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公开(公告)号：US20240160151A1
公开(公告)日：2024-05-16
申请号：US18280459
申请日：2022-03-04
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N. V.
Inventor： Willem Marie Julia Marcel COENE , Vasco Tomas TENNER , Hugo Augustinus Joseph CRAMER , Arie Jeffrrey DEN BOEF , Wouter Dick KOEK , Sergei SOKOLOV , Jeroen Johan Maarten VAN DE WIJDEVEN , Alexander Kenneth RAUB
CPC classification number: G03H1/0486 , G01N21/9501 , G02B21/10 , G02B21/365 , G03H1/0866 , G03H2001/0038 , G03H2001/0044 , G03H2001/005 , G03H2001/0232 , G03H2001/0445 , G03H2001/0473 , G03H2210/62
Abstract: A method of correcting a holographic image, a processing device, a dark field digital holographic microscope, a metrology apparatus and an inspection apparatus. The method includes obtaining a holographic image; determining at least one attenuation function due to motion blur from the holographic image; and correcting the holographic image, or a portion thereof, using the at least one attenuation function.
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公开(公告)号：US20230062585A1
公开(公告)日：2023-03-02
申请号：US17856213
申请日：2022-07-01
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Arie Jeffrey DEN BOEF , Armand Eugene Albert KOOLEN , Nitesh PANDEY , Vasco Tomas TENNER , Willem Marie Julia Marcel COENE , Patrick WARNAAR
Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
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公开(公告)号：US20230044632A1
公开(公告)日：2023-02-09
申请号：US17787244
申请日：2020-10-21
Applicant: ASML Netherlands B.V.
Inventor： Willem Marie Julia Marcel COENE , Arie Jeffrey DEN BOEF , Vasco Tomas TENNER , Nitesh PANDEY , Christos MESSINIS , Johannes Fitzgerald DE BOER
Abstract: A dark field digital holographic microscope is disclosed which is configured to determine a characteristic of interest of a structure. The dark field digital holographic microscope comprises an illumination device configured to provide at least: a first beam pair comprising a first illumination beam of radiation (1010) and a first reference beam of radiation (1030) and a second beam pair comprising a second illumination beam of radiation (1020) and a second reference beam of radiation (1040); and one or more optical elements (1070) operable to capture a first scattered radiation and to capture a second scattered radiation scattered by the structure resultant from the first and second illumination beams respectively. The beams of the first beam pair are mutually coherent and the beams of the second beam pair are mutually coherent. The illumination device is configured to impose incoherence (ADI) between the first beam pair and second beam pair.
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公开(公告)号：US20220309645A1
公开(公告)日：2022-09-29
申请号：US17618306
申请日：2020-05-08
Applicant: ASML Netherlands B.V.
Inventor： Vasco Tomas TENNER , Willem Marie Julia Marcel COENE
IPC: G06T7/00 , G01N21/88 , G01N21/956 , G03F7/20
Abstract: Disclosed is a method of determining a complex-valued field relating to a structure, comprising: obtaining image data relating to a series of images of the structure, for which at least one measurement parameter is varied over the series and obtaining a trained network operable to map a series of images to a corresponding complex-valued field. The method comprises inputting the image data into said trained network and non-iteratively determining the complex-valued field relating to the structure as the output of the trained network. A method of training the trained network is also disclosed.
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公开(公告)号：US20250014164A1
公开(公告)日：2025-01-09
申请号：US18893626
申请日：2024-09-23
Applicant: ASML Netherlands B.V.
Inventor： Vasco Tomas TENNER , Willem Marie Julia Marcel COENE
IPC: G06T7/00 , G01N21/88 , G01N21/956 , G03F7/00
Abstract: Disclosed is a method of determining a complex-valued field relating to a structure, comprising: obtaining image data relating to a series of images of the structure, for which at least one measurement parameter is varied over the series and obtaining a trained network operable to map a series of images to a corresponding complex-valued field. The method comprises inputting the image data into said trained network and non-iteratively determining the complex-valued field relating to the structure as the output of the trained network. A method of training the trained network is also disclosed.
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Patent Agency Ranking
6.发明公开公开(公告)号：US20240319620A1
公开(公告)日：2024-09-26
申请号：US18650790
申请日：2024-04-30
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Arie Jeffrey DEN BOEF , Armand Eugene Albert KOOLEN , Nitesh PANDEY , Vasco Tomas TENNER , Willem Marie Julia Marcel COENE , Patrick WARNAAR
CPC classification number: G03F7/7085 , G01B11/02 , G01B11/0625 , G01N21/4788 , G01N21/9501 , G03F7/70158 , G03F7/705 , G03F7/70625 , G03F7/70633 , G03F9/7088 , G01B2210/56
Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
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公开(公告)号：US20210389365A1
公开(公告)日：2021-12-16
申请号：US17460947
申请日：2021-08-30
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Patrick WARNAAR , Vasco Tomas TENNER , Maurits VAN DER SCHAAR
IPC: G01R31/265
Abstract: Disclosed is a method for obtaining a computationally determined interference electric field describing scattering of radiation by a pair of structures comprising a first structure and a second structure on a substrate. The method comprises determining a first electric field relating to first radiation scattered by the first structure; determining a second electric field relating to second radiation scattered by the second structure; and computationally determining the interference of the first electric field and second electric field, to obtain a computationally determined interference electric field.
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公开(公告)号：US20210003924A1
公开(公告)日：2021-01-07
申请号：US17022910
申请日：2020-09-16
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Arie Jeffrey DEN BOEF , Armand Eugene Albert KOOLEN , Nitesh PANDEY , Vasco Tomas TENNER , Willem Marie Julia Marcel COENE , Patrick WARNAAR
Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.
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公开(公告)号：US20240345489A1
公开(公告)日：2024-10-17
申请号：US18291534
申请日：2022-06-08
Applicant: ASML Netherlands B.V.
Inventor： Vasco Tomas TENNER , Hugo Augustinus Joseph CRAMER , Teunis Willem TUKKER , Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN
IPC: G03F7/00
CPC classification number: G03F7/706851 , G03F7/7065 , G03F7/706849
Abstract: Disclosed is a metrology device operable to measure a sample with measurement radiation and associated method. The metrology device comprises: an illumination branch operable to propagate measurement radiation to a sample, a detection branch operable to propagate one or more components of scattered radiation, scattered from said sample as a result of illumination of the sample by said measurement radiation; and a dispersive arrangement in either of said illumination branch or said detection branch. The dispersive arrangement is arranged to maintain one or more components of said scattered radiation at substantially a same respective location in a detection pupil plane over a range of wavelength values for said measurement radiation.
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公开(公告)号：US20230341813A1
公开(公告)日：2023-10-26
申请号：US18034356
申请日：2021-10-07
Applicant: ASML NETHERLANDS B.V.
Inventor： Nitesh PANDEY , Arie Jeffrey DEN BOEF , Hugo Augustinus Joseph CRAMER , Vasco Tomas TENNER
CPC classification number: G03H1/0443 , G03H1/265 , G03H2001/005
Abstract: A dark field digital holographic microscope and associated metrology method is disclosed which is configured to determine a characteristic of interest of a structure. The dark field digital holographic microscope includes an illumination branch for providing illumination radiation to illuminate the structure; a detection arrangement for capturing object radiation resulting from diffraction of the illumination radiation by the structure; and a reference branch for providing reference radiation for interfering with the object radiation to obtain an image of an interference pattern formed by the illumination radiation and reference radiation. The reference branch has an optical element operable to vary a characteristic of the reference radiation so as to reduce and/or minimize variation in a contrast metric of the image within a field of view of the dark field digital holographic microscope at a detector plane.
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