公开(公告)号：EP3326222A1

公开(公告)日：2018-05-30

申请号：EP16735710.2

申请日：2016-06-29

Applicant: Centre National de la Recherche Scientifique ,  Université de Bordeaux ,  Institut Polytechnique de Bordeaux

Inventor： MANO, Nicolas ,  RECULUSA, Stéphane ,  RAVAINE, Serge ,  KARAJIC, Aleksandar ,  KUHN, Alexander

IPC: H01M4/04 ,  H01M4/1395 ,  H01M4/38 ,  H01M4/76 ,  H01M10/04

CPC classification number: H01M4/0452 ,  A61B5/686 ,  A61B2560/0214 ,  C25D1/006 ,  C25D1/02 ,  C25D1/08 ,  C25D3/12 ,  C25D3/46 ,  C25D3/48 ,  C25D5/12 ,  C25D7/0607 ,  H01M4/0402 ,  H01M4/12 ,  H01M4/1395 ,  H01M4/38 ,  H01M4/661 ,  H01M4/765 ,  H01M4/8626 ,  H01M4/8853 ,  H01M4/9041 ,  H01M6/02 ,  H01M8/16 ,  H01M10/0436 ,  H01M10/38 ,  H01M2004/021 ,  H01M2004/025 ,  H01M2010/0495 ,  H01M2250/30 ,  Y02B90/18

Abstract: The invention relates to a method for manufacturing a miniaturized electrochemical cell and to a miniaturized electrochemical cell. The method of the invention comprises preparing at least one inner electrode (1) made of an electron conducting or semi-conducting material M 1 , providing a hollow support (4) made of an electrically insulating material M 6 , this support (4) having at least one internal hollow channel, depositing on the external surface of the support (4) a layer of an electrically conducting material M 2 , forming a template (5) of colloidal particles made of an electrically insulating material M 3 , on the layer of electrically conducting material M 2 , depositing a layer of an electrically conducting material M 4 on the layer of electrically conducting material M 2 , depositing a layer L 1 of an electron conducting or semi-conducting material M 5 on the layer of electrically conducting material M 4 , introducing the at least one inner electrode (1) into the at least one internal hollow channel of the obtained structure, stabilizing the obtained structure at its two open ends with an electrically insulating material M 7 , removing the materials M 2 , M 3 , M 4 and M 6 . The invention finds applications in the field of electrochemistry, in particular.

公开(公告)号：EP3214207A1

公开(公告)日：2017-09-06

申请号：EP16157979.2

申请日：2016-03-01

Applicant: BASF SE ,  Karlsruher Institut für Technologie

Inventor： Sommer, Heino ,  Al-Salman, Rihab ,  Brezesinski, Torsten

IPC: C25D3/66 ,  C25D3/54

CPC classification number: C25D3/665 ,  C25D1/006 ,  C25D1/04 ,  C25D3/54

Abstract: The present invention relates to a process for producing antimony nanowires comprising at least the process step of electrochemically depositing antimony directly onto at least one surface of an electrode from a solution comprising at least one antimony compound (A), at least one gallium compound (B) and at least one ionic liquid (C).

Abstract translation: 本发明涉及一种生产锑纳米线的方法，所述方法至少包括如下工艺步骤：从包含至少一种锑化合物（A），至少一种镓化合物（B）和至少一种镓化合物（B）的溶液将锑直接电化学沉积到电极的至少一个表面上， ）和至少一种离子液体（C）。

公开(公告)号：EP2602361A4

公开(公告)日：2016-11-16

申请号：EP11814061

申请日：2011-06-13

Applicant: UNIV XIAMEN

Inventor： SUN SHIGANG ,  HUANG RUI ,  CHEN SHENG-PEI

IPC: C25C5/02 ,  B01J23/38 ,  B01J23/70 ,  C25C7/06

CPC classification number: B01J37/348 ,  B01J21/18 ,  B01J21/185 ,  B01J23/42 ,  B01J23/44 ,  B01J23/462 ,  B01J23/464 ,  B01J23/468 ,  B01J23/50 ,  B01J23/52 ,  B01J23/72 ,  B01J23/745 ,  B01J23/75 ,  B01J23/755 ,  B01J35/0013 ,  B01J35/002 ,  B01J35/006 ,  B82Y30/00 ,  C25C5/02 ,  C25C7/00 ,  C25C7/06 ,  C25D1/006 ,  C25D1/04 ,  C25D3/50 ,  C25D5/18 ,  C25D17/00 ,  C25D17/02

Abstract: The present disclousure relates to a surface structure control and preparation process for a metal nanocatalyst involving a metal nanocatalyst. The present disclousure provides a surface structure control and continuous preparation system for a metal nanocatalyst, a metal nanocatalyst having an open surface structure and high surface energy, and a surface structure control and a preparation process thereof. The system is provided with a nucleation electrolytic cell, a distribution valve, at least two growth electrolytic cells, with two ends of the distribution valve being connected to an output port of the nucleation electrolytic cell and to input port of all the growth electrolytic cells, respectively. The metal nanocatalyst having an open surface structure is a single metal nanoscale crystal and has a high density of terrace atoms or active sites on the surface thereof. The precursor reaction solution is injected into the nucleation electrolytic cell, and a nucleation programmed potential is applied to one pair of electrodes in the nucleation electrolytic cell to obtain a nucleation reaction solution having the metal crystal nucleus formed, which is conveyed to the growth electrolytic cell through the distribution valve, a growth programmed potential is applied to one pair of electrodes in the growth electrolytic cell to obtain a metal nanoscale crystal having an open surface structure; controlling the growth time to obtain a reaction solution, and collecting a product by centrifugation.

公开(公告)号：EP3040450A1

公开(公告)日：2016-07-06

申请号：EP14839465.3

申请日：2014-08-21

Applicant: Fujifilm Corporation

Inventor： YAMASHITA Kosuke

IPC: C25D1/00 ,  C25D1/10 ,  C25D11/04 ,  C25D11/24

CPC classification number: C25D1/20 ,  C25D1/006 ,  C25D1/10 ,  C25D3/38 ,  C25D11/045 ,  C25D11/20 ,  C25D11/24 ,  G01R1/06 ,  H01L24/27 ,  H01R12/7076 ,  H01R2201/20 ,  H05K3/32 ,  H05K2203/162

Abstract: An object of the present invention is to provide a method for manufacturing a metal-filled microstructure, capable of easily filling micropores with metal and suppressing the generation of residual stress caused by metal filling. A method for manufacturing a metal-filled microstructure according to the present invention includes: an anodic oxidation treatment step of anodically oxidizing a single surface of an aluminum substrate to form an anodic oxidation film on the single surface of the aluminum substrate, the anodic oxidation film including micropores, which are present in a thickness direction, and a barrier layer which is present in a bottom portion of the micropores; a barrier layer removal step of removing the barrier layer of the anodic oxidation film after the anodic oxidation treatment step; a metal filling step of filling the inside of the micropores with metal through an electroplating treatment after the barrier layer removal step; and a substrate removal step of removing the aluminum substrate to obtain a metal-filled microstructure after the metal filling step.

Abstract translation: 本发明的一个目的是提供一种用于制造金属填充微结构的方法，其能够容易地用金属填充微孔并且抑制由金属填充引起的残余应力的产生。 根据本发明的用于制造金属填充微结构的方法包括：阳极氧化处理步骤，阳极氧化铝基板的单个表面以在铝基板的单个表面上形成阳极氧化膜，阳极氧化膜 包括存在于厚度方向上的微孔和存在于微孔底部中的阻挡层; 在阳极氧化处理步骤之后去除阳极氧化膜的阻挡层的阻挡层去除步骤; 金属填充步骤，在阻挡层去除步骤之后通过电镀处理用金属填充微孔的内部; 和在金属填充步骤之后除去铝基板以获得金属填充的微结构的基板去除步骤。

公开(公告)号：EP2719003A4

公开(公告)日：2014-12-03

申请号：EP12796057

申请日：2012-06-02

Applicant: UNIV WASHINGTON STATE RES FDN

Inventor： NORTON M GRANT ,  SAHAYM UTTARA

IPC: H01M4/1395 ,  C25D5/18 ,  C25D21/12 ,  H01M4/02 ,  H01M4/04 ,  H01M4/134 ,  H01M4/38 ,  H01M4/40 ,  H01M4/42 ,  H01M10/0525

CPC classification number: H01M4/387 ,  C25D1/003 ,  C25D1/006 ,  C25D3/30 ,  C25D5/18 ,  C25D21/12 ,  H01M4/02 ,  H01M4/04 ,  H01M4/0438 ,  H01M4/0452 ,  H01M4/0461 ,  H01M4/134 ,  H01M4/1395 ,  H01M4/38 ,  H01M4/66 ,  H01M4/8605 ,  H01M4/8626 ,  H01M10/04 ,  H01M10/0525 ,  H01M2004/021

Abstract: Several embodiments related to batteries having electrodes with nanostructures, compositions of such nanostructures, and associated methods of making such electrodes are disclosed herein. In one embodiment, a method for producing an anode suitable for a lithium-ion battery comprising preparing a surface of a substrate material and forming a plurality of conductive nanostructures on the surface of the substrate material via electrodeposition without using a template.

Abstract translation: 本文公开了与具有纳米结构的电极，这种纳米结构的组成以及制造这种电极的相关方法的电池有关的几个实施方案。 在一个实施方案中，一种用于生产适用于锂离子电池的阳极的方法，包括通过电沉积而不使用模板来制备衬底材料的表面并在衬底材料的表面上形成多个导电纳米结构。

公开(公告)号：EP2719003A2

公开(公告)日：2014-04-16

申请号：EP12796057.3

申请日：2012-06-02

Applicant: Washington State University Research Foundation

Inventor： NORTON, M., Grant ,  SAHAYM, Uttara

IPC: H01M4/1395 ,  H01M4/38 ,  H01M10/0525 ,  B82B3/00 ,  H01M4/134

CPC classification number: H01M4/387 ,  C25D1/003 ,  C25D1/006 ,  C25D3/30 ,  C25D5/18 ,  C25D21/12 ,  H01M4/02 ,  H01M4/04 ,  H01M4/0438 ,  H01M4/0452 ,  H01M4/0461 ,  H01M4/134 ,  H01M4/1395 ,  H01M4/38 ,  H01M4/66 ,  H01M4/8605 ,  H01M4/8626 ,  H01M10/04 ,  H01M10/0525 ,  H01M2004/021

Abstract: Several embodiments related to batteries having electrodes with nanostructures, compositions of such nanostructures, and associated methods of making such electrodes are disclosed herein. In one embodiment, a method for producing an anode suitable for a lithium-ion battery comprising preparing a surface of a substrate material and forming a plurality of conductive nanostructures on the surface of the substrate material via electrodeposition without using a template.

公开(公告)号：EP2572241A1

公开(公告)日：2013-03-27

申请号：EP11783880.5

申请日：2011-05-23

Applicant: The Regents of The University of California

Inventor： MYUNG, Nosang, Vincent ,  HANGARTER, Carlos, Maldonado

IPC: G03F1/00 ,  G03F7/00

CPC classification number: C25D1/006 ,  B22F1/0025 ,  B82B3/0033 ,  B82Y30/00 ,  B82Y40/00 ,  C22C1/0433 ,  C22C1/0466 ,  C23C18/1635 ,  C23C18/54 ,  C25D1/04 ,  C25D3/12 ,  C25D3/48 ,  Y10T428/12889

Abstract: A method for fabricating nanostructures, which includes the steps of forming a multi-segmented nanowire; and performing a galvanic displacement reaction on the multi-segmented nanowire. The method utilizes template directed electrodeposition to fabricate nanowires with alternating layers of sacrificial/noble metal, enabling a new level of control over particle spacing, aspect ratio, and composition. Moreover, by exploiting the redox potential dependent reaction of galvanic displacement, nanopeapod materials can be extended (semiconductor/metal, p-type/n-type, metal/metal, ferromagnetic/nonmagnetic, etc.) beyond the fundamental metal/metal-oxide nanopeapods synthesized by high temperature techniques. In accordance with an exemplary embodiment. Co/Au and Ni/Au multisegmented nanowires were used to create Te/Au nanopeapods by galvanic displacement, producing Te nanotubes and nanowires with embedded Au particles, respectively.

公开(公告)号：EP2562851A1

公开(公告)日：2013-02-27

申请号：EP11178549.9

申请日：2011-08-23

Applicant: Ürgen, Mustafa K. ,  Timur, Servet I. ,  Kazmanli, Kürsat M. ,  Solak, Nuri ,  Bayata, Fatma

Inventor： Ürgen, Mustafa K. ,  Timur, Servet I. ,  Kazmanli, Kürsat M. ,  Solak, Nuri ,  Bayata, Fatma

IPC: H01M4/04 ,  C25D11/12

CPC classification number: H01G11/86 ,  C25D1/006 ,  C25D3/12 ,  C25D11/045 ,  C25D11/08 ,  C25D11/12 ,  C25D11/24 ,  H01G11/26 ,  H01G11/46 ,  H01M4/0442 ,  H01M4/0452 ,  H01M4/42 ,  H01M4/661 ,  H01M4/80 ,  Y02E60/13

Abstract: The present invention is directed to a cost effective and quick method for producing nanowire electrode materials which eliminates the drawbacks of prior art by way of forming nanowires prior to formation of a support layer. In more detail, the method of the present invention comprises etching of a substrate material, such as alumina, to form a porous nano-pattern, etching of the pore bottoms and simultaneously coating the pore bottom sections with an etchant solution such as a zincate solution, and electroplating a transition metal to said pores until nanowires are filled within the pores and a thick metallic film is formed on the nanowire structure such that this metallic layer function as a support material for the said nanowires. The substrate is subsequently removed leaving behind vertically aligned free standing nanowires with a self-formed electroactive layer on their surfaces

Abstract translation: 本发明涉及用于制备纳米线电极材料的成本有效和快速的方法，其通过在形成支撑层之前形成纳米线而消除了现有技术的缺点。 更详细地，本发明的方法包括蚀刻诸如氧化铝的基底材料以形成多孔纳米图案，蚀刻孔底部并同时用诸如锌酸盐溶液的蚀刻剂溶液涂覆孔底部 并且将过渡金属电镀到所述孔，直到纳米线填充在孔内，并且在纳米线结构上形成厚的金属膜，使得该金属层用作所述纳米线的支撑材料。 随后去除衬底，留下在其表面上具有自形电活性层的垂直取向的自立式纳米线

公开(公告)号：EP2543495A1

公开(公告)日：2013-01-09

申请号：EP12006895.2

申请日：2008-11-19

Applicant: Sharp Kabushiki Kaisha

Inventor： Yamada, Nobuaki ,  Fujii, Akiyoshi ,  Taguchi, Tokio ,  Hayashi, Hidekazu

IPC: B29C59/04 ,  B29C33/38 ,  B29C33/42 ,  G02B1/11 ,  B29L11/00 ,  G03F7/00 ,  C25D11/02

CPC classification number: G02B1/118 ,  B29C33/3842 ,  B29C33/424 ,  B29C59/046 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  C25D1/006 ,  C25D11/12 ,  G03F7/0002 ,  Y10T428/24355 ,  Y10T428/24364 ,  Y10T428/24479 ,  Y10T428/24488 ,  Y10T428/24612

Abstract: A production method of a mold roller for a roller nanoimprint apparatus for producing an optical element,the optical element comprising a nanostructure film including recesses and protrusions in nanometer size formed continuously on a surface of the nanostructure film,the nanostructure film including a nanostructure-free region free from the recesses and protrusions in nanometer size in both ends along a longitudinal direction of the nanostructure film,the nanostructure film further including a moth-eye structure including a plurality of conical protrusions each having a size smaller than a wavelength of visible light, andthe production method comprising the steps of:anodizing an aluminum tube in which a region other than a region where a concave pattern for forming the plurality of conical protrusions is to be formed is masked with a masking material, andetching the aluminum tube, the anodizing and the etching being repeated.

Abstract translation: 一种用于制造光学元件的辊子纳米压印装置的模具辊的制造方法，所述光学元件包括在纳米结构膜的表面上连续形成的纳米尺寸的凹凸部的纳米结构膜，所述纳米结构膜包括无纳米结构 所述纳米结构薄膜还包括具有尺寸小于可见光的波长的多个锥形突起的蛾眼结构， 该制造方法包括以下步骤：阳极氧化铝管，其中形成有用于形成多个锥形突起的凹形图案的区域之外的区域用掩模材料掩模，并且蚀刻铝管，阳极氧化和 重复蚀刻。

公开(公告)号：EP2229470B1

公开(公告)日：2011-11-16

申请号：EP08867895.8

申请日：2008-12-19

Applicant: Nivarox-FAR S.A.

Inventor： FIACCABRINO, Jean-Charles

IPC: C25D1/00 ,  C25D5/02 ,  C25D5/12 ,  C25D7/00

CPC classification number: C25D5/022 ,  C25D1/006 ,  C25D5/024 ,  C25D5/12 ,  C25D7/00 ,  C25D7/005 ,  C25D7/10

Abstract: The invention relates to a method for making a metal microstructure, characterised in that it comprises the steps of forming, by a LIGA-UV method, a mould made of a photosensitive resin, and galvanically and uniformly depositing a layer of a first metal then a layer of a second metal in order to form a block that substantially reaches the upper surface of the photosensitive resin.