Abstract:
PROBLEM TO BE SOLVED: To provide a functional material capable of forming wiring, an electrode, a filling structure, a sealing structure, or a joining structure with high quality and high reliability, which is free from generation of voids, cracks, and the like, and to provide an electronic device.SOLUTION: The functional material according to the present invention contains at least two kinds of particles selected from first metal composite particles, second metal composite particles, and third metal composite particles. Each of the first metal composite particles, the second metal composite particles, and the third metal composite particles contain a plurality of kinds of metal components. The melting point T1 (°C) of the first metal composite particles, the melting point T2 (°C) of the second metal composite particles, and the melting point T3 (°C) of the third metal composite particles satisfy a relationship of T1>T2>T3.
Abstract:
PROBLEM TO BE SOLVED: To provide an electronic apparatus in which when connecting an external electric conductor or an electronic component to metalized wiring, it is possible to ensure oxidation resistance and to securely ensure electrical conduction between them.SOLUTION: A base plate 11 has metalized wiring 12. The metalized wiring 12 includes a metalized layer 121 and a synthetic resin film 122. The metalized layer 121 includes a high melting-point metal component and a low melting-point metal component, and the high melting-point metal component and the low melting-point metal component are diffusion-bonded to each other. The synthetic resin film 122 covers a surface of the metalized layer 121 and has a film thickness ranging 5 nm to 1000 nm.
Abstract:
PROBLEM TO BE SOLVED: To provide a functional material which can achieve a dense metal/alloy filling structure, and is applicable to an electrode material, electrolytic material, wiring material, electronic component bonding material, sputtering target, and the like, and to provide an electronic device in which the functional material is applied to a functional part, an electromagnetic wave absorbing/shielding device and a method suitable for production thereof.SOLUTION: A binding region 1 has a nanocomposite structure containing an intermetallic compound or a metallic compound, and filling the periphery of metal/alloy particles 3 with a size of 200 nm or less. The binding region may have a nanocomposite structure containing a crystalline or amorphous glass component or ceramic. The metal/alloy particles 3 have a nanocomposite structure, and the minimum full size is preferably 1 μm or less.
Abstract:
PROBLEM TO BE SOLVED: To provide an electronic apparatus having metallized wiring which is excellent in conductivity, electrochemical stability, oxidation resistance, filling properties, compactness, and mechanical and physical strength, which achieves high bonding force and adhesive force to a substrate and high quality and high reliability.SOLUTION: A substrate 11 has metallized wiring 12 having a predetermined pattern. The metallized wiring 12 includes a metallized layer 121 and an insulation layer 122. The metallized layer 121 includes a high melting point metal component and a low melting point metal component, and the high melting point metal component and the low melting point metal component are diffusely joined to each other. The insulation layer 122 is formed concurrently with the metallized layer 121 and covers an outer surface of the metallized layer 121. An electronic component 14 electrically connects with the metallized layer 121 of the metallized wiring 12.
Abstract:
PROBLEM TO BE SOLVED: To provide an inexpensive light-emitting diode that achieves the large light-emission quantity, high luminous efficiency, and uniform surface light-emission, a light-emitting device using the same, a lighting device, a display, and a signal light. SOLUTION: A semiconductor light-emitting layer 2 is laminated on one side of a substrate 1. Electrodes 411-414 for supplying electric energy to the semiconductor light-emitting layer 2 are composed of a conductor filled in micropores 511-514 penetrating through the substrate and reaching the semiconductor light-emitting layer 2. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a metal filling apparatus for filling the fine space of an object with a metallic filler without generating a recessing and an air gap, a void and the like and being capable of achieving the reduction of a cost and an improvement in a treatment efficiency. SOLUTION: The metal filling apparatus includes: a first support 10 supporting the object 2 from the reverse side of the opening surfaces of the fine space under the state opening one of the opening surfaces of the fine space; and a second support 11 being joined with the first support 10 from the opening-surface side and sealing the object 2 in a treatment chamber A. The metal filling apparatus further includes: a molten-metal feeder 12 feeding the treatment chamber A with a molten metal M; and a pressure controller 13 controlling a pressure in the treatment chamber A. The metal filling apparatus includes a pressure means pressurizing the treatment chamber A until the molten metal is cured by a cooling after the inside of the fine space is filled with the molten metal M. COPYRIGHT: (C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a nano spherical particle which has a desired composition, is excellent in application properties and is suitable for realizing high efficiency elements and devices having various functions, to provide a powder, and to provide a method for producing a nano spherical particle capable of realizing a collection rate sufficiently satisfying industrial utilizability. SOLUTION: The melt of a raw material metal is fed to the surface of a pan disk rotating at a high speed in an argon inert gas atmosphere, is scattered as droplets by acting centrifugal force, and is rapidly cooled by being made in contact with the gas atmosphere, so as to be spherical particles, Thereafter, the obtained spherical particles are subjected to plasma reaction crystallization treatment where they are collided and reacted with argon ions in a plasma rotating flow, thus the components of the raw material metal are decomposed into nanosizes, and are simultaneously contacted with a reactive gas component or a vapor component. In this way, the nano spherical particles with a nanocomposite structure having a particle diameter of COPYRIGHT: (C)2008,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide silicon fine particles whose particle sizes are nano-order and the inside of each of which has an amorphous or crystalline structure. SOLUTION: The spherical polycrystalline or amorphous silicon fine particles having nano-meter sizes are obtained by supplying molten silicon onto a dish-shaped disk rotating at high speed, scattering the molten silicon as droplets by applying a centrifugal force to it, dispersing silicon particles obtained by rapidly cooling the scattered droplets in an inert gas atmosphere into a liquid medium, and repeating an operation of passing the dispersion through a small diameter nozzle under pressure. COPYRIGHT: (C)2006,JPO&NCIPI