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    METHOD FOR FABRICATING EMITTER
    1.
    发明申请
    METHOD FOR FABRICATING EMITTER 审中-公开
    制造发电机的方法

    公开(公告)号：US20140246397A1

    公开(公告)日：2014-09-04

    申请号：US14278760

    申请日：2014-05-15

    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

    Inventor： Yasuhiko SUGIYAMA ,  Kazuo AITA ,  Fumio ARAMAKI ,  Tomokazu KOZAKAI ,  Osamu MATSUDA ,  Anto YASAKA

    IPC: H01J27/02

    CPC classification number: H01J27/02 ,  H01J1/15 ,  H01J1/3044 ,  H01J9/02 ,  H01J9/025 ,  H01J9/04 ,  H01J37/08 ,  H01J37/26 ,  H01J37/3056 ,  H01J2237/3174 ,  H01J2237/31749

    Abstract: A method for fabricating a sharpened needle-like emitter, the method including: electrolytically polishing an end portion of an electrically conductive emitter material so as to be tapered toward a tip portion thereof; performing a first etching in which the electrolytically polished part of the emitter material is irradiated with a charged-particle beam to form a pyramid-like sharpened part having a vertex including the tip portion; performing a second etching in which the tip portion is further sharpened through field-assisted gas etching, while observing a crystal structure at the tip portion by a field ion microscope and keeping the number of atoms at a leading edge of the tip portion at a predetermined number or less; and heating the emitter material to arrange the atoms at the leading edge of the tip portion of the sharpened part in a pyramid shape.

    Abstract translation: 一种用于制造尖锐的针状发射体的方法，该方法包括：电解抛光导电发射体材料的端部，使其朝其尖端部分逐渐变细; 进行第一蚀刻，其中用电荷粒子束照射发射体材料的电解抛光部分以形成具有包括尖端部分的顶点的棱锥状的锐化部分; 进行第二蚀刻，其中尖端部分通过场辅助气体蚀刻进一步锐化，同时通过场离子显微镜观察尖端部分处的晶体结构，并将尖端部分的前缘处的原子数保持在预定的 数量以下 并且加热发射体材料以将原子布置在尖锐部分的尖端部分的金字塔形状。

    EMITTER STRUCTURE, GAS ION SOURCE AND FOCUSED ION BEAM SYSTEM
    2.
    发明申请
    EMITTER STRUCTURE, GAS ION SOURCE AND FOCUSED ION BEAM SYSTEM 有权
    发射体结构，气体离子源和聚焦离子束系统

    公开(公告)号：US20140291542A1

    公开(公告)日：2014-10-02

    申请号：US14224149

    申请日：2014-03-25

    Applicant: Hitachi High-Tech Science Corporation

    Inventor： Anto YASAKA ,  Yasuhiko SUGIYAMA ,  Hiroshi OBA

    IPC: H01J27/26 ,  H01J37/08

    CPC classification number: H01J27/26 ,  H01J1/15 ,  H01J1/18 ,  H01J3/04 ,  H01J27/024 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/06316

    Abstract: There is provided an emitter structure, a gas ion source including the emitter structure, and a focused ion beam system including the gas ion source. The emitter structure includes a pair of conductive pins which are fixed to a base member, a filament which is connected between the pair of conductive pins, and an emitter which is connected to the filament and has a sharp tip. A supporting member is fixed to the base material, and the emitter is connected to the supporting member.

    Abstract translation: 提供了发射极结构，包括发射极结构的气体离子源和包括气体离子源的聚焦离子束系统。 发射极结构包括固定到基底构件的一对导电引脚，连接在一对导电引脚之间的细丝和连接到灯丝并具有尖锐尖端的发射极。 支撑构件固定在基材上，发射体与支撑构件连接。

    FOCUSED ION BEAM APPARATUS
    7.
    发明申请
    FOCUSED ION BEAM APPARATUS 有权
    聚焦离子束设备

    公开(公告)号：US20160225574A1

    公开(公告)日：2016-08-04

    申请号：US15010231

    申请日：2016-01-29

    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

    Inventor： Anto YASAKA ,  Tomokazu KOZAKAI ,  Osamu MATSUDA ,  Yasuhiko SUGIYAMA ,  Kazuo AITA ,  Fumio ARAMAKI ,  Hiroshi OBA

    IPC: H01J37/08

    CPC classification number: H01J37/08 ,  H01J2237/0807

    Abstract: Disclosed herein is a focused ion beam apparatus equipped with a gas field ion source that can produce a focused ion beam for a long period of time by stably and continuously emitting ions from the gas field ion source having high luminance, along an optical axis of an ion-optical system for a long period of time. In the focused ion beam apparatus equipped with a gas field ion source having an emitter for emitting ions, the emitter has a shape in which sharpened iridium is fixed to dissimilar wire.

    Abstract translation: 本发明公开了一种配备有气体离子源的聚焦离子束装置，其可以通过从具有高亮度的气体离子源稳定且连续地发射离子而长时间地产生聚焦离子束，沿着 离子光学系统长时间使用。 在配备有具有用于发射离子的发射极的气体离子源的聚焦离子束装置中，发射体具有将锐化的铱固定在不同的线上的形状。

    FOCUSED ION BEAM APPARATUS
    8.
    发明申请
    FOCUSED ION BEAM APPARATUS 审中-公开
    聚焦离子束设备

    公开(公告)号：US20150162160A1

    公开(公告)日：2015-06-11

    申请号：US14591843

    申请日：2015-01-07

    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

    Inventor： Anto YASAKA ,  Fumio ARAMAKI ,  Yasuhiko SUGIYAMA ,  Tomokazu KOZAKAI ,  Osamu MATSUDA

    IPC: H01J27/02 ,  H01J27/26

    CPC classification number: H01J27/024 ,  H01J27/26 ,  H01J37/08 ,  H01J37/3056 ,  H01J2237/0807 ,  H01J2237/182

    Abstract: A focused ion beam apparatus has an ion source chamber in which is disposed an emitter for emitting ions. The surface of the emitter is formed of a precious metal, such as platinum, palladium, iridium, rhodium or gold. A gas supply unit supplies nitrogen gas to the ion source chamber so that the nitrogen gas adsorbs on the surface of the emitter. An extracting electrode is spaced from the emitter, and a voltage is applied to the extracting electrode to ionize the adsorbed nitrogen gas and extract nitrogen ions in the form of an ion beam. A temperature control unit controls the temperature of the emitter.

    Abstract translation: 聚焦离子束装置具有离子源室，其中设置有用于发射离子的发射极。 发射体的表面由贵金属形成，例如铂，钯，铱，铑或金。 气体供给单元向离子源室供给氮气，使得氮气吸附在发射体的表面。 提取电极与发射极间隔开，并向提取电极施加电压，使吸附的氮气离子化，并以离子束形式提取氮离子。 温度控制单元控制发射器的温度。

    METHOD FOR FABRICATING EMITTER
    9.
    发明申请
    METHOD FOR FABRICATING EMITTER 有权
    制造发电机的方法

    公开(公告)号：US20130248483A1

    公开(公告)日：2013-09-26

    申请号：US13845630

    申请日：2013-03-18

    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

    Inventor： Yasuhiko SUGIYAMA ,  Kazuo AITA ,  Fumio ARAMAKI ,  Tomokazu KOZAKAI ,  Osamu MATSUDA ,  Anto YASAKA

    IPC: H01J9/02

    CPC classification number: H01J27/02 ,  H01J1/15 ,  H01J1/3044 ,  H01J9/02 ,  H01J9/025 ,  H01J9/04 ,  H01J37/08 ,  H01J37/26 ,  H01J37/3056 ,  H01J2237/3174 ,  H01J2237/31749

    Abstract: A method for fabricating a sharpened needle-like emitter, the method including: electrolytically polishing an end portion of an electrically conductive emitter material so as to be tapered toward a tip portion thereof; performing a first etching in which the electrolytically polished part of the emitter material is irradiated with a charged-particle beam to form a pyramid-like sharpened part having a vertex including the tip portion; performing a second etching in which the tip portion is further sharpened through field-assisted gas etching, while observing a crystal structure at the tip portion by a field ion microscope and keeping the number of atoms at a leading edge of the tip portion at a predetermined number or less; and heating the emitter material to arrange the atoms at the leading edge of the tip portion of the sharpened part in a pyramid shape.

    Abstract translation: 一种用于制造尖锐的针状发射体的方法，该方法包括：电解抛光导电发射体材料的端部，使其朝其尖端部分逐渐变细; 进行第一蚀刻，其中用电荷粒子束照射发射体材料的电解抛光部分以形成具有包括尖端部分的顶点的棱锥状的锐化部分; 进行第二蚀刻，其中尖端部分通过场辅助气体蚀刻进一步锐化，同时通过场离子显微镜观察尖端部分处的晶体结构，并将尖端部分的前缘处的原子数保持在预定的 数量以下 并且加热发射体材料以将原子布置在尖锐部分的尖端部分的金字塔形状。

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