Method and system for forming an oxynitride layer by performing oxidation and nitridation concurrently
    2.
    发明授权
    Method and system for forming an oxynitride layer by performing oxidation and nitridation concurrently 失效
    通过同时进行氧化和氮化来形成氮氧化物层的方法和系统

    公开(公告)号:US07517814B2

    公开(公告)日:2009-04-14

    申请号:US11093262

    申请日:2005-03-30

    IPC分类号: H01L21/33

    CPC分类号: H01L21/3144 C23C8/28 C23C8/36

    摘要: A method for preparing an oxynitride film on a substrate comprising forming the oxynitride film by exposing a surface of the substrate to oxygen radicals and nitrogen radicals formed by plasma induced dissociation of a process gas comprising nitrogen and oxygen using plasma based on microwave irradiation via a plane antenna member having a plurality of slits.

    摘要翻译: 一种在衬底上制备氮氧化物膜的方法,包括通过将基底的表面暴露于氧自由基和由等离子体引起的等离子体诱导的包含氮和氧的工艺气体的解离而形成氮氧化合物的方法,所述方法基于经由平面的微波照射的等离子体 天线构件具有多个狭缝。

    Method and system for forming an oxynitride layer
    8.
    发明授权
    Method and system for forming an oxynitride layer 失效
    用于形成氧氮化物层的方法和系统

    公开(公告)号:US07501352B2

    公开(公告)日:2009-03-10

    申请号:US11093260

    申请日:2005-03-30

    IPC分类号: H01L21/31

    摘要: The present invention generally provides a method for preparing an oxynitride film on a substrate. A surface of the substrate is exposed to oxygen radicals formed by ultraviolet (UV) radiation induced dissociation of a first process gas comprising at least one molecular composition comprising oxygen to form an oxide film on the surface. The oxide film is exposed to nitrogen radicals formed by plasma induced dissociation of a second process gas comprising at least one molecular composition comprising nitrogen using plasma based on microwave irradiation via a plane antenna member having a plurality of slits to nitridate the oxide film and form the oxynitride film.

    摘要翻译: 本发明通常提供了在基板上制备氮氧化物膜的方法。 衬底的表面暴露于通过紫外线(UV)辐射诱导的包含至少一种包含氧的分子组合物的第一工艺气体的解离形成的氧自由基,以在表面上形成氧化膜。 氧化物膜暴露于通过等离子体诱导的包含至少一种包含氮的分子组合物的等离子体诱导的解离形成的氮自由基,所述分子组合物包含氮,使用基于微波照射的等离子体通过具有多个狭缝的平面天线构件来氮化氧化膜并形成 氧氮化物膜。