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公开(公告)号：USD1059312S1
公开(公告)日：2025-01-28
申请号：US29848747
申请日：2022-08-04
Applicant: Applied Materials, Inc.
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公开(公告)号：US11940819B1
公开(公告)日：2024-03-26
申请号：US18099853
申请日：2023-01-20
Applicant: Applied Materials, Inc.
Inventor： Abhishek Chowdhury , Ravikumar Patil , Arun Chakravarthy Chakravarthy , Jon Christian Farr , Saravanan Chandrabalu , Prabhuraj Kuberan
CPC classification number: G05D11/132 , B01F23/191 , F17D1/04 , F17D3/01 , Y10T137/87249
Abstract: Embodiments of fast gas exchange (FGE) manifolds are provided herein. In some embodiments, a FGE manifold includes: a manifold housing having a plurality of inlets and a plurality of outlets for flowing a plurality of process gases therethrough, wherein the plurality of outlets correspond with a plurality of zones in the process chamber; a plurality of hybrid valves disposed in the manifold housing and fluidly coupled to the plurality of inlets; a plurality of mass flow controllers disposed in the manifold housing downstream of the plurality of hybrid valves; a plurality of mixing lines extending downstream from the plurality of mass flow controllers to a plurality of outlet lines; and a plurality of outlet valves disposed in line with corresponding ones of the plurality of outlet lines, wherein a flow path is defined between each inlet of the plurality of inlets and each outlet of the plurality of outlets.
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公开(公告)号：US11881416B2
公开(公告)日：2024-01-23
申请号：US17120976
申请日：2020-12-14
Applicant: Applied Materials, Inc.
Inventor： Arun Chakravarthy Chakravarthy , Chahal Neema , Abhijit A. Kangude , Elizabeth Neville , Vishal S. Jamakhandi , Kurt R. Langeland , Syed A. Alam , Ming Xu , Kenneth Le
CPC classification number: H01L21/67017 , H01J37/3244 , H01J37/32357 , H01J37/32899 , H01L21/67167 , H01J2237/006
Abstract: Exemplary substrate processing systems may include a lid plate. The systems may include a gas splitter seated on the lid plate. The gas splitter may define a plurality of gas inlets and gas outlets. A number of gas outlets may be greater than a number of gas inlets. The systems may include a plurality of valve blocks that are interfaced with the gas splitter. Each valve block may define a number of gas lumens. An inlet of each of the gas lumens may be in fluid communication with one of the gas outlets. An interface between the gas splitter and each of the valve blocks may include a choke. The systems may include a plurality of output manifolds seated on the lid plate. The systems may include a plurality of output weldments that may couple an outlet of one of the gas lumens with one of the output manifolds.
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公开(公告)号：USD1069863S1
公开(公告)日：2025-04-08
申请号：US29848746
申请日：2022-08-04
Applicant: Applied Materials, Inc.
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公开(公告)号：USD1064005S1
公开(公告)日：2025-02-25
申请号：US29848745
申请日：2022-08-04
Applicant: Applied Materials, Inc.
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Patent Agency Ranking
公开(公告)号：US20240047185A1
公开(公告)日：2024-02-08
申请号：US17880335
申请日：2022-08-03
Applicant: Applied Materials, Inc.
Inventor： Abhijit A. Kangude , Badri N. Ramamurthi , Arun Chakravarthy Chakravarthy , Vinay K. Prabhakar , Dharma Ratnam Srichurnam
CPC classification number: H01J37/32853 , H01J37/32357 , H01J37/32449 , H01J37/32899 , H01J37/32522 , C23C16/4405 , C23C16/4408 , H01J2237/002
Abstract: Exemplary substrate processing systems may include a lid plate. The systems may include a gas feed line having an RPS outlet and a bypass outlet. The systems may include a remote plasma unit supported atop the lid plate. The remote plasma unit may include an inlet and an outlet. The inlet may be coupled with the RPS outlet. The systems may include a center manifold having an RPS inlet coupled with the outlet and a bypass inlet coupled with the bypass outlet. The center manifold may include a plurality of outlet ports. The systems may include a plurality of side manifolds that are fluidly coupled with the outlet ports. Each of the side manifolds may define a gas lumen. The systems may include a plurality of output manifolds seated on the lid plate. Each output manifold may be fluidly coupled with the gas lumen of one of the side manifolds.
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公开(公告)号：US20240043999A1
公开(公告)日：2024-02-08
申请号：US17880310
申请日：2022-08-03
Applicant: Applied Materials, Inc.
Inventor： Abhijit A. Kangude , Arun Chakravarthy Chakravarthy
IPC: C23C16/455 , C23C16/24
CPC classification number: C23C16/45561 , C23C16/24 , C23C16/45512
Abstract: Exemplary semiconductor processing systems may a lid plate. A gas splitter may be seated on the lid plate. The gas splitter may include a top surface and a plurality of side surfaces. The gas splitter may defines a gas inlet, one or more gas outlets, and one or more gas lumens. The one or more gas lumens may extend between and fluidly couple the gas inlet with each of the one or more gas outlets. A primary gas weldment may extend to and fluidly couples to the gas inlet. A gas panel may include a first fluid source and a second fluid source that are each fluidly coupled with the primary gas weldment. One or more secondary gas weldments may extend between and fluidly couple each of the one or more gas outlets with a respective one of the plurality of processing chambers.
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公开(公告)号：US20240047232A1
公开(公告)日：2024-02-08
申请号：US17880885
申请日：2022-08-04
Applicant: Applied Materials, Inc.
IPC: H01L21/67
CPC classification number: H01L21/67017 , H01L21/67167
Abstract: Exemplary semiconductor processing systems may include a lid plate and a gas splitter. The gas splitter may be seated on the lid plate. The gas splitter may include a top surface and a plurality of side surfaces. The gas splitter may define a gas inlet, a gas outlet, a gas lumen that extends between and fluidly couples the gas inlet with the gas outlet, and a first divert lumen that is fluidly coupled with the gas lumen and that directs gases away from a processing chamber through a divert outlet. The semiconductor processing system may include a first divert weldment. The first divert weldment may extend from and fluidly couple to the divert outlet. The first divert weldment may include a first divert weldment outlet and a second divert weldment outlet.
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公开(公告)号：US20230124246A1
公开(公告)日：2023-04-20
申请号：US17505323
申请日：2021-10-19
Applicant: Applied Materials, Inc.
Inventor： Arun Chakravarthy Chakravarthy , Vinay K. Prabhakar , Dharma Ratnam Srichurnam , Hossein Rezvantalab
IPC: H01J37/32
Abstract: Exemplary substrate processing systems may include a lid plate. The systems may include a gas splitter seated on the lid plate. The gas splitter may include a top surface and side surfaces. The gas splitter may define a first and second gas inlets, with each gas inlet extending through one side surface. The gas splitter may define first and second gas outlets extending through the top surface. The gas splitter may define first and second gas lumens that extend between and fluidly couple each gas inlet with corresponding gas outlets. The gas splitter may define mixing channels that include a mixing outlet extending through a side surface and a mixing inlet extending through the top surface. The systems may include output manifolds seated on the lid plate. The systems may include output weldments that fluidly couple each mixing outlet with a respective one of the output manifolds.
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公开(公告)号：US20220189793A1
公开(公告)日：2022-06-16
申请号：US17120976
申请日：2020-12-14
Applicant: Applied Materials, Inc.
Inventor： Arun Chakravarthy Chakravarthy , Chahal Neema , Abhijit A. Kangude , Elizabeth Neville , Vishal S. Jamakhandi , Kurt R. Langeland , Syed A. Alam , Ming Xu , Kenneth Le
Abstract: Exemplary substrate processing systems may include a lid plate. The systems may include a gas splitter seated on the lid plate. The gas splitter may define a plurality of gas inlets and gas outlets. A number of gas outlets may be greater than a number of gas inlets. The systems may include a plurality of valve blocks that are interfaced with the gas splitter. Each valve block may define a number of gas lumens. An inlet of each of the gas lumens may be in fluid communication with one of the gas outlets. An interface between the gas splitter and each of the valve blocks may include a choke. The systems may include a plurality of output manifolds seated on the lid plate. The systems may include a plurality of output weldments that may couple an outlet of one of the gas lumens with one of the output manifolds.
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