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1.Vapor deposition process to form a retrograde impurity distribution p-n junction formation wherein the vapor contains both donor and acceptor impurities 失效
Title translation: 气相沉积工艺形成逆向杂质分布p-n结形成,其中蒸气含有供体和受体杂质公开(公告)号:US3190773A
公开(公告)日:1965-06-22
申请号:US10310361
申请日:1961-04-14
Applicant: IBM
Inventor: ANDERSON RICHARD L , MARINACE JOHN C , O'ROURKE INGHAM MARY J
IPC: C30B25/02 , H01L21/00 , H01L21/205 , H01L29/00
CPC classification number: H01L21/00 , C30B25/02 , H01L21/02381 , H01L21/02532 , H01L21/02576 , H01L21/0262 , H01L29/00 , Y10S438/925
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公开(公告)号:US3046459A
公开(公告)日:1962-07-24
申请号:US86288759
申请日:1959-12-30
Applicant: IBM
Inventor: ANDERSON RICHARD L , O'ROURKE MARY J
IPC: H01L21/205 , H01L27/00 , H01L29/00 , H01L31/0687
CPC classification number: H01L31/0687 , H01L21/02381 , H01L21/02532 , H01L21/0262 , H01L27/00 , H01L29/00 , Y02E10/544 , Y10S438/979
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公开(公告)号:US3208887A
公开(公告)日:1965-09-28
申请号:US11911161
申请日:1961-06-23
Applicant: IBM
Inventor: ANDERSON RICHARD L
IPC: C30B25/02 , H01L21/205 , H01L29/00 , H03K17/74
CPC classification number: H03K17/74 , C30B25/02 , H01L21/02381 , H01L21/02532 , H01L21/02576 , H01L21/02579 , H01L21/0262 , H01L29/00
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公开(公告)号:US3072507A
公开(公告)日:1963-01-08
申请号:US82411559
申请日:1959-06-30
Applicant: IBM
Inventor: ANDERSON RICHARD L , MARINACE JOHN C , SILVEY GENE A
IPC: C30B19/04 , C30B19/10 , C30B25/02 , C30B25/18 , H01L21/00 , H01L21/205 , H01L21/363 , H01L29/00
CPC classification number: H01L21/00 , C30B19/04 , C30B19/106 , C30B25/02 , C30B25/18 , C30B29/08 , C30B29/10 , H01L21/0237 , H01L21/02395 , H01L21/02521 , H01L21/02573 , H01L21/02631 , H01L29/00 , Y10S148/022 , Y10S148/065 , Y10S148/107 , Y10S148/17
Abstract: 886,393. Coating with germanium. INTERNATIONAL BUSINESS MACHINES CORPORATION. June 16, 1960 [June 30, 1959], No. 21142/60. Class 82(2). [Also in Group XXXVI] A semi-conductor device is made by epitaxially depositing germanium on a gallium arsenide substrate. The device may be produced in the apparatus shown, germanium source 6 and iodine 7 being heated to 550‹C. by coil 2a to form germanium iodide which decomposes on gallium arsenide substrate 5 (maintained at 420‹C. by coil 2b) to deposit germanium layer 9. Thus a diode may be produced by depositing P type germanium on N type gallium arsenide.
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公开(公告)号:US3082283A
公开(公告)日:1963-03-19
申请号:US85539359
申请日:1959-11-25
Applicant: IBM
Inventor: ANDERSON RICHARD L
IPC: H01L21/205 , H01L31/00
CPC classification number: H01L21/02395 , H01L21/02463 , H01L21/02532 , H01L21/02576 , H01L31/00 , Y10S148/072 , Y10S438/933
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公开(公告)号:US2894152A
公开(公告)日:1959-07-07
申请号:US50854055
申请日:1955-05-16
Applicant: IBM
Inventor: ANDERSON RICHARD L
IPC: H01L29/00 , H01L29/417
CPC classification number: H01L29/00 , H01L29/417
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公开(公告)号:US3234057A
公开(公告)日:1966-02-08
申请号:US12828661
申请日:1961-06-23
Applicant: IBM
Inventor: ANDERSON RICHARD L
CPC classification number: H01L21/185 , H01L21/00 , Y10S148/072 , Y10S438/933
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公开(公告)号:US3067387A
公开(公告)日:1962-12-04
申请号:US82701259
申请日:1959-07-14
Applicant: IBM
Inventor: ANDERSON RICHARD L , O'ROURKE MARY J
IPC: G01R31/26
CPC classification number: G01R31/2601
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