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71.发明公开Apparatus and method for automatically maintaining an electroless plating bath 失效装置和方法，用于自动保持的无电镀浴。
公开(公告)号：EP0180713A1
公开(公告)日：1986-05-14
申请号：EP85108493.9
申请日：1985-07-09
Applicant: SHIPLEY COMPANY INC.
Inventor： Cardin, William J. , Gulla, Michael , Newton, Charles L.
CPC classification number: C23C18/1683 , C23C18/1617 , C23C18/36 , C23C18/405
Abstract: A controller for measuring the concentration of consumable ingredients in a plating solution characterized by the use of a plating poison introduced into the analysate stream to prevent autocatalytic decomposition and deposition of copper onto the walls and sensors of the controller.
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公开(公告)号：EP0062733B1
公开(公告)日：1986-01-02
申请号：EP82100579.0
申请日：1982-01-28
Applicant: SHIPLEY COMPANY INC.
Inventor： Cawston, John D. , Becker, Paul E. Jr.
IPC: G03F7/26
CPC classification number: G03F7/322
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公开(公告)号：EP0114986A1
公开(公告)日：1984-08-08
申请号：EP83112410.2
申请日：1983-12-09
Applicant: SHIPLEY COMPANY INC.
Inventor： Valayil, Silvester P. , Aronson, Vita
IPC: C23C18/34
CPC classification number: C23C18/34
Abstract: An electroless nickel plating composition characterized by the addition of a polymer formed from a 2-acrylamido or 2-methacrylamido alkyl sulfonic acid monomer. The polymer additive increases the rate of deposition from solution, and to a minor extent, improves the appearance of a nickel deposited from the solution.
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74.发明公开Metal ion-free photoresist developer composition 失效Metallionenfreie EntwicklerzusammensetzungfürPhotoresist。
公开(公告)号：EP0062733A1
公开(公告)日：1982-10-20
申请号：EP82100579.0
申请日：1982-01-28
Applicant: SHIPLEY COMPANY INC.
Inventor： Cawston, John D. , Becker, Paul E. Jr.
IPC: G03F7/26
CPC classification number: G03F7/322
Abstract: An aqueous metal ion-free developer composition for developing photoresists comprising a metal ion-free alkali and a metal ion-free surfactant that is quaternary ammonium compound. The developer permits a reduction of from 40-50% in the energy necessary to expose the photoresist without deleterious effect on image quality and image resolution.
Abstract translation: 一种用于显影光致抗蚀剂的无金属离子的显影剂组合物，其包含不含金属离子的碱和作为季铵化合物的无金属离子的表面活性剂。 显影剂允许从曝光光刻胶所需的能量减少40-50％，而不会对图像质量和图像分辨率产生有害影响。
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公开(公告)号：EP0047895A2
公开(公告)日：1982-03-24
申请号：EP81106690.1
申请日：1981-08-28
Applicant: SHIPLEY COMPANY INC.
Inventor： Martin, Robert L. , Gibson, George A.
Abstract: A novel stripping composition and method of using same is disclosed, which stripping composition comprises:
a) a solvent comprising one or more compounds of formula (I)
wherein R and R' are each selected independently from straight and branched alkyl having 1 to 3 carbon atoms, and phenyl, each of which phenyl is optionally substituted with one or more hydroxyl, or R and R' together are alkylene of 3 to 6 carbon atoms; and
b) a suitable organosulfonic acid.
The stripping composition is especially useful for stripping positive photoresists faster and at lower temperatures than known strippers. A preferred composition comprises 10% by weight para-toluene sulfonic acid in dimethyl sulfoxide.-
Patent Agency Ranking
公开(公告)号：EP0763781B2
公开(公告)日：2008-03-12
申请号：EP96116990.1
申请日：1992-10-22
Applicant: SHIPLEY COMPANY INC.
Inventor： Thackeray, James W. , Orsula, George W.
IPC: G03F7/09
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公开(公告)号：EP0565858B1
公开(公告)日：1999-09-01
申请号：EP93103750.1
申请日：1993-03-09
Applicant: SHIPLEY COMPANY INC.
Inventor： Knudsen, Philip D. , Shipley, Charles R. , Pai, Daniel Y.
IPC: G03F7/033
CPC classification number: G03F7/038 , G03F7/0045 , H05K3/287 , Y02P20/582 , Y10T428/24917
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公开(公告)号：EP0423446B1
公开(公告)日：1998-03-04
申请号：EP90114949.2
申请日：1990-08-03
Applicant: SHIPLEY COMPANY INC.
Inventor： Lamola, Angelo A. , Calabrese, Gary , Sinta, Roger
IPC: G03F7/038
CPC classification number: G03F7/0045 , G03F7/038
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79.发明授权Photoresist pattern fabrication employing chemically amplified metalized material 失效一种用于生产使用化学放大和金属化材料光致抗蚀剂结构的过程
公开(公告)号：EP0352739B1
公开(公告)日：1995-12-27
申请号：EP89113699.6
申请日：1989-07-25
Applicant: SHIPLEY COMPANY INC.
Inventor： Thackeray, James W. , Fine, Stephen A.
CPC classification number: G03F7/022 , G03F7/0041 , G03F7/0755 , G03F7/09 , G03F7/265
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公开(公告)号：EP0261424B1
公开(公告)日：1994-07-27
申请号：EP87112337.8
申请日：1987-08-25
Applicant: SHIPLEY COMPANY INC.
Inventor： Wilkinson, Gary Morgan , Deckert, Cheryl Ann , Doubrava, Jeffrey J.
CPC classification number: H05K3/422 , C23C18/28 , H05K3/0055 , H05K3/383 , H05K3/42 , H05K3/427 , H05K2203/0796 , H05K2203/122
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