Abstract:
A layer stack (100; 200) for a touch panel is described. The layer stack includes a substrate (110; 210) including a polymer for depositing one or more layers on the substrate; a patterned transparent conductive oxide (TCO) layer (160; 260) provided over the substrate (110; 210), which comprises areas of TCO and gaps between the areas of TCO; a first dielectric material (170; 270) provided in the gaps of the patterned TCO layer (160; 260); and a dielectric layer (180; 280) being deposited directly on the TCO areas of the TCO layer (160; 260) and directly on the first dielectric material (170; 270). Further, a touch panel including a layer stack and a method for forming a layer stack for a touch panel is described.
Abstract:
A substrate for a light-emitting diode comprising a metal base with a thickness of a predetermined value or more is constituted so that the thickness of a top conductor for an electrical connection with a light-emitting diode (LED) in a predetermined range falls within a predetermined range and the thickness of an insulation layer which electrically insulates the metal base and the top conductor and the thickness of the top conductor meet a predetermined relation. Thereby, a substrate for a light-emitting diode which can show a high heat dissipation capacity by achieving a low thermal resistance as the total thermal resistance of the whole substrate without reducing insulation reliability and high-humidity reliability of the substrate is provided.
Abstract:
A layer stack (100; 200) for a touch panel is described. The layer stack includes a substrate (110; 210) including a polymer for depositing one or more layers on the substrate; a patterned transparent conductive oxide (TCO) layer (160; 260) provided over the substrate (110; 210), which comprises areas of TCO and gaps between the areas of TCO; a first dielectric material (170; 270) provided in the gaps of the patterned TCO layer (160; 260); and a dielectric layer (180; 280) being deposited directly on the TCO areas of the TCO layer (160; 260) and directly on the first dielectric material (170; 270). Further, a touch panel including a layer stack and a method for forming a layer stack for a touch panel is described.
Abstract:
The present invention provides an insulation film and a method for making the insulation film, comprising a film upper layer and a film lower layer, wherein both of the film upper layer and film lower layer are made of a heat conduction plastics material, the heat conduction plastics material contains a heat conduction additive; and a film intermediate layer located between the film upper layer and the film lower layer. The film intermediate layer is made of a heat conduction plastics material, and the heat conduction plastics material contains a conductive additive An upper surface of the film intermediate layer is bound together with a lower surface of the film upper layer, and a lower surface of the film intermediate layer is bound together with an upper surface of the film lower layer.
Abstract:
A substrate for a light-emitting diode comprising a metal base with a thickness of a predetermined value or more is constituted so that the thickness of a top conductor for an electrical connection with a light-emitting diode (LED) in a predetermined range falls within a predetermined range and the thickness of an insulation layer which electrically insulates the metal base and the top conductor and the thickness of the top conductor meet a predetermined relation. Thereby, a substrate for a light-emitting diode which can show a high heat dissipation capacity by achieving a low thermal resistance as the total thermal resistance of the whole substrate without reducing insulation reliability and high-humidity reliability of the substrate is provided.
Abstract:
In a conductive film formed by photo sintering of a film composed of copper particulates, adhesiveness to a base material of the conductive film is improved. A circuit board 1 includes a circuit including a conductive film 2, and a substrate 3. The circuit board 1 further includes a resin layer 4 between the substrate 3 and the conductive film 2. The substrate 3 is made of a non-thermoplastic base material 31. The resin layer 4 contains a thermoplastic resin. The conductive film 2 is formed by photo sintering of a film composed of copper particulates 21, and thus improving adhesiveness of the conductive film 2 to the base material 31 through the resin layer 4.