公开(公告)号：US07595143B2

公开(公告)日：2009-09-29

申请号：US11508079

申请日：2006-08-22

申请人： Jeong-Min Park ,  Hi-Kuk Lee ,  Hyoc-Min Youn ,  Ki-Hyuk Koo ,  Byung-Uk Kim

发明人： Jeong-Min Park ,  Hi-Kuk Lee ,  Hyoc-Min Youn ,  Ki-Hyuk Koo ,  Byung-Uk Kim

IPC分类号： G03F7/00 ,  G03F7/004

CPC分类号： G03F7/0382 ,  G03F7/105 ,  H01L21/32139 ,  H01L29/66765 ,  H01L29/78669 ,  Y10S430/106 ,  Y10S430/114

摘要： A photoresist composition includes about 10 to about 70% by weight of a binder resin including a phenol-based polymer, about 0.5 to about 10% by weight of a photo-acid generator, about 1 to about 20% by weight of a cross-linker, about 0.1 to about 5% by weight of a dye and about 10 to about 80% by weight of a solvent. The photoresist composition may be applied to, for example, a method of manufacturing a TFT substrate.

摘要翻译： 光致抗蚀剂组合物包括约10至约70重量％的包含酚类聚合物的粘合剂树脂，约0.5至约10重量％的光酸产生剂，约1至约20重量％的交联剂， 接头，约0.1至约5重量％的染料和约10至约80重量％的溶剂。 光致抗蚀剂组合物可以应用于例如制造TFT基板的方法。

公开(公告)号：US20070048662A1

公开(公告)日：2007-03-01

申请号：US11508079

申请日：2006-08-22

申请人： Jeong-Min Park ,  Hi-Kuk Lee ,  Hyoc-Min Youn ,  Ki-Hyuk Koo ,  Byung-Uk Kim

发明人： Jeong-Min Park ,  Hi-Kuk Lee ,  Hyoc-Min Youn ,  Ki-Hyuk Koo ,  Byung-Uk Kim

IPC分类号： G03C1/00

CPC分类号： G03F7/0382 ,  G03F7/105 ,  H01L21/32139 ,  H01L29/66765 ,  H01L29/78669 ,  Y10S430/106 ,  Y10S430/114

摘要： A photoresist composition includes about 10 to about 70% by weight of a binder resin including a phenol-based polymer, about 0.5 to about 10% by weight of a photo-acid generator, about 1 to about 20% by weight of a cross-linker, about 0.1 to about 5% by weight of a dye and about 10 to about 80% by weight of a solvent. The photoresist composition may be applied to, for example, a method of manufacturing a TFT substrate.

摘要翻译： 光致抗蚀剂组合物包括约10至约70重量％的包含酚类聚合物的粘合剂树脂，约0.5至约10重量％的光酸产生剂，约1至约20重量％的交联剂， 接头，约0.1至约5重量％的染料和约10至约80重量％的溶剂。 光致抗蚀剂组合物可以应用于例如制造TFT基板的方法。

公开(公告)号：US07638253B2

公开(公告)日：2009-12-29

申请号：US12082436

申请日：2008-04-11

申请人： Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Hyoc-Min Youn ,  Ki-Hyuk Koo

发明人： Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Hyoc-Min Youn ,  Ki-Hyuk Koo

IPC分类号： G03F7/004 ,  G03F7/023 ,  G03F7/30

CPC分类号： G03F7/0382 ,  H01L21/312 ,  H01L27/1214 ,  H01L27/1288

摘要： In one example, a photoresist composition includes about 1 to about 70 parts by weight of a first binder resin including a repeat unit represented by the following Chemical Formula 1, about 1 to about 70 parts by weight of a second binder resin including a repeat unit represented by the following Chemical Formula 2, about 0.5 to about 10 parts by weight of a photo-acid generator, about 1 to about 20 parts by weight of a cross-linker and about 10 to about 200 parts by weight of a solvent. The photoresist composition may improve the heat resistance and adhesion ability of a photoresist pattern. wherein R1 and R2 independently represent an alkyl group having 1 to 5 carbon atoms, and n and m independently represent a natural number.

摘要翻译： 在一个实例中，光致抗蚀剂组合物包括约1至约70重量份的第一粘合剂树脂，其包含由以下化学式1表示的重复单元，约1至约70重量份的第二粘合剂树脂，其包含重复单元 由以下化学式2表示，约0.5至约10重量份的光酸产生剂，约1至约20重量份的交联剂和约10至约200重量份的溶剂。 光致抗蚀剂组合物可以提高光致抗蚀剂图案的耐热性和粘附能力。 其中R1和R2独立地表示具有1至5个碳原子的烷基，n和m独立地表示自然数。

公开(公告)号：US20080254634A1

公开(公告)日：2008-10-16

申请号：US12082436

申请日：2008-04-11

申请人： Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Hyoc-Min Youn ,  Ki-Hyuk Koo

发明人： Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Hyoc-Min Youn ,  Ki-Hyuk Koo

IPC分类号： H01L21/311 ,  G03F7/004

CPC分类号： G03F7/0382 ,  H01L21/312 ,  H01L27/1214 ,  H01L27/1288

摘要： In one example, a photoresist composition includes about 1 to about 70 parts by weight of a first binder resin including a repeat unit represented by the following Chemical Formula 1, about 1 to about 70 parts by weight of a second binder resin including a repeat unit represented by the following Chemical Formula 2, about 0.5 to about 10 parts by weight of a photo-acid generator, about 1 to about 20 parts by weight of a cross-linker and about 10 to about 200 parts by weight of a solvent. The photoresist composition may improve the heat resistance and adhesion ability of a photoresist pattern. wherein R1 and R2 independently represent an alkyl group having 1 to 5 carbon atoms, and n and m independently represent a natural number.

摘要翻译： 在一个实例中，光致抗蚀剂组合物包括约1至约70重量份的第一粘合剂树脂，其包含由以下化学式1表示的重复单元，约1至约70重量份的第二粘合剂树脂，其包含重复单元 由以下化学式2表示，约0.5至约10重量份的光酸产生剂，约1至约20重量份的交联剂和约10至约200重量份的溶剂。 光致抗蚀剂组合物可以提高光致抗蚀剂图案的耐热性和粘附能力。 其中R 1和R 2独立地表示具有1至5个碳原子的烷基，n和m独立地表示自然数。

公开(公告)号：US20110294243A1

公开(公告)日：2011-12-01

申请号：US13092629

申请日：2011-04-22

申请人： Woo-Seok Jeon ,  Jeong-Min Park ,  Byung-Uk Kim ,  Hyoc-Min Youn ,  Ki-Hyuk Koo ,  Su-Youn Choi ,  Jin-Sun Kim

发明人： Woo-Seok Jeon ,  Jeong-Min Park ,  Byung-Uk Kim ,  Hyoc-Min Youn ,  Ki-Hyuk Koo ,  Su-Youn Choi ,  Jin-Sun Kim

IPC分类号： H01L33/08 ,  G03F7/20 ,  G03F7/004

CPC分类号： G03F7/0007 ,  G02F1/13439 ,  G03F7/0236 ,  G03F7/0382

摘要： A photoresist composition suitable for forming a high-resolution pattern, and a method of forming a photoresist pattern using the same. The photoresist composition includes about 10 to about 45 parts by weight of an alkali soluble binder resin including a hydroxyl group, about 0.1 to about 5 parts by weight of a photo-acid generator, about 1 to about 5 parts by weight of a cross-linker that cross-links the alkali-soluble binder resin including the hydroxyl group, about 0.3 to about 3 parts by weight of a quinone diazide compound, and a remainder of a solvent.

摘要翻译： 适合于形成高分辨率图案的光致抗蚀剂组合物和使用其形成光致抗蚀剂图案的方法。 光致抗蚀剂组合物包括约10至约45重量份的包含羟基的碱溶性粘合剂树脂，约0.1至约5重量份的光酸发生剂，约1至约5重量份的交联剂， 使包含羟基的碱溶性粘合剂树脂交联的接头，约0.3至约3重量份的醌二叠氮化合物和剩余的溶剂。

公开(公告)号：US07989136B2

公开(公告)日：2011-08-02

申请号：US12059113

申请日：2008-03-31

申请人： Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Hyoc-Min Yoon ,  Ki-Hyuk Koo

发明人： Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Hyoc-Min Yoon ,  Ki-Hyuk Koo

IPC分类号： G03F7/028 ,  G03F7/038

CPC分类号： G03F7/038 ,  Y10S430/121 ,  Y10S430/123 ,  Y10S430/128

摘要： A photoresist composition comprises about 0.5 to about 20 parts by weight of a photo-acid generator, about 10 to about 70 parts by weight of a novolac resin containing a hydroxyl group, about 1 to about 40 parts by weight of a cross-linker that comprises an alkoxymethylmelamine compound, and about 10 to about 150 parts by weight of a solvent.

摘要翻译： 光致抗蚀剂组合物包含约0.5至约20重量份的光酸发生剂，约10至约70重量份的含有羟基的酚醛清漆树脂，约1至约40重量份的交联剂， 包括烷氧基甲基蜜胺化合物和约10至约150重量份的溶剂。

公开(公告)号：US08059076B2

公开(公告)日：2011-11-15

申请号：US11782236

申请日：2007-07-24

申请人： Doo-Hee Jung ,  Jeong-Min Park ,  Kyung-Su Mun ,  Hi-Kuk Lee ,  Joo-Ae Youn

发明人： Doo-Hee Jung ,  Jeong-Min Park ,  Kyung-Su Mun ,  Hi-Kuk Lee ,  Joo-Ae Youn

IPC分类号： G09G3/36

CPC分类号： G02F1/13454 ,  G02F2001/133388 ,  G02F2001/136236

摘要： A display panel includes a substrate, signal lines, a thin film transistor, a pixel electrode and a dummy opening. The substrate has a display area and a peripheral area surrounding the display area. The signal lines are disposed on the substrate and intersect each other to define a unit pixel. The thin film transistor is electrically connected to the signal lines and disposed at the unit pixel. The pixel electrode is electrically connected to the thin film transistor. The pixel electrode is formed in the unit pixel. The dummy opening is disposed at the peripheral area and spaced apart from the signal lines.

摘要翻译： 显示面板包括基板，信号线，薄膜晶体管，像素电极和虚拟开口。 基板具有显示区域和围绕显示区域的周边区域。 信号线设置在基板上并彼此相交以限定单位像素。 薄膜晶体管电连接到信号线并且设置在单位像素处。 像素电极电连接到薄膜晶体管。 像素电极形成在单位像素中。 虚设开口设置在周边区域并与信号线间隔开。

公开(公告)号：US20090258497A1

公开(公告)日：2009-10-15

申请号：US12389296

申请日：2009-02-19

申请人： Jeong-Min Park ,  Doo-Hee Jung ,  Jung-Soo Lee ,  Hi-Kuk Lee ,  Sae-Tae Oh ,  Jae-Young Choi ,  Doek-Man Kang

发明人： Jeong-Min Park ,  Doo-Hee Jung ,  Jung-Soo Lee ,  Hi-Kuk Lee ,  Sae-Tae Oh ,  Jae-Young Choi ,  Doek-Man Kang

IPC分类号： H01L21/311 ,  G03F7/00

CPC分类号： G03F7/0236 ,  G03F7/0007

摘要： A photoresist resin composition, a method for forming a pattern and a method for manufacturing a display panel using the photoresist resin composition are disclosed. The photoresist resin composition includes an alkali soluble resin, a photoresist compound, and a solvent, wherein the alkali soluble resin includes a first polymer resin represented by the following Chemical Formula 1, wherein, of R1, R2, R3, R4, R5 and R6, at least one is a hydroxyl group, at least two are methyl groups and any remaining groups are hydrogen, and of R7, R8, R9, R10 and R11, at least one is a hydroxyl group, at least two are methyl groups and any remaining groups are hydrogen.

摘要翻译： 公开了光致抗蚀剂树脂组合物，形成图案的方法和使用该光致抗蚀剂树脂组合物的显示面板的制造方法。 光致抗蚀剂树脂组合物包括碱溶性树脂，光致抗蚀剂化合物和溶剂，其中碱溶性树脂包括由以下化学式1表示的第一聚合物树脂，其中R1，R2，R3，R4，R5和R6 至少一个是羟基，至少两个是甲基，任何剩余的基团是氢，R7，R8，R9，R10和R11中的至少一个是羟基，至少两个是甲基，任何 剩余的基团是氢。

公开(公告)号：US07537974B2

公开(公告)日：2009-05-26

申请号：US11346047

申请日：2006-02-02

申请人： Jeong-Min Park ,  Mi-Sun Ryu ,  Hi-Kuk Lee ,  Woo-Seok Jeon

发明人： Jeong-Min Park ,  Mi-Sun Ryu ,  Hi-Kuk Lee ,  Woo-Seok Jeon

IPC分类号： H01L21/00

CPC分类号： H01L27/1288 ,  G03F7/0007 ,  G03F7/0226 ,  G03F7/0236 ,  H01L27/1214 ,  H01L29/458 ,  H01L29/4908

摘要： A photoresist composition includes a novolac resin having where each of R1, R2, R3, and R4 is an alkyl group having a hydrogen atom or between one through six carbon atoms and n is an integer ranging from zero through three; and a mercapto compound having Z1-SH, or SH-Z2-SH, where each of Z1 and Z2 is an alkyl group or an alkyl group having one through twenty carbon atoms, a sensitizer, and a solvent.

摘要翻译： 光致抗蚀剂组合物包括酚醛清漆树脂，其中R1，R2，R3和R4各自为具有氢原子或1-6个碳原子的烷基，n为0至3的整数; 和具有<？in-line-formula description =“In-line formula”end =“lead”？> Z1-SH或<？in-line-formula description =“In-line formula”end =“ 尾部“？> <？in-line-formula description =”In-line Formulas“end =”lead“？> SH-Z2-SH，<？in-line-formula description =”In-line Formulas“end = 尾“→>其中Z 1和Z 2各自为烷基或具有20个碳原子的烷基，敏化剂和溶剂。

公开(公告)号：US20090090911A1

公开(公告)日：2009-04-09

申请号：US12220145

申请日：2008-07-22

申请人： Seung-Ha Choi ,  Min-Seok Oh ,  Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Sang-Gab Kim

发明人： Seung-Ha Choi ,  Min-Seok Oh ,  Jeong-Min Park ,  Doo-Hee Jung ,  Hi-Kuk Lee ,  Sang-Gab Kim

IPC分类号： H01L29/04 ,  H01L21/84

CPC分类号： H01L27/1288 ,  G02F1/133512 ,  G02F1/136209 ,  H01L27/1214 ,  H01L27/124 ,  H01L29/78633

摘要： A thin film transistor array panel for a flat panel display includes a substrate, a first signal line formed on the substrate, a second signal line intersecting and insulated from the first signal line, a switching element having a first terminal connected to the first signal line, a second terminal connected to the second signal line, and a third terminal, a pixel electrode connected to the third terminal of the switching element, and first and second light blocking members extending parallel to the second signal line, each being disposed on an opposite side of and partially overlapping an respective edge of the second signal line, an interval between the first and second light blocking members being in a range of from more than 1.5 μm to less than 4 μm. The array panel prevents light leakage from the display and improves its transmittance, aperture ratio and color reproducibility.

摘要翻译： 一种用于平板显示器的薄膜晶体管阵列面板包括：衬底，形成在衬底上的第一信号线，与第一信号线相交和绝缘的第二信号线;开关元件，具有连接到第一信号线 ，连接到第二信号线的第二端子，以及第三端子，连接到开关元件的第三端子的像素电极，以及平行于第二信号线延伸的第一和第二遮光部件， 并且部分地与第二信号线的相应边缘重叠，第一和第二遮光构件之间的间隔在大于1.5μm至小于4μm的范围内。 阵列面板可防止显示屏漏光，提高透光率，开口率和色彩再现性。