公开(公告)号：US20160068956A1

公开(公告)日：2016-03-10

申请号：US14584441

申请日：2014-12-29

Applicant: Applied Materials, Inc.

Inventor： Shu-Kwan LAU ,  Mehmet Tugrul SAMIR ,  Aaron MILLER

IPC: C23C16/455 ,  F16L41/02

Abstract: Embodiments of the present invention provide a liner assembly including an inject insert. The inject insert enables tenability of flow parameters, such as velocity, density, direction and spatial location, across a substrate being processed. The processing gas across the substrate being processed may be specially tailored for individual processes with a liner assembly according to embodiment of the present invention.

Abstract translation: 本发明的实施例提供了一种包括注射插入件的衬套组件。 注射插入物能够在待处理的基底上实现流动参数（例如速度，密度，方向和空间位置）的稳定性。 正在处理的衬底上的处理气体可以针对根据本发明的实施例的衬套组件针对各个工艺进行专门的定制。

公开(公告)号：US20160068996A1

公开(公告)日：2016-03-10

申请号：US14826287

申请日：2015-08-14

Applicant: Applied Materials, Inc.

Inventor： Shu-Kwan LAU ,  Mehmet Tugrul SAMIR ,  Aaron MILLER

IPC: C30B25/12 ,  C23C16/455 ,  C23C16/458

CPC classification number: C30B25/12 ,  C23C16/45504 ,  C23C16/4584 ,  C23C16/4585 ,  C30B35/00

Abstract: Embodiments of the present disclosure provide an improved susceptor for a substrate processing chamber. In one embodiment, the susceptor comprises an outer peripheral edge circumscribing a pocket, wherein the pocket has a concave surface that is recessed from the outer peripheral edge, and an angled support surface disposed between the outer peripheral edge and the pocket, wherein the angled support surface is inclined with respect to a horizontal surface of the outer peripheral edge.

Abstract translation: 本公开的实施例提供了用于衬底处理室的改进的基座。 在一个实施例中，所述基座包括围绕口袋的外周边缘，其中所述口袋具有从所述外周缘凹陷的凹面，以及设置在所述外周边缘和所述口袋之间的成角度的支撑表面， 表面相对于外周边缘的水平表面倾斜。

公开(公告)号：US20150155190A1

公开(公告)日：2015-06-04

申请号：US14550781

申请日：2014-11-21

Applicant: Applied Materials, Inc.

Inventor： Aaron MILLER ,  Mehran BEHDJAT ,  Norman L. TAM ,  Michael LIU

IPC: H01L21/67 ,  H01L21/66 ,  H01L21/324

CPC classification number: H01L21/67115 ,  H01L21/67248 ,  H01L21/68792

Abstract: Embodiments of the present disclosure provide a cover assembly that includes a cover disposed between a device side surface of a substrate and a reflector plate, which are disposed within a thermal processing chamber. The presence of the cover between the device side surface of a substrate and a reflector plate has many advantages over conventional thermal processing chamber designs, which include an improved temperature uniformity during processing, a reduced chamber down time and an improved cost-of-ownership of the processes performed in the thermal processing chamber. In some configurations, the cover includes two or more ports that are formed therein and are positioned to deliver a gas, from a space formed between the reflector plate and the cover, to desired regions of the substrate during processing to reduce the temperature variation across the substrate.

Abstract translation: 本公开的实施例提供一种盖组件，其包括设置在基板的装置侧表面和反射板之间的盖，所述盖设置在热处理室内。 衬底的器件侧表面与反射板之间的存在与常规热处理室设计相比具有许多优点，其包括在处理期间改进的温度均匀性，减少的室停机时间和改进的拥有成本 在热处理室中进行的处理。 在一些构造中，盖包括形成在其中的两个或更多个端口，并且被定位成在处理期间将气体从形成在反射板和盖之间的空间传送到基板的期望区域，以减少横跨 基质。

公开(公告)号：US20170105249A1

公开(公告)日：2017-04-13

申请号：US15281715

申请日：2016-09-30

Applicant: Applied Materials, Inc.

Inventor： Joseph M. RANISH ,  Aaron MILLER ,  Oleg V. SEREBRYANOV

IPC: H05B3/00 ,  F21V7/22

CPC classification number: H05B3/0047

Abstract: Implementations of the present disclosure provide an adapter for use in a processing chamber. In one implementation, the adapter comprises a hollow body having a first end and a second end opposing the first end, a first block and a second block symmetrically disposed within the hollow body about a longitudinal axis of the body, wherein the first block and the second block define a central opening therebetween, and a retention device disposed in contact with the first and second blocks to confine the movement of the first and second blocks with respect to the hollow body. The central opening is sized so that the first block and the second block provide direct contact with a press seal of the lamp.

公开(公告)号：US20160068959A1

公开(公告)日：2016-03-10

申请号：US14845998

申请日：2015-09-04

Applicant: Applied Materials, Inc.

Inventor： Shu-Kwan LAU ,  Mehmet Tugrul SAMIR ,  Nyi O. MYO ,  Aaron MILLER ,  Aaron Muir HUNTER ,  Errol Antonio C. SANCHEZ ,  Paul BRILLHART ,  Joseph M. RANISH ,  Kartik SHAH ,  Dennis L. DEMARS ,  Satheesh KUPPURAO

IPC: C23C16/48 ,  C23C16/44 ,  C23C16/458

CPC classification number: C23C16/4412 ,  C23C16/44 ,  C23C16/458 ,  C23C16/48 ,  C30B25/08 ,  C30B29/06 ,  C30B29/08 ,  C30B29/406 ,  C30B29/42 ,  F27D1/025 ,  F27D2003/0086 ,  H01L21/67115 ,  H01L21/6719

Abstract: Implementations described herein disclose epitaxial deposition chambers and components thereof. In one implementation, a chamber can include a substrate support positioned in a processing region, a radiant energy assembly comprising a plurality of radiant energy sources, a liner assembly having an upper liner and a lower liner, and a dome assembly positioned between the substrate support and the radiant energy assembly. The epitaxial deposition chambers described herein allow for processing of larger substrates, while maintaining throughput, reducing costs and providing a reliably uniform deposition product.

Abstract translation: 本文所述的实施方式公开了外延沉积室及其部件。 在一个实施方式中，室可以包括位于处理区域中的基板支撑件，包括多个辐射能源的辐射能组件，具有上衬垫和下衬垫的衬套组件，以及位于衬底支撑件 和辐射能组件。 本文所述的外延沉积室允许处理较大的基底，同时保持生产量，降低成本并提供可靠均匀的沉积产物。

公开(公告)号：US20160358789A1

公开(公告)日：2016-12-08

申请号：US15170982

申请日：2016-06-02

Applicant: Applied Materials, Inc.

Inventor： Aaron MILLER ,  Norman L. TAM ,  Michael LIU

IPC: H01L21/324 ,  H01L21/67

CPC classification number: H01L21/67248 ,  H01L21/67109 ,  H01L21/67115 ,  H01L21/68792

Abstract: Embodiments of the present disclosure provide a cover assembly that includes a cover having a plurality of ports, and each port has a diameter of less than 1 mm, such as between about 0.1 mm to about 0.9 mm. The cover may be disposed between a device side surface of a substrate and a reflector plate, which are all disposed within a thermal processing chamber. The presence of the cover having the plurality of small ports within the thermal processing chamber will improve thermal uniformity over time after processing doped substrates.

Abstract translation: 本公开的实施例提供一种盖组件，其包括具有多个端口的盖，并且每个端口具有小于1mm的直径，例如在约0.1mm至约0.9mm之间。 盖可以设置在基板的装置侧表面和反射板之间，反射板都设置在热处理室内。 在热处理室内具有多个小端口的盖的存在将改善在处理掺杂的衬底之后随时间的热均匀性。

公开(公告)号：US20150041453A1

公开(公告)日：2015-02-12

申请号：US14456682

申请日：2014-08-11

Applicant: APPLIED MATERIALS, INC.

Inventor： Kim VELLORE ,  Dinesh KANAWADE ,  Stephen MOFFATT ,  Aaron MILLER ,  Leonid M. TERTITSKI ,  Norman L. TAM ,  Michael LIU ,  Colin FOX

IPC: H01L21/67

CPC classification number: H01L21/67248 ,  H01L21/67115

Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for visual lamp failure detection in a processing chamber, such as an RTP chamber. Visual feedback is facilitated through the use of a wide-angle lens positioned to view lamps within the process chamber. The wide-angle lens is positioned within a probe and secured using a spring in order to withstand high temperature processing. A camera coupled to the lens is adapted to capture an image of the lamps within the process chamber. The captured image of the lamps is then compared to a reference image to determine if the lamps are functioning as desired.

Abstract translation: 本公开的实施例一般涉及用于处理室（例如RTP室）中的视觉灯故障检测的方法和装置。 通过使用定位成观察处理室内的灯的广角透镜来促进视觉反馈。 广角镜头位于探头内并用弹簧固定，以承受高温处理。 耦合到透镜的照相机适于捕获处理室内的灯的图像。 然后将捕获的灯的图像与参考图像进行比较，以确定灯是否按需要起作用。

公开(公告)号：US20200053836A1

公开(公告)日：2020-02-13

申请号：US16390862

申请日：2019-04-22

Applicant: Applied Materials, Inc.

Inventor： Joseph M. RANISH ,  Aaron MILLER ,  Oleg V. SEREBRYANOV

IPC: H05B3/00

Abstract: Implementations of the present disclosure provide an adapter for use in a processing chamber. In one implementation, the adapter comprises a hollow body having a first end and a second end opposing the first end, a first block and a second block symmetrically disposed within the hollow body about a longitudinal axis of the body, wherein the first block and the second block define a central opening therebetween, and a retention device disposed in contact with the first and second blocks to confine the movement of the first and second blocks with respect to the hollow body. The central opening is sized so that the first block and the second block provide direct contact with a press seal of the lamp.

公开(公告)号：US20170345693A1

公开(公告)日：2017-11-30

申请号：US15675825

申请日：2017-08-14

Applicant: Applied Materials, Inc.

Inventor： Kim VELLORE ,  Dinesh KANAWADE ,  Stephen MOFFATT ,  Aaron MILLER ,  Leonid M. TERTITSKI ,  Norman L. TAM ,  Michael LIU ,  Colin FOX

IPC: H01L21/67

CPC classification number: H01L21/67248 ,  H01L21/67115

Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for visual lamp failure detection in a processing chamber, such as an RTP chamber. Visual feedback is facilitated through the use of a wide-angle lens positioned to view lamps within the process chamber. The wide-angle lens is positioned within a probe and secured using a spring in order to withstand high temperature processing. A camera coupled to the lens is adapted to capture an image of the lamps within the process chamber. The captured image of the lamps is then compared to a reference image to determine if the lamps are functioning as desired.

公开(公告)号：US20160068997A1

公开(公告)日：2016-03-10

申请号：US14826065

申请日：2015-08-13

Applicant: Applied Materials, Inc.

Inventor： Shu-Kwan LAU ,  Mehmet Tugrul SAMIR ,  Aaron MILLER

IPC: C30B25/14 ,  C23C16/455 ,  C30B25/08 ,  C23C16/44

CPC classification number: C30B25/14 ,  C23C16/4408 ,  C23C16/45574 ,  C23C16/45591 ,  C30B35/00

Abstract: Embodiments disclosed herein describe a liner assembly including a plurality of individually separated gas passages. The liner assembly provides control of flow parameters, such as velocity, density, direction and spatial location, across a substrate being processed. The processing gas across the substrate being processed may be specially tailored for individual processes with a liner assembly according to the present embodiments.

Abstract translation: 本文公开的实施例描述了包括多个单独分离的气体通道的衬套组件。 衬套组件提供对正在被处理的衬底上的流动参数（例如速度，密度，方向和空间位置）的控制。 正在处理的衬底上的处理气体可以针对根据本实施例的衬套组件针对各个工艺进行专门的定制。