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公开(公告)号：US11050213B2
公开(公告)日：2021-06-29
申请号：US16910846
申请日：2020-06-24
Applicant: Cymer, LLC , ASML Netherlands B.V.
Inventor： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
IPC: G03F7/20 , H01S3/13 , H01S3/036 , H01S3/23 , H01S3/097 , H01S3/038 , H01S3/137 , G01J1/02 , H01S3/225 , H01S3/1055 , G01J1/42
Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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2.发明授权公开(公告)号：US09645510B2
公开(公告)日：2017-05-09
申请号：US14787738
申请日：2014-04-16
Applicant: ASML Netherlands B.V.
Inventor： Wilhelmus Patrick Elisabeth Maria Op 'T Root , Adrianus Leonardus Gertrudus Bommer , Robert De Jong , Frank Everts , Herman Philip Godfried , Roland Pieter Stolk , Paul Van Der Veen
IPC: G03B27/42 , G03F7/20 , H01S3/104 , H01S3/0975 , H01S3/225
CPC classification number: G03F7/70558 , G03F7/70025 , G03F7/70516 , H01S3/0975 , H01S3/104 , H01S3/225
Abstract: A method of selecting a periodic modulation to be applied to a variable of a radiation source, wherein the source delivers radiation for projection onto a substrate and wherein there is relative motion between the substrate and the radiation at a scan speed, the method including: for a set of system parameters and for a position on the substrate, calculating a quantity, the quantity being a measure of the contribution to an energy dose delivered to the position that arises from the modulation being applied to the variable of the source, wherein the contribution to the energy dose is calculated as a convolution of: a profile of radiation, and a contribution to an irradiance of radiation delivered by the source; and selecting a modulation frequency at which the quantity for the set of system parameters and the position on the substrate satisfies a certain criteria.
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公开(公告)号：US20200321746A1
公开(公告)日：2020-10-08
申请号：US16910846
申请日：2020-06-24
Applicant: Cymer, LLC , ASML Netherlands B.V.
Inventor： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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公开(公告)号：US20190324286A1
公开(公告)日：2019-10-24
申请号：US16503073
申请日：2019-07-03
Applicant: Cymer, LLC , ASML Netherlands B.V.
Inventor： Wilhelmus Patrick Elisabeth Maria op 't Root , Thomas Patrick Duffey , Herman Philip Godfried , Frank Everts , Joshua Jon Thornes , Brian Edward King
IPC: G02B27/48 , G01J3/02 , H01S3/225 , H01S3/00 , G03F7/20 , H01S4/00 , G01J11/00 , G01J9/02 , G01J3/26 , G02F1/01
Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
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公开(公告)号：US11287743B2
公开(公告)日：2022-03-29
申请号：US16977667
申请日：2019-02-21
Applicant: ASML Netherlands B.V.
Abstract: A control system for controlling a laser, comprising a sensor for sensing a physical value indicative of a characteristic of a laser beam emitted by the laser, a switch, a first controller and a second controller. Each controller is configured, to receive a further sensor value from the sensor, adjust a received setpoint value based on the received further sensor value to give an output value and cause the laser to operate in accordance with the output value. The switch is configured to switch between the controllers such that output values are provided from each controller in a cyclic fashion.
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Patent Agency Ranking
公开(公告)号：US20210239998A1
公开(公告)日：2021-08-05
申请号：US17240050
申请日：2021-04-26
Applicant: Cymer, LLC , ASML Netherlands B.V.
Inventor： Wilhelmus Patrick Elisabeth Maria op 't Root , Thomas Patrick Duffey , Herman Philip Godfried , Frank Everts , Joshua Jon Thornes , Brian Edward King
IPC: G02B27/48 , G01J3/26 , G01J9/02 , G01J3/02 , G03F7/20 , H01S3/225 , H01S3/00 , G01J11/00 , G02F1/01 , H01S4/00
Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
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公开(公告)号：US11054665B2
公开(公告)日：2021-07-06
申请号：US16503073
申请日：2019-07-03
Applicant: Cymer, LLC , ASML Netherlands B.V.
Inventor： Wilhelmus Patrick Elisabeth Maria op 't Root , Thomas Patrick Duffey , Herman Philip Godfried , Frank Everts , Joshua Jon Thornes , Brian Edward King
IPC: G02B27/48 , G01J3/26 , G01J9/02 , G01J3/02 , G03F7/20 , H01S3/225 , H01S3/00 , G01J11/00 , G02F1/01 , H01S4/00 , G02B19/00
Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
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公开(公告)号：US10451890B2
公开(公告)日：2019-10-22
申请号：US15407153
申请日：2017-01-16
Applicant: Cymer, LLC , ASML Netherlands B.V.
Inventor： Wilhelmus Patrick Elisabeth Maria op 't Root , Thomas Patrick Duffey , Herman Philip Godfried , Frank Everts , Joshua Jon Thornes , Brian Edward King
IPC: G01J3/02 , G01J3/26 , G01J9/02 , G02F1/01 , G03F7/20 , H01S3/00 , H01S4/00 , G01J11/00 , G02B19/00 , G02B27/48
Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
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公开(公告)号：US20180203248A1
公开(公告)日：2018-07-19
申请号：US15407153
申请日：2017-01-16
Applicant: Cymer, LLC , ASML Netherlands B.V.
Inventor： Wilhelmus Patrick Elisabeth Maria op `t Root , Thomas Patrick Duffey , Herman Philip Godfried , Frank Everts , Joshua Jon Thornes , Brian Edward King
Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
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公开(公告)号：US09762023B2
公开(公告)日：2017-09-12
申请号：US14976829
申请日：2015-12-21
Applicant: CYMER, LLC , ASML NETHERLANDS B.V.
Inventor： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
CPC classification number: G01J11/00 , G01J1/0228 , G01J1/0448 , G01J1/4257 , G03F7/70041 , G03F7/70516 , G03F7/7055 , G03F7/70558 , G03F7/70575 , H01S3/0014 , H01S3/10046 , H01S3/10069
Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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