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公开(公告)号：US20230063156A1
公开(公告)日：2023-03-02
申请号：US17794897
申请日：2020-12-24
发明人： Ronald Peter ALBRIGHT , Kursat BAL , Vadim Yevgenyevich BANINE , Richard Joseph BRULS , Sjoerd Frans DE VRIES , Olav Waldemar Vladimir FRIJNS , Yang-Shan HUANG , Zhuangxiong HUANG , Johannes Henricus Wilhelmus JACOBS , Johannes Hubertus Josephina MOORS , Georgi Nanchev NENCHEV , Andrey NIKIPELOV , Thomas Maarten RAASVELD , Manish RANJAN , Edwin TE SLIGTE , Karl Robert UMSTADTER , Eray UZGÖREN , Marcus Adrianus VAN DE KERKHOF , Parham YAGHOOBI
IPC分类号： G03F7/20
摘要： An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.
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公开(公告)号：US20220276553A1
公开(公告)日：2022-09-01
申请号：US17637891
申请日：2020-08-20
发明人： Andrey NIKIPELOV , Sander BALTUSSEN , Vadim Yevgenyevich BANINE , Alexandr DOLGOV , DONMEZ NOYAN , Zomer Silvester HOUWELING , Arnoud Willem NOTENBOOM , Marcus Adrianus VAN DE KERKHOF , Ties Wouter VAN DER WOORD , Paul Alexander VERMEULEN , David Ferdinand VLES , Victoria VORONINA , Halil Gökay YEGEN
IPC分类号： G03F1/62 , C01B32/158 , G03F7/20
摘要： A pellicle membrane for a lithographic apparatus, the membrane including uncapped carbon nanotubes. A method of regenerating a pellicle membrane, the method including decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. A method of reducing the etch rate of a pellicle membrane, the method including providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane. An assembly for a lithographic apparatus, the assembly including a biased electrode near or including the pellicle membrane or heating means for the pellicle membrane.
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公开(公告)号：US20200096880A1
公开(公告)日：2020-03-26
申请号：US16571956
申请日：2019-09-16
发明人： Andrey NIKIPELOV , Vadim Yevgenyevich Banine , Christian Gerardus Norbertus Cloin , Edwin Te Sligte , Marcus Adrianus Van De Kerkhof , Ferdinandus Martinus Jozef Henri Van De Weterring
IPC分类号： G03F7/20
摘要： A component for use in a patterning device environment including a patterning device, wherein the component is treated to suppress EUV plasma-induced contaminant release and/or atomic hydrogen or other radicals induced defectivity. A conduit array comprising at least one conduit, wherein the at least one conduit has been treated to promote adhesion of a contaminant to the at least one conduit.
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公开(公告)号：US20220206396A1
公开(公告)日：2022-06-30
申请号：US17606493
申请日：2020-04-01
IPC分类号： G03F7/20 , H01L21/687
摘要： A method for providing a wear-resistant material on a body. A composite body that may be obtained by the method. The composite body may be a substrate holder or a reticle clamp for use in a lithographic apparatus. The method includes providing a body made of glass, ceramic or glass-ceramic; providing a wear-resistant material having a hardness of more than 20 GPa; and brazing or laser welding the wear-resistant material to the body.
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公开(公告)号：US20210382209A1
公开(公告)日：2021-12-09
申请号：US17282559
申请日：2019-09-13
发明人： Andrey NIKIPELOV , Marcus Adrianus VAN DE KERKHOF , Pieter-Jan VAN ZWOL , Laurentius Cornelius DE WINTER , Wouter Joep ENGELEN , Alexey Olegovich POLYAKOV
摘要： A first diffusor configured to receive and transmit radiation has a plurality of layers, each layer arranged to change an angular distribution of EUV radiation passing through it differently. A second diffusor configured to receive and transmit radiation has a first layer and a second layer. The first layer is formed from a first material, the first layer including a nanostructure on at least one surface of the first layer. The second layer is formed from a second material adjacent to the at least one surface of the first layer such that the second layer also includes a nanostructure. The second material has a refractive index that is different to a refractive index of the first layer. The diffusors may be configured to receive and transmit EUV radiation.
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6.发明申请公开(公告)号：US20210063893A1
公开(公告)日：2021-03-04
申请号：US16983264
申请日：2020-08-03
发明人： Andrey NIKIPELOV , Patrick Sebastian Uebel , Amir Abdolvand , Sebastian Thomas Bauerschmidt , Peter Maximilian Götz , Natallia Eduardauna Uzunbajakava
IPC分类号： G03F7/20
摘要： A system and method for providing a radiation source is disclosed. In one arrangement, the radiation source includes a gas cell having a window, an optical fiber that is hollow and has an axial direction, an end thereof being enclosed within the gas cell and optically coupled to the window via an optical path, and a surface, disposed around the end of the optical fiber, and extending past the end of the optical fiber in the axial direction towards the window so as to limit one or more selected from: the exchange of gas between the optical path and the remainder of the gas cell, ingress of plasma towards or into the optical fiber, and/or radical flux towards etch-susceptible surfaces.
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公开(公告)号：US20190129299A1
公开(公告)日：2019-05-02
申请号：US16093537
申请日：2017-04-12
发明人： Maxim Aleksandrovich NASALEVICH , Erik Achilles ABEGG , Nirupam BANERJEE , Michiel Alexander BLAUW , Derk Servatius Gertruda BROUNS , Paul JANSSEN , Matthias KRUIZINGA , Egbert LENDERINK , Nicolae MAXIM , Andrey NIKIPELOV , Arnoud Willem NOTENBOOM , Claudia PILIEGO , Mária PÉTER , Gijsber RISPENS , Nadja SCHUH , Marcus Adrianus VAN DE KERKHOF , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Antonius Willem VERBURG , Johannes Petrus Martinus Bernardus VERMEULEN , David Ferdinand VLES , Willem-Pieter VOORTHUIJZEN , Aleksandar Nikolov ZDRAVICOV
摘要： Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
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公开(公告)号：US20220205900A1
公开(公告)日：2022-06-30
申请号：US17563867
申请日：2021-12-28
摘要： A method and apparatus for cleaning vacuum ultraviolet (VUV) optics (e.g., one or more mirrors of a VUV) of a substrate inspection system is disclosed. The cleaning system ionizes or disassociates hydrogen gas in a VUV optics environment to generate hydrogen radicals (e.g., H*) or ions (e.g., H+, H2+, H3+, which remove water or hydrocarbons from the surface of the one or more mirrors. The one or more VUV mirrors may include a reflective material, such as aluminum. The one or more VUV mirrors may have a protective coating to protect the reflective material from any detrimental reaction to the hydrogen radicals or ions. The protective coating may include a noble metal.
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公开(公告)号：US20220082945A1
公开(公告)日：2022-03-17
申请号：US17418719
申请日：2019-11-29
IPC分类号： G03F7/20
摘要： A method of producing a substrate holder for use in a lithographic apparatus, the substrate holder comprising a main body having a main body surface, wherein the method includes the steps of: coating at least part of the main body with a layer of a first coating material; and treating a plurality of discrete regions of the first coating material with laser irradiation to selectively convert said first coating material in said regions to a second coating material having a different structure or density.
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公开(公告)号：US20210055660A1
公开(公告)日：2021-02-25
申请号：US16977503
申请日：2019-02-25
发明人： Alexey Olegovich POLYAKOV , Erwin Paul SMAKMAN , Andrey NIKIPELOV , Albertus Victor Gerardus MANGNUS
IPC分类号： G03F7/20 , G01N23/2251 , H01L21/67
摘要： An inspection system that include a selective deposition tool configured to receive a sample and selectively deposit a material onto the sample, an inspection tool configured to perform an inspection process on the sample provided with the deposited material, and an enclosure configured to enclose the selective deposition tool and the inspection tool.
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