公开(公告)号：US20220099498A1

公开(公告)日：2022-03-31

申请号：US17425646

申请日：2019-12-19

Applicant: ASML Netherlands B.V.

Inventor： Sietse Thijmen VAN DER POST ,  Peter Danny VAN VOORST

IPC: G01J9/00 ,  G21K1/06 ,  G01N23/207 ,  G02B5/18 ,  G02B3/00 ,  G03F7/20

Abstract: Disclosed is a wavefront sensor for measuring a tilt of a wavefront at an array of locations across a beam of radiation, wherein said wavefront sensor comprises a film, for example of Zirconium, having an indent array comprising an indent at each of said array of locations, such that each indent of the indent array is operable to perform focusing of said radiation. Also disclosed is a radiation source and inspection apparatus comprising such a wavefront sensor.

公开(公告)号：US20190049861A1

公开(公告)日：2019-02-14

申请号：US16037734

申请日：2018-07-17

Applicant: ASML Netherlands B.V.

Inventor： Peter Danny VAN VOORST ,  Teunis Willem Tukker ,  Nan Lin ,  Han-Kwang Nienhuys

IPC: G03F7/20 ,  G01B11/27 ,  G06T7/70

Abstract: A beam (542, 556) of inspection radiation is generated by focusing infrared (IR) radiation (540) at a source location so as to generate the inspection radiation (542) by high-harmonic generation in a gas cell (532). An illumination optical system (512) focuses the inspection radiation into a spot (S) of radiation by imaging the source location onto a metrology target (T). In one embodiment, the same illumination optical system forms a spot of the IR radiation onto a target material. A spot of visible radiation is generated by second harmonic generation at the metrology target. The visible spot is observed by an alignment camera (564). A special alignment target (592) may be provided, or material present in or near the metrology target can be used. In another embodiment, the spot is imaged using a portion (758) of the inspection radiation reflected by the target.

公开(公告)号：US20200100350A1

公开(公告)日：2020-03-26

申请号：US16566133

申请日：2019-09-10

Applicant: ASML Netherlands B.V.

Inventor： Peter Danny VAN VOORST

IPC: H05G2/00 ,  G03F7/20

Abstract: There is described an optical system (400) for focusing a beam of radiation (B) on a region of interest of a substrate in a metrology apparatus. The beam of radiation comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system comprises a first reflector system (410) and a second reflector system (412). Each of the first and second reflector systems (410, 412) comprises a finite-to-finite Wolter reflector system. The optical system (400) is configured to form, on the region of interest, a demagnified image (414) of an object (416) comprising an apparent source of the beam of radiation (B).

公开(公告)号：US20180120714A1

公开(公告)日：2018-05-03

申请号：US15569086

申请日：2016-04-19

Applicant: ASML Netherlands B.V.

Inventor： Ferry ZIJP ,  Duygu AKBULUT ,  Peter Danny VAN VOORST ,  Jeroen Johan Maarten VAN DE WIJDEVEN ,  Koos VAN BERKEL

IPC: G03F7/20 ,  G01B11/14 ,  G02B21/00 ,  G02B21/33

CPC classification number: G03F7/70641 ,  G01B11/14 ,  G01N21/956 ,  G02B5/3025 ,  G02B21/0016 ,  G03F7/70308 ,  G03F7/70591 ,  G03F7/70625 ,  G03F7/70633

Abstract: A method involving providing incident radiation of a first polarization state by an optical component into an interface of an object with an external environment, wherein a surface is provided adjacent the interface and separated by a gap from the interface, detecting, from incident radiation reflected from the interface and from the surface, radiation of a second different polarization state arising from the reflection of incident radiation of the first polarization at the interface as distinct from the radiation of the first polarization state in the reflected radiation, and producing a position signal representative of a relative position between the focus of the optical component and the object.

公开(公告)号：US20180073992A1

公开(公告)日：2018-03-15

申请号：US15683216

申请日：2017-08-22

Applicant: ASML Netherlands B.V.

Inventor： Peter Danny VAN VOORST ,  Nan Lin ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Sietse Thijmen Van Der Post

IPC: G01N21/88 ,  G03F7/20

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N2021/95676 ,  G03F7/70616 ,  G03F7/7065 ,  H05G2/00 ,  H05G2/008

Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.

公开(公告)号：US20190212660A1

公开(公告)日：2019-07-11

申请号：US16331547

申请日：2017-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitish KUMAR ,  Adrianus Johannes Hendrikus SCHELLEKENS ,  Sietse Thijmen VAN DER POST ,  Ferry ZIJP ,  Willem Maria Julia Marcel COENE ,  Peter Danny VAN VOORST ,  Duygu AKBULUT ,  Sarathi ROY

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70341 ,  G03F7/70516 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70941

Abstract: An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of, e.g., ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a solid immersion lens would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.

公开(公告)号：US20190072853A1

公开(公告)日：2019-03-07

申请号：US16117589

申请日：2018-08-30

Applicant: ASML Netherlands B.V.

Inventor： Sietse Thijmen VAN DER POST ,  Stefan Michael Bruno BÄUMER ,  Peter Danny VAN VOORST ,  Teunis Willem TUKKER ,  Ferry ZIJP ,  Han-Kwang NIENHUYS ,  Jacobus Maria Antonius VAN DEN EERENBEEMD

IPC: G03F7/20 ,  G21K1/06 ,  G01N21/47 ,  G01N21/95

Abstract: An optical system (OS) for focusing a beam of radiation (B) on a region of interest in a metrology apparatus is described. The beam of radiation (B) comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system (OS) comprises a first stage (S1) for focusing the beam of radiation at an intermediate focus region. The optical system (OS) comprises a second stage (S2) for focusing the beam of radiation from the intermediate focus region onto the region of interest. The first and second stages each comprise a Kirkpatrick-Baez reflector combination. At least one reflector comprises an aberration-correcting reflector.