摘要:
An electro-conductive bonding material (20,30) includes: high-melting-point metal particles with a component having a first melting point, middle-melting-point metal particles having a second melting point, lower than the first melting point, low-melting-point metal particles having a third melting point, lower than the second melting point and preferably a flux. The high-melting-point metal particles include Au, Ag, Cu, Au-plated Cu, Sn-Bi-plated Cu and Ag-plated Cu particles. The middle-melting-point metal particles include Sn-Bi and Sn-Bi-Ag particles. The low-melting-point metal particles include Sn-Bi-ln and Sn-Bi-Ga particles. The electro-conductive bonding material (20,30) is used for bonding a substrate (6) and an electronic component (8). A method for bonding comprises supplying the electro-conductive bonding material (e.g. by paste printing) to any one of an electrode (7) of a substrate (6) and a terminal of an electronic component (8) (e.g. an Au bump (9)), heating the supplied electro-conductive bonding material at a temperature lower than the melting point of the middle-melting-point metal particles to form a first metallic bonding state, arranging the electronic component (8) on the substrate (6) with the electro-conductive bonding material in the first metallic bonding state therebetween and heating the electro-conductive bonding material at a temperature of the melting point of the middle-melting-point metal particles or higher and not exceeding 150°C to convert the first metallic bonding state into a second metallic bonding state with a melting point of 250°C or higher and form a bond.
摘要:
An electronic device includes a substrate (11, 14B) and an electronic component (141-146, 14A, 14C, 140). The substrate (11, 14B) has a metallization trace (12, 12n, 12p). The metallization trace (12, 12n, 12p) has a metallization layer (121, 121n, 121p) and a synthetic resin layer (122, 122n, 122p). The metallization layer (121, 121n, 121p) has a high-melting-point metallic component (124) and a low-melting-point metallic component (123). The high-melting-point metallic component (124) and the low-melting-point metallic component (123) are diffusion bonded together and adhered to a surface of the substrate (11, 14B). The synthetic resin layer (122, 122n, 122p) is formed simultaneously with the metallization layer (121, 121n, 121p) to cover a surface of the metallization layer (121, 121n, 121p) with a thickness in the range of 5 nm to 1000 nm, preferably 5 nm to 500 nm. The electronic component (141-146, 14A, 14C, 140) is electrically connected to the metallization layer (121, 121n, 121p). The high-melting-point metallic particles (124) and the low-melting-point metallic particles (123) may have a nanocomposite structure.