Planar avalanche photodiode
    3.
    发明专利
    Planar avalanche photodiode 审中-公开
    平面AVALANCHE PHOTODIODE

    公开(公告)号:JP2011009788A

    公开(公告)日:2011-01-13

    申请号:JP2010229902

    申请日:2010-10-12

    CPC classification number: H01L31/1075 H01L31/035281 Y02E10/50

    Abstract: PROBLEM TO BE SOLVED: To provide a simple and effective avalanche photodiode that can be manufactured inexpensively and with efficient critical control.SOLUTION: The present invention includes a planar avalanche photodiode, having a first n-type semiconductor layer defining a planar contact area and a second n-type semiconductor layer having a p-type diffusion region. A further feature of the structure includes an n-type semiconductor multiplication layer, an n-type semiconductor absorption layer, and a p-type contact layer. A further embodiment includes a planar avalanche photodiode having the first n-type semiconductor layer defining the planar contact area, the n-type semiconductor multiplication layer, the n-type semiconductor absorption layer and a p-type semiconductor layer electrically coupled to the p-type contact layer.

    Abstract translation: 要解决的问题:提供一种简单有效的雪崩光电二极管,其可以廉价地制造并且具有有效的关键控制。解决方案:本发明包括平面雪崩光电二极管,其具有限定平面接触面积的第一n型半导体层和 具有p型扩散区域的第二n型半导体层。 该结构的另一特征包括n型半导体倍增层,n型半导体吸收层和p型接触层。 另一实施例包括具有限定平面接触面积的第一n型半导体层的平面雪崩光电二极管,n型半导体倍增层,n型半导体吸收层和电耦合到p型半导体层的p型半导体层, 型接触层。

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