector 112 is avoided.

    摘要翻译: 本发明描述了发生能量选择的粒子源。 通过透过透镜107偏心地发送带电粒子103的束来进行能量选择。其结果是,由透镜形成的图像中会发生能量分散。 通过将该图像投影到能量选择膜108中的狭缝109上,可以仅允许能量谱的有限部分中的粒子通过。 因此,通过的梁113将具有减小的能量扩展。 偏转单元112将光束偏转到光轴101.还可以选择将穿过透镜中间的光束105偏转到光轴并具有例如更大的电流。 能量分散点通过偏转器111在狭缝上成像。当将能量分散点定位在狭缝上时,中心光束105从轴线偏转到由能量选择膜片停止的程度。 因此避免了在隔膜之后的区域中由该光束产生的反射和污染。 避免了在偏转器112的区域中与来自中心光束的电子与能量过滤光束相互作用的电子 - 电子相互作用。

    Corrector for the correction of chromatic aberrations in a particle-optical apparatus
    24.
    发明公开
    Corrector for the correction of chromatic aberrations in a particle-optical apparatus 审中-公开
    Korrektor zur Korrektion von chromatischen Aberrationen in einem korpuskularoptiachen Apparat

    公开(公告)号:EP1783811A2

    公开(公告)日:2007-05-09

    申请号:EP05111064.1

    申请日:2005-11-22

    申请人: FEI COMPANY

    IPC分类号: H01J37/153 H01J37/26

    摘要: The invention describes a corrector for the correction of chromatic aberrations in a particle lens, such as used in a SEM or a TEM. So as to reduce the stability demands on the power supplies of such a corrector, the energy with which the particle beam passes through the corrector is lower than the energy with which the beam passes through the lens to be corrected.

    摘要翻译: 本发明描述了用于校正像在SEM或TEM中使用的粒子透镜中的色差的校正器。 为了降低对这种校正器的电源的稳定性要求,粒子束通过校正器的能量低于光束通过透镜的能量,以被校正。

    ELECTRON BEAM DEVICE
    25.
    发明公开

    公开(公告)号:EP4170693A1

    公开(公告)日:2023-04-26

    申请号:EP22212478.6

    申请日:2021-03-25

    申请人: FEI Company

    IPC分类号: H01J37/04 H01J37/26

    摘要: Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.

    MAGNETIC FIELD FREE SAMPLE PLANE FOR CHARGED PARTICLE MICROSCOPE

    公开(公告)号:EP4020519A1

    公开(公告)日:2022-06-29

    申请号:EP21214236.8

    申请日:2021-12-14

    申请人: FEI Company

    IPC分类号: H01J37/141

    摘要: An adjustable magnetic field free objective lens for a charged particle microscope is disclosed herein. An example charged particle microscope at least includes first (220) and second (222) optical elements arranged on opposing sides of a sample plane (208), a third optical element (244, 246, 250) arranged around the sample plane, and a controller coupled to control the first, second and third optical elements. The controller coupled to excite the first and second optical elements to generate first and second magnetic lenses, the first and second magnetic lenses formed on opposing sides of the sample plane and oriented in the same direction, and excite the third optical element to generate a third magnetic lens at the sample plane that is oriented in an opposite direction, where a ratio of the excitation of the third optical element to the excitation of the first and second optical elements adjusts a magnetic field at the sample plane.

    CORRECTOR TRANSFER OPTICS FOR LORENTZ EM
    28.
    发明公开

    公开(公告)号:EP3770946A1

    公开(公告)日:2021-01-27

    申请号:EP20185617.6

    申请日:2020-07-14

    申请人: FEI Company

    IPC分类号: H01J37/26 H01J37/153

    摘要: Charged particle microscopes having an optimized performance across multiple modes of operation are disclosed herein. More specifically, the disclosure includes improved charged particle microscopes that increase and/or optimize the performance of the microscope in both a standard mode of operation and a Lorentz mode of operation. The charged particle microscopes include an extra transfer lens between a corrector and the traditional transfer lens which allows for the flexibility to optimize performance in both the standard mode of operation and the Lorentz mode of operation. For example, in a Lorentz mode of operation, improved charged particle microscope according to the present disclosure can be used to tune the C 5 aberration, while hardly affecting defocus and/or C s aberrations. Additionally, the inclusion of the extra transfer lens provides the charged particle microscopes disclosed herein with an extra degree of freedom with which to zero defocus and total C s and C 5 .

    Beam pulsing device for use in charged-particle microscopy
    29.
    发明公开
    Beam pulsing device for use in charged-particle microscopy 审中-公开
    Strahlpuls-Erzeuger zur Verwendung in der Teilchenstrahlmikroskopie

    公开(公告)号:EP2722865A1

    公开(公告)日:2014-04-23

    申请号:EP12189369.7

    申请日:2012-10-22

    申请人: FEI COMPANY

    IPC分类号: H01J37/04 H01J37/28

    摘要: A charged-particle microscope comprising:
    - A charged-particle source, for producing a beam of charged particles that propagates along a particle-optical axis;
    - A sample holder, for holding and positioning a sample;
    - A charged-particle lens system, for directing said beam onto a sample held on the sample holder;
    - A detector, for detecting radiation emanating from the sample as a result of its interaction with the beam;
    - A beam pulsing device, for causing the beam to repeatedly switch on and off so as to produce a pulsed beam,

    wherein the beam pulsing device comprises a unitary resonant cavity disposed about said particle-optical axis and having an entrance aperture and an exit aperture for the beam, which resonant cavity is embodied to simultaneously produce a first oscillatory deflection of the beam at a first frequency in a first direction and a second oscillatory deflection of the beam at a second, different frequency in a second, different direction. The resonant cavity may have an elongated (e.g. rectangular or elliptical) cross-section, with a long axis parallel to said first direction and a short axis parallel to said second direction.

    摘要翻译: 一种带电粒子显微镜,包括: - 带电粒子源,用于产生沿着粒子 - 光轴传播的带电粒子束; - 样品架,用于固定和定位样品; - 带电粒子透镜系统,用于将所述光束引导到保持在样品保持器上的样品上; - 检测器,用于检测由于其与梁的相互作用而从样品发出的辐射; 一种光束脉冲装置,用于使光束反复打开和关闭以产生脉冲光束,其中光束脉冲装置包括围绕所述粒子 - 光轴设置并具有入射孔和出射孔的单一谐振腔 对于所述光束,所述谐振腔被实现为在第一方向上以第一频率同时产生所述光束的第一振荡偏转和所述光束在第二不同方向上的第二不同频率的第二振荡偏转。 谐振腔可以具有细长(例如矩形或椭圆形)横截面,其长轴平行于所述第一方向,短轴与所述第二方向平行。

    Charged-particle apparatus equipped with improved Wien-type Cc corrector
    30.
    发明公开
    Charged-particle apparatus equipped with improved Wien-type Cc corrector 审中-公开
    Mit motictem Cc-Korrektor vom Wien-Typ ausgestattete Ladungsteilchenvorrichtung

    公开(公告)号:EP2674959A1

    公开(公告)日:2013-12-18

    申请号:EP12171725.0

    申请日:2012-06-13

    申请人: FEI Company

    IPC分类号: H01J37/153

    CPC分类号: H01J37/153 H01J2237/1534

    摘要: The invention relates to a charged-particle apparatus equipped with improved Wien-type C c corrector. A charged particle apparatus (TEM, STEM, SEM) with a double-focusing ExB filter as a corrector for an objective lens is known to the person skilled in the art. Inventors realized an improved corrector by introducing a drift space in the middle of the corrector, thereby dividing the corrector in two, preferably identical, modules. This results in a corrector with, for identical excitation, a larger negative C c and enables positioning an energy selective slit in the mid-plane, thus enabling the corrector to simultaneously act as an energy filter. A simulation of two ExB modules with a length of 25 mm, divided by a drift space of 10 mm, is discussed.

    摘要翻译: 本发明涉及装备有改进的维恩型C c校正器的带电粒子装置。 具有作为物镜的校正器的双重聚焦ExB滤光器的带电粒子装置(TEM,STEM,SEM)是本领域技术人员已知的。 发明人通过在校正器的中间引入漂移空间来实现改进的校正器,从而将校正器分成两个,优选相同的模块。 这导致校正器具有相同的激励,具有较大的负C c并且使得能够在中间平面中定位能量选择性狭缝,从而使得校正器能够同时用作能量过滤器。 讨论了长度为25毫米的两个ExB模块与10毫米的漂移空间的模拟。