公开(公告)号：US20170192359A1

公开(公告)日：2017-07-06

申请号：US15308598

申请日：2015-04-23

Applicant: ASML Netherlands B.V. ,  ASML HOLDING N.V.

Inventor： Martinus Hendrikus Antonius LEENDERS ,  Niek Elout DE KRUIJF ,  Mircea DUSA ,  Martijn HOUBEN ,  Johannes Gerardus Maria MULDER ,  Thomas POIESZ ,  Marco Adrianus Peter VAN DEN HEUVEL ,  Paul VAN DONGEN ,  Justin Johannes Hermanus GERRITZEN ,  Antonie Hendrik VER WEIJ ,  Abraham Alexander SOETHOUDT

IPC: G03F7/20 ,  H01L21/683

CPC classification number: G03F7/707 ,  G03F7/70716 ,  G03F7/70783 ,  H01L21/6835 ,  H01L21/6838

Abstract: A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.

公开(公告)号：US20150364335A1

公开(公告)日：2015-12-17

申请号：US14764133

申请日：2014-01-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Sander Frederik WUISTER ,  Tamara DRUZHININA ,  Mircea DUSA

IPC: H01L21/308 ,  G03F1/50 ,  G03F1/80 ,  H01L29/78

CPC classification number: H01L21/3086 ,  B82Y10/00 ,  G03F1/50 ,  G03F1/80 ,  G03F7/0002 ,  H01L21/0271 ,  H01L21/0337 ,  H01L29/0673 ,  H01L29/66439 ,  H01L29/66795 ,  H01L29/775 ,  H01L29/785

Abstract: A method of forming a plurality of regularly spaced lithography features, the method including providing a self-assemblable block copolymer having first and second blocks in a plurality of trenches on a substrate, each trench including opposing side-walls and a base, with the side-walls having a width therebetween, wherein a first trench has a greater width than a second trench; causing the self-assemblable block copolymer to self-assemble into an ordered layer in each trench, the layer having a first domain of the first block alternating with a second domain of the second block, wherein the first and second trenches have the same number of each respective domain; and selectively removing the first domain to form regularly spaced rows of lithography features having the second domain along each trench, wherein the pitch of the features in the first trench is greater than the pitch of the features in the second trench.

Abstract translation: 一种形成多个规则间隔的光刻特征的方法，所述方法包括提供在衬底上的多个沟槽中具有第一和第二块的自组装嵌段共聚物，每个沟槽包括相对的侧壁和底部， 在其间具有宽度的壁，其中第一沟槽具有比第二沟槽更大的宽度; 使得所述自组装嵌段共聚物自组装成每个沟槽中的有序层，所述层具有所述第一嵌段的第一区域与所述第二嵌段的第二区域交替，其中所述第一和第二沟槽具有相同数量的 各个域; 并且选择性地移除所述第一区域以形成沿着每个沟槽具有所述第二区域的规则间隔的光刻特征行，其中所述第一沟槽中的所述特征的间距大于所述第二沟槽中的所述特征的间距。

公开(公告)号：US20140233025A1

公开(公告)日：2014-08-21

申请号：US14264547

申请日：2014-04-29

Applicant: ASML, Netherlands B.V.

Inventor： Arie Jeffrey Maria DEN BOEF ,  Arno Jan BLEEKER ,  Youri Johannes Laurentius Maria VAN DOMMELEN ,  Mircea DUSA ,  Antoine Gaston Marie KIERS ,  Paul Frank LUEHRMANN ,  Henricus Petrus Maria PELLEMANS ,  Maurits VAN DER SCHAAR ,  Cedric Desire GROUWSTRA ,  Markus Gerardus Martinus VAN KRAAIJ

IPC: G01N21/88

CPC classification number: G01N21/8806 ,  G03F7/70341 ,  G03F7/70633 ,  G03F7/7065 ,  G03F9/7034

Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.

Abstract translation: 通过在高数值孔径透镜的光瞳平面中测量作为辐射的结果的角度分辨光谱从衬底反射来确定衬底的性质的装置和方法。 该属性可以是角度和波长相关的，并且可以包括TM和TE偏振辐射的强度及其相对相位差。

公开(公告)号：US20210208083A1

公开(公告)日：2021-07-08

申请号：US17192276

申请日：2021-03-04

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey DEN BOEF ,  Amo Jan BLEEKER ,  Youri Johannes VAN DOMMELEN ,  Mircea DUSA ,  Antoine Gaston Marie KIERS ,  Paul Frank LUEHRMANN ,  Henricus Petrus Maria PELLEMANS ,  Maurits VAN DER SCHAAR ,  Cédric Désiré GROUWSTRA ,  Markus Geradus Maritinus VAN KRAAIJ

IPC: G01N21/88 ,  G03F7/20 ,  G03F9/00

Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.

公开(公告)号：US20190170657A1

公开(公告)日：2019-06-06

申请号：US16270155

申请日：2019-02-07

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey Maria DEN BOEF ,  Arno Jan BLEEKER ,  Youri Johannes Laurentiu VAN DOMMELEN ,  Mircea DUSA ,  Antoine Gaston Marie KIERS ,  Paul Frank LUEHRMANN ,  Henricus Petrus Maria PELLEMANS ,  Maurits VAN DER SCHAAR ,  Cedric Desire GROUWSTRA ,  Markus Gerardus Martinus VAN KRAAIJ

IPC: G01N21/88 ,  G03F7/20 ,  G03F9/00

Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.