公开(公告)号：US20150357147A1

公开(公告)日：2015-12-10

申请号：US14830106

申请日：2015-08-19

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Anto YASAKA ,  Yasuhiko SUGIYAMA ,  Hiroshi OBA

IPC: H01J27/26 ,  H01J27/02 ,  H01J37/08

CPC classification number: H01J27/26 ,  H01J1/15 ,  H01J1/18 ,  H01J3/04 ,  H01J27/024 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/06316

Abstract: A focused ion beam system includes a gas ion source and an emitter structure. The emitter structure includes a pair of conductive pins fixed to a base member, a filament connected between the pair of conductive pins, and an emitter which has a tip end with one atom or three atoms and which is connected to the filament. A supporting member is fixed to the base material, and the emitter is connected to the supporting member.

Abstract translation: 聚焦离子束系统包括气体离子源和发射极结构。 发射极结构包括固定到基底构件的一对导电引脚，连接在一对导电引脚之间的细丝和具有一个原子或三个原子的尖端并连接到灯丝的发射极。 支撑构件固定在基材上，发射体与支撑构件连接。

公开(公告)号：US20170069456A1

公开(公告)日：2017-03-09

申请号：US15256967

申请日：2016-09-06

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Yasuhiko SUGIYAMA ,  Hiroshi OBA

IPC: H01J37/08 ,  H01J37/10

CPC classification number: H01J37/08 ,  H01J37/10 ,  H01J37/12 ,  H01J37/18 ,  H01J2237/0805 ,  H01J2237/083 ,  H01J2237/103

Abstract: A focused ion beam apparatus includes an ion source that emits an ion beam, an extraction electrode that extracts ions from a tip end of an emitter of the ion source, and a first lens electrode that configures a condenser lens by a potential difference with the extraction electrode, the condenser lens focusing the ions extracted by the extraction electrode, in which a strong lens action is generated between the extraction electrode and the first lens electrode so as to focus all ions extracted from the ion source to pass through a hole of the condenser lens including the first lens electrode.

Abstract translation: 聚焦离子束装置包括发射离子束的离子源，从离子源的发射极的前端提取离子的提取电极和通过提取电位差构成聚光透镜的第一透镜电极 电极，所述聚光透镜聚焦由所述提取电极提取的离子，其中在所述提取电极和所述第一透镜电极之间产生强透镜作用，以便将从所述离子源提取的所有离子聚焦通过所述冷凝器的孔 透镜包括第一透镜电极。

公开(公告)号：US20140292189A1

公开(公告)日：2014-10-02

申请号：US14218020

申请日：2014-03-18

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Fumio ARAMAKI ,  Yasuhiko SUGIYAMA ,  Hiroshi OBA

IPC: H01J37/30

CPC classification number: H01J37/08 ,  H01J2237/002 ,  H01J2237/0807

Abstract: A focused ion beam apparatus is configured to perform at least one of a process of controlling an operation of a cooling unit so that a temperature of a wall surface contacting a source gas in an ion source chamber is maintained at a temperature higher than a temperature at which the source gas freezes and a process of controlling an operation of a heater so that an emitter is temporarily heated when the source gas is exchanged.

Abstract translation: 聚焦离子束装置被配置为执行控制冷却单元的操作的处理中的至少一个，使得与离子源室中的源气体接触的壁面的温度保持在高于 源气体冻结，并且控制加热器的操作的过程，使得当更换源气体时发射器被暂时加热。

公开(公告)号：US20240355574A1

公开(公告)日：2024-10-24

申请号：US18687706

申请日：2021-09-01

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Koji NAGAHARA ,  Hiroshi OBA ,  Yasuhiko SUGIYAMA

IPC: H01J37/09 ,  H01J37/08 ,  H01J37/28 ,  H01J37/305

CPC classification number: H01J37/09 ,  H01J37/3056 ,  H01J37/08 ,  H01J37/28 ,  H01J2237/31749

Abstract: An ion beam tube of a composite beam device is provided with an ion source and an ion optics. The ion optics is provided with a diaphragm member in which at least one through-hole that is switchable in order to pass part of an ion beam generated from the ion source therethrough is formed. The ion optics is provided with a blocking member that blocks part of the ion beam passing through the through-hole of the diaphragm member, and a blocking drive mechanism that drives the blocking member. The blocking drive mechanism performs switching between the presence and absence of blocking of the ion beam passing through the through-hole of the diaphragm member by the blocking member in a state where the ion optics maintains a predetermined optical condition.

公开(公告)号：US20140291542A1

公开(公告)日：2014-10-02

申请号：US14224149

申请日：2014-03-25

Applicant: Hitachi High-Tech Science Corporation

Inventor： Anto YASAKA ,  Yasuhiko SUGIYAMA ,  Hiroshi OBA

IPC: H01J27/26 ,  H01J37/08

CPC classification number: H01J27/26 ,  H01J1/15 ,  H01J1/18 ,  H01J3/04 ,  H01J27/024 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/06316

Abstract: There is provided an emitter structure, a gas ion source including the emitter structure, and a focused ion beam system including the gas ion source. The emitter structure includes a pair of conductive pins which are fixed to a base member, a filament which is connected between the pair of conductive pins, and an emitter which is connected to the filament and has a sharp tip. A supporting member is fixed to the base material, and the emitter is connected to the supporting member.

Abstract translation: 提供了发射极结构，包括发射极结构的气体离子源和包括气体离子源的聚焦离子束系统。 发射极结构包括固定到基底构件的一对导电引脚，连接在一对导电引脚之间的细丝和连接到灯丝并具有尖锐尖端的发射极。 支撑构件固定在基材上，发射体与支撑构件连接。

公开(公告)号：US20210296080A1

公开(公告)日：2021-09-23

申请号：US17207184

申请日：2021-03-19

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Hiroshi OBA ,  Yasuhiko SUGIYAMA ,  Yoshitomo NAKAGAWA ,  Koji NAGAHARA

IPC: H01J37/12 ,  H01J37/20 ,  H01J37/09 ,  H01J37/317 ,  H01J37/08 ,  H01J37/21

Abstract: Provided is a focused ion beam processing apparatus including: an ion source; a sample stage a condenser lens; an aperture having a slit in a straight line shape; a projection lens and the sample stage, wherein, in a transfer mode, by Köhler illumination, with an applied voltage of the condenser lens when a focused ion beam is focused on a main surface of the projection lens scaled to be 100, the applied voltage is set to be less than 100 and greater than or equal to 80; a position of the aperture is set such that the focused ion beam is masked by the aperture with the one side of the aperture at a distance greater than 0 μm and equal to or less than 500 μm from a center of the focused ion beam; and the shape of the slit is transferred onto the sample.

公开(公告)号：US20190267208A1

公开(公告)日：2019-08-29

申请号：US16280719

申请日：2019-02-20

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Yoko NAKAJIMA ,  Yoshimi KAWANAMI ,  Hironori MORITANI ,  Hiroshi OBA

IPC: H01J9/02

Abstract: Disclosed is a method of manufacturing an emitter in which the tip of the emitter can be formed into a desired shape even when various materials are used for the emitter. The method includes performing an electrolytic polishing process of polishing a front end of a conductive emitter material so that a diameter of the front end is gradually reduced toward a tip; performing a first etching process by irradiating a processing portion of the emitter material processed by the electrolytic polishing process with a charged particle beam; performing a sputtering process by irradiating the pointed portion formed by the first etching process with a focused ion beam; and performing a secondary etching process of further sharpening the tip by an electric field induced gas etching processing while observing a crystal structure of the tip of the pointed portion processed by the sputtering process using a field ion microscope.

公开(公告)号：US20160225574A1

公开(公告)日：2016-08-04

申请号：US15010231

申请日：2016-01-29

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Anto YASAKA ,  Tomokazu KOZAKAI ,  Osamu MATSUDA ,  Yasuhiko SUGIYAMA ,  Kazuo AITA ,  Fumio ARAMAKI ,  Hiroshi OBA

IPC: H01J37/08

CPC classification number: H01J37/08 ,  H01J2237/0807

Abstract: Disclosed herein is a focused ion beam apparatus equipped with a gas field ion source that can produce a focused ion beam for a long period of time by stably and continuously emitting ions from the gas field ion source having high luminance, along an optical axis of an ion-optical system for a long period of time. In the focused ion beam apparatus equipped with a gas field ion source having an emitter for emitting ions, the emitter has a shape in which sharpened iridium is fixed to dissimilar wire.

Abstract translation: 本发明公开了一种配备有气体离子源的聚焦离子束装置，其可以通过从具有高亮度的气体离子源稳定且连续地发射离子而长时间地产生聚焦离子束，沿着 离子光学系统长时间使用。 在配备有具有用于发射离子的发射极的气体离子源的聚焦离子束装置中，发射体具有将锐化的铱固定在不同的线上的形状。

公开(公告)号：US20130248732A1

公开(公告)日：2013-09-26

申请号：US13845582

申请日：2013-03-18

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tatsuya ASAHATA ,  Yasuhiko SUGIYAMA ,  Hiroshi OBA

IPC: H01J37/10

CPC classification number: H01J37/10 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/0206 ,  H01J2237/04924 ,  H01J2237/216 ,  H01J2237/24535 ,  H01J2237/31749

Abstract: An ion beam apparatus including: an ion source configured to emit an ion beam; a condenser lens electrode configured to condense the ion beam; a condenser lens power source configured to apply a voltage to the condenser lens electrode; a storage portion configured to store, a first voltage value, a second voltage value, a third voltage value, and a fourth voltage value; and a control portion configured to retrieve the third voltage value from the storage portion and set the retrieved third voltage value to the condenser lens power source when an observation mode is switched to a wide-range observation mode, and retrieve the fourth voltage value from the storage portion and set the retrieved fourth voltage value to the condenser lens power source when a processing mode is switched to the wide-range observation mode.

Abstract translation: 一种离子束装置，包括：被配置为发射离子束的离子源; 配置成冷凝离子束的聚光透镜电极; 聚光透镜电源，被配置为向聚光透镜电极施加电压; 存储部，被配置为存储第一电压值，第二电压值，第三电压值和第四电压值; 以及控制部，被配置为当观察模式切换到宽范围观察模式时，从存储部分检索第三电压值，并将检索到的第三电压值设置为聚光透镜电源，并且从第 存储部分，并且当处理模式切换到宽范围观察模式时，将获取的第四电压值设置到聚光透镜电源。