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    Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same
    4.
    发明授权
    Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same 有权
    含氟化合物，含氟聚合物，负型抗蚀剂组合物和使用它们的图案化工艺

    公开(公告)号：US08513457B2

    公开(公告)日：2013-08-20

    申请号：US13474187

    申请日：2012-05-17

    申请人： Yoshimi Isono ,  Jonathan Joachim Jodry ,  Satoru Narizuka ,  Kazuhiro Yamanaka

    发明人： Yoshimi Isono ,  Jonathan Joachim Jodry ,  Satoru Narizuka ,  Kazuhiro Yamanaka

    IPC分类号： C07C59/58

    CPC分类号： C07C69/653 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0046 ,  G03F7/0382 ,  Y10S430/108 ,  Y10S430/115 ,  Y10S430/143 ,  Y10S430/167 ,  Y10T428/24802

    摘要： A fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.

    摘要翻译： 由式（1）表示的含氟不饱和羧酸，其中R 1表示可聚合双键的基团，R 3表示氟原子或含氟烷基，W表示二价连接基团。 该化合物可以提供重均分子量为1,000〜1,000,000的含氟聚合物化合物，并且含有式（2）所示的重复单元，其中R 3和W如上定义，各自为R 4，R 5和R 6 独立地表示氢原子，氟原子或一价有机基团，R4，R5和R6中的至少两个可以组合形成环。 该高分子化合物可以提供对KrF或ArF准分子激光透明的化学放大抗蚀剂组合物，并且具有高分辨率，并且能够形成具有无膨胀的矩形截面的图案。

    Fluorine-containing dicarboxylic acids and their novel polymer compounds
    6.
    发明授权
    Fluorine-containing dicarboxylic acids and their novel polymer compounds 有权
    含氟二羧酸及其新型高分子化合物

    公开(公告)号：US08304508B2

    公开(公告)日：2012-11-06

    申请号：US13195375

    申请日：2011-08-01

    申请人： Satoru Narizuka ,  Yuji Hagiwara ,  Masashi Nagamori ,  Kazuhiro Yamanaka

    发明人： Satoru Narizuka ,  Yuji Hagiwara ,  Masashi Nagamori ,  Kazuhiro Yamanaka

    IPC分类号： C08G63/685

    CPC分类号： C08G63/6826 ,  C07C65/01 ,  C08G73/22

    摘要： A fluorine-containing dicarboxylic acid represented by formula (1), wherein n represents an integer of 1-4, and the two carboxylic groups are not adjacent to each other on the aromatic ring. It is possible to obtain a linear polymer compound by reacting the fluorine-containing dicarboxylic acid with a comonomer (e.g., diaminodiol). By thermal cyclization, this linear polymer compound can be converted into another polymer compound having superior characteristics.

    摘要翻译： 由式（1）表示的含氟二羧酸，其中n表示1-4的整数，并且所述两个羧基在芳香环上彼此不相邻。 可以通过使含氟二羧酸与共聚单体（例如二氨基二醇）反应来获得线型高分子化合物。 通过热环化，该线性高分子化合物可以转化为具有优异特性的另一种高分子化合物。

    Water Repellent Additive for Immersion Resist
    7.
    发明申请
    Water Repellent Additive for Immersion Resist 审中-公开
    防水添加剂

    公开(公告)号：US20120064459A1

    公开(公告)日：2012-03-15

    申请号：US13320871

    申请日：2010-05-14

    申请人： Kazuhiko Maeda ,  Takamasa Kitamoto ,  Haruhiko Komoriya ,  Satoru Narizuka ,  Yoshimi Isono ,  Kazunori Mori

    发明人： Kazuhiko Maeda ,  Takamasa Kitamoto ,  Haruhiko Komoriya ,  Satoru Narizuka ,  Yoshimi Isono ,  Kazunori Mori

    IPC分类号： G03F7/039 ,  C08F20/22 ,  G03F7/38

    CPC分类号： G03F7/20 ,  C08F20/26 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

    摘要： Disclosed is a water repellent additive for an immersion resist, which is composed of a fluorine-containing polymer that has a repeating unit represented by general formula (1). By adding the water repellent additive to a resist composition, the resist composition can be controlled to have high water repellency during exposure and to exhibit improved solubility in a developing solution during development. [In the formula, R1 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group; R2 represents a heat-labile protecting group; R3 represents a fluorine atom or a fluorine-containing alkyl group; and W represents a divalent linking group.]

    摘要翻译： 公开了一种浸渍抗蚀剂的防水添加剂，其由具有由通式（1）表示的重复单元的含氟聚合物组成。 通过将防水添加剂添加到抗蚀剂组合物中，可以将抗蚀剂组合物控制为在曝光期间具有高的拒水性，并且在显影期间在显影液中表现出改善的溶解性。 [式中，R 1表示氢原子，氟原子，甲基或三氟甲基。 R2代表热不稳定保护基; R3表示氟原子或含氟烷基; W表示二价连接基。]

    Fluorinated Dicarboxylic Acid Derivative and Polymer Obtained Therefrom
    8.
    发明申请
    Fluorinated Dicarboxylic Acid Derivative and Polymer Obtained Therefrom 有权
    氟化二羧酸衍生物和聚合物

    公开(公告)号：US20110301305A1

    公开(公告)日：2011-12-08

    申请号：US13201766

    申请日：2010-02-18

    申请人： Yoshimi Isono ,  Satoru Narizuka ,  Hidehisa Nanai ,  Kazuhiro Yamanaka

    发明人： Yoshimi Isono ,  Satoru Narizuka ,  Hidehisa Nanai ,  Kazuhiro Yamanaka

    IPC分类号： C08G63/685 ,  C07C57/58 ,  C07C57/76 ,  C08G73/06 ,  C08G63/199 ,  C08G69/32 ,  C08G73/22 ,  C07C69/65 ,  C07C59/64

    CPC分类号： C07C59/64 ,  C07C69/65 ,  C07C69/734 ,  C08G63/6826 ,  C08G69/42 ,  C08G73/06 ,  C08G73/1039 ,  C08G73/22

    摘要： According to the present invention, a polymer is obtained by polycondensation of a fluorinated dicarboxylic acid derivative of the general formula (M-1) or an acid anhydride of the fluorinated dicarboxylic acid with a polyfunctional compound having two to four reactive groups corresponding in reactivity to carbonyl moieties of the fluorinated dicarboxylic acid derivative or acid anhydride. [Chem. 134] AOCF2C-Q-CF2COA′  (M-1) In the above formula, Q represents a divalent organic group having a substituted or unsubstituted aromatic ring; and A and A′ each independently represent an organic group. This polymer exhibits a sufficiently low dielectric constant for use as a semiconductor protection film and has the capability of forming a film at a relatively low temperature of 250° C. or lower.

    摘要翻译： 根据本发明，通过使通式（M-1）的氟化二羧酸衍生物或氟化二羧酸的酸酐与具有2〜4个反应性对应的反应性基团的多官能化合物与反应性对应的反应性进行缩聚而获得聚合物 氟化二羧酸衍生物或酸酐的羰基部分。 [Chem。 134] AOCF2C-Q-CF2COA'（M-1）在上式中，Q表示具有取代或未取代的芳环的二价有机基团; A和A'各自独立地表示有机基团。 该聚合物表现出足够低的介电常数用作半导体保护膜，并且具有在250℃或更低的较低温度下形成膜的能力。

    Fluorine-containing dicarboxylic acids and their novel polymer compounds
    9.
    发明授权
    Fluorine-containing dicarboxylic acids and their novel polymer compounds 有权
    含氟二羧酸及其新型高分子化合物

    公开(公告)号：US08003749B2

    公开(公告)日：2011-08-23

    申请号：US12174414

    申请日：2008-07-16

    申请人： Satoru Narizuka ,  Yuji Hagiwara ,  Masashi Nagamori ,  Kazuhiro Yamanaka

    发明人： Satoru Narizuka ,  Yuji Hagiwara ,  Masashi Nagamori ,  Kazuhiro Yamanaka

    IPC分类号： C08G75/00

    CPC分类号： C08G63/6826 ,  C07C65/01 ,  C08G73/22

    摘要： Disclosed is a fluorine-containing dicarboxylic acid represented by formula (1), wherein n represents an integer of 1-4, and the two carboxylic groups are not adjacent to each other on the aromatic ring. It is possible to obtain a linear polymer compound by reacting the fluorine-containing dicarboxylic acid with a comonomer (e.g., diaminodiol). By thermal cyclization, this linear polymer compound can be converted into another polymer compound having superior characteristics.

    摘要翻译： 公开了由式（1）表示的含氟二羧酸，其中n表示1-4的整数，并且两个羧基在芳环上彼此不相邻。 可以通过使含氟二羧酸与共聚单体（例如二氨基二醇）反应来获得线型高分子化合物。 通过热环化，该线性高分子化合物可以转化为具有优异特性的另一种高分子化合物。

    Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same
    10.
    发明申请
    Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same 有权
    含氟化合物，含氟聚合物，柱型抗蚀剂组合物和使用其的图案化方法

    公开(公告)号：US20080311507A1

    公开(公告)日：2008-12-18

    申请号：US12137145

    申请日：2008-06-11

    申请人： Yoshimi ISONO ,  Jonathan Joachim JODRY ,  Satoru NARIZUKA

    发明人： Yoshimi ISONO ,  Jonathan Joachim JODRY ,  Satoru NARIZUKA

    IPC分类号： G03F7/20 ,  G03F7/004 ,  C07C69/63 ,  C07C69/65 ,  C08F20/22

    CPC分类号： C07C69/54 ,  C07C69/618 ,  C07C69/653 ,  C07C69/67 ,  C08F20/22 ,  C08F220/26 ,  C08F220/28 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/0397 ,  Y02P20/55 ,  Y10S430/108 ,  Y10S430/111

    摘要： Disclosed is a fluorine-containing compound represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R2 represents an acid-labile protecting group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R2, R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.

    摘要翻译： 公开了式（1）表示的含氟化合物，其中R1表示可聚合双键的基团，R2表示酸不稳定保护基，R3表示氟原子或含氟烷基，W表示 二价连接基团。 该化合物可以提供重均分子量为1,000〜1,000,000的含氟聚合物化合物，其含有式（2）表示的重复单元，其中，R2，R3和W如上所定义，R 4，R 5， R6独立地表示氢原子，氟原子或一价有机基团，R 4，R 5和R 6中的至少两个可以组合形成环。 该高分子化合物可以提供能够形成对曝光光透明并且矩形性优异的图案的抗蚀剂组合物。