公开(公告)号：US20210118642A1

公开(公告)日：2021-04-22

申请号：US17072691

申请日：2020-10-16

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Yasuhiko SUGIYAMA ,  Naoko HIROSE

IPC: H01J37/12 ,  H01J37/147 ,  H01J37/08 ,  H01J37/153 ,  H01J37/28

Abstract: The focused ion beam apparatus includes: an ion source configured to generate ions; a first electrostatic lens configured to accelerate and focus the ions to form an ion beam; a beam booster electrode configured to accelerate the ion beam to a higher level; one or a plurality of electrodes, which are placed in the beam booster electrode, and are configured to electrostatically deflect the ion beam; a second electrostatic lens, which is provided between the one or plurality of electrodes and a sample table, and is configured to focus the ion beam applied with a voltage; and a processing unit configured to obtain a measurement condition, and set at least one of voltages to be applied to the one or plurality of electrodes or a voltage to be applied to each of the first electrostatic lens and the second electrostatic lens, based on the obtained measurement condition.

公开(公告)号：US20210118645A1

公开(公告)日：2021-04-22

申请号：US17072678

申请日：2020-10-16

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Yasuhiko SUGIYAMA ,  Koji NAGAHARA

IPC: H01J37/28 ,  H01J37/12 ,  H01J37/147

Abstract: The charged particle beam apparatus includes: a charged particle source configured to generate charged particles; a plurality of scanning electrodes configured to generate electric fields for deflecting charged particles that are emitted by applying an acceleration voltage to the charged particle source, and applying an extraction voltage to an extraction electrode configured to extract the charged particles; an electrostatic lens, which is provided between the plurality of scanning electrodes and a sample table, and is configured to focus a charged particle beam deflected by the plurality of scanning electrodes; and a processing unit configured to obtain a measurement condition, and set each of scanning voltages to be applied to the plurality of scanning electrodes based on the obtained measurement condition.

公开(公告)号：US20150357147A1

公开(公告)日：2015-12-10

申请号：US14830106

申请日：2015-08-19

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Anto YASAKA ,  Yasuhiko SUGIYAMA ,  Hiroshi OBA

IPC: H01J27/26 ,  H01J27/02 ,  H01J37/08

CPC classification number: H01J27/26 ,  H01J1/15 ,  H01J1/18 ,  H01J3/04 ,  H01J27/024 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/06316

Abstract: A focused ion beam system includes a gas ion source and an emitter structure. The emitter structure includes a pair of conductive pins fixed to a base member, a filament connected between the pair of conductive pins, and an emitter which has a tip end with one atom or three atoms and which is connected to the filament. A supporting member is fixed to the base material, and the emitter is connected to the supporting member.

Abstract translation: 聚焦离子束系统包括气体离子源和发射极结构。 发射极结构包括固定到基底构件的一对导电引脚，连接在一对导电引脚之间的细丝和具有一个原子或三个原子的尖端并连接到灯丝的发射极。 支撑构件固定在基材上，发射体与支撑构件连接。

公开(公告)号：US20170069456A1

公开(公告)日：2017-03-09

申请号：US15256967

申请日：2016-09-06

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Yasuhiko SUGIYAMA ,  Hiroshi OBA

IPC: H01J37/08 ,  H01J37/10

CPC classification number: H01J37/08 ,  H01J37/10 ,  H01J37/12 ,  H01J37/18 ,  H01J2237/0805 ,  H01J2237/083 ,  H01J2237/103

Abstract: A focused ion beam apparatus includes an ion source that emits an ion beam, an extraction electrode that extracts ions from a tip end of an emitter of the ion source, and a first lens electrode that configures a condenser lens by a potential difference with the extraction electrode, the condenser lens focusing the ions extracted by the extraction electrode, in which a strong lens action is generated between the extraction electrode and the first lens electrode so as to focus all ions extracted from the ion source to pass through a hole of the condenser lens including the first lens electrode.

Abstract translation: 聚焦离子束装置包括发射离子束的离子源，从离子源的发射极的前端提取离子的提取电极和通过提取电位差构成聚光透镜的第一透镜电极 电极，所述聚光透镜聚焦由所述提取电极提取的离子，其中在所述提取电极和所述第一透镜电极之间产生强透镜作用，以便将从所述离子源提取的所有离子聚焦通过所述冷凝器的孔 透镜包括第一透镜电极。

公开(公告)号：US20140292189A1

公开(公告)日：2014-10-02

申请号：US14218020

申请日：2014-03-18

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Fumio ARAMAKI ,  Yasuhiko SUGIYAMA ,  Hiroshi OBA

IPC: H01J37/30

CPC classification number: H01J37/08 ,  H01J2237/002 ,  H01J2237/0807

Abstract: A focused ion beam apparatus is configured to perform at least one of a process of controlling an operation of a cooling unit so that a temperature of a wall surface contacting a source gas in an ion source chamber is maintained at a temperature higher than a temperature at which the source gas freezes and a process of controlling an operation of a heater so that an emitter is temporarily heated when the source gas is exchanged.

Abstract translation: 聚焦离子束装置被配置为执行控制冷却单元的操作的处理中的至少一个，使得与离子源室中的源气体接触的壁面的温度保持在高于 源气体冻结，并且控制加热器的操作的过程，使得当更换源气体时发射器被暂时加热。

公开(公告)号：US20140284474A1

公开(公告)日：2014-09-25

申请号：US14221514

申请日：2014-03-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Yasuhiko SUGIYAMA ,  Tomokazu KOZAKAI ,  Osamu MATSUDA

IPC: H01J37/26 ,  H01J27/20

CPC classification number: H01J37/28 ,  H01J37/08 ,  H01J37/222 ,  H01J2237/0807 ,  H01J2237/221 ,  H01J2237/2803 ,  H01J2237/31749

Abstract: A focused ion beam system includes a gas field ion source which generates gas ions, an ion gun unit which accelerates the gas ions and radiates the gas ions as an ion beam, a beam optical system which includes at least a focusing lens electrode and radiates the ion beam onto a sample, and an image acquiring mechanism which acquires an FIM image of a tip of an emitter based on the ion beam. The image acquiring mechanism includes an alignment electrode which is disposed between the ion gun unit and the focusing lens electrode and adjusts a radiation direction of the ion beam, an alignment control unit which applies an alignment voltage to the alignment electrode, and an image processing unit which combines a plurality of FIM images acquired when applying different alignment voltages to generate one composite FIM image.

Abstract translation: 聚焦离子束系统包括产生气体离子的气体离子源，加速气体离子并将气体离子作为离子束辐射的离子枪单元，包括至少聚焦透镜电极的射束光学系统， 离子束到样品，以及图像获取机构，其基于离子束获取发射器的尖端的FIM图像。 图像获取机构包括配置在离子枪单元和聚焦透镜电极之间并调整离子束的辐射方向的取向电极，向对准电极施加取向电压的取向控制单元和图像处理单元 其组合当应用不同对准电压时获得的多个FIM图像以生成一个复合FIM图像。

公开(公告)号：US20140246397A1

公开(公告)日：2014-09-04

申请号：US14278760

申请日：2014-05-15

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Yasuhiko SUGIYAMA ,  Kazuo AITA ,  Fumio ARAMAKI ,  Tomokazu KOZAKAI ,  Osamu MATSUDA ,  Anto YASAKA

IPC: H01J27/02

CPC classification number: H01J27/02 ,  H01J1/15 ,  H01J1/3044 ,  H01J9/02 ,  H01J9/025 ,  H01J9/04 ,  H01J37/08 ,  H01J37/26 ,  H01J37/3056 ,  H01J2237/3174 ,  H01J2237/31749

Abstract: A method for fabricating a sharpened needle-like emitter, the method including: electrolytically polishing an end portion of an electrically conductive emitter material so as to be tapered toward a tip portion thereof; performing a first etching in which the electrolytically polished part of the emitter material is irradiated with a charged-particle beam to form a pyramid-like sharpened part having a vertex including the tip portion; performing a second etching in which the tip portion is further sharpened through field-assisted gas etching, while observing a crystal structure at the tip portion by a field ion microscope and keeping the number of atoms at a leading edge of the tip portion at a predetermined number or less; and heating the emitter material to arrange the atoms at the leading edge of the tip portion of the sharpened part in a pyramid shape.

Abstract translation: 一种用于制造尖锐的针状发射体的方法，该方法包括：电解抛光导电发射体材料的端部，使其朝其尖端部分逐渐变细; 进行第一蚀刻，其中用电荷粒子束照射发射体材料的电解抛光部分以形成具有包括尖端部分的顶点的棱锥状的锐化部分; 进行第二蚀刻，其中尖端部分通过场辅助气体蚀刻进一步锐化，同时通过场离子显微镜观察尖端部分处的晶体结构，并将尖端部分的前缘处的原子数保持在预定的 数量以下 并且加热发射体材料以将原子布置在尖锐部分的尖端部分的金字塔形状。

公开(公告)号：US20240355574A1

公开(公告)日：2024-10-24

申请号：US18687706

申请日：2021-09-01

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Koji NAGAHARA ,  Hiroshi OBA ,  Yasuhiko SUGIYAMA

IPC: H01J37/09 ,  H01J37/08 ,  H01J37/28 ,  H01J37/305

CPC classification number: H01J37/09 ,  H01J37/3056 ,  H01J37/08 ,  H01J37/28 ,  H01J2237/31749

Abstract: An ion beam tube of a composite beam device is provided with an ion source and an ion optics. The ion optics is provided with a diaphragm member in which at least one through-hole that is switchable in order to pass part of an ion beam generated from the ion source therethrough is formed. The ion optics is provided with a blocking member that blocks part of the ion beam passing through the through-hole of the diaphragm member, and a blocking drive mechanism that drives the blocking member. The blocking drive mechanism performs switching between the presence and absence of blocking of the ion beam passing through the through-hole of the diaphragm member by the blocking member in a state where the ion optics maintains a predetermined optical condition.

公开(公告)号：US20200266029A1

公开(公告)日：2020-08-20

申请号：US16785362

申请日：2020-02-07

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Yasuhiko SUGIYAMA ,  Naoko Hirose ,  Hiroshi Oba

IPC: H01J37/248 ,  H01J37/08 ,  H01J37/28

Abstract: Disclosed is a composite charged particle beam apparatus including: an ion supply unit supplying an ion beam; an acceleration voltage application unit applying an acceleration voltage to the ion beam supplied by the ion supply unit to accelerate the ion beam; a first focusing unit focusing the ion beam; a beam booster voltage application unit applying a beam booster voltage to the ion beam; a second focusing unit focusing the ion beam to irradiate a sample; an electron beam emission unit emitting an electron beam to irradiate the sample; and a controller setting a value of the beam booster voltage that the beam booster voltage application unit applies to the ion beam, based on a value of the acceleration voltage applied to the ion beam by the acceleration voltage application unit and of a set value predetermined according to a focal distance of the focused ion beam.

公开(公告)号：US20140291542A1

公开(公告)日：2014-10-02

申请号：US14224149

申请日：2014-03-25

Applicant: Hitachi High-Tech Science Corporation

Inventor： Anto YASAKA ,  Yasuhiko SUGIYAMA ,  Hiroshi OBA

IPC: H01J27/26 ,  H01J37/08

CPC classification number: H01J27/26 ,  H01J1/15 ,  H01J1/18 ,  H01J3/04 ,  H01J27/024 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/06316

Abstract: There is provided an emitter structure, a gas ion source including the emitter structure, and a focused ion beam system including the gas ion source. The emitter structure includes a pair of conductive pins which are fixed to a base member, a filament which is connected between the pair of conductive pins, and an emitter which is connected to the filament and has a sharp tip. A supporting member is fixed to the base material, and the emitter is connected to the supporting member.

Abstract translation: 提供了发射极结构，包括发射极结构的气体离子源和包括气体离子源的聚焦离子束系统。 发射极结构包括固定到基底构件的一对导电引脚，连接在一对导电引脚之间的细丝和连接到灯丝并具有尖锐尖端的发射极。 支撑构件固定在基材上，发射体与支撑构件连接。