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公开(公告)号：US08301396B1
公开(公告)日：2012-10-30
申请号：US11975772
申请日：2007-10-22
Applicant: Suresh Dhanijala , Manish Ranjan
Inventor： Suresh Dhanijala , Manish Ranjan
IPC: G01N31/00
Abstract: Theory and design of a new electrical-mobility based instrument for measurement of aerosol particle size distributions in real time is presented. Miniature Electrical Aerosol Spectrometer has a rectangular cross-section with two main regions: the Electrostatic Precipitator (ESP) and Classifier sections. The ESP section enables charged particle injection into the classifier section in a narrow range of streamlines at the desired location. The injected charged particles are then segregated based on their electrical mobility in the classifier section and collected on a series of plates that are connected to electrometers. Real-time particle size distribution measurements can be inferred from the electrometer signal strengths with the knowledge of the instrument transfer function. A theoretical approach is developed to calculate Miniature Electrical Aerosol Spectrometer transfer function considering the non-uniformity in the electric and flow fields inside the instrument, and accounting for the instrument dimensions and its operating conditions. The theoretical predictions of size classification characteristics are seen to compare well with numerical results. The modeling results suggest that an optimal operational domain exists for Miniature Electrical Aerosol Spectrometer.
Abstract translation: 提出了一种实时测量气溶胶颗粒尺寸分布的新型电动移动性仪器的理论与设计。 微型电气气溶胶光谱仪具有矩形截面，具有两个主要区域：静电除尘器（ESP）和分类器部分。 ESP部分使得带电粒子在所需位置的窄流线范围内注入分类器部分。 然后注入的带电粒子基于其在分级器部分中的电迁移率而被分离并收集在连接到静电计器的一系列板上。 通过仪器传递函数的知识，可以从静电计信号强度推断实时粒度分布测量。 考虑到仪器内部电气和流场的不均匀性，并考虑仪器尺寸及其工作条件，开发了一种理论方法来计算微型电气雾度光谱仪传递函数。 大小分类特征的理论预测与数值结果相比较。 建模结果表明，微型电气气溶胶光谱仪存在最佳操作领域。
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2.发明授权公开(公告)号：US10824748B2
公开(公告)日：2020-11-03
申请号：US15933662
申请日：2018-03-23
Applicant: Carl R Crandall , Robert M Malek , Ravi Kumar Rao , Souvik Das , Manish Ranjan Mahanta
Inventor： Carl R Crandall , Robert M Malek , Ravi Kumar Rao , Souvik Das , Manish Ranjan Mahanta
Abstract: A method and system for providing a plurality of host systems shared access to data files from a file server. The method includes monitoring a control file for updates, the control file located within a corresponding host directory located within the file server; receiving a request for access to a data file stored on the file server, the access request being written to the control file, the access request including a requested data file operation; performing the requested data file operation in response to the control file being updated with the access request; creating a status file in the host directory in which the requested data file operation was performed upon completion of the requested data file operation; writing status data in the status file, the status data including a result of the performance of the requested data file operation; and allowing access to the host directory in which the requested data file operation was performed in response to the status data being written to the status file.
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公开(公告)号：US08797504B2
公开(公告)日：2014-08-05
申请号：US13408471
申请日：2012-02-29
Applicant: Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
Inventor： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
CPC classification number: G03F7/70933 , G03F7/70875 , G03F7/70891
Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
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4.发明授权Wetting wave front control for reduced air entrapment during wafer entry into electroplating bath 有权润湿波前控制，减少晶片进入电镀槽期间的空气滞留公开(公告)号：US09028666B2
公开(公告)日：2015-05-12
申请号：US13460423
申请日：2012-04-30
Applicant: Manish Ranjan , Shantinath Ghongadi , Frederick Dean Wilmot , Douglas Hill , Bryan L. Buckalew
Inventor： Manish Ranjan , Shantinath Ghongadi , Frederick Dean Wilmot , Douglas Hill , Bryan L. Buckalew
IPC: C25D5/00 , C25D17/00 , C25D7/12 , H01L21/288
CPC classification number: C25D21/12 , C25D5/00 , C25D7/12 , C25D7/123 , C25D17/001 , C25D17/06 , G03F7/16 , G03F7/20 , H01L21/0206 , H01L21/0273 , H01L21/2885 , H01L21/76802 , H01L21/76873 , H01L21/76879 , H01L23/5226 , H01L23/53228
Abstract: Methods described herein manage wafer entry into an electrolyte so that air entrapment due to initial impact of the wafer and/or wafer holder with the electrolyte is reduced and the wafer is moved in such a way that an electrolyte wetting wave front is maintained throughout immersion of the wafer also minimizing air entrapment.
Abstract translation: 本文描述的方法将晶片进入电解质，使得由于晶片和/或晶片保持器与电解质的初始冲击而引起的空气滞留减少，并且晶片以这样的方式移动，使得在浸渍期间保持电解质润湿波前 该晶片还使空气截留最小化。
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公开(公告)号：US08299446B2
公开(公告)日：2012-10-30
申请号：US12803344
申请日：2010-06-24
Applicant: Andrew M. Hawryluk , Emily True , Manish Ranjan , Warren Flack , Detlef Fuchs
Inventor： Andrew M. Hawryluk , Emily True , Manish Ranjan , Warren Flack , Detlef Fuchs
CPC classification number: G03F9/7003 , H01L21/568 , H01L23/3107 , H01L24/03 , H01L24/96 , H01L25/105 , H01L2224/02371 , H01L2224/02379 , H01L2224/0401 , H01L2224/04105 , H01L2224/05554 , H01L2224/12105 , H01L2224/96 , H01L2225/1035 , H01L2225/1058 , H01L2924/01006 , H01L2924/01033 , H01L2924/01075 , H01L2924/01078 , H01L2924/01082 , H01L2924/10253 , H01L2924/14 , H01L2924/1461 , H01L2924/15331 , H01L2924/181 , H01L2224/03 , H01L2224/11 , H01L2924/00
Abstract: Sub-field enhanced global alignment (SEGA) methods for aligning reconstituted wafers in a lithography process are disclosed. The SEGA methods provide the ability to accommodate chip placement errors for chips supported by a reconstituted wafer when performing a lithographic process having an overlay requirement. The SEGA methods include measuring chip locations to determine sub-fields of the reconstituted wafer over which enhanced global alignment (EGA) can be performed on the chips therein to within the overlay requirement. The SEGA methods further included individually performing EGA over the respective sub-fields. The SEGA methods take advantage of the benefits of both EGA and site-by-site alignment and are particularly applicable to wafer-level packing lithographic processes such as fan-out wafer-level packaging.
Abstract translation: 公开了用于在光刻工艺中对准重构晶片的子场增强全局对准（SEGA）方法。 当执行具有覆盖要求的光刻工艺时，SEGA方法能够适应由重构的晶片支持的芯片的芯片放置误差。 SEGA方法包括测量芯片位置以确定重构晶片的子场，通过该子场可以在覆盖要求内对其上的芯片执行增强的全局对准（EGA）。 SEGA方法还包括在各个子场上单独执行EGA。 SEGA方法利用了EGA和现场对准的优点，特别适用于晶圆级封装光刻工艺，如扇形晶圆级封装。
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Patent Agency Ranking
6.发明申请公开(公告)号：US20190258810A1
公开(公告)日：2019-08-22
申请号：US15933662
申请日：2018-03-23
Applicant: CARL R. CRANDALL , ROBERT M. MALEK , RAVI KUMAR RAO , SOUVIK DAS , MANISH RANJAN MAHANTA
Inventor： CARL R. CRANDALL , ROBERT M. MALEK , RAVI KUMAR RAO , SOUVIK DAS , MANISH RANJAN MAHANTA
Abstract: A method and system for providing a plurality of host systems shared access to data files from a file server. The method includes monitoring a control file for updates, the control file located within a corresponding host directory located within the file server; receiving a request for access to a data file stored on the file server, the access request being written to the control file, the access request including a requested data file operation; performing the requested data file operation in response to the control file being updated with the access request; creating a status file in the host directory in which the requested data file operation was performed upon completion of the requested data file operation; writing status data in the status file, the status data including a result of the performance of the requested data file operation; and allowing access to the host directory in which the requested data file operation was performed in response to the status data being written to the status file.
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公开(公告)号：US08730448B2
公开(公告)日：2014-05-20
申请号：US13409752
申请日：2012-03-01
Applicant: Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
Inventor： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
CPC classification number: G03F7/70933 , G03F7/70875 , G03F7/70891
Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
Abstract translation: 光刻设备包括被构造成保持基板的基板台，配置成将图案化的辐射束投射通过开口并到达基板的目标部分的投影系统，以及在开口中具有出口的导管。 导管构造成将气体输送到开口。 光刻设备还包括由控制系统控制的冷却装置。 冷却装置构造成冷却气体，使得当气体入射到基板上时，从开口行进到基板的气体具有预定温度。
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公开(公告)号：US20120229783A1
公开(公告)日：2012-09-13
申请号：US13409752
申请日：2012-03-01
Applicant: Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
Inventor： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
IPC: G03B27/52
CPC classification number: G03F7/70933 , G03F7/70875 , G03F7/70891
Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
Abstract translation: 光刻设备包括被构造成保持基板的基板台，配置成将图案化的辐射束投射通过开口并到达基板的目标部分的投影系统，以及在开口中具有出口的导管。 导管构造成将气体输送到开口。 光刻设备还包括由控制系统控制的冷却装置。 冷却装置构造成冷却气体，使得当气体入射到基板上时，从开口行进到基板的气体具有预定温度。
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9.发明申请公开(公告)号：US20180266007A1
公开(公告)日：2018-09-20
申请号：US15462765
申请日：2017-03-17
Applicant: Douglas Hill , Cian Sweeney , Manish Ranjan
Inventor： Douglas Hill , Cian Sweeney , Manish Ranjan
IPC: C25D17/08 , C25D17/00 , C25D21/12 , H01L21/687 , H01L21/68
Abstract: A determination is made of a real-time azimuthal position of a notch alignment feature located on a support surface of a substrate holder relative to a fixed reference ray extending perpendicularly away from a rotational axis of the substrate holder as the substrate holder rotates about the rotational axis. A determination is made of an approach initiation azimuthal position of the notch alignment feature relative to the fixed reference ray at which vertical movement of the substrate holder should initiate in order to have the notch alignment feature located at a prescribed azimuthal position relative to the fixed reference ray when the substrate holder reaches a prescribed vertical position. A determination is made of a time delay required to have the notch alignment feature located at the approach initiation azimuthal position. Vertical movement of the substrate holder is initiated in accordance with the determined time delay.
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10.发明申请WETTING WAVE FRONT CONTROL FOR REDUCED AIR ENTRAPMENT DURING WAFER ENTRY INTO ELECTROPLATING BATH 有权在波浪进入电镀浴期间减少空气进入的湿度正面控制公开(公告)号：US20120292192A1
公开(公告)日：2012-11-22
申请号：US13460423
申请日：2012-04-30
Applicant: Manish RANJAN , Shantinath GHONGADI , Frederick Dean WILMOT , Douglas HILL , Bryan L. BUCKALEW
Inventor： Manish RANJAN , Shantinath GHONGADI , Frederick Dean WILMOT , Douglas HILL , Bryan L. BUCKALEW
CPC classification number: C25D21/12 , C25D5/00 , C25D7/12 , C25D7/123 , C25D17/001 , C25D17/06 , G03F7/16 , G03F7/20 , H01L21/0206 , H01L21/0273 , H01L21/2885 , H01L21/76802 , H01L21/76873 , H01L21/76879 , H01L23/5226 , H01L23/53228
Abstract: Methods described herein manage wafer entry into an electrolyte so that air entrapment due to initial impact of the wafer and/or wafer holder with the electrolyte is reduced and the wafer is moved in such a way that an electrolyte wetting wave front is maintained throughout immersion of the wafer also minimizing air entrapment.
Abstract translation: 本文描述的方法将晶片进入电解质，使得由于晶片和/或晶片保持器与电解质的初始冲击而引起的空气滞留减少，并且晶片以这样的方式移动，使得在浸渍期间保持电解质润湿波前 该晶片还使空气截留最小化。
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