公开(公告)号：US20200326635A1

公开(公告)日：2020-10-15

申请号：US16761608

申请日：2018-10-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Abraham Alexander SOETHOUDT ,  Thomas POIESZ

IPC: G03F7/20

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member; and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

公开(公告)号：US20200292947A1

公开(公告)日：2020-09-17

申请号：US16758917

申请日：2018-10-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Thomas POIESZ ,  Satish ACHANTA ,  Jeroen BOUWKNEGT ,  Abraham Alexander SOETHOUDT

IPC: G03F7/20

Abstract: A substrate holder, a method of manufacturing of the substrate holder and a lithographic apparatus having the substrate holder. In one arrangement, a substrate holder is for use in a lithographic apparatus. The substrate holder is configured to support a lower surface of a substrate. The substrate holder has a main body, a plurality of burls and a coating. The main body has a substrate-facing face. The plurality of burls protrudes from the substrate-facing face. Each burl has a distal end configured to engage with the substrate. The distal ends are configured for supporting the substrate. The coating is on the substrate-facing face between the burls. Between the burls the substrate-facing face has an arrangement of areas. Adjacent areas are separated by a step-change in distance below the support plane. Each step-change is greater than a thickness of the coating.

公开(公告)号：US20180190534A1

公开(公告)日：2018-07-05

申请号：US15580601

申请日：2016-06-01

Applicant: ASML Netherlands B.V.

Inventor： Thomas POIESZ ,  Martijn HOUBEN ,  Abraham Alexander SOETHOUDT

IPC: H01L21/687 ,  H01L21/027 ,  G03F7/20 ,  B23H7/26

CPC classification number: H01L21/6875 ,  B23H7/26 ,  G03F7/2002 ,  G03F7/2004 ,  G03F7/707 ,  G03F7/70783 ,  H01L21/0274 ,  H01L21/6831 ,  H01L21/6838

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including: a main body having a main body surface; and a plurality of burls projecting from the main body surface; wherein each burl has a distal end configured to engage with the substrate; the distal ends of the burls substantially conform to a support plane whereby a substrate can be supported in a substantially flat state on the burls; a frictional force between the distal end of each burl and a substrate engaged therewith arises in a direction parallel to the support plane in the event of a relative movement of the substrate and substrate holder in the direction; and distal end surfaces of the burls are provided with a release structure configured so that the frictional force is less than would arise in the absence of the release structure.

公开(公告)号：US20220357675A1

公开(公告)日：2022-11-10

申请号：US17870444

申请日：2022-07-21

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Thomas POIESZ ,  Coen Hubertus Matheus BALTIS ,  Abraham Alexander SOETHOUDT ,  Mehmet Ali AKBAS ,  Dennis VAN DEN BERG ,  Wouter VANESCH ,  Marcel Maria Cornelius Franciscus TEUNISSEN

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.

公开(公告)号：US20210381548A1

公开(公告)日：2021-12-09

申请号：US17407778

申请日：2021-08-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Siegfried Alexander TROMP ,  Antonie Hendrik VERWEIJ ,  Abraham Alexander SOETHOUDT ,  Jan Pieter VAN DE POEL

IPC: F16C32/06 ,  H01L21/683 ,  F16C29/02 ,  G03F7/20

Abstract: A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.

公开(公告)号：US20180149983A1

公开(公告)日：2018-05-31

申请号：US15569135

申请日：2016-05-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Abraham Alexander SOETHOUDT ,  Thomas POIESZ

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  B01D53/346 ,  B01D53/56 ,  B01D53/79 ,  B01D2251/2062 ,  B01D2251/2067 ,  B01D2257/402 ,  B01D2257/404 ,  B01D2258/0283 ,  B01D2259/124 ,  B05B13/0278 ,  B05B13/041 ,  B05B13/0627 ,  B05B15/656 ,  B05B15/68 ,  F23J15/003 ,  F23J2219/20 ,  G03F7/707 ,  G03F7/70783 ,  Y02C20/10

Abstract: A lithographic apparatus includes a support table and a gas extraction system. The gas extraction system is configured to extract gas from a gap between a base surface of the support table and a substrate through at least one gas extraction opening when the substrate is being lowered onto the support table. The lithographic apparatus is configured such that gas is extracted from the gap at a first loading flow rate when the distance between the substrate and the support plane is greater than a threshold distance and gas is extracted from the gap at a second loading flow rate when the distance between the substrate and the support plane is less than the threshold distance, wherein the second loading flow rate is lower than the first loading flow rate.

公开(公告)号：US20230260820A1

公开(公告)日：2023-08-17

申请号：US18305925

申请日：2023-04-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus JEUNINK ,  Robby Franciscus Josephus MARTENS ,  Youssef Karel Maria DE VOS ,  Ringo Petrus Cornelis VAN DORST ,  Gerhard Albert TEN BRINKE ,  Dirk Jerome Andre SENDEN ,  Coen Hubertus Matheus BALTIS ,  Justin Johannes Hermanus GERRITZEN ,  Jelmer Mattheüs KAMMINGA ,  Evelyn Wallis PACITTI ,  Thomas POIESZ ,  Arie Cornelis SCHEIBERLICH ,  Bert Dirk SCHOLTEN ,  André SCHREUDER ,  Abraham Alexander SOETHOUDT ,  Siegfried Alexander TROMP ,  Yuri Johannes Gabriël VAN DE VIJVER

IPC: H01L21/683 ,  G03F7/00 ,  H01L21/687 ,  B25B11/00

CPC classification number: H01L21/6838 ,  G03F7/707 ,  G03F7/70733 ,  H01L21/68742 ,  B25B11/005

Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

公开(公告)号：US20210223696A1

公开(公告)日：2021-07-22

申请号：US16334381

申请日：2017-08-23

Applicant: ASML Netherlands B.V.

Inventor： Satish ACHANTA ,  Wilhelmus Jacobus Johannes WELTERS ,  Abraham Alexander SOETHOUDT ,  Jelmer Mattheüs KAMMINGA ,  Christian LIEDECKE

IPC: G03F7/16 ,  C23C16/458 ,  H01L21/67 ,  H01L21/687

Abstract: A substrate, a substrate holder, a substrate coating apparatus, a method for coating the substrate and a method for removing the coating. A monomolecular layer is applied to the backside of the substrate or a clamp surface of the substrate holder. The friction force between the substrate backside and the substrate is small when the substrate does not experience full clamping force. After loading the substrate on the substrate holder full clamping force is exerted in order to fix the substrate. The clamping force causes local removal of the monomolecular layer, resulting in an increase of the friction force between the substrate and the substrate holder.

公开(公告)号：US20200183289A1

公开(公告)日：2020-06-11

申请号：US16690198

申请日：2019-11-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Thomas POIESZ ,  Bert Dirk SCHOLTEN ,  Dirk Willem HARBERTS ,  Lucas Henricus Johannes STEVENS ,  Laura Maria FERNANDEZ DIAZ ,  Johannes Adrianus Cornelis Maria PIJNENBURG ,  Abraham Alexander SOETHOUDT ,  Wilhelmus Jacobus Johannes WELTERS ,  Jimmy Matheus Wilhelmus VAN DE WINKEL

IPC: G03F7/20

Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.

公开(公告)号：US20190339627A1

公开(公告)日：2019-11-07

申请号：US16511867

申请日：2019-07-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Abraham Alexander SOETHOUDT ,  Thomas POIESZ

IPC: G03F7/20 ,  B05B15/68 ,  B05B15/656 ,  B01D53/34 ,  B01D53/56 ,  B01D53/79 ,  B05B13/02 ,  B05B13/04 ,  F23J15/00

Abstract: A lithographic apparatus includes a support table and a gas extraction system. The gas extraction system is configured to extract gas from a gap between the base surface of the support table and a substrate through at least one gas extraction opening when the substrate is being lowered onto the support table. The lithographic apparatus is configured such that gas is extracted from the gap at a first loading flow rate when the distance between the substrate and the support plane is greater than a threshold distance and gas is extracted from the gap at a second loading flow rate when the distance between the substrate and the support plane is less than the threshold distance, wherein the second loading flow rate is lower than the first loading flow rate.